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20 条记录 (耗时 0.015 秒)

    Low “K” factor hybrid photoresist
    3.
    发明授权
    Low “K” factor hybrid photoresist 失效
    低“K”因子混合光刻胶

    公开(公告)号：US06440635B1

    公开(公告)日：2002-08-27

    申请号：US09675608

    申请日：2000-09-29

    申请人： Steven J. Holmes ,  Ahmad D. Katnani ,  Niranjan M. Patel ,  Paul A. Rabidoux

    发明人： Steven J. Holmes ,  Ahmad D. Katnani ,  Niranjan M. Patel ,  Paul A. Rabidoux

    IPC分类号： G03F7039

    CPC分类号： G03F7/0045 ,  G03F7/095 ,  Y10S430/106 ,  Y10S430/11 ,  Y10S430/111

    摘要： A photoresist having both positive and negative tone components resulting in a lower “k” factor than the single tone photoresist is disclosed. The hybrid resist may either have the negative tone resist or the positive tone resist as the major portion, while the other tone is a relatively minor portion. For examples, a positive tone resist may include a minor portion of a negative tone cross-linker or a negative tone resist may include positively acting functional groups. The hybrid resist of the present invention allows for wider exposure dosage windows, therefore increasing the yield or performance and line density.

    摘要翻译： 公开了具有比单色光致抗蚀剂低的“k”因子的具有正和负色调分量的光致抗蚀剂。 混合抗蚀剂可以具有负色调抗蚀剂或正色调抗蚀剂作为主要部分，而另一种色调是相对较小的部分。 例如，正色调抗蚀剂可以包括负色调交联剂的较小部分或负色调抗蚀剂可以包括正性官能团。 本发明的混合抗蚀剂允许更宽的曝光剂量窗口，从而提高产量或性能和线密度。

    Low “K” factor hybrid photoresist
    7.
    发明授权
    Low “K” factor hybrid photoresist 失效
    低“K”因子混合光刻胶

    公开(公告)号：US06190829B1

    公开(公告)日：2001-02-20

    申请号：US08715288

    申请日：1996-09-16

    申请人： Steve J. Holmes ,  Ahmad D. Katnani ,  Niranjan M. Patel ,  Paul A. Rabidoux

    发明人： Steve J. Holmes ,  Ahmad D. Katnani ,  Niranjan M. Patel ,  Paul A. Rabidoux

    IPC分类号： G03F7004

    CPC分类号： G03F7/0045 ,  G03F7/095 ,  Y10S430/106 ,  Y10S430/11 ,  Y10S430/111

    摘要： A photoresist having both positive and negative tone components resulting in a lower “k” factor than the single tone photoresist is disclosed. The hybrid resist may either have the negative tone resist or the positive tone resist as the major portion, while the other tone is a relatively minor portion. For examples, a positive tone resist may include a minor portion of a negative tone cross-linker or a negative tone resist may include positively acting functional groups. The hybrid resist of the present invention allows for wider exposure dosage windows, therefore increasing the yield or performance and line density.

    摘要翻译： 公开了具有比单色光致抗蚀剂低的“k”因子的具有正和负色调分量的光致抗蚀剂。 混合抗蚀剂可以具有负色调抗蚀剂或正色调抗蚀剂作为主要部分，而另一种色调是相对较小的部分。 例如，正色调抗蚀剂可以包括负色调交联剂的较小部分或负色调抗蚀剂可以包括正性官能团。 本发明的混合抗蚀剂允许更宽的曝光剂量窗口，从而提高产量或性能和线密度。

    Apparatus for forming cavity structures using thermally decomposable surface layer
    9.
    发明授权
    Apparatus for forming cavity structures using thermally decomposable surface layer 失效
    用于使用可热分解表面层形成腔体结构的装置

    公开(公告)号：US5785800A

    公开(公告)日：1998-07-28

    申请号：US668294

    申请日：1996-06-21

    申请人： Govindarajan Natarajan ,  Niranjan M. Patel ,  Kurt A. Smith

    发明人： Govindarajan Natarajan ,  Niranjan M. Patel ,  Kurt A. Smith

    IPC分类号： H01L23/12 ,  H01L21/48 ,  B32B31/20

    CPC分类号： B32B37/0023 ,  B32B37/26 ,  H01L21/4807 ,  H01L21/4857 ,  B32B2315/02 ,  Y10S428/901 ,  Y10T428/24322 ,  Y10T428/24331

    摘要： The present invention relates generally to a new apparatus and method for forming cavities in semiconductor substrates without the necessity of using an insert. More particularly, the invention encompasses an apparatus and a method for fabricating cavities in semiconductor substrates wherein a thermally decomposable surface layer is placed over the cavity prior to lamination and caused to conform to the contour of the cavity, thus preventing collapse of, or damage to, the cavity shelves during the lamination process. After the lamination process, the thermally decomposable surface layer is conveniently removed in pyrolysis and binder removal segments of the sinter process without causing damage to the cavity shelves or paste pull-outs.

    摘要翻译： 本发明一般涉及一种用于在半导体衬底中形成空腔的新装置和方法，而不需要使用插入件。 更具体地说，本发明包括一种用于在半导体衬底中制造空腔的装置和方法，其中在层压之前将可热分解的表面层放置在空腔上方并使其符合空腔的轮廓，从而防止破坏或损坏 ，层压过程中的腔架。 在层压过程之后，在热解和烧结过程的粘合剂去除段中方便地去除可热分解的表面层，而不会损坏空腔架或浆料抽出。

    Cationic complex of technetium-99m.
    10.
    发明授权
    Cationic complex of technetium-99m. 失效
    锝99m阳离子配合物。

    公开(公告)号：US4781912A

    公开(公告)日：1988-11-01

    申请号：US941917

    申请日：1986-12-15

    申请人： Giuseppe D. Zanelli ,  Frank Brady ,  Niranjan M. Patel ,  Avijit Lahiri

    发明人： Giuseppe D. Zanelli ,  Frank Brady ,  Niranjan M. Patel ,  Avijit Lahiri

    IPC分类号： A61K51/00 ,  A61K51/04 ,  C07F13/00 ,  A61K49/02

    CPC分类号： A61K51/0489 ,  A61K51/0478 ,  C07F13/005 ,  A61K2123/00

    摘要： The invention relates to a cationic complex of technetium-99m with(a) at least one bidendate ligand X having the formulaR.sub.1 R.sub.2 ZQZR.sub.3 R.sub.4 whereeach Z is phosphorus or arsenic,Q is a (CH.sub.2).sub.n linking group where n is 2 to 8 or a 1,2-phenylene linking group,each of R.sub.1, R.sub.2, R.sub.3 and R.sub.4 is hydrogen, C.sub.1 to C.sub.5 alkyl or phenyl; and(b) at least one monodentate isonitrile ligand Y.The invention also relates to a radiopharmaceutical composition comprising said complex, to a kit for preparing said composition, and to the use of said composition for a radiodiagnostic examination.

    摘要翻译： 本发明涉及锝-99m的阳离子络合物和（a）至少一种具有式R1R2ZQZR3R4的锑酸盐配体X，其中每个Z是磷或砷，Q是（2）n连接基团，其中n为2至8或a 1,2-亚苯基连接基，R1，R2，R3和R4各自为氢，C1至C5烷基或苯基; 和（b）至少一种单齿异腈配体Y.本发明还涉及包含所述复合物，制备所述组合物的试剂盒以及所述组合物用于放射诊断检查的放射性药物组合物。