公开(公告)号：US20200004160A1

公开(公告)日：2020-01-02

申请号：US16420134

申请日：2019-05-22

申请人： Yu-Chih CHEN ,  Po-Chung CHENG ,  Li-Jui CHEN ,  Shang-Chieh CHIEN ,  Sheng-Kang YU ,  Wei-Chun YEN

发明人： Yu-Chih CHEN ,  Po-Chung CHENG ,  Li-Jui CHEN ,  Shang-Chieh CHIEN ,  Sheng-Kang YU ,  Wei-Chun YEN

IPC分类号： G03F7/20 ,  G02B5/08 ,  H05G2/00

摘要： An EUV collector mirror for an extreme ultra violet (EUV) radiation source apparatus includes an EUV collector mirror body on which a reflective layer as a reflective surface is disposed, a heater attached to or embedded in the EUV collector mirror body and a drain structure to drain melted metal from the reflective surface of the EUV collector mirror body to a back side of the EUV collector mirror body.

公开(公告)号：US07675604B2

公开(公告)日：2010-03-09

申请号：US11427434

申请日：2006-06-29

申请人： Li-Jui Chen ,  Tzung-Chi Fu ,  Ching-Yu Chang ,  Fu-Jye Liang ,  Lin-Hung Shiu ,  Chun-Kuang Chen ,  Tsai-Sheng Gau

发明人： Li-Jui Chen ,  Tzung-Chi Fu ,  Ching-Yu Chang ,  Fu-Jye Liang ,  Lin-Hung Shiu ,  Chun-Kuang Chen ,  Tsai-Sheng Gau

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70341

摘要： A lithography apparatus includes an imaging lens module; a substrate table positioned underlying the imaging lens module and configured to hold a substrate; a fluid retaining module configured to hold a fluid in a space between the imaging lens module and a substrate on the substrate stage; and a heating element configured in the fluid retaining module and adjacent to the space. The heating element includes at least two of following: a sealant insoluble to the fluid for sealing the heating element in the fluid retaining module; a sealed opening configured in one of top portion and side portion of the fluid retaining module for sealing the heating element in the fluid retaining module; and/or a non-uniform temperature compensation device configured with the heating element.

摘要翻译： 光刻设备包括成像透镜模块; 位于所述成像透镜模块下方且被配置为保持基板的基板台; 流体保持模块，被配置为将流体保持在所述成像透镜模块和所述基板载台上的基板之间的空间中; 以及配置在所述流体保持模块中且与所述空间相邻的加热元件。 所述加热元件包括以下至少两个：对所述流体不溶的密封剂，用于密封所述流体保持模块中的所述加热元件; 密封开口，其构造在流体保持模块的顶部和侧部之一中，用于密封流体保持模块中的加热元件; 和/或配置有加热元件的不均匀的温度补偿装置。

公开(公告)号：US20080309892A1

公开(公告)日：2008-12-18

申请号：US11764573

申请日：2007-06-18

申请人： Li-Jui Chen ,  Tsai-Sheng Gau ,  Chi-Kang Peng

发明人： Li-Jui Chen ,  Tsai-Sheng Gau ,  Chi-Kang Peng

IPC分类号： G03B27/42 ,  G01N21/00

CPC分类号： G03B27/42 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70908

摘要： An immersion lithography system, comprising a lens unit configured to project a pattern from an end thereof and onto a wafer, a hood unit configured to confine an immersion fluid to a region of the wafer surrounding the end of the lens unit, a wafer stage configured to position the wafer proximate the end of the lens unit, and at least one of an image capturing apparatus and a scattering light detection apparatus, wherein the image capturing apparatus is coupled to the wafer stage and is configured to capture an image of a surface of the hood unit proximate the wafer stage, and wherein the scattering light detection apparatus is proximate the end of the lens unit and the hood unit and is configured to detect particles on a surface of the wafer stage.

摘要翻译： 一种浸没光刻系统，包括被配置为将图案从其端部突出到晶片上的透镜单元，被配置为将浸没流体限制在围绕透镜单元的端部的晶片的区域的罩单元，被配置为 将晶片定位在透镜单元的端部附近，以及图像捕获设备和散射光检测设备中的至少一个，其中图像捕获设备耦合到晶片台，并且被配置为捕获图像的表面的图像 所述罩单元靠近所述晶片台，并且其中所述散射光检测装置靠近所述透镜单元和所述罩单元的端部，并且被配置为检测所述晶片台的表面上的颗粒。

公开(公告)号：US20070258060A1

公开(公告)日：2007-11-08

申请号：US11427434

申请日：2006-06-29

申请人： Li-Jui CHEN ,  Tzung-Chi FU ,  Ching-Yu CHANG ,  Fu-Jye LIANG ,  Lin-Hung SHIU ,  Chun-Kuang CHEN ,  Tsai-Sheng GAU

发明人： Li-Jui CHEN ,  Tzung-Chi FU ,  Ching-Yu CHANG ,  Fu-Jye LIANG ,  Lin-Hung SHIU ,  Chun-Kuang CHEN ,  Tsai-Sheng GAU

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A lithography apparatus includes an imaging lens module; a substrate table positioned underlying the imaging lens module and configured to hold a substrate; a fluid retaining module configured to hold a fluid in a space between the imaging lens module and a substrate on the substrate stage; and a heating element configured in the fluid retaining module and adjacent to the space. The heating element includes at least one of following: a sealant insoluble to the fluid for sealing the heating element in the fluid retaining module; a sealed opening configured in one of top portion and side portion of the fluid retaining module for sealing the heating element in the fluid retaining module; and/or a non-uniform temperature compensation device configured with the heating element.

摘要翻译： 光刻设备包括成像透镜模块; 位于所述成像透镜模块下方且被配置为保持基板的基板台; 流体保持模块，被配置为将流体保持在所述成像透镜模块和所述基板载台上的基板之间的空间中; 以及配置在所述流体保持模块中且与所述空间相邻的加热元件。 所述加热元件包括以下至少一种：不溶于所述流体以密封所述流体保持模块中的所述加热元件的密封剂; 密封开口，其构造在流体保持模块的顶部和侧部之一中，用于密封流体保持模块中的加热元件; 和/或配置有加热元件的不均匀的温度补偿装置。

公开(公告)号：US07135259B2

公开(公告)日：2006-11-14

申请号：US10447010

申请日：2003-05-28

申请人： Li-Jui Chen ,  Chih-Ming Ke ,  Bang-Ching Ho ,  Jen-Chieh Shih ,  Tsai-Sheng Gau

发明人： Li-Jui Chen ,  Chih-Ming Ke ,  Bang-Ching Ho ,  Jen-Chieh Shih ,  Tsai-Sheng Gau

IPC分类号： H01L21/66

CPC分类号： G01K11/12 ,  G01K11/00 ,  G01K11/125 ,  G03F7/38

摘要： A method of determining temperatures at localized regions of a substrate during processing of the substrate in a photolithography process includes the following steps: independently illuminating a photoresist layer including a photoresist pattern at a plurality of locations on the substrate with a light source, so that light is diffracted off the plurality of locations of the photoresist pattern; measuring the diffracted light from the plurality of locations to determine measured diffracted values associated with respective locations from the plurality of locations; and comparing the measured diffracted values against a library to determine a pre-illumination process temperature of the photoresist layer at the plurality of locations.

摘要翻译： 在光刻工艺中在衬底处理期间确定衬底的局部区域处的温度的方法包括以下步骤：用光源在衬底上的多个位置处独立地照射包括光致抗蚀剂图案的光致抗蚀剂图案，使得光 从光致抗蚀剂图案的多个位置衍射; 测量来自多个位置的衍射光，以确定与来自多个位置的相应位置相关联的测量的衍射值; 以及将测量的衍射值与文库进行比较，以确定多个位置处的光致抗蚀剂层的预照射过程温度。

公开(公告)号：US20050282396A1

公开(公告)日：2005-12-22

申请号：US10872238

申请日：2004-06-18

申请人： Yu-Liang Lin ,  Henry Lo ,  Chung-Long Chang ,  Gorge Huang ,  Tony Lu ,  Gnesh Yeh ,  Candy Liang ,  Chun-Hsien Lin ,  Mei Sheng Zhou ,  Sunny Wu ,  Ai-Sen Liu ,  Cheng-Lin Huang ,  Li-Jui Chen ,  Shih Wang

发明人： Yu-Liang Lin ,  Henry Lo ,  Chung-Long Chang ,  Gorge Huang ,  Tony Lu ,  Gnesh Yeh ,  Candy Liang ,  Chun-Hsien Lin ,  Mei Sheng Zhou ,  Sunny Wu ,  Ai-Sen Liu ,  Cheng-Lin Huang ,  Li-Jui Chen ,  Shih Wang

IPC分类号： H01L21/00 ,  H01L21/302 ,  H01L21/311 ,  H01L21/336 ,  H01L21/461 ,  H01L23/544

CPC分类号： H01L23/544 ,  H01L21/31111 ,  H01L21/67282 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2223/5446 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method and apparatus for locally etching a substrate area the method including providing a substrate comprising a process surface; depositing a material layer over the process surface; and, applying a wet etchant to cover a targeted etching portion of the process surface while excluding an adjacent surrounding area to selectively etch the material layer overlying the targeted etching portion.

摘要翻译： 一种用于局部蚀刻衬底区域的方法和装置，该方法包括提供包含工艺表面的衬底; 在工艺表面上沉积材料层; 以及施加湿蚀刻剂以覆盖所述工艺表面的目标蚀刻部分，同时排除相邻的周围区域以选择性地蚀刻覆盖所述目标蚀刻部分的所述材料层。

公开(公告)号：US06768555B2

公开(公告)日：2004-07-27

申请号：US10103619

申请日：2002-03-21

申请人： Li-Jui Chen ,  Ran-Jin Lin

发明人： Li-Jui Chen ,  Ran-Jin Lin

IPC分类号： G01B902

CPC分类号： G01J3/26

摘要： Within a Fabry-Perot filter apparatus, a method for fabricating the Fabry-Perot filter apparatus and a method for operating the Fabry-Perot filter apparatus, there is employed a Fabry-Perot filter and at least one color filter layer, both assembled over a substrate and covering at least two optical transducer elements which are formed within the substrate. Within the foregoing apparatus and methods, the at least one color filter layer comprises at least two color filter elements of separate color, each registered with a separate optical transducer element within the at least two optical transducer elements. The apparatus and methods provide for enhanced optical discrimination properties.

摘要翻译： 在法布里 - 珀罗过滤器装置中，制造法布里 - 珀罗过滤装置的方法和操作法布里 - 珀罗过滤装置的方法，采用了法布里 - 珀罗过滤器和至少一个滤色器层， 衬底并且覆盖形成在衬底内的至少两个光学换能器元件。 在上述装置和方法中，至少一个滤色器层包括至少两个分离颜色的滤色器元件，每个滤色器元件与至少两个光学换能器元件内的单独的光学换能器元件配准。 该装置和方法提供增强的光学鉴别特性。

公开(公告)号：US20130229638A1

公开(公告)日：2013-09-05

申请号：US13411245

申请日：2012-03-02

申请人： Li-Jui Chen ,  Fu-Jye Liang ,  Hsueh-Hung Wu

发明人： Li-Jui Chen ,  Fu-Jye Liang ,  Hsueh-Hung Wu

IPC分类号： G03B27/42

CPC分类号： G03F9/7096 ,  G03F9/7019

摘要： Disclosed is a lithography system. The lithography system includes a lithography exposure tool designed for performing an exposure process to a radiation-sensitive material layer coated on an integrated circuit substrate; an alignment module coupled with the lithography exposure tool, designed for alignment measurement, and configured for transferring the integrated circuit substrate to the lithography exposure tool; and an alignment calibration module designed to calibrate the alignment module relative to the lithography exposure.

摘要翻译： 公开了一种光刻系统。 光刻系统包括设计用于对涂覆在集成电路基板上的辐射敏感材料层进行曝光处理的光刻曝光工具; 与光刻曝光工具耦合的对准模块，设计用于对准测量，并且被配置为将集成电路基板传送到光刻曝光工具; 以及设计用于相对于光刻曝光校准对准模块的对准校准模块。

公开(公告)号：US20130201463A1

公开(公告)日：2013-08-08

申请号：US13365845

申请日：2012-02-03

申请人： Li-Jui Chen

发明人： Li-Jui Chen

IPC分类号： G03B27/54

CPC分类号： G03F9/7034 ,  G03F7/7085

摘要： Disclosed is a lithography system. The lithography system includes a radiation source for providing radiation energy; a reticle stage configured to hold a reticle; an imaging lens module configured to direct the radiation energy onto a substrate to form an image of the reticle; and a leveling sensor configured to receive a leveling signal from an exposure field of the reticle secured on the reticle stage.

摘要翻译： 公开了一种光刻系统。 光刻系统包括用于提供辐射能量的辐射源; 被配置为保持掩模版的掩模版台; 成像透镜模块，被配置为将辐射能量引导到基板上以形成所述掩模版的图像; 以及调平传感器，其被配置为从固定在所述标线片台上的所述掩模版的曝光区域接收调平信号。

公开(公告)号：US08329360B2

公开(公告)日：2012-12-11

申请号：US12631591

申请日：2009-12-04

申请人： Guo-Tsai Huang ,  Fu-Jye Liang ,  Li-Jui Chen ,  Chih-Ming Ke

发明人： Guo-Tsai Huang ,  Fu-Jye Liang ,  Li-Jui Chen ,  Chih-Ming Ke

IPC分类号： G03F1/00 ,  H01L21/66

CPC分类号： G03F7/70283 ,  G03F7/70633 ,  H01L2924/0002 ,  H01L2924/00

摘要： Provided is an apparatus that includes an overlay mark. The overlay mark includes a first portion that includes a plurality of first features. Each of the first features have a first dimension measured in a first direction and a second dimension measured in a second direction that is approximately perpendicular to the first direction. The second dimension is greater than the first dimension. The overlay mark also includes a second portion that includes a plurality of second features. Each of the second features have a third dimension measured in the first direction and a fourth dimension measured in the second direction. The fourth dimension is less than the third dimension. At least one of the second features is partially surrounded by the plurality of first features in both the first and second directions.

摘要翻译： 提供了一种包括重叠标记的装置。 覆盖标记包括包括多个第一特征的第一部分。 每个第一特征具有在第一方向上测量的第一尺寸和在大致垂直于第一方向的第二方向上测量的第二尺寸。 第二维度大于第一维度。 覆盖标记还包括包括多个第二特征的第二部分。 每个第二特征具有在第一方向上测量的第三尺寸，并且在第二方向上测量第四尺寸。 第四个维度小于第三个维度。 第二特征中的至少一个在第一和第二方向上被多个第一特征部分地包围。