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    RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR
    1.
    发明申请
    RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR 有权
    抗蚀剂组合物，形成抗蚀剂图案，新型化合物和酸产生剂的方法

    公开(公告)号：US20110287362A1

    公开(公告)日：2011-11-24

    申请号：US13106691

    申请日：2011-05-12

    申请人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Kazushige Dohtani

    发明人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Kazushige Dohtani

    IPC分类号： G03F7/004 ,  C07D335/16 ,  C07D493/18 ,  G03F7/20 ,  C07D327/04

    CPC分类号： G03F7/0045 ,  C07D333/52 ,  C07D333/76 ,  C07D493/18 ,  C07D497/08 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

    摘要： A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) represented by general formula (b1-1) shown below (in the formula, RX represents a divalent aliphatic group of 3 to 20 carbon atoms; RY represents a monovalent aliphatic group of 3 to 20 carbon atoms having —C(═O)—O— or —S(═O)2—; each of R1 and R2 independently represents a divalent linking group; and Z+ represents a monovalent organic cation).

    摘要翻译： 一种抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和曝光时产生酸的酸发生剂成分（B），所述酸发生剂成分（B）含有酸发生剂 （b1）表示的通式（b1-1）（式中，RX表示碳原子数3〜20的2价脂肪族基团; RY表示碳原子数3〜20的1价脂肪族基团，具有-C（= 0） ）-O-或-S（= O）2 - ; R 1和R 2各自独立地表示二价连接基团; Z +表示一价有机阳离子）。

    RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
    5.
    发明申请
    RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 审中-公开
    耐蚀组合物和形成耐力图案的方法

    公开(公告)号：US20110008728A1

    公开(公告)日：2011-01-13

    申请号：US12788160

    申请日：2010-05-26

    申请人： Tsuyoshi NAKAMURA ,  Masaru TAKESHITA ,  Jiro YOKOYA ,  Hideo HADA ,  Kensuke MATSUZAWA ,  Kazushige DOHTANI

    发明人： Tsuyoshi NAKAMURA ,  Masaru TAKESHITA ,  Jiro YOKOYA ,  Hideo HADA ,  Kensuke MATSUZAWA ,  Kazushige DOHTANI

    IPC分类号： G03F7/20 ,  G03F7/004

    CPC分类号： G03F7/0045 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/12 ,  C07C309/19 ,  C08F220/18 ,  C08F220/24 ,  C08F2220/281 ,  C08F2220/285 ,  G03F7/0035 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/0397 ,  G03F7/2041 ,  C08F220/28

    摘要： A resist composition including: a base component which exhibits changed solubility in an alkali developing solution under the action of acid; and an acid-generator component containing an acid generator (B1) consisting of a compound represented by general formula (b1); dissolved in an organic solvent containing an alcohol-based organic solvent having a boiling point of at least 150° C., wherein R7″ to R9″ represents an aryl group or an alkyl group, provided that at least one of R7″ to R9″ represents a substituted aryl group which has been substituted with a group represented by the formula: —O—R70 (R70 represents an organic group), and two of R7″ to R9″ may be mutually bonded to form a ring with the sulfur atom; X represents a hydrocarbon group of 3 to 30 carbon atoms; Q1 represents a divalent linking group containing an oxygen atom; and Y1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group of 1 to 4 carbon atoms.

    摘要翻译： 一种抗蚀剂组合物，其包含：在酸的作用下在碱性显影液中显示出改变的溶解度的碱成分; 以及含有由通式（b1）表示的化合物构成的酸发生剂（B1）的酸发生剂成分。 溶解在含有沸点至少为150℃的醇类有机溶剂的有机溶剂中，其中R7“至R9”表示芳基或烷基，条件是R7“至R9”中的至少一个 表示被由下式表示的基团取代的取代的芳基：-R-70（R70表示有机基团），并且R7“至R9”中的两个可以相互键合形成具有硫原子的环; X表示3〜30个碳原子的烃基; Q1表示含有氧原子的二价连接基团; Y1表示碳原子数为1〜4的亚烷基或碳原子数1〜4的氟化亚烷基。