发明授权
US08932795B2 Resist composition, method of forming resist pattern, novel compound, and acid generator
有权
抗蚀剂组合物，抗蚀剂图案形成方法，新型化合物和酸发生剂
- 专利标题： Resist composition, method of forming resist pattern, novel compound, and acid generator
- 专利标题（中）： 抗蚀剂组合物，抗蚀剂图案形成方法，新型化合物和酸发生剂
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申请号： US13106691申请日： 2011-05-12
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公开(公告)号： US08932795B2公开(公告)日： 2015-01-13
- 发明人: Takehiro Seshimo , Yoshiyuki Utsumi , Kazushige Dohtani
- 申请人： Takehiro Seshimo , Yoshiyuki Utsumi , Kazushige Dohtani
- 申请人地址： JP Kawasaki-shi
- 专利权人： Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人： Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人地址： JP Kawasaki-shi
- 代理机构： Knobbe Martens Olson & Bear LLP
- 优先权： JP2010-115452 20100519
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/20 ; C07D333/52 ; C07D333/76 ; C07D493/18 ; C07D497/08 ; G03F7/039
摘要：
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) represented by general formula (b1-1) shown below (in the formula, RX represents a divalent aliphatic group of 3 to 20 carbon atoms; RY represents a monovalent aliphatic group of 3 to 20 carbon atoms having —C(═O)—O— or —S(═O)2—; each of R1 and R2 independently represents a divalent linking group; and Z+ represents a monovalent organic cation).
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