公开(公告)号：US08389197B2

公开(公告)日：2013-03-05

申请号：US11994602

申请日：2006-06-30

申请人： Takako Hirosaki ,  Daiju Shiono ,  Taku Hirayama ,  Hideo Hada

发明人： Takako Hirosaki ,  Daiju Shiono ,  Taku Hirayama ,  Hideo Hada

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/20 ,  G03F7/30

CPC分类号： G03F7/0397 ,  C07C67/343 ,  C07C69/712 ,  C07C2603/74 ,  G03F7/0045

摘要： The present invention provides a positive resist composition and a resist pattern forming method that are capable of forming a resist pattern with a reduced level of roughness. The positive resist composition includes the compound represented by the general formula (I) below. The present invention also provides the resist pattern forming method using the positive resist composition above. [wherein, in formula (I), R11 and R12 each represents, independently, an alkyl group of 1 to 10 carbon atoms or an aromatic hydrocarbon group, and may include a hetero atom in the structure thereof; R21 to R24 each represents, independently, a hydrogen atom or an acid dissociable, dissolution inhibiting group, and two of the R21 to R24 represents a hydrogen atom and the others represents an acid dissociable, dissolution inhibiting group; X is a group represented by general formulas (Ia) or (Ib) below].

摘要翻译： 本发明提供能够形成具有降低的粗糙度的抗蚀剂图案的正型抗蚀剂组合物和抗蚀剂图案形成方法。 正型抗蚀剂组合物包括由下述通式（I）表示的化合物。 本发明还提供了使用上述正型抗蚀剂组合物的抗蚀剂图案形成方法。 式（I）中，R 11和R 12分别独立地表示1〜10个碳原子的烷基或芳香族烃基，其结构中可以含有杂原子; R21〜R24各自独立地表示氢原子或酸解离的溶解抑制基团，R21〜R24中的两个表示氢原子，其余表示酸解离，溶解抑制基团。 X为下述通式（Ia）或（Ib）表示的基团。

公开(公告)号：US08206890B2

公开(公告)日：2012-06-26

申请号：US12499610

申请日：2009-07-08

申请人： Akiya Kawaue ,  Yoshiyuki Utsumi ,  Takehiro Seshimo ,  Tsuyoshi Nakamura ,  Naoto Motoike ,  Hiroaki Shimizu ,  Kensuke Matsuzawa ,  Hideo Hada

发明人： Akiya Kawaue ,  Yoshiyuki Utsumi ,  Takehiro Seshimo ,  Tsuyoshi Nakamura ,  Naoto Motoike ,  Hiroaki Shimizu ,  Kensuke Matsuzawa ,  Hideo Hada

IPC分类号： G03F7/039 ,  C07C381/12 ,  C07C309/04 ,  C07C309/17

CPC分类号： G03F7/0045 ,  C07C309/09 ,  C07C309/10 ,  C07C309/17 ,  C07C311/48 ,  C07C311/51 ,  C07C317/04 ,  C07C317/10 ,  C07C381/12 ,  C07C2601/14 ,  C07C2602/42 ,  C07C2603/74 ,  C07D307/92 ,  C07D307/94 ,  C07D493/18 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/122

摘要： A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below: wherein R7″ to R9″ each independently represent an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X− represents an anion; and Rf represents a fluorinated alkyl group.

摘要翻译： 一种抗蚀剂组合物，其包含：在酸的作用下在碱性显影液中表现出改变的溶解度的碱成分（A） 和产生酸的酸发生剂组分（B），其中所述酸产生剂组分（B）包含酸产生剂（B1），其包含如下所示的由通式（b1-11）表示的化合物：其中R7“至 R9“各自独立地表示芳基或烷基，其中R7”至R9“中的两个可以彼此键合以形成具有硫原子的环，并且R 7”至R 9“中的至少一个表示取代的芳基 具有下述通式（I）表示的基团作为取代基的基团; X-表示阴离子; Rf表示氟化烷基。

公开(公告)号：US08012669B2

公开(公告)日：2011-09-06

申请号：US12400203

申请日：2009-03-09

申请人： Hiroaki Shimizu ,  Yasuhiro Yoshii ,  Yoshiyuki Utumi ,  Hideo Hada

发明人： Hiroaki Shimizu ,  Yasuhiro Yoshii ,  Yoshiyuki Utumi ,  Hideo Hada

IPC分类号： G03F7/00 ,  G03F7/004

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

摘要： A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1) shown below (wherein Q1 represents a divalent linkage group containing an oxygen atom; Y1 represents a fluorinated alkylene group of 1 to 4 carbon atoms which may have a substituent, with the proviso that the carbon atom adjacent to the sulfur atom within the —SO3− group has a fluorine atom bonded thereto; X represents a hydrocarbon group of 3 to 30 carbon atoms which may have a substituent; and A+ represents an organic cation), and the resist composition further including an organic compound (C) which generates an acid exhibiting a weaker acid strength than the acid generated from the acid generator (B1) upon exposure. [Chemical Formula 1] X-Q1-Y1—SO3+A+  (b1)

摘要翻译： 一种抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和曝光时产生酸的酸发生剂成分（B），所述酸发生剂成分（B）含有酸发生剂 （b1）由下述通式（b1）表示的化合物（其中Q1表示含有氧原子的二价连接基团; Y1表示可具有取代基的1〜4个碳原子的氟化亚烷基，条件是 与-SO 3 - 基中的硫原子相邻的碳原子具有氟原子键合; X表示可以具有取代基的碳原子数3〜30的烃基，A +表示有机阳离子），抗蚀剂 组合物还包含有机化合物（C），该有机化合物（C）在曝光时产生的酸强度比酸产生剂（B1）产生的酸弱。 [化学式1] X-Q1-Y1-SO3 + A +（b1）

公开(公告)号：US07910284B2

公开(公告)日：2011-03-22

申请号：US11838951

申请日：2007-08-15

申请人： Kyoko Kojima ,  Hideo Hada ,  Daiju Shiono

发明人： Kyoko Kojima ,  Hideo Hada ,  Daiju Shiono

IPC分类号： G03F7/004 ,  G03F7/30 ,  C07C63/00 ,  C07C43/23

CPC分类号： C07C39/17 ,  C07C39/15 ,  G03F7/0382 ,  Y10S430/106

摘要： To overcome the problem that a device performance is degraded by the edge roughness of a photoresist pattern, a mixture of polynuclear phenol compounds having, in one molecule, 0 to 6 functional groups which are chemically converted due to actions of an acid with the solubility in an alkaline developer reduced is used as a material for photoresist. In the mixture, two or more triphenyl methane structures are bonded to portions other than the functional group in the nonconjugated state. Furthermore, the mixture comprises polynuclear compounds with the average number of functional groups of 2.5 or below and includes the polynuclear compounds not having any functional group per molecule by 15% or less in the term of weight ratio, and the polynuclear phenol compounds having 3 or more functional groups per molecule by 40% or less.

摘要翻译： 为了克服由光致抗蚀剂图案的边缘粗糙度降低器件性能的问题，在一分子中具有0至6个官能团的多核酚化合物的混合物，其由于酸的作用而具有溶解度而化学转化 还原的碱性显影剂被用作光致抗蚀剂的材料。 在该混合物中，在非共轭状态下，将两个以上的三苯基甲烷结构键合至官能团以外的部分。 此外，该混合物包含平均官能团数为2.5或更低的多核化合物，并且包括在重量比方面每分子不具有15％或更少的任何官能团的多核化合物，并且多核苯酚化合物具有3或 每个分子更多的官能团减少40％以下。

公开(公告)号：US07829259B2

公开(公告)日：2010-11-09

申请号：US12365752

申请日：2009-02-04

申请人： Hideo Hada ,  Masaru Takeshita ,  Shogo Matsumaru ,  Hiroaki Shimizu

发明人： Hideo Hada ,  Masaru Takeshita ,  Shogo Matsumaru ,  Hiroaki Shimizu

IPC分类号： G03F7/039 ,  G03F7/028 ,  C08F2/38

CPC分类号： G03F7/0045 ,  G03F7/0397 ,  Y10S430/109 ,  Y10S430/115

摘要： A resin for photoresist compositions is disclosed with excellent resolution and line edge roughness characteristics. A photoresist composition and a method for forming a resist pattern using such a resin are also disclosed. The resin has a hydroxyl group bonded to a carbon atom at a polymer terminal, and the carbon atom in the α-position to the hydroxyl group has at least one electron attractive group.

摘要翻译： 公开了用于光致抗蚀剂组合物的树脂，其具有优异的分辨率和线边缘粗糙度特性。 还公开了光致抗蚀剂组合物和使用这种树脂形成抗蚀剂图案的方法。 该树脂在聚合物末端具有与碳原子键合的羟基，并且与羟基的α-位上的碳原子具有至少一个吸电子基团。

公开(公告)号：US20100151383A1

公开(公告)日：2010-06-17

申请号：US12707462

申请日：2010-02-17

申请人： Toshiyuki Ogata ,  Syogo Matsumaru ,  Hideo Hada ,  Masaaki Yoshida

发明人： Toshiyuki Ogata ,  Syogo Matsumaru ,  Hideo Hada ,  Masaaki Yoshida

IPC分类号： G03F7/20 ,  G03F7/004 ,  C08F224/00

CPC分类号： C08F220/28 ,  C07C69/54 ,  C07C2601/14 ,  C08F222/1006 ,  C08F232/08 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

摘要： A polymer compound that, within a chemically amplified positive resist system, exhibits a significant change in alkali solubility from a state prior to exposure to that following exposure, as well as a photoresist composition that includes such a polymer compound and a method for forming a resist pattern, which are capable of forming fine patterns with a high level of resolution. The polymer compound includes, as an alkali-soluble group (i), a substituent group in which a group selected from amongst alcoholic hydroxyl groups, carboxyl groups, and phenolic hydroxyl groups is protected with an acid dissociable, dissolution inhibiting group (ii) represented by a general formula (1) shown below: [Formula 1] —CH2—O-AO—CH2—]n  (1) (wherein, A represents an organic group of 1 to 20 carbon atoms with a valency of at least n+1, and n represents an integer from 1 to 4).

摘要翻译： 化学放大型正性抗蚀剂体系内的曝光后的状态下的碱溶解度显着变化的高分子化合物以及包含这种高分子化合物的光致抗蚀剂组合物和形成抗蚀剂的方法 图案，能够以高分辨率形成精细图案。 高分子化合物作为碱溶性基团（i）包括其中选自醇羟基，羧基和酚羟基的基团用酸解离的溶解抑制基团（ii）保护的取代基， 通式（1）表示的化合物：[式1] -CH 2 OAOO-CH 2 - ] n（1）（其中，A表示1〜20个碳原子的有机基团， 1，n表示1〜4的整数）。

公开(公告)号：US20100086879A1

公开(公告)日：2010-04-08

申请号：US12441514

申请日：2007-09-13

申请人： Toshikazu Takayama ,  Keita Ishiduka ,  Hideo Hada ,  Shigeru Yokoi

发明人： Toshikazu Takayama ,  Keita Ishiduka ,  Hideo Hada ,  Shigeru Yokoi

IPC分类号： G03F7/20 ,  C08L55/00 ,  C08K5/01 ,  G03F7/00

CPC分类号： G03F7/11 ,  G03F7/2041 ,  Y10S430/106 ,  Y10S430/146

摘要： Disclosed are: a material for forming a protective film to be laminated on a photoresist film, which can prevent the contamination of an exposing device with an outgas generated from the photoresist film, which has little influence on the environment, which has a high water repellent property, which sparingly causes mixing with the photoresist film, and which can form a high-resolution photoresist pattern; a method for forming a photoresist pattern; and a solution for washing/removing a protective film. Specifically disclosed are: a material for forming a protective film, which comprises (a) a non-polar polymer and (b) a non-polar solvent; a method for forming a photoresist pattern by using the material; and a solution for washing/removing a protective film, which is intended to be used in the method.

摘要翻译： 公开了一种用于形成层压在光致抗蚀剂膜上的保护膜的材料，其可以防止由具有高斥水性的对环境影响很小的光致抗蚀剂膜产生的废气对曝光装置的污染 性质，其微小地引起与光致抗蚀剂膜的混合，并且其可以形成高分辨率光致抗蚀剂图案; 形成光致抗蚀剂图案的方法; 以及洗涤/除去保护膜的溶液。 具体公开的是：形成保护膜的材料，其包含（a）非极性聚合物和（b）非极性溶剂; 通过使用该材料形成光致抗蚀剂图案的方法; 以及旨在用于该方法的保护膜的洗涤/去除溶液。

公开(公告)号：US07682772B2

公开(公告)日：2010-03-23

申请号：US12265607

申请日：2008-11-05

申请人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Hideo Hada ,  Hiroaki Shimizu ,  Tsuyoshi Nakamura

发明人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Hideo Hada ,  Hiroaki Shimizu ,  Tsuyoshi Nakamura

IPC分类号： G03F7/004 ,  G03F7/30 ,  C07D327/02

CPC分类号： G03F7/0045 ,  C07D327/02 ,  C07D327/04 ,  C07D497/08 ,  C08K5/36 ,  C08K5/42 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/123

摘要： A compound represented by general formula (I); and a compound represented by general formula (b1-1).[Chemical Formula 1] X-Q1-Y1—SO3−M+  (I) X-Q1-Y1—SO3−A+  (b1-1) wherein Q1 represents a divalent linkage group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an —SO2— bond in the structure thereof; M+ represents an alkali metal ion; and A+ represents an organic cation.

摘要翻译： 由通式（I）表示的化合物; 和由通式（b1-1）表示的化合物。 [化学式1]其中Q1表示二价连接基团或单键的X-Q1-Y1-SO3-M +（I）X-Q1-Y1-SO3-A +（b1-1） Y1表示可以具有取代基的亚烷基或可以具有取代基的氟化亚烷基; X表示可以具有取代基的3〜30个碳原子的环状基团，其结构中具有-SO 2 - 键; M +表示碱金属离子; 而A +代表有机阳离子。

公开(公告)号：US20090162784A1

公开(公告)日：2009-06-25

申请号：US11576518

申请日：2005-09-22

申请人： Toshiyuki Ogata ,  Shogo Matsumaru ,  Hideo Hada

发明人： Toshiyuki Ogata ,  Shogo Matsumaru ,  Hideo Hada

IPC分类号： G03F7/004 ,  C08F16/36 ,  C08F24/00 ,  G03F7/20

CPC分类号： G03F7/0397 ,  C08F220/28 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/146

摘要： The present invention relates to a polymer compound comprising at least one constituent unit (a0) selected from the group consisting of constituent units represented by the following general formulas (A0-1), (A0-2), (A0-3) and (A0-4) [wherein R represents a hydrogen atom or a lower alkyl group], and a constituent unit (a1) derived from an (a-lower alkyl)acrylate ester having an acid dissociable dissolution inhibiting group.

摘要翻译： 本发明涉及包含至少一种选自由以下通式（A0-1），（A0-2），（A0-3）和（A0-3）和（A0-3）表示的结构单元组成的组的组成单元（a0） A0-4）[其中R表示氢原子或低级烷基]，以及由具有酸解离溶解抑制基团的（α-低级烷基）丙烯酸酯衍生的构成单元（a1）。

公开(公告)号：US20090142696A1

公开(公告)日：2009-06-04

申请号：US12089681

申请日：2006-10-17

申请人： Sanae Furuya ,  Hideo Hada ,  Yusuke Nakagawa ,  Akiyoshi Yamazaki

发明人： Sanae Furuya ,  Hideo Hada ,  Yusuke Nakagawa ,  Akiyoshi Yamazaki

IPC分类号： G03F7/20 ,  G03F7/004

CPC分类号： G03F7/0397 ,  C08F220/28 ,  G03F7/0007 ,  G03F7/0046 ,  Y10S430/111

摘要： Disclosed is a positive resist composition comprising a resin component (A) and an acid generator component (B), wherein the component (A) contains a polymer compound (A1) containing a structural unit (a0) represented by formula (a0) shown below and a structural unit (a2) derived from an acrylate ester containing a lactone-containing cyclic group: (wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group, or a halogenated lower alkyl group; Y1 represents an aliphatic cyclic group; Z represents an acid dissociable, dissolution inhibiting group containing a tertiary alkyl group; a represents an integer from 1 to 3, b represents an integer from 0 to 2, and a+b=1 to 3; and c, d and e each represents, independently, an integer from 0 to 3).

摘要翻译： 公开了包含树脂组分（A）和酸产生剂组分（B）的正型抗蚀剂组合物，其中组分（A）含有包含由下式（a0）表示的结构单元（a0）的高分子化合物（A1） 和衍生自含有内酯的环状基团的丙烯酸酯的结构单元（a2）（其中，R表示氢原子，卤素原子，低级烷基或卤代低级烷基; Y1表示脂肪族环状基团 Z表示含有叔烷基的酸解离抑制基团，a表示1〜3的整数，b表示0〜2的整数，a + b = 1〜3，c，d，e各自独立地表示 独立地表示0〜3的整数）。