发明授权
US08206890B2 Resist composition, method of forming resist pattern, compound and acid generator
有权
抗蚀剂组合物，形成抗蚀剂图案的方法，化合物和酸发生剂
- 专利标题： Resist composition, method of forming resist pattern, compound and acid generator
- 专利标题（中）： 抗蚀剂组合物，形成抗蚀剂图案的方法，化合物和酸发生剂
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申请号： US12499610申请日： 2009-07-08
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公开(公告)号： US08206890B2公开(公告)日： 2012-06-26
- 发明人: Akiya Kawaue , Yoshiyuki Utsumi , Takehiro Seshimo , Tsuyoshi Nakamura , Naoto Motoike , Hiroaki Shimizu , Kensuke Matsuzawa , Hideo Hada
- 申请人： Akiya Kawaue , Yoshiyuki Utsumi , Takehiro Seshimo , Tsuyoshi Nakamura , Naoto Motoike , Hiroaki Shimizu , Kensuke Matsuzawa , Hideo Hada
- 申请人地址： JP Kawasaki-shi
- 专利权人： Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人： Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人地址： JP Kawasaki-shi
- 代理机构： Knobbe Martens Olson & Bear LLP
- 优先权： JP2008-184185 20080715; JP2008-271120 20081021; JP2009-123095 20090521
- 主分类号： G03F7/039
- IPC分类号： G03F7/039 ; C07C381/12 ; C07C309/04 ; C07C309/17
摘要：
A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below: wherein R7″ to R9″ each independently represent an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X− represents an anion; and Rf represents a fluorinated alkyl group.
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