公开(公告)号：US08574792B2

公开(公告)日：2013-11-05

申请号：US13110024

申请日：2011-05-18

申请人： Jong Kwang Lee ,  Jin Ho Ju ,  Min Kang ,  Hyang-Shik Kong

发明人： Jong Kwang Lee ,  Jin Ho Ju ,  Min Kang ,  Hyang-Shik Kong

IPC分类号： G03F1/00

CPC分类号： G03F1/50

摘要： A photomask includes a substrate, a mask pattern layer and a super lens. The substrate includes a pattern which includes protruding portions, and open portions between the protruding portions. The mask pattern layer is in the open portions of the pattern and fills the open portions of the pattern. The super lens is on the substrate and the mask pattern layer.

摘要翻译： 光掩模包括基板，掩模图案层和超透镜。 基板包括包括突出部分和突出部分之间的开口部分的图案。 掩模图案层位于图案的开口部分并填充图案的开口部分。 超透镜位于基板和掩模图案层上。

公开(公告)号：US20130122403A1

公开(公告)日：2013-05-16

申请号：US13471080

申请日：2012-05-14

申请人： Bong-Yeon Kim ,  Min Kang ,  Jong Kwang Lee ,  Jin Ho Ju

发明人： Bong-Yeon Kim ,  Min Kang ,  Jong Kwang Lee ,  Jin Ho Ju

IPC分类号： G03F7/20 ,  G03F1/26

CPC分类号： G03F1/32

摘要： Provided is a photolithography mask capable of forming fine patterns beyond a critical resolution of an exposer without replacing or changing the exposer. The mask includes an at least partially light absorbing phase shift layer and uses a complex wavelength light source.

摘要翻译： 提供了一种能够在不更换或改变曝光器的情况下形成超出曝光机的临界分辨率的精细图案的光刻掩模。 掩模包括至少部分吸光相移层并使用复合波长光源。

公开(公告)号：US20130048604A1

公开(公告)日：2013-02-28

申请号：US13568233

申请日：2012-08-07

申请人： Min Kang ,  Jin-Ho Ju ,  Jong-Kwang Lee ,  Bong-Yeon Kim ,  Jeong-Won Kim ,  Deok-Man Kang ,  Jung-Hwan Cho ,  Kyung-Mi Choi

发明人： Min Kang ,  Jin-Ho Ju ,  Jong-Kwang Lee ,  Bong-Yeon Kim ,  Jeong-Won Kim ,  Deok-Man Kang ,  Jung-Hwan Cho ,  Kyung-Mi Choi

IPC分类号： G03F7/004 ,  B44C1/22 ,  G03F7/022 ,  G03F7/027 ,  G03F7/016

CPC分类号： G03F7/0392 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/11

摘要： A photoresist composition includes from about 20% to about 50% by weight of a polymer, from about 0.5% to about 1.5% by weight of a photo-acid generator, from about 0.01% to about 0.5% by weight of a photo absorber and the remainder includes an organic solvent. Also provided is a method of forming a fine pattern including forming a thin film on a substrate; forming a photoresist pattern by using a photoresist composition that includes from about 20% to about 50% by weight of a polymer, from about 0.5% to about 1.5% by weight of a photo-acid generator, from about 0.01% to about 0.5% by weight of a photo absorber and a remainder comprising an organic solvent; and patterning the thin film by using the photoresist pattern as an etch-stop layer to form a fine pattern.

摘要翻译： 光致抗蚀剂组合物包括约20重量％至约50重量％的聚合物，约0.5重量％至约1.5重量％的光酸产生剂，约0.01重量％至约0.5重量％的光吸收剂， 剩余部分包括有机溶剂。 还提供了形成包括在基板上形成薄膜的精细图案的方法; 通过使用光致抗蚀剂组合物形成光致抗蚀剂图案，所述光致抗蚀剂组合物包含约20重量％至约50重量％的聚合物，约0.5重量％至约1.5重量％的光酸产生剂，约0.01重量％至约0.5重量％ 的光吸收剂，余量包含有机溶剂; 并通过使用光致抗蚀剂图案作为蚀刻停止层来图案化薄膜以形成精细图案。

公开(公告)号：US20130017637A1

公开(公告)日：2013-01-17

申请号：US13486858

申请日：2012-06-01

申请人： Woo-Seok JEON ,  Jong Kwang LEE ,  Jin Ho JU ,  Min KANG ,  Hoon KANG ,  Seung Bo SHIM ,  Gwui-Hyun PARK ,  Bong-Yeon KIM

发明人： Woo-Seok JEON ,  Jong Kwang LEE ,  Jin Ho JU ,  Min KANG ,  Hoon KANG ,  Seung Bo SHIM ,  Gwui-Hyun PARK ,  Bong-Yeon KIM ,  Seon-Il KIM

IPC分类号： G03F7/20 ,  H01L33/62 ,  G03F7/22

CPC分类号： G03F7/203 ,  G03F7/20 ,  G03F7/70466 ,  Y10S438/942

摘要： A method for forming a fine exposure pattern where a width and an interval of the pattern are each 1CD, by first exposing a photoresist by using an exposure mask where an interval ratio of a light shielding part and a light transmission part is 2CD:1CD to 4CD:1CD, and then second exposing the photoresist after the exposure mask is shifted at a predetermined interval, or second exposing the photoresist by using an exposure mask formed at a position where a light transmission part is shifted at a predetermined interval, and developing the photoresist, such that it is possible to form a display device having a pixel electrode including a plurality of fine branch electrodes having a smaller width and interval than a resolution of an exposure apparatus.

摘要翻译： 通过使用遮光部和光透射部的间隔比为2CD:1CD的曝光掩模，首先使光致抗蚀剂曝光，形成图案的宽度和间隔为1CD的微细曝光图案的方法， 4CD：1CD，然后在曝光掩模以预定间隔移动之后第二次曝光光致抗蚀剂，或者通过使用形成在光透射部分以预定间隔移动的位置处的曝光掩模来第二次曝光光致抗蚀剂， 光致抗蚀剂，使得可以形成具有像素电极的显示装置，该像素电极包括具有比曝光装置的分辨率更小的宽度和间隔的多个细分支电极。

公开(公告)号：US20120153091A1

公开(公告)日：2012-06-21

申请号：US13326440

申请日：2011-12-15

申请人： Hyo Jik Lee ,  Kiho Kim ,  Jong Kwang Lee ,  Byung-Suk Park ,  Ho Dong Kim

发明人： Hyo Jik Lee ,  Kiho Kim ,  Jong Kwang Lee ,  Byung-Suk Park ,  Ho Dong Kim

IPC分类号： B66C13/14 ,  B66C11/00 ,  B65H75/48 ,  B66C19/00

CPC分类号： B66C17/06 ,  B66C13/14

摘要： Disclosed herein is an apparatus for cable management synchronized with telescopic motion. The apparatus is configured such that cables for transmitting power or signals to a manipulator provided on a lower end of a telescopic tube and for receiving signals therefrom are wound or unwound in response to expansion or contraction of the telescopic tube. Moreover, the apparatus is configured such that the cables are prevented from being displaced from the correct positions, a noise is prevented from being generated, and the tension of each cable is adjusted even when it is in the clamped state.

摘要翻译： 本文公开了一种与伸缩运动同步的电缆管理装置。 该装置被配置为使得响应于伸缩管的膨胀或收缩而将功率或信号传输到设置在伸缩管的下端上并用于接收信号的机械手的电缆被卷绕或退绕。 此外，该装置被配置为使得防止电缆从正确的位置移位，防止产生噪声，并且即使当它处于夹紧状态时也调节每根电缆的张力。

公开(公告)号：US08083460B2

公开(公告)日：2011-12-27

申请号：US12328792

申请日：2008-12-05

申请人： Jong Kwang Lee ,  Chang Hwan Choi ,  Kwang Ho Yoon ,  Hyo Jik Lee ,  Byung Suk Park ,  Ji Sup Yoon

发明人： Jong Kwang Lee ,  Chang Hwan Choi ,  Kwang Ho Yoon ,  Hyo Jik Lee ,  Byung Suk Park ,  Ji Sup Yoon

IPC分类号： B25J13/00

CPC分类号： B25J9/1045 ,  Y10T74/20323

摘要： The present invention discloses a cable-driven manipulator comprising an operating unit having a drive motor, and a pulley rotated by the drive motor. An upper arm is coupled, through a joint, to one side of the operating unit. A forearm coupled, through a joint, to the other side of the upper arm by the cable. A gripper of an end effector operably coupled to the forearm, a cable compensation device is installed between the upper arm and the forearm so as to maintain constant the length of the cable that transmits the power of the operating unit to the end effector during the pivoting of the forearm. It is thus possible to prevent the variation of tensile force due to the variation of the length of the cable for operating the end effector during the pivoting of the forearm or the unintended malfunction of the end effector.

摘要翻译： 本发明公开了一种电缆驱动的操纵器，其包括具有驱动马达的操作单元和由驱动马达旋转的滑轮。 上臂通过接头联接到操作单元的一侧。 前臂通过电缆连接到上臂的另一侧。 可操作地联接到前臂的末端执行器的夹持器，电缆补偿装置安装在上臂和前臂之间，以便在枢转期间保持将操作单元的动力传递到末端执行器的电缆的长度恒定 的前臂。 因此，可以防止在前臂枢转期间用于操作末端执行器的电缆的长度变化引起的拉力的变化或端部执行器的意外故障。

公开(公告)号：US09224763B2

公开(公告)日：2015-12-29

申请号：US13211360

申请日：2011-08-17

申请人： Min Kang ,  Jong Kwang Lee ,  Sang Hee Jang ,  Jin Ho Ju

发明人： Min Kang ,  Jong Kwang Lee ,  Sang Hee Jang ,  Jin Ho Ju

IPC分类号： H01L33/50 ,  H01L27/12 ,  H01L27/32

CPC分类号： H01L27/1248 ,  H01L27/1218 ,  H01L27/1262 ,  H01L27/3279

摘要： Provided are a display device and a method of manufacturing of the display device. The display device includes a substrate subjected to a primary preprocess; a conductor formed on the substrate and subjected to a secondary preprocess; and an insulating layer formed on the substrate and the conductor, in which the primary preprocess is performed for a surface energy of the first substrate higher than a first reference value and the secondary preprocess is performed for a surface energy of the conductor lower than a second reference value.

摘要翻译： 提供了显示装置和显示装置的制造方法。 显示装置包括经受一次预处理的基板; 形成在基板上并进行二次预处理的导体; 以及形成在所述基板和所述导体上的绝缘层，其中对所述第一基板的表面能进行高于第一参考值的所述初步预处理，并且对于所述导体的表面能进行二次预处理，所述表面能低于第二基准 参考值。

公开(公告)号：US08895209B2

公开(公告)日：2014-11-25

申请号：US13565659

申请日：2012-08-02

申请人： Min Kang ,  Jong Kwang Lee ,  Jin Ho Ju ,  Bong-Yeon Kim ,  Hyang-Shik Kong ,  Kyoung Sik Kim ,  Seung Hwa Baek

发明人： Min Kang ,  Jong Kwang Lee ,  Jin Ho Ju ,  Bong-Yeon Kim ,  Hyang-Shik Kong ,  Kyoung Sik Kim ,  Seung Hwa Baek

IPC分类号： G03F1/00

CPC分类号： G03F1/50 ,  G03F1/38 ,  G03F7/70575

摘要： Provided are a photomask, including: a substrate; an opaque pattern formed on the substrate and made of a material which does not penetrate light; a first dielectric layer formed on the substrate and the opaque pattern; and a negative refractive-index meta material layer formed on the first dielectric layer, in which a dispersion mode used in the photomask uses a Quasi bound mode, a manufacturing method of the photomask, and a manufacturing method of a substrate using the photomask.

摘要翻译： 提供一种光掩模，包括：基底; 在基板上形成的不透光的材料制成的不透明图案; 形成在所述基板和所述不透明图案上的第一电介质层; 以及形成在第一介质层上的负折射率超材料层，其中在光掩模中使用的分散模式使用准界限模式，光掩模的制造方法以及使用光掩模的基板的制造方法。

公开(公告)号：US20120244471A1

公开(公告)日：2012-09-27

申请号：US13224935

申请日：2011-09-02

申请人： Jeong Won KIM ,  Jin Ho JU ,  Jong Kwang LEE ,  Min KANG ,  Tae Gyun KIM

发明人： Jeong Won KIM ,  Jin Ho JU ,  Jong Kwang LEE ,  Min KANG ,  Tae Gyun KIM

IPC分类号： G03F7/20 ,  G03F7/027

CPC分类号： G03F7/40 ,  G02F1/134309 ,  G02F1/13439 ,  G03F7/0226 ,  G03F7/023 ,  G03F7/30

摘要： A method for forming a pattern includes forming a photosensitive film by coating a photosensitive resin composition on a substrate, exposing the photosensitive film to light through a mask that includes a light transmission region and a non-light transmission region, coating a developing solution on the photosensitive film, and forming a photosensitive film pattern by baking the photosensitive film, wherein the photosensitive resin composition includes an alkali soluble base resin, a photoacid generator and a photoactive compound.

摘要翻译： 形成图案的方法包括通过将感光性树脂组合物涂布在基板上来形成感光膜，通过包含透光区域和非透光区域的掩模将感光膜曝光，将显影液涂布在 感光性膜，通过烘烤感光性膜形成感光性膜图案，其中，感光性树脂组合物含有碱溶性基础树脂，光致酸产生剂和光活性化合物。

公开(公告)号：US07794171B2

公开(公告)日：2010-09-14

申请号：US11819654

申请日：2007-06-28

申请人： Byung Suk Park ,  Jong Kwang Lee ,  Hyo Jik Lee ,  Dong Hee Hong ,  Ji Sup Yoon

发明人： Byung Suk Park ,  Jong Kwang Lee ,  Hyo Jik Lee ,  Dong Hee Hong ,  Ji Sup Yoon

IPC分类号： F16D1/00

CPC分类号： B25J3/04 ,  B25J9/026 ,  B25J15/04 ,  B25J18/025 ,  Y10T74/20305 ,  Y10T403/7007 ,  Y10T403/7015

摘要： A system applicable to a bridge transporter telescopic servomanipulator, is provided. The bridge transporter telescopic servomanipulator is used for performing operation and maintenance of process equipments in a working environment having a possibility of radiation exposure. The system can be coupled/decoupled by including a coupling device in a telescopic transfer device and a servomanipulator, and can manipulate an ascending/descending device of the servomanipulator in a remote area without direct access by a worker. The coupling/decoupling device includes a first coupling plate and a second coupling plate, the first coupling plate being provided on a lower portion of the telescopic transfer device, and the second coupling plate being provided on an upper portion of the servomanipulator. While coupling protrusions are inserted into coupling holes being formed on the first coupling plate, position and orientation between a master servomanipulator and a slave servomanipulator correspond to each other, and the servomanipulator can be coupled with the telescopic transfer device since the coupling protrusions are fixed by rotating a rotation plate being provided on the second coupling plate.

摘要翻译： 提供了一种适用于桥式运输机伸缩式伺服机械手的系统。 桥式运输机伸缩式伺服操纵器用于在具有辐射可能性的工作环境中对工艺设备进行操作和维护。 该系统可以通过在伸缩式传送装置和伺服操纵器中包括耦合装置来耦合/解耦，并且可以在远程区域中操纵伺服操纵器的上升/下降装置，而无需工作人员直接访问。 联接/解耦装置包括第一联接板和第二联接板，第一联接板设置在伸缩传送装置的下部，第二联接板设置在伺服操纵器的上部。 当联接突起插入到形成在第一联接板上的联接孔中时，主伺服操纵器和从动伺服操纵器之间的位置和方向彼此对应，并且伺服操纵器可以与伸缩传送装置联接，因为联接突起被 旋转设置在第二联接板上的旋转板。