Invention Grant
- Patent Title: Photomask including super lens and manufacturing method thereof
- Patent Title (中): 包含超级透镜的光掩模及其制造方法
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Application No.: US13110024Application Date: 2011-05-18
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Publication No.: US08574792B2Publication Date: 2013-11-05
- Inventor: Jong Kwang Lee , Jin Ho Ju , Min Kang , Hyang-Shik Kong
- Applicant: Jong Kwang Lee , Jin Ho Ju , Min Kang , Hyang-Shik Kong
- Applicant Address: KR
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2010-0129284 20101216
- Main IPC: G03F1/00
- IPC: G03F1/00
Abstract:
A photomask includes a substrate, a mask pattern layer and a super lens. The substrate includes a pattern which includes protruding portions, and open portions between the protruding portions. The mask pattern layer is in the open portions of the pattern and fills the open portions of the pattern. The super lens is on the substrate and the mask pattern layer.
Public/Granted literature
- US20120156594A1 PHOTOMASK INCLUDING SUPER LENS AND MANUFACTURING METHOD THEREOF Public/Granted day:2012-06-21
Information query
