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公开(公告)号：US5343290A
公开(公告)日：1994-08-30
申请号：US897198
申请日：1992-06-11
IPC分类号： G01B9/02 , G01B11/30 , G01J9/04 , G01N21/47 , G01N21/88 , G01N21/93 , G01N21/94 , G01N21/95 , G01N21/956 , H01L21/66
CPC分类号： G01N21/94 , G01J9/04 , G01N2021/8822 , G01N21/47 , G01N21/9501
摘要： A heterodyne interferometer is combined with darkfield surface particle detection for improved surface particle detection sensitivity. The probe beam and the reference beam have different wavelengths. The reference beam may either be a real reference beam or a virtual reference beam. The probe beam may be incident at the surface at either a grazing angle or at an angle substantially normal to the surface. The real reference beam is incident at the surface at a grazing angle. The detection may either be conventional heterodyne detection or a combination of heterodyne and Lloyd's mirror detection.
摘要翻译： 外差干涉仪与暗场表面颗粒检测相结合，提高表面颗粒检测灵敏度。 探测光束和参考光束具有不同的波长。 参考光束可以是真实参考光束或虚拟参考光束。 探针光束可以以掠射角度或基本上垂直于表面的角度入射在表面处。 实际参考光束以掠射角入射在表面。 检测可以是常规外差检测或外差和劳合镜检测的组合。
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2.发明授权Apparatus and a method for high numerical aperture microscopic examination of materials 失效高数值孔径显微镜检查材料的仪器和方法
公开(公告)号：US5220403A
公开(公告)日：1993-06-15
申请号：US954282
申请日：1992-09-30
CPC分类号： G01N21/9505 , G02B21/0016 , G02B3/00 , G01J2003/421 , G01J2009/0207 , G01J3/44 , G01N2021/1725 , G01N2021/1782 , G01N2021/8822 , G01N21/3563 , G01N21/359 , G01N2201/0638 , G01N2201/1087
摘要： Apparatus and a method for performing high resolution optical imaging in the near infrared of internal features of semiconductor wafers uses an optical device made from a material having a high index of refraction and held in very close proximity to the wafer. The optical device may either be a prism or a plano-convex lens. The plano-convex lens may be held in contact with the wafer or separated from the wafer via an air bearing or an optical coupling fluid to allow the sample to be navigated beneath the lens. The lens may be used in a number of optical instruments such as a bright field microscope, a Schlieren microscope, a dark field microscope, a Linnik interferometer, a Raman spectroscope and an absorption spectroscope.
摘要翻译： 在半导体晶片的内部特征的近红外线中执行高分辨率光学成像的装置和方法使用由具有高折射率的材料制成的光学装置，并且保持非常靠近晶片。 光学器件可以是棱镜或平凸透镜。 平凸透镜可以保持与晶片接触或通过空气轴承或光耦合流体与晶片分离，以允许样品在透镜下面导航。 透镜可以用于许多光学仪器，例如明视野显微镜，Schlieren显微镜，暗视野显微镜，Linnik干涉仪，拉曼光谱仪和吸收光谱仪。
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公开(公告)号：US4771468A
公开(公告)日：1988-09-13
申请号：US853100
申请日：1986-04-17
CPC分类号： G06T7/001 , G03F7/7065 , G06T2207/30141 , G06T2207/30148
摘要： A method and apparatus for automatic inspection of periodic patterns typically found on patterned silicon wafers, printed circuit board, and the like is disclosed herein. The method comprises an inspection algorithm of two parts: a low-level algorithm and a higher level algorithm which includes, therein the operation of the low-level algorithm. The low-level algorithm utilizes the known periodicity of the pattern to find defects by comparing identical cells in the periodic array. The high-level algorithm comprises applying the low-level algorithm, some number of times (N) in succession on the image. An accumulator image is formed by adding the results of the low-level algorithm to create a separate image array where the pixels relate to the number of times that the pixel in the original image was detected as defective by the low-level algorithm.The apparatus for implementing the above method comprises a parallel/pipeline architecture for high speed processing and RAM LUT's to implement a plurality of subtract and compare functions.
摘要翻译： 本文公开了用于自动检查在图案化硅晶片，印刷电路板等上通常发现的周期性图案的方法和装置。 该方法包括两部分的检查算法：低级算法和较高级算法，其中包括低级算法的操作。 低级算法利用已知的周期性模式来通过比较周期性阵列中的相同单元来找到缺陷。 高级算法包括在图像上连续应用一些次数（N）的低级算法。 通过将低级算法的结果相加以产生单独的图像阵列形成累加器图像，其中像素与原始图像中的像素被低级算法检测为缺陷的次数相关。 用于实现上述方法的装置包括用于高速处理的并行/流水线架构和RAM LUT以实现多个减法和比较功能。
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公开(公告)号：US6085957A
公开(公告)日：2000-07-11
申请号：US629268
申请日：1996-04-08
CPC分类号： B29C67/0055 , B65H51/30 , B65H63/08 , G05D7/0605 , B65H2511/14 , B65H2513/10 , B65H2701/31
摘要： A volumetric feed control apparatus for a build material element such as a filament used in a three-dimensional modeling machine having an application tip includes a pair of feed rollers feeding the filament to the application tip, and a sensor or sensor system feeding information to a central processing unit that continuously computes the effective cross section of the filament using the signals received from the sensor or sensor system. The central processing unit controls the speed of a DC servo or stepper motor which in turn rotates the feed rollers to advance the filament toward the application tip of the modeling machine. The central processing unit adjusts the speed of the feed rollers to supply a constant flow rate of material to the application tip. Alternatively, the sensor system can be incorporated into the feed rollers, eliminating the need for further space constraints.
摘要翻译： 用于具有应用尖端的三维建模机中使用的诸如用于构造材料的构件材料元件的体积进料控制装置包括将丝线馈送到施加尖端的一对进给辊，以及将信息馈送到 中央处理单元，其使用从传感器或传感器系统接收的信号连续计算灯丝的有效截面。 中央处理单元控制直流伺服或步进电机的速度，该伺服或步进电机又使进给辊转动，以将纤维推向建模机的应用端。 中央处理单元调节进给辊的速度，以向应用尖端提供恒定的材料流速。 或者，传感器系统可以结合到进料辊中，从而不需要进一步的空间限制。
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5.发明授权Method for optimizing parameters characteristic of an object developed in a rapid prototyping system 失效用于优化在快速原型系统中开发的对象的参数特征的方法
公开(公告)号：US5491643A
公开(公告)日：1996-02-13
申请号：US191906
申请日：1994-02-04
申请人： John S. Batchelder
发明人： John S. Batchelder
IPC分类号： B29C67/00 , G05B19/4099 , G06F17/17 , G06T17/30
CPC分类号： B29C67/0088 , G05B19/4099 , B29C2037/90 , B29K2995/0064 , B29K2995/007 , B29K2995/0077 , G05B2219/35013 , G05B2219/35021 , G05B2219/49007 , Y02P90/265
摘要： A method suitable for optimizing parameters characteristic of a preselected portion of an object developed in a rapid prototyping system. The method comprises the steps of identifying an object characteristic space comprising at least one dimension, the or each dimension defining a continuum for one object parameter; and, selecting a predetermined subset of said object characteristic space comprising desired optimal characteristics of the preselected portion of the object.
摘要翻译： 一种适用于优化在快速原型系统中开发的对象的预选部分的参数特性的方法。 该方法包括以下步骤：识别包含至少一个维度的对象特征空间，所述维度或每个维度为一个对象参数定义连续体; 以及选择所述对象特征空间的预定子集，其包括所述对象的预选部分的期望最优特性。
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公开(公告)号：US5426722A
公开(公告)日：1995-06-20
申请号：US119260
申请日：1993-09-09
申请人： John S. Batchelder
发明人： John S. Batchelder
IPC分类号： B25J9/16 , B25J9/18 , G05B19/4103 , G05B19/416 , G06F17/60 , G05B19/42
CPC分类号： G05B19/4103 , B29C2947/92571 , B29C2947/9258 , B29C2947/926 , B29C2947/92809 , B29C2947/92904 , B29C2947/9298 , G05B2219/34132 , G05B2219/40466 , G05B2219/43062 , G05B2219/43201
摘要： A method for determining an optimal trajectory and velocity for an open loop stepper motor driven robot (1) is disclosed, as is an open loop robotic system suitable for use in, by example, a rapid prototyping system (10). The method utilizes a deflection angle calculation of a maximal velocity for each vertex of a set of vertices that define a desired trajectory, a heap sort for globally ensuring that none of the vertices have an excessive velocity, and a vertex adding technique that ensures that the robot is performing straight line moves as rapidly as is possible.
摘要翻译： 公开了用于确定开环步进电机驱动机器人（1）的最佳轨迹和速度的方法，以及适用于例如快速原型系统（10）的开环机器人系统。 该方法利用对定义期望轨迹的一组顶点的每个顶点的最大速度的偏转角计算，用于全局地确保没有顶点具有过大速度的堆排序以及确保 机器人尽可能快地进行直线移动。
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公开(公告)号：US5312224A
公开(公告)日：1994-05-17
申请号：US30984
申请日：1993-03-12
CPC分类号： B29C47/6012 , B29C47/38 , F04D29/183 , F04D3/02 , B29C2045/465 , B29C47/0014 , B29C47/0023 , B29C47/60 , Y10T29/49236 , Y10T29/49245
摘要： A rotary viscosity pump is provided that has a housing and an impeller. The housing has a conical chamber with an outlet at a narrow end of the chamber. The impeller has a conical section with a logarithmic spiral groove along its exterior. The spacing between the housing and the impeller can have either a constant gap or a gap that decreases along the length of the impeller. The depth of the groove can be constant, increase, or decrease in depth along the length of the impeller.
摘要翻译： 提供一种具有壳体和叶轮的旋转粘度泵。 壳体具有在腔室的窄端处具有出口的锥形室。 叶轮具有沿其外部的对数螺旋槽的圆锥形截面。 壳体和叶轮之间的间隔可以具有沿叶轮的长度减小的恒定间隙或间隙。 槽的深度可以沿叶轮的长度恒定，增加或减小。
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8.发明授权
公开(公告)号：US5208648A
公开(公告)日：1993-05-04
申请号：US667773
申请日：1991-03-11
IPC分类号： G01N21/88 , G01J3/42 , G01J3/44 , G01J9/02 , G01N21/35 , G01N21/95 , G01N21/956 , G01Q30/02 , G02B3/00 , G02B21/00 , G02B27/00 , H01L21/66
CPC分类号： G01N21/9505 , G02B21/0016 , G02B3/00 , G01J2003/421 , G01J2009/0207 , G01J3/44 , G01N2021/1725 , G01N2021/1782 , G01N2021/8822 , G01N21/3563 , G01N21/359 , G01N2201/0638 , G01N2201/1087
摘要： Apparatus and a method for performing high resolution optical imaging in the near infrared of internal features of semiconductor wafers uses an optical device made from a material having a high index of refraction and held in very close proximity to the wafer. The optical device may either be a prism or a plano-convex lens. The plano-convex lens may be held in contact with the wafer or separated from the wafer via an air bearing or an optical coupling fluid to allow the sample to be navigated beneath the lens. The lens may be used in a number of optical instruments such as a bright field microscope, a Schlieren microscope, a dark field microscope, a Linnik interferometer, a Raman spectroscope and an absorption spectroscope.
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公开(公告)号：US5133602A
公开(公告)日：1992-07-28
申请号：US682752
申请日：1991-04-08
CPC分类号： G01N15/0205 , G01N2015/0238 , G01N2021/1759 , G01N2021/4792
摘要： A bright-field, particle position determining optical system is disclosed that uses both phase shift and extinction signals to determine particle trajectories. In a first embodiment, a pair of orthogonally polarized beams are positioned along an axis that intersects a particle's flow path at an acute angle. An optical system recombines the beams after they exit the flow path, the combined beams manifesting an elliptical polarization if a particle intersects one of the beams. Bright field detectors detect polarization components of the combined beam, provide a phase shift signal between the beam's orthogonal components and provide corresponding signals to a processor. The processor determines a signal asymmetry from the phase shift signal that is indicative of a particle's position in the flow path. Another embodiment of the invention examines a signal resulting from the beam's phase shift and determines a correction factor that is dependent upon the distance of the particle from the focal plane of the beams. Another embodiment employs a dithering system for cyclically moving one or more optical beams across a particle to further enable its trajectory or position to be determined.
摘要翻译： 公开了使用相移和消光信号来确定粒子轨迹的明场，粒子位置确定光学系统。 在第一实施例中，一对正交偏振光束沿着与颗粒的流动通道以锐角相交的轴线定位。 光束在离开流路之后将光束重新组合，如果粒子与光束之一相交，那么组合光束表现出椭圆极化。 光场检测器检测组合光束的偏振分量，在光束的正交分量之间提供相移信号，并向处理器提供相应的信号。 处理器确定来自指示颗粒在流动路径中的位置的相移信号的信号不对称性。 本发明的另一个实施例检查由光束的相移产生的信号，并确定取决于粒子与光束的焦平面的距离的校正因子。 另一个实施例采用抖动系统来循环移动一个或多个光束穿过颗粒，以进一步确定其轨迹或位置。
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10.发明授权Dark field imaging defect inspection system for repetitive pattern integrated circuits 失效用于重复图案集成电路的暗场成像缺陷检查系统
公开(公告)号：US5177559A
公开(公告)日：1993-01-05
申请号：US701936
申请日：1991-05-17
IPC分类号： G01B11/24 , G01N21/88 , G01N21/94 , G01N21/956 , H01L21/66
CPC分类号： G02B21/10 , G01N21/95623 , G01N2021/8822
摘要： An optical inspection system for patterned semiconductor wafers generates a dark field image of the wafer by applying a collimated beam of monochrome light at an incident angle with respect to the surface of the wafer of between 8.degree. and a maximum angle defined by the numerical aperture of the imaging system and collecting the light which is scattered at angles approximately normal to the surface of the wafer and within the numerical aperture of the imaging system. In addition, the incident light is at an angle of 45.degree. in the surface plane of the wafer with respect to the rectangular lines which predominate in the pattern. Before forming the dark field image, the collected light is passed through a Fourier transform filter which substantially attenuates spatial frequency components corresponding to the pattern. In the resultant dark field image, defects in the pattern and contaminating particles are accentuated relative to the pattern features.
摘要翻译： 用于图案化半导体晶片的光学检查系统通过以相对于晶片表面的入射角施加8°的准直光束和由数字孔径的数值孔径限定的最大角度来施加晶片的暗视场图像 成像系统并收集以大致垂直于晶片表面并且在成像系统的数值孔径内散射的光。 此外，入射光在晶片的表面平面上相对于以图案为主的矩形线成45度的角度。 在形成暗场图像之前，所收集的光通过傅里叶变换滤波器，该滤波器基本上衰减对应于图案的空间频率分量。 在所得到的暗场图像中，图案和污染颗粒中的缺陷相对于图案特征被加强。
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