Methods of characterizing similarity between measurements on entities, computer programs product and data carrier
    3.
    发明授权
    Methods of characterizing similarity between measurements on entities, computer programs product and data carrier 有权
    表征实体,计算机程序产品和数据载体上的测量之间的相似性的方法

    公开(公告)号:US07889318B2

    公开(公告)日:2011-02-15

    申请号:US12233484

    申请日:2008-09-18

    IPC分类号: G03B27/53 G03B27/32

    摘要: A method for characterizing the similarity between measurements on a plurality of entities comprising a first entity and a second entity comprises receiving measurements taken at a plurality of measurement points per entity. A model is defined comprising a stochastic process and a model function having values which depend on a set of parameters and the measurement points. A set (β) of parameters is estimated by fitting the model function to the measurements. Residual data is determined for at least a part of the plurality of measurement points for the first entity and the second entity by subtracting the fitted function from the measurements. A correlation coefficient for the first entity (i′) and the second entity (i″) is estimated based on the determined residual data and the estimated correlation coefficient is used to characterize the similarity between the measurements. The model is defined such that the residual data is expected to have a deterministic component which depends on the measurement points and that dominates the estimate of the correlation coefficient. The correlation coefficient is estimated using an estimate for the entity average residue averaged over the measurement points of the first entity and using an estimate for the entity average residue averaged over the measurement points of the second entity.

    摘要翻译: 用于表征包括第一实体和第二实体的多个实体上的测量之间的相似性的方法包括接收在每个实体的多个测量点处进行的测量。 定义的模型包括随机过程和具有取决于一组参数和测量点的值的模型函数。 通过将模型函数拟合到测量中来估计参数的集合(&bgr)。 通过从测量中减去拟合函数,为第一实体和第二实体的多个测量点的至少一部分确定剩余数据。 基于所确定的残差数据来估计第一实体(i')和第二实体(i“)的相关系数,并且使用估计的相关系数来表征测量之间的相似性。 定义模型,使得残差数据预期具有取决于测量点的确定性分量,并且支配相关系数的估计。 使用对第一实体的测量点平均的实体平均残差的估计并使用在第二实体的测量点上平均的实体平均残差的估计来估计相关系数。

    Methods of characterizing similarity or consistency in a set of entities
    5.
    发明申请
    Methods of characterizing similarity or consistency in a set of entities 有权
    表征一组实体的相似性或一致性的方法

    公开(公告)号:US20090073403A1

    公开(公告)日:2009-03-19

    申请号:US11902186

    申请日:2007-09-19

    IPC分类号: G06F17/50 G03B27/42

    CPC分类号: G03F9/7003 G03F9/7034

    摘要: A method of characterizing the similarity between entities in a set of entities, wherein an entity is selected from substrate layers, substrate fields and substrates. Including determining positions at a plurality of measurement points per entity for providing position data; computing a correlation coefficient for each of a plurality of combinations of entities from the entity set, the correlation coefficients being based on the position data and being representative of the correlation between the associated combination of entities; comparing the correlation coefficients to a threshold amount to determine the extent of similarity between the entities. The invention also relates to a similar method incorporating determining an average value of the computed correlation coefficients, the average value providing a measure of the consistency.

    摘要翻译: 表征一组实体中的实体之间的相似性的方法,其中从衬底层,衬底场和衬底中选择实体。 包括在每个实体的多个测量点处确定位置以提供位置数据; 计算来自所述实体集合的多个实体组合中的每一个的相关系数,所述相关系数基于所述位置数据并且表示所述相关联的实体组合之间的相关性; 将相关系数与阈值进行比较,以确定实体之间的相似程度。 本发明还涉及一种包括确定所计算的相关系数的平均值的类似方法,该平均值提供一致性的量度。

    Method of characterization, method of characterizing a process operation, and device manufacturing method
    10.
    发明授权
    Method of characterization, method of characterizing a process operation, and device manufacturing method 失效
    表征方法,表征工艺操作的方法以及器件制造方法

    公开(公告)号:US07649614B2

    公开(公告)日:2010-01-19

    申请号:US11440436

    申请日:2006-05-25

    IPC分类号: G03B27/32

    摘要: A system in which deformation of a substrate is monitored during processing of the substrate is described. In one embodiment, the distortion in the substrate is measured after each exposure and processing operation by comparing the position of a plurality of reference marks to values in a database. The substrate may be characterized by measuring positions on the substrate for a number of measurement fields and a number of measurement positions per field, calculating an estimated variance based at least on the number of measurement fields, the number of measurement positions per field, and a number of model parameters, and comparing the calculated estimated variance to a threshold amount to determine a status of the substrate.

    摘要翻译: 描述了在衬底的处理期间监测衬底的变形的系统。 在一个实施例中,通过将多个参考标记的位置与数据库中的值进行比较,在每次曝光和处理操作之后测量衬底中的失真。 基板的特征在于,通过测量基板上的位置,测量场的数量和每个场的测量位置的数量,至少基于测量场的数量,每场的测量位置的数量和 模型参数的数量,以及将计算的估计方差与阈值量进行比较以确定衬底的状态。