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公开(公告)号：US09310698B2
公开(公告)日：2016-04-12
申请号：US13012386
申请日：2011-01-24
IPC分类号： G03F7/20
CPC分类号： G03F7/70633 , G03F7/705 , G03F7/70516 , G03F7/70525
摘要： A lithographic exposure process is performed on a substrate using a scanner. The scanner comprises several subsystems. There are errors in the overlay arising from the subsystems during the exposure. The overlay errors are measured using a scatterometer to obtain overlay measurements. Modeling is performed to separately determine from the overlay measurements different subsets of estimated model parameters, for example field distortion model parameters, scan/step direction model parameters and position/deformation model parameters. Each subset is related to overlay errors arising from a corresponding specific subsystem of the lithographic apparatus. Finally, the exposure is controlled in the scanner by controlling a specific subsystem of the scanner using its corresponding subset of estimated model parameters. This results in a product wafer being exposed with a well controlled overlay.
摘要翻译： 使用扫描仪在基板上进行光刻曝光处理。 扫描仪包括几个子系统。 暴露过程中子系统产生的覆盖错误。 使用散射仪测量覆盖误差以获得覆盖测量。 执行建模以从覆盖测量单独确定估计模型参数的不同子集，例如场失真模型参数，扫描/步进方向模型参数和位置/变形模型参数。 每个子集与由光刻设备的相应特定子系统产生的叠加误差有关。 最后，通过使用其对应的估计模型参数子集来控制扫描仪的特定子系统，在扫描仪中控制曝光。 这导致用良好控制的覆盖物暴露产品晶片。
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2.发明授权Lithographic apparatus and device manufacturing method for measuring wafer parameters using non-standard alignment settings 有权用于使用非标准对准设置测量晶片参数的平版印刷设备和器件制造方法公开(公告)号：US09134625B2
公开(公告)日：2015-09-15
申请号：US13010388
申请日：2011-01-20
CPC分类号： G03F7/70616 , G03F7/70516 , G03F9/7011 , G03F9/7019
摘要： A method produces at least one monitor wafer for a lithographic apparatus. The monitor wafer is for use in combination with a scanning control module to periodically retrieve measurements defining a baseline from the monitor wafer thereby determining parameter drift from the baseline. In doing this, allowance and/or correction can be to be made for the drift. The baseline is determined by initially exposing the monitor wafer(s) using the lithographic apparatus, such that the initial exposure is performed while using non-standard alignment model settings optimized for accuracy, such as those used for testing the apparatus. An associated lithographic apparatus is also disclosed.
摘要翻译： 一种方法产生用于光刻设备的至少一个监视晶片。 监视器晶片与扫描控制模块组合使用，以周期性地从监视器晶片检索定义基线的测量结果，从而确定基线的参数漂移。 在这样做时，可以对漂移进行津贴和/或修正。 通过使用光刻设备初始曝光监视器晶片来确定基线，使得在使用针对精度优化的非标准对准模型设置（例如用于测试设备的那些）时执行初始曝光。 还公开了相关的光刻设备。
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3.发明申请Lithographic Apparatus, Device Manufacturing Method and Associated Data Processing Apparatus and Computer Program Product 有权平版印刷设备，设备制造方法及相关数据处理设备及计算机程序产品公开(公告)号：US20110216294A1
公开(公告)日：2011-09-08
申请号：US13009250
申请日：2011-01-19
IPC分类号： G03B27/42
CPC分类号： G03F7/70258 , G03F7/70616
摘要： A lithographic apparatus operates by moving a substrate and a patterning device relative to each other in a sequence of movements such that a pattern is applied at a successive portions on the substrate. Each portion of the substrate is patterned by a scanning operation in which the patterning device is scanned through the radiation beam while synchronously scanning the substrate through the patterned radiation beam so as to apply the pattern to the desired portion on the substrate. An intrafield correction is applied during each scanning operation so as to compensate for distortion effects which vary during the scanning operation. The intrafield correction includes corrective variations of one or more properties of the projection system, and optionally out-of-plane movements of the patterning device and/or substrate table.
摘要翻译： 平版印刷设备通过以一系列运动相对于彼此移动基板和图案形成装置来操作，使得在基板上的连续部分施加图案。 通过扫描操作来对衬底的每个部分进行构图，其中图案形成装置通过辐射束扫描，同时通过图案化的辐射束同步扫描衬底，以将图案施加到衬底上的期望部分。 在每次扫描操作期间，进行场内校正，以补偿在扫描操作期间变化的失真效应。 场内校正包括投影系统的一个或多个特性的校正变化，以及图案形成装置和/或衬底台的任意的平面外运动。
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公开(公告)号：US20110216293A1
公开(公告)日：2011-09-08
申请号：US13009232
申请日：2011-01-19
CPC分类号： G03F7/70616 , G03F7/70516 , G03F7/70525 , G03F9/7003 , G03F9/7011 , G03F9/7019 , G03F9/7046
摘要： A method controls a scanning function of a lithographic apparatus. A first alignment strategy is used. A monitor wafer is exposed to determine baseline control parameters pertaining to the scanning function. The baseline control parameters are periodically retrieved from the monitor wafer. Parameter drift is determined from the baseline control parameters. Corrective action is taken based on the determination. A production wafer is exposed using a second alignment strategy, different to the first alignment strategy. The corrective action is modified so as to be substantially closer to the correction that would have been made had the second alignment strategy been used in exposing the monitor wafer.
摘要翻译： 方法控制光刻设备的扫描功能。 使用第一对齐策略。 暴露监视器晶片以确定与扫描功能有关的基线控制参数。 从监视器晶片周期性地检索基线控制参数。 参数漂移由基线控制参数决定。 根据确定采取纠正措施。 使用与第一对准策略不同的第二对准策略来曝光生产晶片。 校正动作被修改，以便基本上更接近如果在暴露监视器晶片时已经使用第二对准策略将会进行的校正。
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5.发明授权公开(公告)号：US07595496B2
公开(公告)日：2009-09-29
申请号：US11812801
申请日：2007-06-21
申请人： Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Jeroen Pieter Starreveld , Wouterus Johannes Petrus Maria Maas , Willem Jurrianus Venema , Boris Menchtchikov
发明人： Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Jeroen Pieter Starreveld , Wouterus Johannes Petrus Maria Maas , Willem Jurrianus Venema , Boris Menchtchikov
IPC分类号： G21K5/00
CPC分类号： G03F7/70616 , G03F7/70783 , G03F7/70875
摘要： A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the pre-specified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations. Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.
摘要翻译： 本文介绍了一种校正光刻曝光的基底的热诱导场变形的方法和装置。 在一个实施例中，该方法包括根据预先指定的曝光信息将图案曝光到基板的多个场上，并测量场的属性以评估由曝光过程的热效应引起的场的变形。 该方法还包括基于所测量的属性来确定校正信息，并且基于校正信息调整预定曝光信息，以补偿热诱导的场变形。 其他实施例包括使用预测模型来预测对场的热诱导效应和热成像以确定跨越衬底的温度变化。
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公开(公告)号：US07304715B2
公开(公告)日：2007-12-04
申请号：US10917535
申请日：2004-08-13
申请人： Theodorus Petrus Maria Cadee , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederick Eduard De Jong , Koen Goorman , Boris Menchtchikov , Marco Koert Stavenga , Martin Frans Pierre Smeets , Aschwin Lodewijk Hendricus Johannes Van Meer , Bart Leonard Peter Schoondermark , Patricius Aloysius Jacobus Tinnemans , Stoyan Nihtianov
发明人： Theodorus Petrus Maria Cadee , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederick Eduard De Jong , Koen Goorman , Boris Menchtchikov , Marco Koert Stavenga , Martin Frans Pierre Smeets , Aschwin Lodewijk Hendricus Johannes Van Meer , Bart Leonard Peter Schoondermark , Patricius Aloysius Jacobus Tinnemans , Stoyan Nihtianov
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.
摘要翻译： 公开了一种光刻设备。 该装置包括配置成调节辐射束的照明系统和构造成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述设备还包括被构造成保持基板的基板台，配置成将图案化的辐射束投影到基板的目标部分上的投影系统，配置成至少部分地填充投影系统和基板之间的空间的液体供应系统 具有液体，被布置成基本上容纳空间内的液体的密封构件以及用于控制和/或补偿浸没液体从基底蒸发的元件。
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公开(公告)号：US20060087637A1
公开(公告)日：2006-04-27
申请号：US10972754
申请日：2004-10-26
申请人： Joost Ottens , Jeroen Johannes Mertens , Frederik De Jong , Koen Goorman , Boris Menchtchikov , Edwin Van Gompel
发明人： Joost Ottens , Jeroen Johannes Mertens , Frederik De Jong , Koen Goorman , Boris Menchtchikov , Edwin Van Gompel
IPC分类号： G03B27/52
CPC分类号： H01L21/67109 , G03F7/70341 , G03F7/707 , G03F7/70783 , G03F7/70875
摘要： A lithographic apparatus includes a substrate support that is constructed to support a substrate, and a projection system that is configured to project a patterned radiation beam onto a target portion of the substrate. The substrate support is arranged to move the substrate along a predetermined trajectory of subsequently targeted target portions of the substrate. The substrate support includes a duct configuration for providing thermal stabilization to the substrate. The duct configuration is arranged to duct thermally stabilizing media in the support, and to substantially duct the media away from a part of the substrate support that supports the target portion via parts of the substrate support that support previously targeted portions of the substrate, so as to keep subsequently targeted target portions thermally stable.
摘要翻译： 光刻设备包括被构造为支撑衬底的衬底支撑件和被配置为将图案化的辐射束投影到衬底的目标部分上的投影系统。 衬底支撑件布置成沿着衬底的随后靶向目标部分的预定轨迹移动衬底。 衬底支撑件包括用于向衬底提供热稳定性的管道构造。 导管构造被布置成将支撑体中的热稳定化介质导管，并且基本上通过支撑基板的先前目标部分的基板支撑件的支撑目标部分的基板支撑件的一部分基本上导管介质，以便 以保持随后的目标靶部分热稳定。
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8.发明授权Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product 有权光刻设备，设备制造方法及相关数据处理设备及计算机程序产品公开(公告)号：US08717536B2
公开(公告)日：2014-05-06
申请号：US13009250
申请日：2011-01-19
CPC分类号： G03F7/70258 , G03F7/70616
摘要： A lithographic apparatus operates by moving a substrate and a patterning device relative to each other in a sequence of movements such that a pattern is applied at a successive portions on the substrate. Each portion of the substrate is patterned by a scanning operation in which the patterning device is scanned through the radiation beam while synchronously scanning the substrate through the patterned radiation beam so as to apply the pattern to the desired portion on the substrate. An intrafield correction is applied during each scanning operation so as to compensate for distortion effects which vary during the scanning operation. The intrafield correction includes corrective variations of one or more properties of the projection system, and optionally out-of-plane movements of the patterning device and/or substrate table.
摘要翻译： 平版印刷设备通过以一系列运动相对于彼此移动基板和图案形成装置来操作，使得在基板上的连续部分施加图案。 通过扫描操作来对衬底的每个部分进行构图，其中图案形成装置通过辐射束扫描，同时通过图案化的辐射束同步扫描衬底，以将图案施加到衬底上的期望部分。 在每次扫描操作期间，进行场内校正，以补偿在扫描操作期间变化的失真效应。 场内校正包括投影系统的一个或多个特性的校正变化，以及图案形成装置和/或衬底台的任意的平面外运动。
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公开(公告)号：US20110213584A1
公开(公告)日：2011-09-01
申请号：US13018868
申请日：2011-02-01
IPC分类号： G06F15/00
CPC分类号： G03F7/70633 , G03F7/70516
摘要： System parameters are checked through self-assessment of a production wafer without a reference or a monitor wafer. In particular, exposure errors and substrate table positioning errors can be corrected for.
摘要翻译： 系统参数通过对生产晶片的自我评估进行检查，无需参考或监视晶片。 特别地，可以校正曝光误差和衬底台定位误差。
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公开(公告)号：US20110205520A1
公开(公告)日：2011-08-25
申请号：US13010409
申请日：2011-01-20
IPC分类号： G03B27/58
CPC分类号： G03F7/70516 , G03F7/70616
摘要： A method produces at least one monitor wafer for a lithographic apparatus. The monitor wafer is for use in combination with a scanning control module to periodically retrieve measurements defining a baseline from the monitor wafer, thereby determining parameter drift from the baseline. In doing this, allowance and/or correction can be to be made for the drift. The baseline is determined by initially exposing the monitor wafer(s) using the lithographic apparatus to perform multiple exposure passes on each of the monitor wafer(s). An associated lithographic apparatus is also disclosed.
摘要翻译： 一种方法产生用于光刻设备的至少一个监视晶片。 监视器晶片与扫描控制模块组合使用，以周期性地从监视器晶片检索限定基线的测量值，从而确定从基准线的参数漂移。 在这样做时，可以对漂移进行津贴和/或修正。 通过使用光刻设备最初暴露监视器晶片以在每个监视器晶片上执行多次曝光确定来确定基线。 还公开了相关的光刻设备。
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