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    Lithographic apparatus and device manufacturing method
    3.
    发明申请
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号：US20090033891A1

    公开(公告)日：2009-02-05

    申请号：US12232971

    申请日：2008-09-26

    申请人： Ronald Johannes Hultermans ,  Ton DE Groot ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Gerardus Everardus Marie Hannen

    发明人： Ronald Johannes Hultermans ,  Ton DE Groot ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Gerardus Everardus Marie Hannen

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70341 ,  G03F7/70866 ,  G03F7/70925

    摘要： An immersion lithographic apparatus is disclosed having comprising a pump and buffer volume configured to remove remaining liquid from a substrate, the pump and the buffer volume configured to generate a vacuum cleaning gas flow near the substrate by gas suction into the buffer volume. In an embodiment, since gas flow is needed only a limited amount of time (ordinarily less than 5%), evacuation may be performed using only a moderately powered vacuum pump. In addition or alternatively, the buffer volume may be used as a backup volume buffer configured to provide gas vacuum suction, e.g., in case of a vacuum supply outage.

    摘要翻译： 公开了一种浸没式光刻设备，其包括构造成从衬底去除剩余液体的泵和缓冲体积，所述泵和缓冲体积构造成通过气体吸入到缓冲体积中而在衬底附近产生真空清洁气体流。 在一个实施方案中，由于仅需要有限量的时间（通常小于5％），因此只能使用中等功率的真空泵进行排气。 另外或替代地，缓冲器体积可以用作配置为提供气体真空吸力的备用体积缓冲器，例如在真空供应中断的情况下。

    Lithographic apparatus and device manufacturing method
    7.
    发明授权
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号：US08045137B2

    公开(公告)日：2011-10-25

    申请号：US12153116

    申请日：2008-05-14

    申请人： Martinus Cornelis Maria Verhagen ,  Hans Jansen ,  Marco Koert Stavenga ,  Jacobus Johannus Leonardus Hendricus Verspay

    发明人： Martinus Cornelis Maria Verhagen ,  Hans Jansen ,  Marco Koert Stavenga ,  Jacobus Johannus Leonardus Hendricus Verspay

    IPC分类号： G03B27/42 ,  G03B27/52

    CPC分类号： G03F7/70341 ,  G03F7/70808

    摘要： A lithographic apparatus is disclosed wherein a liquid supply system is configured to at least partly fill a region between a substrate and a projection system of the lithographic apparatus with a liquid and having a liquid confinement structure fixed in a plane substantially perpendicular to an optical axis of the projection system and configured to cooperate with a substrate table configured to hold the substrate in order to restrict the liquid to a region above an upper surface of the substrate table so that a side of the substrate to be exposed is substantially covered in the liquid during exposure.

    摘要翻译： 公开了一种光刻设备，其中液体供应系统被配置为至少部分地用液体填充光刻设备的基板和投影系统之间的区域，并且具有固定在基本垂直于光轴的光轴的平面中的液体限制结构 所述投影系统被配置为与被配置为保持所述衬底的衬底台配合，以便将所述液体限制在所述衬底台的上表面上方的区域上，使得待暴露的所述衬底的一侧基本上被覆盖在所述液体中 曝光。