公开(公告)号：US20120255492A1

公开(公告)日：2012-10-11

申请号：US13080874

申请日：2011-04-06

Applicant: Mien-Win Wu ,  Ding-Guey Tsai ,  Hwei-Lang Chang ,  Deng-Lain Lin ,  Cheng-Chang Hsieh ,  Chi-Fong Ai

Inventor： Mien-Win Wu ,  Ding-Guey Tsai ,  Hwei-Lang Chang ,  Deng-Lain Lin ,  Cheng-Chang Hsieh ,  Chi-Fong Ai

IPC: C23C16/513 ,  C23C16/458 ,  C23C16/50 ,  C23C16/453

CPC classification number: C23C16/545 ,  C23C16/0245 ,  C23C16/4401 ,  C23C16/45512 ,  C23C16/45565 ,  C23C16/50 ,  C23C16/513 ,  H01J37/32366 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32568 ,  H01J37/32761 ,  H01J37/32825 ,  H01J37/32853

Abstract: An apparatus provides large area atmospheric pressure plasma enhanced chemical vapor deposition without contaminations in its electrode assembly and deposited films. The apparatus consists of a large area vertical planar nitrogen plasma activation electrode assembly and its high voltage power supply, a large area vertical planar nitrogen plasma deposition electrode assembly and its high voltage power supply, a long-line uniform precursor jet apparatus, a roll-to-roll apparatus for substrate movement, and a sub-atmospheric pressure deposition chamber and its pumping apparatus. Not only can the deposited film contaminations in the electrode assembly interior and the debris of the deposited films from exterior of the electrode assembly and the air aerosols in the deposition chamber be completely prevented, but a large area roll-to-roll uniform deposition can also be achieved to meet a roll-to-roll continuous production, so as to achieve improved film quality, increased production throughput and reduced manufacturing cost.

Abstract translation: 一种装置在其电极组件和沉积膜中提供大面积的大气压等离子体增强化学气相沉积而没有污染。 该装置由大面积垂直平面氮等离子体激活电极组件及其高压电源，大面积垂直平面氮等离子体沉积电极组件及其高压电源，长线均匀前驱体喷射装置， 用于基板移动的滚动装置和次大气压力沉积室及其抽吸装置。 不仅可以完全防止电极组件内部的沉积膜污染物和电极组件外部沉积膜的碎屑和沉积室中的空气气溶胶，而且大面积的卷对卷均匀沉积也可以 实现卷对卷连续生产，从而达到提高胶片质量，提高生产量和降低制造成本的目的。

公开(公告)号：US20100225234A1

公开(公告)日：2010-09-09

申请号：US11896620

申请日：2007-09-04

Applicant: Ching-Pei Tseng ,  Cheng-Chang Hsieh ,  Chi-Fong Ai ,  Chia-Cheng Lee ,  Tien-Hsiang Hsueh ,  Chun-Han Wang

Inventor： Ching-Pei Tseng ,  Cheng-Chang Hsieh ,  Chi-Fong Ai ,  Chia-Cheng Lee ,  Tien-Hsiang Hsueh ,  Chun-Han Wang

IPC: H05H1/24

CPC classification number: H05H1/46 ,  H01J37/32596 ,  H01J37/32724

Abstract: A hollow-cathode plasma generator includes a plurality of hollow cathodes joined together and connected to a power supply for generating plasma in vacuum. Each of the hollow cathodes includes at least one fillister defined therein, a fin formed on a side of the fillister, an air-circulating tunnel in communication with the fillister and a coolant-circulating tunnel defined therein. The fillister is used to contain working gas. The fin receives negative voltage from the power supply for ionizing the working gas to generate the plasma and spread the plasma in a single direction. The working gas travels into the fillister from the air-circulating tunnel. The coolant-circulating tunnel is used to circulate coolant for cooling the hollow cathode.

Abstract translation: 中空阴极等离子体发生器包括多个连接在一起的中空阴极，并连接到用于在真空中产生等离子体的电源。 每个中空阴极包括限定在其中的至少一个填充器，形成在填充器一侧的翅片，与填充器连通的空气循环隧道和限定在其中的冷却剂循环通道。 灌装机用于容纳工作气体。 翅片从电源接收负电压，用于电离工作气体以产生等离子体并且在单个方向上扩散等离子体。 工作气体从空气循环通道进入灌装机。 冷却剂循环隧道用于循环冷却剂以冷却空心阴极。

公开(公告)号：US20100218896A1

公开(公告)日：2010-09-02

申请号：US11898356

申请日：2007-09-11

Applicant: Chi-fong Ai ,  Mien-Win Wu ,  Cheng-Chang Hsieh

Inventor： Chi-fong Ai ,  Mien-Win Wu ,  Cheng-Chang Hsieh

IPC: C23F1/08 ,  C23C16/00

CPC classification number: C23C16/509 ,  C23C16/452 ,  H01J37/32348 ,  H01J37/32825 ,  H05H1/2406 ,  H05H2001/2412 ,  H05H2001/2425

Abstract: An atmospheric pressure plasma reactor includes a high-voltage electrode, a common grounded electrode, a bias electrode and at least one dielectric layer. The high-voltage electrode is connected to a high-voltage power supply. The common grounded electrode is used with the high-voltage electrode to discharge and therefore produce planar atmospheric plasma from reactive gas. The bias electrode is used to generate bias for attracting the ions of the planar atmospheric pressure plasma. The dielectric layer is used to suppress undesirable arc discharge during the discharging.

Abstract translation: 大气压等离子体反应器包括高压电极，公共接地电极，偏置电极和至少一个电介质层。 高压电极连接到高压电源。 公共接地电极与高电压电极一起使用以放电，因此从反应气体产生平面大气等离子体。 偏置电极用于产生用于吸引平面大气压等离子体的离子的偏压。 电介质层用于抑制放电期间的不期望的电弧放电。

公开(公告)号：US20100218721A1

公开(公告)日：2010-09-02

申请号：US11896738

申请日：2007-09-05

Applicant: Der-Jun Jan ,  Shin-Wu Wei ,  Chi-Fong Ai

Inventor： Der-Jun Jan ,  Shin-Wu Wei ,  Chi-Fong Ai

IPC: C23C16/513 ,  C23C16/448 ,  C23C16/505

CPC classification number: C23C16/505 ,  H01J37/32009 ,  H01J37/32596 ,  H01J37/32761

Abstract: A hollow-cathode discharge apparatus is disclosed for plasma-based processing. The hollow-cathode discharge apparatus includes a vacuum chamber, a hollow cathode disposed in the center of the vacuum chamber, a carrier for synchronously carrying a plurality of work-pieces in the vacuum chamber and a driving element for driving the carrier.

Abstract translation: 公开了一种用于等离子体处理的中空阴极放电装置。 中空阴极放电装置包括真空室，设置在真空室中心的中空阴极，用于同时承载真空室中的多个工件的载体和用于驱动载体的驱动元件。

公开(公告)号：US20090197014A1

公开(公告)日：2009-08-06

申请号：US12068249

申请日：2008-02-04

Applicant: Jin-Yu Wu ,  Chun-Han Wang ,  Ding-Guey Tsai ,  Ming-Ruesy Tsai ,  Chi-Fong Ai

Inventor： Jin-Yu Wu ,  Chun-Han Wang ,  Ding-Guey Tsai ,  Ming-Ruesy Tsai ,  Chi-Fong Ai

IPC: H05H1/24 ,  B05C11/00

CPC classification number: H01J37/32522 ,  C23C16/27 ,  C23C16/271 ,  C23C16/4411 ,  C23C16/4412 ,  C23C16/45523 ,  C23C16/45565 ,  C23C16/52 ,  H01J37/32009 ,  H01J2237/3321

Abstract: There is a disclosed apparatus for coating diamond on work pieces via hot filament chemical vapor deposition. The apparatus includes a chamber, a pump for pumping air from the chamber, a pressure controller for con trolling the pressure in the chamber, a grid disposed in the chamber, a grid-bias power supply for providing a positive bias to the grid, a holder for carrying the work pieces, a holder-bias power supply for providing a negative bias to the holder, filaments provided between the grid and the carrier, a filament power supply for energizing the filaments to heat up, a programmable temperature controller for controlling the temperature in the chamber and a pipe for transferring reaction gas into the chamber.

Abstract translation: 公开了一种用于通过热丝化学气相沉积在工件上涂覆金刚石的公开的装置。 该装置包括：腔室，用于从腔室抽空气的泵，用于控制腔室内的压力的压力控制器，设置在腔室中的格栅，用于向栅格提供正偏压的栅极偏置电源; 用于承载工件的保持器，用于向保持器提供负偏压的保持器偏置电源，设置在电网和载体之间的灯丝，用于使灯丝加热的灯丝电源，用于控制灯丝的可编程温度控制器 室内的温度和用于将反应气体输送到室中的管道。

公开(公告)号：US20110192348A1

公开(公告)日：2011-08-11

申请号：US12701035

申请日：2010-02-05

Applicant: Ching-Pei Tseng ,  Cheng-Chang Hsieh ,  Chi-Fong Ai ,  Chia-Cheng Lee ,  Deng-Lain Lin

Inventor： Ching-Pei Tseng ,  Cheng-Chang Hsieh ,  Chi-Fong Ai ,  Chia-Cheng Lee ,  Deng-Lain Lin

IPC: C23C16/00 ,  H05H1/24

CPC classification number: C23C16/509 ,  H01J37/3244 ,  H01J37/32596

Abstract: An RF hollow cathode plasma source consists of a vacuum chamber, a pipe, a hollow cathode, at least two compartments, a conduit and input electrodes. The pipe is inserted into the chamber for introducing working gas into the chamber. The hollow cathode is disposed in the chamber and formed with a large number of apertures. At least two compartments are located below the hollow cathode. Each of the compartments includes small apertures for uniformly spreading the working gas into the apertures of the hollow cathode. The conduit is disposed along two sides of the hollow cathode to circulate cooling water around the hollow cathode. The plural input power leads are arranged near the hollow cathode. The input power leads, the pipe and the conduits are connected to the hollow cathode though the electrically-insulated walls of the grounded vacuum chamber.

Abstract translation: RF空心阴极等离子体源由真空室，管，中空阴极，至少两个隔室，导管和输入电极组成。 将管插入腔室中以将工作气体引入腔室。 中空阴极设置在室中并形成有大量孔。 至少两个隔室位于空心阴极的下面。 每个隔室包括用于将工作气体均匀地分散到中空阴极的孔中的小孔。 导管沿空心阴极的两侧设置，以将冷却水循环在中空阴极周围。 多个输入电源引线设置在中空阴极附近。 输入功率引线，管道和导管通过接地真空室的电绝缘壁连接到空心阴极。

公开(公告)号：US20110088766A1

公开(公告)日：2011-04-21

申请号：US12726930

申请日：2010-03-18

Applicant: Min-Chuan Wang ,  Yong-Zhi Chen ,  Der-Jun Jan ,  Chi-Fong Ai

Inventor： Min-Chuan Wang ,  Yong-Zhi Chen ,  Der-Jun Jan ,  Chi-Fong Ai

IPC: H01L31/0224 ,  H01L31/18

CPC classification number: H01L31/07 ,  H01L31/056 ,  Y02E10/52

Abstract: A thin-film photovoltaic device comprising at least: a substrate, a transparent electrode layer, a p-type semiconductor as the ohmic contact layer, an intrinsic semiconductor as the light absorption layer, and a magnesium alloy substituted for the n-type semiconductor as the other ohmic contact layer. A method for manufacturing the thin-film photovoltaic device is also provided in the present invention.

Abstract translation: 一种薄膜光伏器件，至少包括：基板，透明电极层，作为欧姆接触层的p型半导体，作为光吸收层的本征半导体，以及代替n型半导体的镁合金 另一个欧姆接触层。 本发明还提供了薄膜光伏器件的制造方法。

公开(公告)号：US20110041766A1

公开(公告)日：2011-02-24

申请号：US12732753

申请日：2010-03-26

Applicant: Shih-Cheng Tseng ,  Cheng-Chang Hsieh ,  Ming-Chung Yang ,  Der-Jun Jan ,  Chi-Fong Ai

Inventor： Shih-Cheng Tseng ,  Cheng-Chang Hsieh ,  Ming-Chung Yang ,  Der-Jun Jan ,  Chi-Fong Ai

IPC: C23C16/513

CPC classification number: H01J37/3266 ,  H01J37/3211 ,  H01J37/32174 ,  H01J37/32357

Abstract: A plasma source comprises a vacuum chamber, a plurality of discharge tubes, a plurality of permanent magnets, a plurality of RF antennas, and an RF power distribution circuit. The RF power distribution circuit is electrically coupled to an RF power supply and each of the plurality of RF antennas. The lengths of the transmission paths between each of the plurality of RF antennas and the RF power supply are the same, so that the RF power supply can provide each of discharge tubes with the same RF power.

Abstract translation: 等离子体源包括真空室，多个放电管，多个永磁体，多个RF天线和RF功率分配电路。 RF功率分配电路电耦合到RF电源和多个RF天线中的每一个。 多个RF天线中的每一个和RF电源之间的传输路径的长度相同，使得RF电源可以为每个放电管提供相同的RF功率。

公开(公告)号：US20080105657A1

公开(公告)日：2008-05-08

申请号：US11592237

申请日：2006-11-03

Applicant: Jin-Yu Wu ,  Ming-Ruesy Tsai ,  Shang-Feng Huang ,  Ding-Guey Tsai ,  Shin-Wu Wei ,  Chi-Fong Ai

Inventor： Jin-Yu Wu ,  Ming-Ruesy Tsai ,  Shang-Feng Huang ,  Ding-Guey Tsai ,  Shin-Wu Wei ,  Chi-Fong Ai

IPC: C25D17/16

CPC classification number: H01J37/32871 ,  H01J37/32055 ,  H01J37/32623 ,  H01J2237/022

Abstract: A plasma source is designed with a starting rod to reduce target vapor shielding. A curve ion duct has reverse thorns on its inner wall to filter macroparticles in plasma. The curve ion duct has duct segments and each duct segment has an individual electricity. The present invention increases ion amount, acquires a film through high energy ions, and obtains enhanced film adhesion and film quality.

Abstract translation: 等离子体源设计有起始杆以减少目标蒸气屏蔽。 曲线离子管在其内壁上具有反向刺，以在等离子体中过滤大颗粒。 曲线离子管道具有管道段，每个管道段具有单独的电力。 本发明增加离子量，通过高能离子获得膜，并且获得增强的膜附着力和膜质量。

公开(公告)号：US20080060579A1

公开(公告)日：2008-03-13

申请号：US11510824

申请日：2006-08-28

Applicant: Cheng-Chang Hsieh ,  Mien-Win Wu ,  Chi-Fong Ai

Inventor： Cheng-Chang Hsieh ,  Mien-Win Wu ,  Chi-Fong Ai

IPC: C23C16/00

CPC classification number: H01J37/32825 ,  H01J37/32009 ,  H01J37/32348 ,  H01J37/32587

Abstract: A dielectric barrier discharge uses three electrodes at an atmospheric pressure. A wide discharge gap can be used and an enhanced plasma density can be achieved so that thick materials can be processed and its processing speed can also be greatly improved.

Abstract translation: 电介质阻挡放电在大气压下使用三个电极。 可以使用宽的放电间隙，并且可以实现增强的等离子体密度，使得可以处理厚的材料并且还可以极大地改善其加工速度。