公开(公告)号：US20110192348A1

公开(公告)日：2011-08-11

申请号：US12701035

申请日：2010-02-05

Applicant: Ching-Pei Tseng ,  Cheng-Chang Hsieh ,  Chi-Fong Ai ,  Chia-Cheng Lee ,  Deng-Lain Lin

Inventor： Ching-Pei Tseng ,  Cheng-Chang Hsieh ,  Chi-Fong Ai ,  Chia-Cheng Lee ,  Deng-Lain Lin

IPC: C23C16/00 ,  H05H1/24

CPC classification number: C23C16/509 ,  H01J37/3244 ,  H01J37/32596

Abstract: An RF hollow cathode plasma source consists of a vacuum chamber, a pipe, a hollow cathode, at least two compartments, a conduit and input electrodes. The pipe is inserted into the chamber for introducing working gas into the chamber. The hollow cathode is disposed in the chamber and formed with a large number of apertures. At least two compartments are located below the hollow cathode. Each of the compartments includes small apertures for uniformly spreading the working gas into the apertures of the hollow cathode. The conduit is disposed along two sides of the hollow cathode to circulate cooling water around the hollow cathode. The plural input power leads are arranged near the hollow cathode. The input power leads, the pipe and the conduits are connected to the hollow cathode though the electrically-insulated walls of the grounded vacuum chamber.

Abstract translation: RF空心阴极等离子体源由真空室，管，中空阴极，至少两个隔室，导管和输入电极组成。 将管插入腔室中以将工作气体引入腔室。 中空阴极设置在室中并形成有大量孔。 至少两个隔室位于空心阴极的下面。 每个隔室包括用于将工作气体均匀地分散到中空阴极的孔中的小孔。 导管沿空心阴极的两侧设置，以将冷却水循环在中空阴极周围。 多个输入电源引线设置在中空阴极附近。 输入功率引线，管道和导管通过接地真空室的电绝缘壁连接到空心阴极。

公开(公告)号：US20100225234A1

公开(公告)日：2010-09-09

申请号：US11896620

申请日：2007-09-04

Applicant: Ching-Pei Tseng ,  Cheng-Chang Hsieh ,  Chi-Fong Ai ,  Chia-Cheng Lee ,  Tien-Hsiang Hsueh ,  Chun-Han Wang

Inventor： Ching-Pei Tseng ,  Cheng-Chang Hsieh ,  Chi-Fong Ai ,  Chia-Cheng Lee ,  Tien-Hsiang Hsueh ,  Chun-Han Wang

IPC: H05H1/24

CPC classification number: H05H1/46 ,  H01J37/32596 ,  H01J37/32724

Abstract: A hollow-cathode plasma generator includes a plurality of hollow cathodes joined together and connected to a power supply for generating plasma in vacuum. Each of the hollow cathodes includes at least one fillister defined therein, a fin formed on a side of the fillister, an air-circulating tunnel in communication with the fillister and a coolant-circulating tunnel defined therein. The fillister is used to contain working gas. The fin receives negative voltage from the power supply for ionizing the working gas to generate the plasma and spread the plasma in a single direction. The working gas travels into the fillister from the air-circulating tunnel. The coolant-circulating tunnel is used to circulate coolant for cooling the hollow cathode.

Abstract translation: 中空阴极等离子体发生器包括多个连接在一起的中空阴极，并连接到用于在真空中产生等离子体的电源。 每个中空阴极包括限定在其中的至少一个填充器，形成在填充器一侧的翅片，与填充器连通的空气循环隧道和限定在其中的冷却剂循环通道。 灌装机用于容纳工作气体。 翅片从电源接收负电压，用于电离工作气体以产生等离子体并且在单个方向上扩散等离子体。 工作气体从空气循环通道进入灌装机。 冷却剂循环隧道用于循环冷却剂以冷却空心阴极。

公开(公告)号：US20110011737A1

公开(公告)日：2011-01-20

申请号：US12505042

申请日：2009-07-17

Applicant: Jin-Yu Wu ,  Wen-Lung Liung ,  Ming-Jui Tsai ,  Der-Jun Jan ,  Cheng-Chang Hsieh ,  Shin-Wu Wei ,  Chia-Cheng Lee ,  Chi-Fong Ai

Inventor： Jin-Yu Wu ,  Wen-Lung Liung ,  Ming-Jui Tsai ,  Der-Jun Jan ,  Cheng-Chang Hsieh ,  Shin-Wu Wei ,  Chia-Cheng Lee ,  Chi-Fong Ai

IPC: C23C14/35

CPC classification number: H01J37/3405 ,  H01J37/3444 ,  H01J37/3467

Abstract: A magnetron sputtering apparatus suitable for coating on a workpiece is provided. The magnetron sputtering apparatus includes a vacuum chamber, a holder, a magnetron plasma source and a high-power pulse power supply set, wherein the magnetron plasma source includes a base, a magnetron controller and a target. A reactive gas is inputted into the vacuum chamber, and the holder supporting the workpiece is disposed inside the vacuum chamber. The magnetron plasma source is disposed opposite to the workpiece, wherein the magnetron controller is disposed in the base, and the target is disposed on the base. The high-power pulse power supply set is coupled to the vacuum chamber, the magnetron plasma source and the holder, and a high voltage pulse power is inputted to the magnetron plasma source to generate plasma to coat a film on the surface of the workpiece.

Abstract translation: 提供了适用于在工件上涂覆的磁控溅射装置。 磁控溅射装置包括真空室，保持器，磁控管等离子体源和大功率脉冲电源组，其中磁控管等离子体源包括基极，磁控管控制器和靶。 反应气体被输入到真空室中，并且支撑工件的支架设置在真空室内。 磁控管等离子体源与工件相对设置，其中磁控管控制器设置在基座中，并且目标件设置在基座上。 大功率脉冲电源组耦合到真空室，磁控管等离子体源和保持器，并且高压脉冲功率被输入到磁控管等离子体源以产生等离子体以在工件的表面上涂覆膜。