公开(公告)号：US20080105657A1

公开(公告)日：2008-05-08

申请号：US11592237

申请日：2006-11-03

Applicant: Jin-Yu Wu ,  Ming-Ruesy Tsai ,  Shang-Feng Huang ,  Ding-Guey Tsai ,  Shin-Wu Wei ,  Chi-Fong Ai

Inventor： Jin-Yu Wu ,  Ming-Ruesy Tsai ,  Shang-Feng Huang ,  Ding-Guey Tsai ,  Shin-Wu Wei ,  Chi-Fong Ai

IPC: C25D17/16

CPC classification number: H01J37/32871 ,  H01J37/32055 ,  H01J37/32623 ,  H01J2237/022

Abstract: A plasma source is designed with a starting rod to reduce target vapor shielding. A curve ion duct has reverse thorns on its inner wall to filter macroparticles in plasma. The curve ion duct has duct segments and each duct segment has an individual electricity. The present invention increases ion amount, acquires a film through high energy ions, and obtains enhanced film adhesion and film quality.

Abstract translation: 等离子体源设计有起始杆以减少目标蒸气屏蔽。 曲线离子管在其内壁上具有反向刺，以在等离子体中过滤大颗粒。 曲线离子管道具有管道段，每个管道段具有单独的电力。 本发明增加离子量，通过高能离子获得膜，并且获得增强的膜附着力和膜质量。

公开(公告)号：US20090197014A1

公开(公告)日：2009-08-06

申请号：US12068249

申请日：2008-02-04

Applicant: Jin-Yu Wu ,  Chun-Han Wang ,  Ding-Guey Tsai ,  Ming-Ruesy Tsai ,  Chi-Fong Ai

Inventor： Jin-Yu Wu ,  Chun-Han Wang ,  Ding-Guey Tsai ,  Ming-Ruesy Tsai ,  Chi-Fong Ai

IPC: H05H1/24 ,  B05C11/00

CPC classification number: H01J37/32522 ,  C23C16/27 ,  C23C16/271 ,  C23C16/4411 ,  C23C16/4412 ,  C23C16/45523 ,  C23C16/45565 ,  C23C16/52 ,  H01J37/32009 ,  H01J2237/3321

Abstract: There is a disclosed apparatus for coating diamond on work pieces via hot filament chemical vapor deposition. The apparatus includes a chamber, a pump for pumping air from the chamber, a pressure controller for con trolling the pressure in the chamber, a grid disposed in the chamber, a grid-bias power supply for providing a positive bias to the grid, a holder for carrying the work pieces, a holder-bias power supply for providing a negative bias to the holder, filaments provided between the grid and the carrier, a filament power supply for energizing the filaments to heat up, a programmable temperature controller for controlling the temperature in the chamber and a pipe for transferring reaction gas into the chamber.

Abstract translation: 公开了一种用于通过热丝化学气相沉积在工件上涂覆金刚石的公开的装置。 该装置包括：腔室，用于从腔室抽空气的泵，用于控制腔室内的压力的压力控制器，设置在腔室中的格栅，用于向栅格提供正偏压的栅极偏置电源; 用于承载工件的保持器，用于向保持器提供负偏压的保持器偏置电源，设置在电网和载体之间的灯丝，用于使灯丝加热的灯丝电源，用于控制灯丝的可编程温度控制器 室内的温度和用于将反应气体输送到室中的管道。

公开(公告)号：US20110011737A1

公开(公告)日：2011-01-20

申请号：US12505042

申请日：2009-07-17

Applicant: Jin-Yu Wu ,  Wen-Lung Liung ,  Ming-Jui Tsai ,  Der-Jun Jan ,  Cheng-Chang Hsieh ,  Shin-Wu Wei ,  Chia-Cheng Lee ,  Chi-Fong Ai

Inventor： Jin-Yu Wu ,  Wen-Lung Liung ,  Ming-Jui Tsai ,  Der-Jun Jan ,  Cheng-Chang Hsieh ,  Shin-Wu Wei ,  Chia-Cheng Lee ,  Chi-Fong Ai

IPC: C23C14/35

CPC classification number: H01J37/3405 ,  H01J37/3444 ,  H01J37/3467

Abstract: A magnetron sputtering apparatus suitable for coating on a workpiece is provided. The magnetron sputtering apparatus includes a vacuum chamber, a holder, a magnetron plasma source and a high-power pulse power supply set, wherein the magnetron plasma source includes a base, a magnetron controller and a target. A reactive gas is inputted into the vacuum chamber, and the holder supporting the workpiece is disposed inside the vacuum chamber. The magnetron plasma source is disposed opposite to the workpiece, wherein the magnetron controller is disposed in the base, and the target is disposed on the base. The high-power pulse power supply set is coupled to the vacuum chamber, the magnetron plasma source and the holder, and a high voltage pulse power is inputted to the magnetron plasma source to generate plasma to coat a film on the surface of the workpiece.

Abstract translation: 提供了适用于在工件上涂覆的磁控溅射装置。 磁控溅射装置包括真空室，保持器，磁控管等离子体源和大功率脉冲电源组，其中磁控管等离子体源包括基极，磁控管控制器和靶。 反应气体被输入到真空室中，并且支撑工件的支架设置在真空室内。 磁控管等离子体源与工件相对设置，其中磁控管控制器设置在基座中，并且目标件设置在基座上。 大功率脉冲电源组耦合到真空室，磁控管等离子体源和保持器，并且高压脉冲功率被输入到磁控管等离子体源以产生等离子体以在工件的表面上涂覆膜。