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公开(公告)号：US11879904B2
公开(公告)日：2024-01-23
申请号：US17507874
申请日：2021-10-22
发明人： Kouhei Nonaka , Takamichi Mori , Yoichi Aruga , Yosuke Horie , Andrew McCaughey , Alexander Seiler
CPC分类号： G01N35/1004 , G01N35/1009 , B01F31/00 , B01L3/0275 , G01N2035/00524 , G01N2035/00554
摘要： A method of washing an aspiration probe of an in-vitro diagnostic system is disclosed. The aspiration probe comprises an outer surface and an inner surface forming an inner space for receiving a fluid. The method comprises dipping the aspiration probe into a first wash fluid so that the outer surface is immersed at least in part into the first wash fluid, aspirating an amount of the first wash fluid into the inner space of the aspiration probe, propagating an ultrasonic vibration to the outer surface of the aspiration probe via the first wash fluid, and rinsing the outer surface and the inner surface of the aspiration probe with a second wash fluid. Further, an in-vitro diagnostic method and an in-vitro diagnostic system are disclosed.
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公开(公告)号：US11791124B2
公开(公告)日：2023-10-17
申请号：US17230650
申请日：2021-04-14
发明人： Yuta Kawamoto , Akira Ikegami , Yasushi Ebizuka , Nobuo Fujinaga
IPC分类号： H01J37/10 , H01J37/153 , H01J37/147
CPC分类号： H01J37/153 , H01J37/10 , H01J37/1472 , H01J2237/0473 , H01J2237/1534
摘要： An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.
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公开(公告)号：US20230258672A1
公开(公告)日：2023-08-17
申请号：US18136406
申请日：2023-04-19
发明人： Masashi AKUTSU , Naoto SUZUKI , Hiroki FUJITA , Akihiro YASUI
CPC分类号： G01N35/02 , G01N35/00603 , G01N2035/00752 , G01N2035/00831 , G01N27/447
摘要： This automated analysis device is provided with a plurality of analysis units for analyzing a specimen, a buffer portion which holds a plurality of specimen racks on which are placed specimen containers holding the specimen, a sampler portion which conveys the specimen racks held in the buffer portion to the analysis units, and a control portion which, when performing a process to deliver the specimen racks to the plurality of analysis units, outputs synchronization signals to all the plurality of analysis units, wherein the analysis unit performs a delivery process starting from the synchronization signal, and the analysis unit performs a delivery process starting from the synchronization signal.
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公开(公告)号：US11621141B2
公开(公告)日：2023-04-04
申请号：US16077782
申请日：2016-02-26
发明人： Toru Iwaya , Hisayuki Takasu , Sakae Koubori
IPC分类号： H01J37/20 , H01J37/305 , H01J37/08 , H01J37/26 , H01J37/304 , H01J37/30
摘要： Provided is a machining technology to obtain a desired machining content while suppressing a possibility of causing a redeposition in a machining surface. The invention is directed to provide an ion milling device which includes an ion source which emits an ion beam, a sample holder which holds a sample, and a sample sliding mechanism which slides the sample holder in a direction including a normal direction of an axis of the ion beam.
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公开(公告)号：US11538671B2
公开(公告)日：2022-12-27
申请号：US16666842
申请日：2019-10-29
IPC分类号： H01J37/32
摘要： In time-series data indicating light emission of plasma when plasma processing is carried out on a sample by generating the plasma, an analysis apparatus creates combinations of a plurality of light emission wavelengths of elements and a plurality of time intervals within a plasma processing interval and calculates, for each of the combinations of the wavelengths and the time intervals, a correlation between an average value of light emission intensity and the number of times the plasma processing is carried out on the samples for each of the combinations of the wavelengths and the time intervals that have been created. Thereafter, the data analysis apparatus selects, as a combination of the wavelength and the time interval used to observe or control the plasma processing, a combination of a wavelength of light emitting from a specific element and a specific time interval having a maximum correlation.
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公开(公告)号：US11506534B2
公开(公告)日：2022-11-22
申请号：US16472129
申请日：2017-10-24
发明人： Takeshi Ishida , Isao Yamazaki , Sakuichiro Adachi , Shin Imamura
摘要： An automatic analysis apparatus comprises: a light source generating light having a center wavelength equal to or shorter than 340 nm; a fluorescent substance excited by the light source light, and generates light together with transmitted light from the light source, having a wavelength of 340 nm to 800 nm; a condenser lens; at least one slit; a reaction cell holding a reaction solution where a specimen and reagent are mixed, and that the light source light and the light from the fluorescent substance enter; and a detector that detects light transmitted through the reaction cell. The light source, fluorescent substance, condenser lens, and slit are provided along a straight light corresponding to the optical axis. The width of the slit's opening is equal to or narrower than the width of a ray forming an image of the light source at the position of the slit.
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公开(公告)号：US11458513B2
公开(公告)日：2022-10-04
申请号：US16616165
申请日：2017-06-21
发明人： Akinari Morikawa , Kotaro Hosoya
摘要： To provide a charged particle beam apparatus. The charged particle beam apparatus includes: a stage on which a sample is placed; a cleaner configured to remove a contaminant on the sample; and a stage control unit configured to adjust a relative positional relationship between the cleaner and the sample by moving the stage during use of the cleaner.
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公开(公告)号：US11442024B2
公开(公告)日：2022-09-13
申请号：US16642948
申请日：2017-09-11
发明人： Takanori Kondo , Toshifumi Honda , Akira Hamamatsu , Hideo Ota , Yoshio Kimoto
IPC分类号： G01N21/95 , G01N21/956
摘要： In order to prevent an erroneous determination of an on-film defect, the sensitivity of the post-inspection is reduced so that a film swelling due to a minute defect would not be detected. Classification is performed to determine whether a defect is at least one of an on-film defect and a film swelling, by performing a coordinate correction on the result of a post-inspection by an actual-defect fine alignment using the result of a pre-inspection performed with two-stage thresholds, and by checking defects against each other. In addition, classification is performed to determine whether a defect is at least one of an on-film defect and a film swelling by, during the post-inspection, preparing instruction data from information of the refractive index and thickness of a film formed on a wafer and comparing the instruction data with a signal intensity ratio of a detection system.
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公开(公告)号：US11418101B2
公开(公告)日：2022-08-16
申请号：US16600010
申请日：2019-10-11
摘要： Since wires connected to a linear motor are routed in a vacuum sample chamber, outgassing is generated from wire coating and efficiency of assembly operations is reduced. Further, there is a problem that thrust generation efficiency of the linear motor is reduced when a gap between a coil and a permanent magnet of the linear motor cannot be small. In order to solve the above problems, a linear motor for vacuum is provided, the linear motor for vacuum including: a mover having a permanent magnet; and a stator having a support member to which a coil is fixed, in which the support member includes a vacuum sealing portion that vacuum seals with a wall surface of a vacuum sample chamber, and a feed-through for supplying a current to the coil provided in the vacuum sample chamber.
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公开(公告)号：US11410836B2
公开(公告)日：2022-08-09
申请号：US16281652
申请日：2019-02-21
IPC分类号： H01J37/32 , H01L21/67 , H01L21/311
摘要： There is provided a method of analyzing data obtained from an etching apparatus for micromachining a wafer using plasma. This method includes the following steps: acquiring the plasma light-emission data indicating light-emission intensities at a plurality of different wavelengths and times, the plasma light-emission data being measured under a plurality of different etching processing conditions, and being obtained at the time of the etching processing, evaluating the relationship between changes in the etching processing conditions and changes in the light-emission intensities at the plurality of different wavelengths and times with respect to the wavelengths and times of the plasma light-emission data, and identifying the wavelength and the time of the plasma light-emission data based on the evaluation result, the wavelength and the time being to be used for the adjustment of the etching processing condition.
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