公开(公告)号：US06822233B2

公开(公告)日：2004-11-23

申请号：US10346138

申请日：2003-01-17

Applicant: Kuniyasu Nakamura ,  Hiroshi Kakibayashi ,  Mikio Ichihashi ,  Shigeto Isakozawa ,  Yuji Sato ,  Takahito Hashimoto

Inventor： Kuniyasu Nakamura ,  Hiroshi Kakibayashi ,  Mikio Ichihashi ,  Shigeto Isakozawa ,  Yuji Sato ,  Takahito Hashimoto

IPC: H01J3704

CPC classification number: H01J37/1471 ,  H01J37/28 ,  H01J2237/2802

Abstract: A scanning transmission electron microscope (STEM) has an electron source for generating a primary electron beam and an electron illuminating lens system for converging the primary electron beam from the electron source onto a specimen for illumination. An electron deflecting system is provided for scanning the specimen with the primary electron beam. The STEM also has a scattered electron detector for detecting scattered electrons transmitted through the specimen. A projection lens system projects the scattered electrons onto a detection surface of the scattered electron detector. An image displaying device displays the scanning transmission electron microscope image of the specimen using a detection signal from the scattered electron detector. A detection angle changing device for establishes the range of the scattering angle of the scattered electrons detected by the scattered electron detector. This structure enhances the contrast of a desired portion of the specimen under observation for a scanning transmitted image by selective establishment of detection angle ranges for the scattered electron detector.

Abstract translation: 扫描透射电子显微镜（STEM）具有用于产生一次电子束的电子源和用于将来自电子源的一次电子束聚焦到用于照明的样本上的电子照明透镜系统。 提供电子偏转系统用于用一次电子束扫描样本。 STEM还具有散射电子检测器，用于检测通过样品传播的散射电子。 投影透镜系统将散射的电子投射到散射电子检测器的检测表面上。 图像显示装置使用来自散射电子检测器的检测信号来显示样本的扫描透射电子显微镜图像。 一种用于确定由散射电子检测器检测的散射电子的散射角的范围的检测角度改变装置。 该结构通过选择性地建立散射电子检测器的检测角度范围，增强了扫描透射图像观察下的样本的期望部分的对比度。

公开(公告)号：US06747279B2

公开(公告)日：2004-06-08

申请号：US10182437

申请日：2002-10-03

Applicant: Pavel Adamec

Inventor： Pavel Adamec

IPC: H01J3710

CPC classification number: H01J37/1471 ,  H01J37/141 ,  H01J37/28

Abstract: An improved objective lens for a charged particle beam device is constituted by, among other things, a magnetic lens that creates a first magnetic field for focussing the charged particle beam onto the specimen. Furthermore, a deflector is integrated into the magnetic lens by providing at least one additional coil arrangement that creates a second magnetic field used to deflect the charged particle beam. Thereby, the second magnetic field is guided through at least one of the pole pieces of the magnetic lens. The present invention also provides an improved column for a charged particle beam device including the improved objective lens.

Abstract translation: 用于带电粒子束装置的改进的物镜由除其他之外的磁性透镜构成，该磁透镜产生用于将带电粒子束聚焦到样本上的第一磁场。 此外，偏转器通过提供至少一个额外的线圈装置而被集成到磁性透镜中，该线圈装置产生用于偏转带电粒子束的第二磁场。 由此，第二磁场被引导通过磁性透镜的极片中的至少一个。 本发明还提供了一种用于包括改进的物镜的带电粒子束装置的改进的列。

公开(公告)号：US06437350B1

公开(公告)日：2002-08-20

申请号：US09649183

申请日：2000-08-28

Applicant: Joseph C. Olson ,  Anthony Renau

Inventor： Joseph C. Olson ,  Anthony Renau

IPC: H01J3708

CPC classification number: H01J37/3171 ,  H01J37/1471

Abstract: Methods and apparatus for implanting ions in a workpiece, such as a semiconductor wafer, include generating an ion beam, measuring parallelism of the ion beam, adjusting the ion beam for a desired parallelism based on the measured parallelism, measuring a beam direction of the adjusted ion beam, orienting a workpiece at an implant angle referenced to the measured beam direction and performing an implant with the workpiece oriented at the implant angle referenced to the measured beam direction. The implant may be performed with a high degree of beam parallelism.

Abstract translation: 用于在诸如半导体晶片的工件中注入离子的方法和装置包括产生离子束，测量离子束的平行度，基于所测量的平行度调节离子束以达到期望的平行度，测量经调节的 离子束，以参考所测量的束方向的注入角度定向工件，并且以与以测量的光束方向为准的注入角度对准的工件进行植入。 可以以高度的束平行度执行植入物。

公开(公告)号：US20010028037A1

公开(公告)日：2001-10-11

申请号：US09766129

申请日：2001-01-19

Inventor： Shohei Suzuki

IPC: G21K001/08 ,  H01J003/14 ,  H01J003/26 ,  H01J049/42

CPC classification number: H01J37/1471 ,  B82Y10/00 ,  B82Y40/00 ,  G21K1/02 ,  H01J37/09 ,  H01J37/3174 ,  H01J2237/3175

Abstract: Hollow-beam apertures and methods for using same are disclosed, especially for achieving alignment of the beam center with the center of the hollow-beam aperture. The hollow-beam apertures define beam-transmissive portions (e.g., through-holes) that form a hollow beam propagating downstream of the hollow-beam aperture. Also included is a relatively thick region that causes absorption of at least a portion of the incident beam and may also cause localized scattering of the beam. Absorption of charged particles generates an electrical current that can be measured. From such current measurements accompanying controlled displacement of the incident beam, a measurement of the lateral beam-intensity distribution can be obtained. I.e., the current typically is maximal whenever the beam center is aligned with the center of the hollow-beam aperture. Lateral beam adjustment can be achieved using an aligner (deflector assembly).

Abstract translation: 公开了空心光束孔及其使用方法，特别是用于实现光束中心与中空光束孔的中心的对准。 中空光束孔限定了透射部分（例如，通孔），其形成在中空光束孔径的下游传播的中空光束。 还包括引起至少一部分入射光束的吸收的相对较厚的区域，并且还可能引起光束的局部散射。 带电粒子的吸收产生可以测量的电流。 根据伴随入射光束受控位移的这种电流测量，可以获得横向光束强度分布的测量。 即，当光束中心与中空光束孔径的中心对准时，电流通常是最大的。 可以使用对准器（偏转器组件）实现横梁调节。

公开(公告)号：US6060711A

公开(公告)日：2000-05-09

申请号：US014004

申请日：1998-01-27

Applicant: Hiroyasu Shimizu

Inventor： Hiroyasu Shimizu

IPC: H01J37/147 ,  H01J37/153 ,  H01J37/317 ,  H01J37/14

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/3174

Abstract: Charged-particle beam pattern transfer apparatus and charged-particle beam optical systems are disclosed. A representative charged-particle beam pattern transfer apparatus comprises a projection lens that images patterns from a mask onto a substrate. To reduce off-axis image aberrations, especially anisotropic coma and astigmatism, deflectors are provided that produce a magnetic field such that the effective optical axis of the lenses is along a straight line that is tilted with respect to the mask and the substrate. Focus correctors are provided that produce a magnetic field that corrects image focus. Mathematical descriptions of these magnetic fields are disclosed. With such magnetic fields, the charged-particle beam that irradiates a central region of a subfield on the mask propagates along a straight-line axis through the projection lens, reducing deflection aberration and improving image quality.

Abstract translation: 公开了带电粒子束图案转印装置和带电粒子束光学系统。 一种代表性的带电粒子束图案转移装置包括将图案从掩模图形成基底的投影透镜。 为了减少离轴图像像差，特别是各向异性彗差和像散，提供了产生磁场的偏转器，使得透镜的有效光轴沿着相对于掩模和基板倾斜的直线。 提供聚焦校正器，产生校正图像焦点的磁场。 公开了这些磁场的数学描述。 利用这样的磁场，照射掩模上的子场的中心区域的带电粒子束通过投影透镜沿直线轴传播，减少偏转像差和提高图像质量。

公开(公告)号：US5689117A

公开(公告)日：1997-11-18

申请号：US548616

申请日：1995-10-26

Applicant: Mamoru Nakasuji

Inventor： Mamoru Nakasuji

IPC: H01J37/141 ,  H01J37/147 ,  H01J37/317 ,  H01J37/30

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/141 ,  H01J37/1471 ,  H01J37/3174 ,  H01J2237/152 ,  H01J2237/1536 ,  H01J2237/31788

Abstract: An image transferring apparatus using a charged particle beam comprising a projection lens for transferring a pattern formed on a mask onto a target by focusing a charged particle beam passing perpendicularly through the mask, and a deflector for deflecting the charged particle beam passing through the mask toward a predetermined direction (x-axis direction) so that a transfer position of the pattern to the target is changed. In this apparatus, the deflector comprises a deflection coil for generating a deflection magnetic field extending in a direction (y-axis direction) perpendicular to the predetermined direction, and correction coils for generating correction magnetic fields extending in the same direction as the deflection magnetic field at areas spaced apart from the center of the deflection magnetic field along the direction (x-axis direction) perpendicular to the direction of the deflection magnetic field.

Abstract translation: 一种使用带电粒子束的图像传送装置，包括投影透镜，用于通过聚焦垂直通过掩模的带电粒子束将用于将形成在掩模上的图案转印到靶上的投影透镜，以及用于使通过掩模的带电粒子束偏转的偏转器 预定方向（x轴方向），使得图案向目标的转印位置改变。 在该装置中，偏转器包括用于产生沿垂直于预定方向的方向（y轴方向）延伸的偏转磁场的偏转线圈和用于产生沿与偏转磁场相同方向延伸的校正磁场的校正线圈 在与偏转磁场的方向（x轴方向）垂直的偏转磁场的中心隔开的区域。

公开(公告)号：US4486664A

公开(公告)日：1984-12-04

申请号：US401614

申请日：1982-07-26

Applicant: Hermann Wollnik

Inventor： Hermann Wollnik

IPC: G21K1/087 ,  H01J37/147 ,  H01J49/04 ,  B01D59/44 ,  H01J35/00

CPC classification number: H01J49/061 ,  G21K1/087 ,  H01J37/1471

Abstract: An arrangement and a process for adjusting imaging systems for bundles of charged particles, or for adjusting spectrometers for bundles of charged particles, are indicated, in which arrangement and process electric and/or magnetic correcting elements are used, which possess, in every case, a large number of electrodes and/or current conductors, which are arranged, symmetrically or asymmetrically, around the optical axis of the particle bundle, these electrodes being at potentials such that the resulting potentials V (r, .PHI.) at an azimuth angle (.PHI.) to a cylindrical surface at a radius (r) around an optical axis (Z) can be represented as the sum of V.sub.1 and V.sub.2, or, as the case may be, these current conductors carrying currents such that the magnitudes of the resulting currents I (r, .PHI.) at the azimuth angle (.PHI.), as defined above, can be represented as the sum of I.sub.1 and I.sub.2. The expressions V.sub.1, V.sub.2 and I.sub.1, I.sub.2 can, in their turn, be represented as sums, their addends being, respectively, of the type V.sub.1 =V.sub.1k sink.PHI., V.sub.2 =V.sub.2k cosk.PHI., and I.sub.1 =I.sub.1k sink.PHI. and I.sub.2 =I.sub.2k cosk.PHI., where k=1, 2, . . . P, with P representing the order of the multipole. The potentials and/or the currents are utilized, in this manner, to obtain superpositions of electric and/or magnetic dipoles, quadrupoles, hexapoles, etc.

Abstract translation: 示出了用于调整带电粒子束成像系统或用于调节带电粒子束束的光谱仪的装置和方法，其中使用了布置和处理电和/或磁校正元件，其在每种情况下都具有， 围绕颗粒束的光轴布置，对称或不对称地布置的大量电极和/或电流导体，这些电极处于电位，使得所得到的电位V（r，PHI）在方位角（PHI ）到围绕光轴（Z）的半径（r）处的圆柱形表面可以表示为V1和V2的总和，或者视情况而定，这些电流导体承载电流，使得所得到的电流的大小 如上定义的方位角（PHI）下的I（r，PHI）可以表示为I1和I2的和。 表达式V1，V2和I1，I2又可以表示为和，它们的加数分别为V1 = V1ksink PHI，V2 = V2kcosk PHI，I1 = I1ksink PHI，I2 = I2kcosk PHI， 其中k = 1,2。 。 。 P，P代表多极的顺序。 以这种方式利用电势和/或电流来获得电和/或磁偶极子，四极体，六极体等的叠加。

公开(公告)号：US3876883A

公开(公告)日：1975-04-08

申请号：US42943873

申请日：1973-12-28

Applicant: IBM

Inventor： BROERS ALEC NIGEL ,  HERITAGE MARCUS BARRY

IPC: H01J37/147 ,  H01J37/21 ,  H01J37/30 ,  H01J37/00

CPC classification number: H01J37/3005 ,  H01J37/1471 ,  H01J37/21

Abstract: A method and system for improved focusing and registration in an electron beam device including an electron beam source, condenser lenses, deflection coils, projection lenses, a mask and a target. The deflection coils are located between second and final condenser lenses and deflect the focused electron beam onto a projection mark on the mask and onto a similar registration mark on the target to provide superimposed images for registration purposes.

公开(公告)号：US2886727A

公开(公告)日：1959-05-12

申请号：US62625256

申请日：1956-12-04

Applicant: VICKERS ELECTRICAL CO LTD

Inventor： EDWARD HAINE MICHAEL

IPC: G01Q30/02 ,  G01C13/00 ,  H01J37/147

CPC classification number: H01J37/1471 ,  G01C13/00

公开(公告)号：US2301987A

公开(公告)日：1942-11-17

申请号：US30476339

申请日：1939-11-16

Applicant: VON BORRIES BODO

Inventor： VON BORRIES BODO

IPC: H01J37/147 ,  H01J37/15 ,  H01J37/24

CPC classification number: H01J37/1471 ,  H01J37/15 ,  H01J37/24