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96 条记录 (耗时 0.016 秒)

    Rotating tool
    73.
    发明授权
    Rotating tool 有权

    公开(公告)号：US11865668B2

    公开(公告)日：2024-01-09

    申请号：US18077460

    申请日：2022-12-08

    申请人： MAKITA CORPORATION

    发明人： Kenji Shibata ,  Masanori Furusawa

    IPC分类号： B24B47/00 ,  B24B47/26 ,  B24B23/02 ,  B24B47/12

    CPC分类号： B24B47/26 ,  B24B23/02 ,  B24B47/12

    摘要： A grinder including a motor, a switch operated ON and OFF in accordance with an operation of a switch lever to control a rotation of an output shaft of the motor, a spindle that rotates in accordance with the rotation of the output shaft to rotate a disk-shaped grinding wheel and a brake mechanism controllable with respect to a brake plate that integrally rotates with the output shaft, in a housing, the brake plate includes fins.

    POLISHING APPARATUS AND POLISHING METHOD
    76.
    发明申请
    POLISHING APPARATUS AND POLISHING METHOD 审中-公开

    公开(公告)号：US20170239784A1

    公开(公告)日：2017-08-24

    申请号：US15431062

    申请日：2017-02-13

    申请人： EBARA CORPORATION

    发明人： Kenji KAMIMURA ,  Kenichi KOBAYASHI

    IPC分类号： B24B51/00 ,  B24B41/06 ,  B24B47/00

    CPC分类号： B24B51/00 ,  B24B41/06 ,  B24B47/00

    摘要： A polishing apparatus and a polishing method capable of detecting whether a polishing tool has been brought into contact with a substrate, such as a wafer, and further capable of detecting a position of the polishing tool are disclosed. The polishing apparatus includes a substrate holder configured to hold a substrate, a pressing member configured to press a polishing tool against a surface of the substrate, an actuator configured to apply a pressing force to the pressing member, a motor-drive moving device configured to move the pressing member along the surface of the substrate, and a monitoring device configured to emit an alarm if a motor current supplied to the motor-drive moving device is smaller than a threshold value.

    Wafer polishing carrier apparatus and chemical mechanical polishing equipment using the same
    77.
    发明授权
    Wafer polishing carrier apparatus and chemical mechanical polishing equipment using the same 有权
    晶圆抛光载体设备和使用其的化学机械抛光设备

    公开(公告)号：US08202140B2

    公开(公告)日：2012-06-19

    申请号：US12231529

    申请日：2008-09-03

    申请人： Yong-Sung Hong ,  Jong-Yoon Park ,  Hyun-Joon Park

    发明人： Yong-Sung Hong ,  Jong-Yoon Park ,  Hyun-Joon Park

    IPC分类号： B24B29/00 ,  B24B47/00

    CPC分类号： B24B37/04 ,  B24B57/00

    摘要： A wafer polishing carrier apparatus and a chemical mechanical polishing equipment employing the same includes a drive rotary union rotating on an axis and receiving a flow of fluid through a first conduit in a sealed-up state; driven rotary unions revolving on their own axis at different sides of the drive rotary union, and receiving the flow of fluid from the drive rotary union through a second conduit in a sealed-up state; a carrier attached to an end part of the driven rotary union to adsorb/detach a wafer using a fluid pressure provided through a third conduit connected through the second conduit; and a filter filtering pollution material in the fluid flowing in and out of the third conduit on the periphery of the carrier to prevent the pollution material from escaping external to the carrier, the pollution material generated from rotation of the drive rotary union and driven rotary unions.

    摘要翻译： 晶片抛光载体装置和采用该晶片抛光载体的化学机械抛光装置包括：驱动旋转联轴器，其在轴上旋转并且以密封状态接收通过第一导管的流体流; 驱动旋转接头在驱动旋转接头的不同侧在其自身的轴线上旋转，并且以密封状态通过第二导管从驱动旋转接头接收流体流; 附接到从动旋转接头的端部的载体，以使用通过第二导管连接的第三导管提供的流体压力吸附/分离晶片; 以及过滤器在流入和流出载体周围的第三导管的流体中的污染物质，以防止污染物质从外部逸出，由驱动旋转联轴器和从动旋转接头旋转产生的污染物质 。

    ABRADING DEVICE HAVING A FRONT EXHAUST
    78.
    发明申请
    ABRADING DEVICE HAVING A FRONT EXHAUST 有权
    具有前排气装置的装置

    公开(公告)号：US20110183586A1

    公开(公告)日：2011-07-28

    申请号：US12693973

    申请日：2010-01-26

    申请人： Frank LEHMAN

    发明人： Frank LEHMAN

    IPC分类号： B24B23/03 ,  B24B47/00 ,  B24B55/02

    CPC分类号： B24B23/03 ,  B24B23/026 ,  B24B55/02 ,  B24B55/045 ,  B24B55/052

    摘要： A head for an orbital abrading machine comprising a housing, a shroud including inner and outer portions, defining a chamber between the inner and outer portions, a drive means for driving an abrading pad, the drive means at least partially enclosed by the housing and the shroud, wherein the drive means produces an exhaust which is directly vented into the chamber without leaving the head, and wherein the chamber includes at least one opening for directing the exhaust toward the abrading pad for cooling the pad with the exhaust.

    摘要翻译： 一种用于轨道研磨机的头部，包括壳体，包括内部和外部的护罩，在内部和外部之间限定腔室，用于驱动研磨垫的驱动装置，驱动装置至少部分地被壳体包围， 护罩，其中所述驱动装置产生直接排放到所述腔室中而不离开所述头部的排气，并且其中所述腔室包括用于将所述排气引向所述研磨垫的至少一个开口，以用所述排气冷却所述垫。

    FLOOR TREATMENT APPARATUS WITH TENSIONING PULLEY DRIVE
    79.
    发明申请
    FLOOR TREATMENT APPARATUS WITH TENSIONING PULLEY DRIVE 有权
    地板处理装置与张紧螺丝刀驱动

    公开(公告)号：US20110136418A1

    公开(公告)日：2011-06-09

    申请号：US12632191

    申请日：2009-12-07

    申请人： James Weder

    发明人： James Weder

    IPC分类号： F16H7/02 ,  F16H7/18 ,  B24B23/02 ,  B24B47/00

    CPC分类号： B24B7/186 ,  A47L11/4069 ,  B24B47/12

    摘要： A floor treatment apparatus includes a frame, a housing which is rotatable with respect to the frame according to a main axis, at least three head pulleys which are rotatable with respect to the housing according to respective head axes which are regularly spaced around, and which are parallel to, the main axis, a motor supported by the frame, a drive pulley which is drivable by the motor, a main belt tensioning pulley and a main belt which is slung around the drive pulley, the head pulleys and the main belt tensioning pulley. Further an auxiliary pulley is coaxially connected to the main belt tensioning pulley. A fixed pulley is connected to the frame. An auxiliary belt is slung around the auxiliary pulley and the fixed pulley for rotating the housing with respect to the frame.

    摘要翻译： 一种地板处理设备包括：框架，可根据主轴线相对于框架旋转的壳体;至少三个头部滑轮，其可相对于壳体相对于围绕规则间隔开的相应的头部轴线旋转，并且其中 平行于主轴，由框架支撑的马达，可由马达驱动的驱动皮带轮，主皮带张紧滑轮和主动皮带，主皮带围绕驱动皮带轮，头皮带轮和主皮带张紧 滑轮。 此外，辅助滑轮同轴地连接到主皮带张紧滑轮。 固定滑轮连接到框架。 辅助皮带围绕辅助皮带轮和固定滑轮环绕，以相对于框架旋转外壳。

    FLOOR TREATMENT APPARATUS WITH SOLITARY DRIVE PULLEY
    80.
    发明申请
    FLOOR TREATMENT APPARATUS WITH SOLITARY DRIVE PULLEY 有权
    地面处理装置与独特的驱动器PULLEY

    公开(公告)号：US20110136417A1

    公开(公告)日：2011-06-09

    申请号：US12632130

    申请日：2009-12-07

    申请人： James WEDER

    发明人： James WEDER

    IPC分类号： F16H7/02 ,  F16H7/18 ,  B24B23/02 ,  B24B47/00

    CPC分类号： B24B7/186 ,  B24B47/12

    摘要： A floor treatment apparatus includes a frame, a housing which is rotatable with respect to the frame according to a main axis, at least three head pulleys which are rotatable with respect to the housing according to respective head axes which are regularly spaced around, and which are parallel to, the main axis, a motor supported by the frame and a main belt drivable by the motor and being slung around the drive pulley and the driven head pulleys. Furthermore, the main belt is slung around a first auxiliary pulley and a second auxiliary pulley. The second auxiliary pulley is driven by the first auxiliary pulley. An auxiliary belt is slung around a fixed pulley connected to the frame and around the second auxiliary pulley for rotating the housing with respect to the frame.

    摘要翻译： 一种地板处理设备包括：框架，可根据主轴线相对于框架旋转的壳体;至少三个头部滑轮，其可相对于壳体相对于围绕规则间隔开的相应的头部轴线旋转，并且其中 平行于主轴，由框架支撑的马达和由马达驱动的主带，并且围绕驱动皮带轮和从动头皮带轮被甩动。 此外，主带围绕第一辅助滑轮和第二辅助皮带轮而悬挂。 第二辅助滑轮由第一副滑轮驱动。 辅助带围绕连接到框架并围绕第二辅助滑轮的固定滑轮环绕，以相对于框架旋转壳体。