Thiol compound derivative, curable composition containing the derivative, and molded product thereof
    73.
    发明授权
    Thiol compound derivative, curable composition containing the derivative, and molded product thereof 失效
    硫醇化合物衍生物,含有该衍生物的固化性组合物及其成型体

    公开(公告)号:US07384995B2

    公开(公告)日:2008-06-10

    申请号:US11711691

    申请日:2007-02-28

    IPC分类号: C08K5/34

    摘要: The present invention relates to a thiol compound derivative represented by the following formula (1), a curable composition containing the derivative, and a molded product made of the composition. More particularly, the invention relates to a thiol compound derivative which is added to a polymer having reactivity to a thiol derivative substituent to provide a curable composition, a curable composition containing the derivative and a crosslinkable halogen-containing crosslinking polymer, and a crosslinked molded product of the composition. wherein X1, X2 and X3 are each a group represented by the following formula (2):

    摘要翻译: 本发明涉及由下式(1)表示的硫醇化合物衍生物,含有该衍生物的可固化组合物和由该组合物制成的模塑产品。 更具体地说,本发明涉及一种硫醇化合物衍生物,其添加到具有与硫醇衍生物取代基具有反应性的聚合物中以提供可固化组合物,含有该衍生物的可固化组合物和可交联的含卤素交联聚合物,以及交联模制产品 的组成。 其中X 1,X 2和X 3各自为下式(2)表示的基团:

    Sulfonamide derivative, process for preparing the same and herbicide
using the same
    78.
    发明授权
    Sulfonamide derivative, process for preparing the same and herbicide using the same 失效
    磺酰胺衍生物,其制备方法和使用其的除草剂

    公开(公告)号:US5376620A

    公开(公告)日:1994-12-27

    申请号:US41998

    申请日:1993-04-02

    摘要: Disclosed are a sulfonamide compound represented by the following formula (I): ##STR1## wherein Y represents a lower akyl group, a lower alkenyl group, a lower alkynyl group, a halo-lower alkyl group, a cyano-lower alkyl group or --C(CH.sub.3).sub.2 (OR.sup.1) where R.sup.1 represents a lower akyl group, a lower alkenyl group, a lower alkynyl group, a halo-lower alkyl group or a cyano-lower alkyl group; Q represents a substituted or unsubstituted pyridyl group or --NR.sup.2 R.sup.3 where R.sup.2 represents a hydrogen atom, a lower alkyl group, a lower alkoxy group; and R.sup.3 represents a lower alkyl group, a lower alkenyl group, a lower alkynyl group, a phenyl group or a benzyl group; or R.sup.2 and R.sup.3 may be combined to form a cycloamino group; X represents an oxygen atom or a sulfur atom; and Z represents a nitrogen atom or --CH.dbd. group;processes for preparing the same and a herbicide containing the same as an active ingredient(s).

    摘要翻译: 公开了由下式(I)表示的磺酰胺化合物:其中Y表示低级烷基,低级烯基,低级炔基,卤代低级烷基,氰基 - 低级烷基 基团或-C(CH 3)2(OR 1),其中R 1表示低级烷基,低级烯基,低级炔基,卤代低级烷基或氰基 - 低级烷基; Q表示取代或未取代的吡啶基或-NR2R3,其中R2表示氢原子,低级烷基,低级烷氧基; R3表示低级烷基,低级烯基,低级炔基,苯基或苄基。 或者R 2和R 3可以组合形成环氨基; X表示氧原子或硫原子; Z表示氮原子或-CH =基团; 其制备方法和含有其作为活性成分的除草剂。

    Alkanoic acid derivatives and herbicidal compositions
    80.
    发明授权
    Alkanoic acid derivatives and herbicidal compositions 失效
    酸性衍生物和除草剂组合物

    公开(公告)号:US5087289A

    公开(公告)日:1992-02-11

    申请号:US571118

    申请日:1990-08-23

    摘要: A herbicidal alkanoic acid derivative of the formula: ##STR1## wherein R.sup.3 is a hydrogen atom, a halogen atom, a halogen-substituted alkyl group, an alkyl group, a cycloalkyl group, an alkylthioalkyl group, a hydroxyalkyl group, a hydroxyl group, a cyano group, an acyloxyalkyl group, a thienyl group, a naphthyl group, a dihydronaphthyl group ##STR2## wherein R.sup.8 is a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an alkoxy group or --S(O).sub.n R.sup.9 wherein R.sup.9 is an alkyl group, and n is an integer of from 0 to 2, m is an integer of from 0 to 2, each of R.sup.2 and R.sup.4 which may be the same or different is a hydrogen atom or an alkyl group, or R.sup.2 and R.sup.4 form together with the adjacent carbon atom a 3-, 4-, 5- or 6-membered ring which may contain an oxygen atom and may be substituted by one or two alkyl groups, each of R.sup.5 and R.sup.6 which may be the same or different is a hydrogen atom or an alkyl group, R.sup.7 is an alkyl group or a phenyl group, or R.sup.6 and R.sup.7 form --(CH.sub.2).sub.l -- wherein l is an integer of 3 or 4 which may be substituted by one or two alkyl groups, or R is an alkenyl group, a dihyronaphthyl group, a tetrahydronaphthyl group, a 1-oxo-1,2,3,4-tetrahydronaphthyl group, a 1,2-epoxycycloalkyl group or an indanyl group which may be substituted by an alkyl or alkoxy group; R.sup.1 is a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, a phenyl group, an alkylideneamino group, an alkoxyalkyl group, an alkoxycarbonylalkyl group, a halogen-substituted alkyl group, a cycloalkyl group, a nitro-substituted phenylthioalkyl group, a halogen atom or a benzyl group which may be substituted by an alkyl or alkoxy group; or R and R.sup.1 form a ring; A is an alkyl group, an alkoxy group, an alkylthio group, a halogen atom, a halogen-substituted alkoxy group, an amino group, an alkylamino group or a dialkylamino group; B is a hydrogen atom, an alkyl group, an alkoxy group or a halogen-substituted alkoxy group; X is an oxygen atom or a sulfur atom; and Z is a methine group or a nitrogen atom; and a salt thereof.