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    Positive photoresist composition
    61.
    发明授权
    Positive photoresist composition 有权
    正光致抗蚀剂组合物

    公开(公告)号：US06485883B2

    公开(公告)日：2002-11-26

    申请号：US09769375

    申请日：2001-01-26

    申请人： Kunihiko Kodama ,  Shinichi Kanna ,  Toshiaki Aoai

    发明人： Kunihiko Kodama ,  Shinichi Kanna ,  Toshiaki Aoai

    IPC分类号： G03F7039

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/126

    摘要： A positive photoresist composition which comprises (A) a resin having a group which decomposes by the action of an acid to increase solubility in an alkaline developing solution, and (B) a compound which generates an aliphatic or aromatic carboxylic acid substituted with at least one fluorine atom upon irradiation with an actinic ray or radiation. The positive photoresist composition of the present invention is improved in resolution and process allowance such as exposure margin and depth of focus in a lithographic technology using a light source having a short wavelength capable of conducting the ultra fine fabrication and a chemical amplification-type positive photoresist. Further, it exhibits the excellent performance when an electron beam is used as a light source for exposure.

    摘要翻译： 一种正型光致抗蚀剂组合物，其包含（A）具有通过酸的作用分解以提高在碱性显影液中的溶解度的基团的树脂，和（B）产生被至少一个 通过光化射线或辐射照射，本发明的正性光致抗蚀剂组合物在使用具有短波长能够导电的光源的光刻技术中的分辨率和工艺容限（例如曝光余量和焦深）方面得到改善 超精细制造和化学放大型正性光致抗蚀剂。 此外，当使用电子束作为曝光用光源时，其表现出优异的性能。

    Positive-working chemical-amplification photoresist composition
    63.
    发明申请
    Positive-working chemical-amplification photoresist composition 审中-公开
    正性化学增幅光刻胶组合物

    公开(公告)号：US20020119393A1

    公开(公告)日：2002-08-29

    申请号：US10126673

    申请日：2002-04-22

    发明人： Hiroto Yukawa ,  Katsumi Oomori ,  Ryusuke Uchida ,  Yukihiro Sawayanagi

    IPC分类号： G03F007/038

    CPC分类号： G03F7/0045 ,  Y10S430/111 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/126

    摘要： Disclosed is a positive-working chemical-amplification photoresist composition used in the patterning works in the manufacture of semiconductor devices, with which quite satisfactory patterning of a photoresist layer can be accomplished even on a substrate surface provided with an undercoating film of silicon nitride, phosphosilicate glass, borosilicate glass and the like in contrast to the prior art using a conventional photoresist composition with which satisfactory patterning can hardly be accomplished on such an undercoating film. The photoresist composition comprises, besides a film-forming resin capable of being imparted with increased solubility in an alkaline solution by interacting with an acid and a radiation-sensitive acid-generating compound, a phosphorus-containing oxo acid such as phosphoric acid and phosphonic acid or an ester thereof.

    摘要翻译： 公开了用于制造半导体器件的图案化工作中的正性化学扩增光致抗蚀剂组合物，即使在具有氮化硅，磷硅酸盐的底涂膜的衬底表面上也可以实现光刻胶层的非常令人满意的图案化 玻璃，硼硅酸盐玻璃等，与现有技术相比，使用常规的光致抗蚀剂组合物，在这种底涂膜上难以实现令人满意的图案化。 光致抗蚀剂组合物除了能够通过与酸和辐射敏感的产酸化合物相互作用而在碱性溶液中赋予增加的溶解性的成膜树脂之外，还含有含磷的含氧酸如磷酸和膦酸 或其酯。

    Image-forming material and novel sulfonic acid ester derivative
    64.
    发明申请
    Image-forming material and novel sulfonic acid ester derivative 失效
    成像材料和新型磺酸酯衍生物

    公开(公告)号：US20020037480A1

    公开(公告)日：2002-03-28

    申请号：US09818574

    申请日：2001-03-28

    发明人： Atsuhiro Ohkawa ,  Seiya Sakurai

    IPC分类号： G03C001/705

    CPC分类号： G03C1/73 ,  Y10S430/115 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/126 ,  Y10S430/145 ,  Y10S430/146

    摘要： An image-forming material is described, comprising on an support an acid-generating agent selected from a sulfonic acid ester of a specific structure generating an acid by the action of heat and the polymer thereof, and a compound causing a light absorption change in the absorption region of from 350 to 700 nm by an intramolecular or intermolecular reaction by the action of an acid. The image-forming material has a high sensitivity and excellent storage stability and gives low haze and good images in the case of performing image formation using a high-output laser light. A sulfonic acid ester derivative represented by the formula, nullR1SO3CH(R2)nullR3 (wherein R1 represents an alkyl group, an aryl group or a heterocyclic group R2 and R3 each independently represents an alkyl group or an aryl group, excluding that R2 and R3 are simultaneously aryl groups, R2 and R3 may combine to form a ring, and at least one of R2 and R3 has a polymerizing unsaturated group), and a polymer synthesized by the monomer containing it, are also described.

    摘要翻译： 描述了一种图像形成材料，其在载体上包含选自由热作用产生酸的特定结构的磺酸酯及其聚合物的酸产生剂和引起光吸收变化的化合物 通过酸的作用通过分子内或分子间的反应从350nm到700nm的吸收区域。 图像形成材料具有高灵敏度和优异的储存稳定性，并且在使用高输出激光进行图像形成的情况下，具有低雾度和良好的图像。 由式[R 1 SO 3 CH（R 2）] R 3（其中R 1表示烷基，芳基或杂环基R 2和R 3各自独立地表示烷基或芳基）表示的磺酸酯衍生物，不包括R 2和 R3同时为芳基，R2和R3可以结合形成环，并且R 2和R 3中的至少一个具有聚合性不饱和基团）和由含有该单体的单体合成的聚合物。

    Chemical amplification, positive resist compositions
    65.
    发明申请
    Chemical amplification, positive resist compositions 有权
    化学放大，正光刻胶组合物

    公开(公告)号：US20010033994A1

    公开(公告)日：2001-10-25

    申请号：US09799009

    申请日：2001-03-06

    发明人： Youichi Ohsawa ,  Jun Watanabe ,  Takanobu Takeda ,  Akihiro Seki

    IPC分类号： G03F007/039

    CPC分类号： G03F7/0392 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/126

    摘要： A chemical amplification, positive resist composition is provided comprising (A) a photoacid generator and (B) a resin which changes its solubility in an alkali developer under the action of acid and has substituents of the formula: C6H11null(CH2)nOCH(CH2CH3)null wherein C6H11 is cyclohexyl and nnull0 or 1. The composition has many advantages including improved focal latitude, improved resolution, minimized line width variation or shape degradation even on long-term PED, minimized defect left after coating, development and stripping, and improved pattern profile after development and is suited for microfabrication by any lithography, especially deep UV lithography.

    摘要翻译： 提供化学放大正性抗蚀剂组合物，其包含（A）光酸产生剂和（B）在酸作用下改变其在碱显影剂中的溶解度并具有下式的取代基的树脂：C 6 H 11 - （CH 2）n OCH（CH 2 CH 3 ） - 其中C 6 H 11是环己基并且n = 0或1.该组合物具有许多优点，包括改进的焦点纬度，改进的分辨率，最小化的线宽变化或形状退化，即使在长期PED，最小化在涂覆，显影和剥离之后的缺陷， 并且在显影后改进的图案轮廓，并且适用于通过任何光刻，特别是深UV光刻的微细加工。

    Positive-working photosensitive composition
    68.
    发明授权
    Positive-working photosensitive composition 有权
    正性感光组合物

    公开(公告)号：US6060213A

    公开(公告)日：2000-05-09

    申请号：US270516

    申请日：1999-03-17

    申请人： Kunihiko Kodama

    发明人： Kunihiko Kodama

    IPC分类号： G03F7/004 ,  G03F7/039 ,  G03C1/73 ,  G03C1/72

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/126

    摘要： The present invention provides a positive-working photosensitive composition which comprises (a) a basic nitrogen-containing compound having a polycyclic structure represented by formula (I) and (b) at least one of compounds represented by formulae (II) to (IV) defined in the specification: wherein Y and Z may be the same or different and each represent a straight-chain, branched or cyclic alkylene group, which may contain a hetero atom or may be substituted. The positive-working photosensitive composition which exhibits no reduction of width of resist pattern or no T-top deformation of surface shape of resist pattern with time between after exposure and heat treatment without causing sensitivity drop.

    摘要翻译： 本发明提供了一种正性光敏组合物，其包含（a）具有式（I）和（b）表示的多环结构的碱式含氮化合物至少一种式（II）至（IV）表示的化合物， 在本说明书中定义：其中Y和Z可以相同或不同，并且各自表示可以含有杂原子或可以被取代的直链，支链或环状亚烷基。 抗曝光和热处理后，抗蚀剂图案的表面形状无抗蚀剂图案的宽度或表面形状的T形变形的正性感光性组合物，不会引起敏感性降低。

    Process for the production of a multicolored image and photosensitive material for carrying out this process
    69.
    发明授权
    Process for the production of a multicolored image and photosensitive material for carrying out this process 失效
    用于生产多彩图像和感光材料以进行该过程的方法

    公开(公告)号：US5725992A

    公开(公告)日：1998-03-10

    申请号：US20829

    申请日：1993-02-19

    申请人： Stephan J. W. Platzer ,  Wojciech A. Wilczak ,  Gerhard Buhr ,  Dieter Mohr

    发明人： Stephan J. W. Platzer ,  Wojciech A. Wilczak ,  Gerhard Buhr ,  Dieter Mohr

    IPC分类号： G03C1/675 ,  C08F2/50 ,  G03F3/10 ,  G03F7/004 ,  G03F7/027 ,  G03F7/029 ,  G03F7/105 ,  G03F7/34 ,  G03C1/795

    CPC分类号： G03F3/106 ,  G03F7/0295 ,  Y10S430/121 ,  Y10S430/126 ,  Y10S430/127

    摘要： A photosensitive material for the production of color proofing films for multicolor printing, having (A) a transparent, flexible film support, (B) a photopolymerizable layer which contains (B1) a polymeric binder, (B2) a free-radical-polymerizable compound, (B3) a substituted bistrihalomethyl-s-triazine having an absorption maximum in the range from 300 to 380 nm and an absorbance of greater than 11,000 at the absorption maximum, and an absorbance of less than 1400 at 400 nm and above, as photoinitiator, and (B4) a dye or a colored pigment in a primary color of multicolor printing, and (C) a thermoplastic adhesive layer on the photo-sensitive layer. The material is processed by lamination onto an image-receiving material, exposure of the material and peeling apart of film support and image-receiving material, leaving the unexposed layer areas on the image-receiving material together with the adhesive layer. To produce a multicolored image, these steps are repeated with at least one further single-color sheet. The material has increased photosensitivity and gives color prints with lower background discoloration.

    摘要翻译： 一种用于生产多色印刷用彩色印刷膜的感光材料，其具有（A）透明柔性膜载体，（B）含有（B1）聚合物粘合剂的可光聚合层，（B2）可自由基聚合的化合物 ，（B3）作为光引发剂，吸收最大值为300〜380nm，吸收最大吸光度为11000以上，400nm以上的吸光度小于1400的取代双三甲基-s-三嗪 ，和（B4）多色印刷原色的染料或着色颜料，（C）感光层上的热塑性粘合剂层。 该材料通过层压到图像接收材料上，曝光材料并剥离薄膜载体和图像接收材料，将图像接收材料上的未曝光层区域与粘合剂层一起留下。 为了产生多色图像，这些步骤与至少一个另外的单色片重复。 该材料具有增加的光敏性，并且具有较低背景变色的彩色印刷品。

    Fluorone and pyronin Y derivatives
    70.
    发明授权
    Fluorone and pyronin Y derivatives 失效
    氟和pyronin Y衍生物

    公开(公告)号：US5623080A

    公开(公告)日：1997-04-22

    申请号：US388802

    申请日：1995-02-15

    申请人： Douglas C. Neckers ,  Jianmin Shi

    发明人： Douglas C. Neckers ,  Jianmin Shi

    IPC分类号： C07D311/78 ,  C07D311/82 ,  C07D311/84 ,  C07D498/06 ,  C08F2/50 ,  C08G59/68 ,  G03F7/028 ,  G03F7/029 ,  G03F7/031 ,  G03F7/038 ,  G03F7/075 ,  A01N43/02 ,  C07D495/12

    CPC分类号： C08F2/50 ,  C07D311/78 ,  C07D311/82 ,  C07D311/84 ,  C08G59/68 ,  G03F7/028 ,  G03F7/029 ,  G03F7/031 ,  G03F7/038 ,  G03F7/0755 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/124 ,  Y10S430/126

    摘要： A compound of the formula (I) or (II): ##STR1## where R.sup.1, R.sup.2, R.sup.5 and R.sup.6 are the same or different and represent a hydrogen atom or a halogen atom and R.sup.1 and R.sup.2 may combine to form a ring; R.sup.3, and R.sup.4 are the same or different and represent a hydrogen atom, a halogen atom, a benzoyl group, a group of the formula --L(CH.sub.2).sub.n R.sup.8 where n is 1 to 8, R.sup.8 is a hydrogen, hydroxy, amino, dialkylamino, --COR.sup.16 or --COOR.sup.14 where R.sup.16 is a hydrogen, chlorine, COCl, C.sub.1 -C.sub.8 alkyl, --NR.sub.2 or aryl and R.sup.14 is a hydrogen, C.sub.1 -C.sub.8 alkyl, aryl, COR, 2,4-dinitrophenyl, N-imido or --NR.sub.2 and L is a direct bond or C.dbd.O; W is .dbd.O; W.sup.1 is hydrogen or --OR.sup.9, where R.sup.9 is hydrogen, C.sub.1 -C.sub.8 alkyl, acyl or a group of the formula --(CH.sub.2).sub.n R.sup.10 where n is 1 to 8 and R.sup.10 is amino, dialkylamino, hydroxy, acryloyl or methacryloyl; Y is oxygen, sulfur, selenium, tellurium, C.dbd.O, or >N--R.sup.13 is where R.sup.13 is 4-methylphenyl, and A is hydrogen, alkenyl, dichlorotriazinylamino, or an electron withdrawing group selected from the group consisting of COOR.sup.11, C(O)OCOR.sup.11, CONR.sub.2, CN, NO.sub.2, NCS, NCO, SO.sub.2 R.sup.12, SO.sub.3, R.sup.12, SO.sub.3 R.sup.11, SO.sub.2 NR.sub.2 and CX.sub.3.sup.2 where X.sup.2 is the same or different and is a halogen atom and R.sup.11 is hydrogen, alkyl, aryl, or aralkyl, and R.sup.12 is hydrogen, alkyl, aryl, or aralkyl; provided that when R.sup.1 -R.sup.6 are all hydrogen, A is not hydrogen.

    摘要翻译： 式（I）或（II）的化合物：其中R 1，R 2，R 5和R 6相同或不同，表示氢原子或卤原子，并且R 1和R 2可以组合 形成戒指 R 3和R 4相同或不同，表示氢原子，卤素原子，苯甲酰基，式-L（CH 2）n R 8的基团，其中n为1至8，R 8为氢，羟基，氨基， 二烷基氨基，-COR 16或-COOR 14，其中R 16是氢，氯，COCl，C 1 -C 8烷基，-NR 2或芳基，R 14是氢，C 1 -C 8烷基，芳基，COR，2,4-二硝基苯基， 或-NR2和L是直接键或C = O; W = 0; W1是氢或-OR9，其中R9是氢，C1-C8烷基，酰基或式 - （CH2）nR10的基团，其中n是1-8，R10是氨基，二烷基氨基，羟基，丙烯酰基或甲基丙烯酰基; Y是氧，硫，硒，碲，C = O或> N-R13，其中R13是4-甲基苯基，A是氢，烯基，二氯三嗪基氨基或选自COOR11，C （O）OCOR11，CONR2，CN，NO2，NCS，NCO，SO2R12，SO3，R12，SO3R11，SO2NR2和CX32，其中X2相同或不同，为卤素原子，R11为氢，烷基，芳基或芳烷基， 和R 12是氢，烷基，芳基或芳烷基; 条件是当R 1 -R 6都是氢时，A不是氢。