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    POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME
    3.
    发明申请
    POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME 审中-公开
    正性感光性组合物及其形成图案的方法

    公开(公告)号：US20120058431A1

    公开(公告)日：2012-03-08

    申请号：US13293290

    申请日：2011-11-10

    申请人： Hyou TAKAHASHI ,  Naoya Sugimoto ,  Kunihiko Kodama ,  Kei Yamamoto

    发明人： Hyou TAKAHASHI ,  Naoya Sugimoto ,  Kunihiko Kodama ,  Kei Yamamoto

    IPC分类号： G03F7/20 ,  G03F7/004

    CPC分类号： G03F7/0397 ,  C08F224/00 ,  G03F7/26 ,  G03F7/38 ,  Y10S430/106 ,  Y10S430/111

    摘要： A positive photosensitive composition includes: a resin (A) whose dissolution rate in an alkaline developing solution increases by the action of an acid, the resin (A) containing an acid decomposable repeating unit represented by a general formula (I) and an acid nondecomposable repeating unit represented by a general formula (II); and a compound (B) capable of generating an acid upon irradiation with one of active rays and radiations: wherein Xa1 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A1 represents one of a single bond and a divalent connecting group, ALG represents an acid leaving hydrocarbon group, Xa2 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A2 represents one of a single bond and a divalent connecting group, and ACG represents an acid nonleaving hydrocarbon group.

    摘要翻译： 正型感光性组合物包括：通过酸的作用使碱性显影液中的溶解速度增加的树脂（A），含有由通式（I）表示的酸分解性重复单元的树脂（A）和酸不分解性 由通式（II）表示的重复单元; 以及能够在照射活性射线和辐射之一时产生酸的化合物（B）：其中Xa1表示氢原子，烷基，氰基和卤素原子中的一个，A1表示单键 和二价连接基团，ALG表示离去烃基的酸，Xa2表示氢原子，烷基，氰基和卤素原子中的一个，A2表示单键和二价连接基团之一，ACG 代表无酸的酸性烃基。

    Positive photosensitive composition and pattern forming method using the same
    5.
    发明授权
    Positive photosensitive composition and pattern forming method using the same 有权
    正光敏组合物和使用其的图案形成方法

    公开(公告)号：US08012665B2

    公开(公告)日：2011-09-06

    申请号：US11475128

    申请日：2006-06-27

    申请人： Kunihiko Kodama ,  Fumiyuki Nishiyama

    发明人： Kunihiko Kodama ,  Fumiyuki Nishiyama

    IPC分类号： G03C1/00 ,  G03F1/00

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0395

    摘要： A positive photosensitive composition comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B1) a resin of which solubility in an alkali developer increases under an action of an acid; and (B2) a resin that has at least one group selected from (a) an alkali-soluble group and (b) a group capable of decomposing under an action of an alkali to produce an alkali-soluble group, and the resin (B2) does not have a group capable of decomposing under an action of an acid; and a pattern forming method using the same.

    摘要翻译： 一种正型感光性组合物，其包含：（A）在用光化射线或辐射照射时能够产生酸的化合物; （B1）在碱性显影剂中的溶解度在酸的作用下增加的树脂; 和（B2）具有选自（a）碱溶性基团和（b）能够在碱的作用下分解以产生碱溶性基团的基团中的至少一种的树脂，并且树脂（B2 ）没有能够在酸的作用下分解的基团; 以及使用该图案形成方法的图案形成方法。

    Positive resist composition and pattern forming method using the same
    6.
    发明授权
    Positive resist composition and pattern forming method using the same 有权
    正型抗蚀剂组合物和使用其的图案形成方法

    公开(公告)号：US07887988B2

    公开(公告)日：2011-02-15

    申请号：US11717645

    申请日：2007-03-14

    申请人： Kazuyoshi Mizutani ,  Kaoru Iwato ,  Kunihiko Kodama ,  Masaomi Makino

    发明人： Kazuyoshi Mizutani ,  Kaoru Iwato ,  Kunihiko Kodama ,  Masaomi Makino

    IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  Y10S430/108 ,  Y10S430/111

    摘要： A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents a benzene ring or a naphthalene ring; R represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group; Z represents a linking group for forming a ring together with AR; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.

    摘要翻译： 一种抗蚀剂组合物，其包含：（A）含有由式（I）表示的重复单元的树脂; 和（B）能够在用光化射线或辐射照射时能产生酸的化合物：其中AR表示苯环或萘环; R表示氢原子，烷基，环烷基或芳基; Z表示与AR一起形成环的连接基团; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团，以及使用该抗蚀剂组合物的图案形成方法。

    POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD
    8.
    发明申请
    POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD 审中-公开
    积极抵抗组成和图案形成方法

    公开(公告)号：US20100104974A1

    公开(公告)日：2010-04-29

    申请号：US12529927

    申请日：2008-03-26

    申请人： Yushi Kaneko ,  Kunihiko Kodama ,  Akinori Shibuya ,  Yuko Yoshida

    发明人： Yushi Kaneko ,  Kunihiko Kodama ,  Akinori Shibuya ,  Yuko Yoshida

    IPC分类号： G03F7/20 ,  G03F7/004

    CPC分类号： G03F7/0397 ,  C09D133/14 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/2041

    摘要： A positive resist composition comprises: (A) a compound that generates an acid upon irradiation with an actinic ray or radiation; and (B) a resin that has an acid-decomposable repeating unit represented by formula (I′), has a dispersity of 1.5 or less and increases its solubility in an alkali developer by action of an acid, wherein Xa1 represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom; Ry1 to Ry3 each independently represents an alkyl group or a cycloalkyl group, and at least two members out of Ry1 to Ry3 may combine to form a ring structure; and Z represents a divalent linking group.

    摘要翻译： 正型抗蚀剂组合物包括：（A）在用光化射线或辐射照射时产生酸的化合物; 和（B）具有由式（I'）表示的可酸分解重复单元的树脂，其分散性为1.5以下，通过酸的作用增加其在碱性显影剂中的溶解性，其中Xa1表示氢原子， 烷基，氰基或卤素原子; Ry1至Ry3各自独立地表示烷基或环烷基，并且Ry1至Ry3中的至少两个成员可以结合形成环结构; Z表示二价连接基团。

    Positive resist composition for immersion exposure and method of pattern formation with the same
    9.
    发明授权
    Positive resist composition for immersion exposure and method of pattern formation with the same 有权
    用于浸渍曝光的正型抗蚀剂组合物及其形成图案的方法

    公开(公告)号：US07273690B2

    公开(公告)日：2007-09-25

    申请号：US11060530

    申请日：2005-02-18

    申请人： Kunihiko Kodama ,  Hiromi Kanda

    发明人： Kunihiko Kodama ,  Hiromi Kanda

    IPC分类号： G03F7/00 ,  G03F7/004

    CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041

    摘要： A positive resist composition for immersion exposure which comprises (A) a resin which enhances its solubility in an alkaline developer by the action of an acid and (B) at least one compound which generates an acid upon irradiation with an actinic ray or a radiation, the compound being selected from the following (Ba) to (Bc): (Ba) a sulfonium salt compound having a specific alkyl or cycloalkyl residue in the cation part, (Bb) a sulfonium salt compound having a specific alkyl or cycloalkyl residue in the cation part, and (Bc) a sulfonium salt compound having a specific alkyl or cycloalkyl residue in the anion part; and a method of pattern formation with the composition.

    摘要翻译： 一种用于浸渍曝光的正型抗蚀剂组合物，其包含（A）通过酸的作用增强其在碱性显影剂中的溶解度的树脂和（B）至少一种在通过光化射线或辐射照射时产生酸的化合物， 所述化合物选自以下（Ba）至（Bc）：（Ba）在阳离子部分具有特定烷基或环烷基残基的锍盐化合物，（Bb）具有特定烷基或环烷基残基的锍盐化合物 阳离子部分和（Bc）在阴离子部分具有特定烷基或环烷基残基的锍盐化合物; 以及用该组合物形成图案的方法。

    Positive photosensitive composition
    10.
    发明授权
    Positive photosensitive composition 有权
    正光敏组合物

    公开(公告)号：US07214465B2

    公开(公告)日：2007-05-08

    申请号：US10338737

    申请日：2003-01-09

    申请人： Hajime Nakao ,  Yasumasa Kawabe ,  Toru Fujimori ,  Kunihiko Kodama

    发明人： Hajime Nakao ,  Yasumasa Kawabe ,  Toru Fujimori ,  Kunihiko Kodama

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0045 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/123

    摘要： A positive photosensitive composition comprising (A1) a compound that generates an aromatic sulfonic acid substituted with at least one fluorine atom and/or a group having at least one fluorine atom upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution, and (C) a compound that has at least three hydroxy or substituted hydroxy groups and at least one cyclic structure or (A2) an onium salt of an alkanesulfonic acid in which the α-position of the sulfonic acid is not substituted with a fluorine atom and/or an onium salt of a carboxylic acid.

    摘要翻译： 一种正型感光性组合物，其包含（A1）在光化射线或辐射照射时产生被至少一个氟原子取代的芳香族磺​​酸和/或具有至少一个氟原子的基团的化合物，（B）具有 单环或多环脂环族烃结构，并通过酸的作用分解以提高在碱性显影液中的溶解度，（C）具有至少三个羟基或取代羟基和至少一个环状结构的化合物或（A2 ）其中磺酸的α-位没有被氟原子和/或羧酸的鎓盐取代的烷基磺酸的鎓盐。