公开(公告)号：US20040232355A1

公开(公告)日：2004-11-25

申请号：US10847127

申请日：2004-05-17

Applicant: ASM JAPAN K.K.

Inventor： Nobuo Matsuki ,  Atsuki Fukazawa ,  Naoto Tsuji

IPC: H01J037/32

CPC classification number: H01J33/00 ,  H01J37/06

Abstract: An electron-beam irradiation apparatus includes an evacuatable filament-electron gun chamber housing a filament and an anode and having an inactive-gas inlet through which an inactive gas flows in; an evacuatable treatment chamber connected to an exhaust system; and a separation wall for separating the filament-electrode gun chamber and the treatment chamber. The separation wall has an aperture configured to pass electrons and gas therethrough from the filament-electron gun chamber.

Abstract translation: 电子束照射装置包括容纳灯丝和阳极并具有非活性气体入口的惰性气体入口的可抽出的灯丝电子枪室; 连接到排气系统的可抽空处理室; 以及用于分离灯丝电极枪室和处理室的分离壁。 分隔壁具有孔，该孔被配置为使电子和气体从灯丝电子枪室通过。

公开(公告)号：US20020036264A1

公开(公告)日：2002-03-28

申请号：US09891612

申请日：2001-06-27

Inventor： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shin Oowada ,  Shoji Yoshikawa ,  Mutsumi Saito

IPC: G21K007/00 ,  G01N023/00

CPC classification number: G01N23/225 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817

Abstract: An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system. Specifically, the electron beam apparatus comprises beam generating means 2004 for irradiating an electron beam having a particular width, a primary electron-optical system 2001 for leading the beam to reach the surface of a substrate 2006 under testing, a secondary electron-optical system 2002 for trapping secondary electrons generated from the substrate 2006 and introducing them into an image processing system 2015, a stage 2003 for transportably holding the substrate 2006 with a continuous degree of freedom equal to at least one, a testing chamber for the substrate 2006, a substrate transport mechanism for transporting the substrate 2006 into and out of the testing chamber, an image processing analyzer 2015 for detecting defects on the substrate 2006, a vibration isolating mechanism for the testing chamber, a vacuum system for holding the testing chamber at a vacuum, and a control system 2017 for displaying or storing positions of defects on the substrate 2006.

Abstract translation: 诸如基于片材束的测试装置的电子束装置具有电子光学系统，用于用来自电子束源的一次电子束照射待测物体，并且投射通过照射的二次电子束的图像 一次电子束和用于检测由电子 - 光学系统投影的二次电子束图像的检测器。 具体地，电子束装置包括用于照射具有特定宽度的电子束的光束产生装置2004，用于引导光束到达待测基板2006的表面的初级电子 - 光学系统2001，二次电子光学系统2002 用于捕获从衬底2006产生的二次电子并将它们引入到图像处理系统2015中，用于以等于至少一个的连续自由度可移动地保持衬底2006的阶段2003，用于衬底2006的测试室，衬底 用于将基板2006输送到测试室中的传送机构，用于检测基板2006上的缺陷的图像处理分析器2015，用于测试室的隔振机构，用于将测试室保持在真空的真空系统，以及 用于在基板2006上显示或存储缺陷位置的控制系统2017。

公开(公告)号：US06296976B1

公开(公告)日：2001-10-02

申请号：US09333931

申请日：1999-06-16

Applicant: Timothy R. Groves ,  Steven D. Golladay ,  Hans C. Pfeiffer

Inventor： Timothy R. Groves ,  Steven D. Golladay ,  Hans C. Pfeiffer

IPC: G03F900

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/06 ,  H01J37/3174 ,  H01J2237/0653 ,  Y10S430/143

Abstract: A method for improving image fidelity on a resist. The method adjusts the intensity distribution of the electron beam such that the feature size at the edges and the center of a subfield have a same width “w”. This is accomplished by intentionally increasing the incident intensity where the images are small (more pronounced blurring), and intentionally decreasing the incident intensity where the images are large (less pronounced blurring). This can be achieved, for example, by maintaining a cathode temperature profile which increases or decreases radially by an appropriate amount.

Abstract translation: 一种提高抗蚀剂图像保真度的方法。 该方法调整电子束的强度分布，使得子区域的边缘和中心处的特征尺寸具有相同的宽度“w”。 这是通过有意识地增加图像较小（更明显的模糊）的入射强度，并有意降低图像大的模糊的较少的入射强度来实现的。 这可以通过例如维持一个适当量的径向增加或减小的阴极温度分布来实现。

公开(公告)号：US5977549A

公开(公告)日：1999-11-02

申请号：US74866

申请日：1998-05-08

Applicant: Yuh-Lin Wang ,  Lung-Wen Chen

Inventor： Yuh-Lin Wang ,  Lung-Wen Chen

IPC: H01J37/06 ,  H01J37/08 ,  H01J37/26

CPC classification number: H01J37/08 ,  H01J37/06 ,  H01J2237/2817 ,  H01J2237/31742

Abstract: An apparatus and a method of producing a dual ion/electron source. The ion beam and the electron beam are produced by a charged particle optical system. Using an ion source metal to emit an ion beam or an electron beam. The direction of the ion beam and the electron beam is identical. Neither the particle source nor the sample need to be rotated or shifted.

Abstract translation: 一种制造双离子/电子源的装置和方法。 离子束和电子束由带电粒子光学系统产生。 使用离子源金属发射离子束或电子束。 离子束和电子束的方向是相同的。 粒子源和样品都不需要旋转或移动。

公开(公告)号：US5270611A

公开(公告)日：1993-12-14

申请号：US917687

申请日：1992-07-17

Applicant: Gerardus G. P. Van Gorkom

Inventor： Gerardus G. P. Van Gorkom

IPC: H01J3/02 ,  H01J31/12 ,  H01J37/06 ,  H01J29/70 ,  H01J43/06

CPC classification number: H01J31/124 ,  H01J3/023 ,  H01J37/06

Abstract: Electric discharge element comprising a cathode which cooperates with an electron duct cavity which is defined by walls of electrically insulating material having a secondary emission coefficient .delta., which cavity has an output aperture, while electrode means which can be connected to a voltage source are provided for applying, in operation, an electric field across a path in the cavity from the cathode to the output aperture so as to enable electron transport through the cavity.

Abstract translation: 放电元件包括​​与电子管腔相配合的阴极，电子管腔由电绝缘材料的壁限定，该电绝缘材料具有二次发射系数三角形，该空腔具有一个输出孔，而电极装置可连接到电压源， 在操作中施加穿过空腔中的从阴极到输出孔的路径的电场，以使电子能够通过空腔传输。

公开(公告)号：US5245250A

公开(公告)日：1993-09-14

申请号：US640435

申请日：1991-02-06

Applicant: Hidetsugu Ikegami

Inventor： Hidetsugu Ikegami

IPC: G21K1/00 ,  H01J3/02 ,  H01J37/06 ,  H01S1/00 ,  H05H7/00 ,  H05H7/18 ,  H05H15/00

CPC classification number: H05H7/18 ,  H01J3/02 ,  H01J37/06

Abstract: In an electron beam apparatus making use of an electron beam, a solenoid magnetic field generating section is disposed along an electron beam, and a cyclotron maser stimulating high-frequency resonator is provided within this magnetic field generating section. An emittance of the electron beam is adjusted by projecting a cyclotron maser stimulating high frequency wave in the same direction as or in the opposite direction to the traveling direction of the electron beam, and thereby a high-luminosity beam is generated.

公开(公告)号：US5001385A

公开(公告)日：1991-03-19

申请号：US316393

申请日：1989-02-27

Applicant: Bernardus J. G. M. Roelofs

Inventor： Bernardus J. G. M. Roelofs

IPC: H01J1/15 ,  H01J1/18 ,  H01J37/06 ,  H01J37/067

CPC classification number: H01J37/06 ,  H01J1/18

Abstract: In order to avoid undesired variations in the emission current intensity of a clamping device for a thermally emitting cathode tip constructed from pyrolytice graphite, a resilient coupling compensating the thermal stresses n the graphite is provided in an electron beam apparatus.

公开(公告)号：US4988869A

公开(公告)日：1991-01-29

申请号：US396888

申请日：1989-08-21

Applicant: William Aberth

Inventor： William Aberth

IPC: H01J37/06 ,  H01J49/26 ,  H01J49/28

CPC classification number: H01J49/0054 ,  H01J37/06 ,  H01J49/26 ,  H01J49/288

Abstract: A tandem mass spectrometer includes an ion source, a first mass analyzer, a second mass analyzer, and a detector. An electron focusing source is provided between the first mass analyzer and the second mass analyzer in order to provide for dissociation of a parent ion beam into a plurality of daughter ion beams. In a first embodiment, the focused electron source comprises a cylindrical cathode having a concentric cylindrical anode in its interior. Control of the cathode temperature and the potential between the cathode and the anode provides a desired electron flux along the axis of the source. The second embodiment, the desired electron flux is provided by a field emission electrode.

Abstract translation: 串联质谱仪包括离子源，第一质量分析器，第二质量分析器和检测器。 在第一质量分析器和第二质量分析器之间提供电子聚焦源，以提供母离子束分解成多个子离子束。 在第一实施例中，聚焦电子源包括在其内部具有同心圆柱形阳极的圆柱形阴极。 阴极温度和阴极和阳极之间的电势的控制提供了沿源的轴线所需的电子通量。 第二实施例中，期望的电子通量由场发射电极提供。

公开(公告)号：US4473771A

公开(公告)日：1984-09-25

申请号：US274724

申请日：1981-06-18

Applicant: Stephen Lhotsky ,  Yves Poussart

Inventor： Stephen Lhotsky ,  Yves Poussart

IPC: H01J1/15 ,  H01J9/04 ,  H01J37/06 ,  H01J1/16 ,  H01J19/10

CPC classification number: H01J1/15 ,  H01J37/06 ,  H01J9/04

Abstract: A tungsten filament intended as a thermionic source, made from a wire of which the zone defining the point is of a diameter smaller than that of the basal zone and where the diameter of the transitory part of the wire changes progressively. This filament is contained in the same plane and its lower legs are welded to rigid posts in a ceramic base. A novel electrolytic sharpening process is used for the reduction of the diameter of the filament wire, and this process, which permits the progressive reduction of the dimension of a workpiece, can be used in other applications. An apparatus is used for the manufacturing of such a filament by cyclic electrolytic sharpening, as well as means enabling the bending of the wire and its positioning during the welding operation.

Abstract translation: 作为热离子源的钨丝，由其中限定点的区域的直径小于基础区域的直径的线制成，并且线的短暂部分的直径逐渐变化。 该灯丝包含在同一平面上，其下部的支脚焊接在陶瓷基座中的刚性支柱上。 使用新颖的电解磨削工艺来减少丝线的直径，并且允许逐渐减小工件尺寸的该方法可用于其它应用。 用于通过循环电解磨削制造这种灯丝的装置以及在焊接操作期间能够弯曲导线及其定位的装置。

公开(公告)号：US4424448A

公开(公告)日：1984-01-03

申请号：US216948

申请日：1980-12-16

Applicant: Tadahiro Takigawa ,  Isao Sasaki

Inventor： Tadahiro Takigawa ,  Isao Sasaki

IPC: H01J37/06 ,  H01J37/26 ,  H01J37/304 ,  H01J3/08 ,  H01J3/12

CPC classification number: H01J37/06 ,  H01J37/265 ,  H01J37/304

Abstract: An electron beam apparatus comprises an electron gun having a cathode consisting of single-crystal lanthanum hexaboride and a plurality of electron lenses for projecting the cross-over image of an electron beam emitted from the electron gun as a reduced-scale image onto a sample. It further comprises a circuit for measuring the brightness and shape of the cross-over image projected onto the sample and the emission pattern of the electron beam emitted from the electron gun, and a circuit for applying a bias voltage, with which the cross-over image has a desired brightness and is round and the emission pattern is anisotropic, to the electron gun.

Abstract translation: 电子束装置包括具有由单晶镧六硼化物构成的阴极和多个电子透镜的电子枪，用于将从电子枪发射的电子束的交叉图像作为缩小图像投射到样品上。 它还包括一个电路，用于测量投射到样品上的交叉图像的亮度和形状以及从电子枪发射的电子束的发射图案，以及一个施加偏置电压的电路，与之交叉 图像具有期望的亮度，并且是圆形的，并且发射图案是各向异性的，对于电子枪。