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61.发明授权公开(公告)号：US07105842B2
公开(公告)日：2006-09-12
申请号：US10958141
申请日：2004-10-05
Applicant: Sayaka Tanimoto , Yasunari Sohda , Yoshinori Nakayama , Osamu Kamimura , Haruo Yoda , Masaki Hosoda
Inventor： Sayaka Tanimoto , Yasunari Sohda , Yoshinori Nakayama , Osamu Kamimura , Haruo Yoda , Masaki Hosoda
IPC: H01J37/302 , G03F7/20
CPC classification number: H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/04 , H01J37/317
Abstract: Disclosed is equipment for charged-particle beam lithography capable of executing exposure even when an electron beam with a bad property is produced due to a failure in some multibeam forming element, without replacing the failing multibeam forming element and without reducing the exposure accuracy. The equipment includes means for forming a plurality of charged-particle beams arranged at predetermined intervals; a plurality of blankers which act on the plurality of charged-particle beams individually; a common blanker which acts on all of the plurality of charged-particle beams; and a blanking restriction for causing those charged-particle beams which are given predetermined deflection by the plurality of blankers to reach onto a sample, with a signal applied to the common blanker, and blocking those charged-particle beams which are not given the predetermined deflection by the plurality of blankers to the sample. The equipment blocks beams with bad properties to the sample and executes exposure using only those beams which have bad properties.
Abstract translation: 本发明公开了即使由于某些多波束形成元件的故障而产生具有不良特性的电子束也能够进行曝光的带电粒子束光刻设备，而不更换故障多波束形成元件而不降低曝光精度。 该设备包括用于形成以预定间隔布置的多个带电粒子束的装置; 分别作用在多个带电粒子束上的多个阻挡器; 作用于所有多个带电粒子束的常见消隐器; 以及消隐限制，用于使得由多个消隐器给予预定偏转的那些带电粒子束到达样本，信号施加到公共消隐器，并且阻挡未被给予预定偏转的那些带电粒子束 通过多个消隐器到样品。 设备阻挡样品性能不良的光束，并仅使用具有不良特性的光束执行曝光。
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公开(公告)号：US20050199821A1
公开(公告)日：2005-09-15
申请号：US10799836
申请日：2004-03-12
Applicant: Rahul Saini , Zoran Jandric
Inventor： Rahul Saini , Zoran Jandric
CPC classification number: H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/28 , H01J37/3177 , H01J2237/03 , H01J2237/0492 , H01J2237/1205
Abstract: A microcolumn including an assembly substrate and a plurality of beam modification components. The assembly substrate includes a plurality of sockets, and the beam modification components each include a connector coupled to a corresponding one of the sockets. Assembly of the beam modification components to the assembly substrate may employ automation and/or automated calibration, including automated motion of robotic stages in a substantially automated manner.
Abstract translation: 包括组装衬底和多个束修改组件的微柱。 组装衬底包括多个插座，并且光束修改部件各自包括连接到对应的一个插座的连接器。 将束修改部件组装到组装衬底可以采用自动化和/或自动校准，包括基本自动化的机器人级的自动运动。
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公开(公告)号：US06943349B2
公开(公告)日：2005-09-13
申请号：US10258869
申请日：2001-04-27
Applicant: Pavel Adamec , Ralf Degenhardt , Hans-Peter Feuerbaum , Harry Munack , Dieter Winkler
Inventor： Pavel Adamec , Ralf Degenhardt , Hans-Peter Feuerbaum , Harry Munack , Dieter Winkler
CPC classification number: H01J37/04 , H01J37/09 , H01J37/266
Abstract: The present invention provides an improved column for a charged particle beam device. The column comprises an aperture plate having multiple apertures to produce multiple beams of charged particles and a deflector to influence the beams of charged particles so that each beam appears to come from a different source. Furthermore, an objective lens is used in order to focus the charged-particle beams onto the specimen. Due to the deflector, multiple images of the source are created on the surface of the specimen whereby all the images can be used for parallel data acquisition. Accordingly, the speed of data acquisition is increased. With regard to the focusing properties of the objective lens, the beams of charged particles can basically be treated as independent particle beams which do not negatively affect each other. Accordingly, each beam basically provides the same resolution as the beam of a conventional charged particle beam device.
Abstract translation: 本发明提供了一种用于带电粒子束装置的改进的柱。 柱包括具有多个孔的孔板，以产生多个带电粒子束和偏转器，以影响带电粒子束，使得每个束似乎来自不同的源。 此外，使用物镜以将带电粒子束聚焦到样本上。 由于偏转器，在样品的表面上产生了源的多个图像，从而所有图像可以用于并行数据采集。 因此，数据采集的速度增加。 关于物镜的聚焦特性，带电粒子束基本上可以被视为不会相互影响的独立的粒子束。 因此，每个光束基本上提供与常规带电粒子束装置的光束相同的分辨率。
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公开(公告)号：US06201251B1
公开(公告)日：2001-03-13
申请号：US09143065
申请日：1998-08-28
Applicant: Steven Douglas Golladay , William Albert Enichen
Inventor： Steven Douglas Golladay , William Albert Enichen
IPC: H01J3700
CPC classification number: H01J37/04 , H01J2237/04922
Abstract: Variable space charge effects in the imaging portion of a particle beam projection system due to variations in transmitted beam current are compensated with an additional lens appropriately positioned within the imaging system and having a focal length which varies in response to the transmitted beam current.
Abstract translation: 由于透射光束电流的变化，在粒子束投影系统的成像部分中的可变空间电荷效应被适当地定位在成像系统内并具有响应于透射束电流而变化的焦距的附加透镜进行补偿。
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公开(公告)号：US06194729B1
公开(公告)日：2001-02-27
申请号：US09123017
申请日：1998-07-26
Applicant: Eugen Weimer
Inventor： Eugen Weimer
IPC: G01N2300
CPC classification number: H01J37/145 , H01J37/04 , H01J37/28 , H01J2237/04756 , H01J2237/2443
Abstract: The invention relates to a particle beam apparatus, in which very low target energies of the particles focused on the object can be set, with good imaging conditions. For this purpose, the beam guiding tube (5), from the anode (4) to behind the objective (6, 7) is at a high potential, which insures that the particles within the beam guiding tube have a high kinetic energy which is independent of the target energy. A braking electrode (9) arranged after the beam guiding tube, together with the object holder (10) and the object arranged thereon, is at a specimen potential UP which deviates from the ground potential and which has the same sign as the cathode potential UK. The specimen potential UP acts as the decelerating potential, by means of which the particles are braked to energies which can be below the energy value determined by the cathode potential UK. Thus even at the lowest target energies the object does not need to be brought to a high, high-voltage potential, so that object damage and high voltage flashovers are excluded. At the same time, the kinetic energy of the electrons within the beam guiding tube is largely independent of the target energy, so that the imaging relationships within the beam guiding tube are largely independent of the target energy.
Abstract translation: 本发明涉及一种粒子束装置，其中可以设置具有良好成像条件的聚焦在物体上的粒子的非常低的目标能量。 为此，从阳极（4）到物镜（6,7）之后的光束引导管（5）处于高电位，确保光束引导管内的颗粒具有高动能 独立于目标能量。 布置在光束引导管之后的制动电极（9）与物体保持器（10）和布置在其上的物体一起处于与地电位偏离并且具有与阴极电位UK相同的标志的检测电位UP 。 样品电势UP用作减速电位，通过该电位将颗粒制动到能量低于由阴极电势UK确定的能量值的能量。 因此，即使在最低目标能量下，物体也不需要被带到高的高电压电位，所以不包括物体损坏和高压闪络。 同时，光束引导管内电子的动能很大程度上与目标能量无关，因此光束引导管内的成像关系很大程度上与目标能量无关。
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Patent Agency Ranking
公开(公告)号：US5757009A
公开(公告)日：1998-05-26
申请号：US773702
申请日：1996-12-27
Applicant: Peter L. Walstrom
Inventor： Peter L. Walstrom
Abstract: A charged particle beam expander increases a diameter of a charged particle beam while increasing uniformity of an area energy distribution thereof. The charged particle beam expander has a first linear optics section receiving the charged particle beam from a particle accelerator and for forming the charged particle beam to have a generally circular cross-section and a non-linear optics section receiving the charged particle beam from the first linear optics section and for redistributing charged particles from a periphery of the charged particle beam toward a core thereof. The charged particle beam expander also has a second linear optics section receiving the charged particle beam from the non-linear optics section, the second linear optics section for increasing the diameter of the charged particle beam and for imaging the charged particle beam onto the target.
Abstract translation: 带电粒子束扩束器增加带电粒子束的直径，同时增加其面积能量分布的均匀性。 带电粒子束扩束器具有第一线性光学部分，其接收来自粒子加速器的带电粒子束并且用于形成带电粒子束以具有大致圆形的横截面，并且非线性光学部分接收来自第一 线性光学部分，并且用于将带电粒子从带电粒子束的周边重新分配到其核心。 带电粒子束扩展器还具有接收来自非线性光学部分的带电粒子束的第二线性光学部分，第二线性光学部分用于增加带电粒子束的直径并将带电粒子束成像到靶上。
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公开(公告)号：US5468965A
公开(公告)日：1995-11-21
申请号：US303963
申请日：1994-09-09
Applicant: Robert W. Garnett , M. Christian Dobelbower
Inventor： Robert W. Garnett , M. Christian Dobelbower
CPC classification number: G21K1/093 , H01J37/04 , H01J2237/04922
Abstract: A charged particle beam line is formed with magnetic optics that manipulate the charged particle beam to form the beam having a generally rectangular configuration to a circular beam cross-section having a uniform particle distribution at a predetermined location. First magnetic optics form a charged particle beam to a generally uniform particle distribution over a square planar area at a known first location. Second magnetic optics receive the charged particle beam with the generally square configuration and affect the charged particle beam to output the charged particle beam with a phase-space distribution effective to fold corner portions of the beam toward the core region of the beam. The beam forms a circular configuration having a generally uniform spatial particle distribution over a target area at a predetermined second location.
Abstract translation: 带电的粒子束线形成有磁光学器件，其操作带电粒子束以形成具有大致矩形构造的梁，其具有在预定位置处具有均匀粒子分布的圆形横截面。 第一磁性光学器件在已知的第一位置上形成在正方形平面区域上的大致均匀的粒子分布的带电粒子束。 第二磁光学接收具有大致正方形配置的带电粒子束，并且影响带电粒子束，以输出具有有效地折射束朝向光束核心区域的角部分的相位空间分布的带电粒子束。 波束形成在预定的第二位置处的目标区域上具有大致均匀的空间粒子分布的圆形构造。
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公开(公告)号：US4918358A
公开(公告)日：1990-04-17
申请号：US215739
申请日：1988-07-06
Applicant: Ryuzo Aihara , Haruo Kasahara
Inventor： Ryuzo Aihara , Haruo Kasahara
Abstract: An emitter produces a beam of electrons or ions accelerated at a relatively high accelerating voltage. The beam is sharply focused by a condenser lens at the final stage. An electrostatic field for retarding the beam is produced between the lens at the final stage and a target on which the beam impinges. The retarding field lowers the landing energy of the beam. An auxiliary electrode which is maintained at substantially the same potential as the target is disposed between the lens and the target. A secondary electron detector is mounted between the auxiliary electrode and the target.
Abstract translation: 发射极产生在相对高的加速电压下加速的电子束或离子束。 光束在最后阶段被聚光透镜锐利聚焦。 用于延迟光束的静电场在最后阶段的透镜和光束撞击的目标之间产生。 延迟场降低了束的着陆能。 保持在与靶物基本相同的电位的辅助电极设置在透镜和靶之间。 二次电子检测器安装在辅助电极和靶之间。
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公开(公告)号：US4851670A
公开(公告)日：1989-07-25
申请号：US90443
申请日：1987-08-28
Applicant: Ondrej L. Krivanek
Inventor： Ondrej L. Krivanek
Abstract: Quadruple lenses 30, 31 and 32 and sextupole lenses 40, 41, 42, and 43 are interposed between a energy-dispersing device 17 and an electron imaging device 50 in an energy-selected electron imaging filter. The energy-dispersing device produces a focussed spectrum 21 of electron energies in the plane of an energy-selecting slit 20, and the quadrupole and sextupole lenses transform the spectrum into an energy-selecting slit may also be either removed or opened wide, and the quadrupole lenses may be refocussed, so that the electron imaging device directly observes a magnified spectrum of the electron energies.
Abstract translation: 四倍透镜30,31和32以及六极透镜40,41,42和43插入在能量选择的电子成像滤光器中的能量分散装置17和电子成像装置50之间。 能量分散装置在能量选择狭缝20的平面中产生电子能量的聚焦光谱21，并且将光谱转换成能量选择狭缝的四极和六极透镜也可以被去除或打开得很宽，并且 四极透镜可以重新聚焦，使得电子成像装置直接观察电子能量的放大光谱。
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公开(公告)号：US4766372A
公开(公告)日：1988-08-23
申请号：US13006
申请日：1987-02-10
Applicant: Valluri R. M. Rao
Inventor： Valluri R. M. Rao
CPC classification number: G01N23/2251 , H01J37/04 , H01J37/268
Abstract: An electron beam tester for fault detection and isolation in large and very large scale integrated circuits. An electron optical column focuses a primary beam of electrons on the surface of a circuit chip. An immersion extractor provides an electrical field to attract secondary electrons emitted from the irradiated surface. Secondary electrons are detected in an integral spectrometer. A wide bore final lens and integral high resolution double defection scan coils enable large area voltage contrast imaging as well as quantitative waveform measurement from internal nodes of the circuit chip.
Abstract translation: 用于大型和大规模集成电路中的故障检测和隔离的电子束测试仪。 电子光学柱将电子束的一次电子束聚焦在电路芯片的表面上。 浸没提取器提供电场以吸引从辐射表面发射的二次电子。 二次电子在积分光谱仪中检测。 宽孔最终镜头和整体高分辨率双重扫描线圈可实现大面积电压对比成像以及电路芯片内部节点的定量波形测量。
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