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    SUBSTRATE SUPPORTING UNIT, APPARATUS FOR TREATING SUBSTRATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
    61.
    发明申请
    SUBSTRATE SUPPORTING UNIT, APPARATUS FOR TREATING SUBSTRATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE 有权

    公开(公告)号：US20250146133A1

    公开(公告)日：2025-05-08

    申请号：US18672023

    申请日：2024-05-23

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Yeontae Kim ,  Yihwan Kim ,  Minsu Lee ,  Hyeonjin Jeon ,  Hyeongun Jeon

    IPC: C23C16/458 ,  C23C16/455 ,  C23C16/46 ,  H01L21/687

    Abstract: A substrate support unit includes a chuck having an upper surface on which to mount a substrate, and including a heater for heating the substrate; a shaft assembly supporting a lower portion of the chuck, and including an electric line connected to the heater; a support assembly having an accommodation space surrounding and accommodating a portion of the shaft assembly, and supporting the shaft assembly; a seal sealing a lower portion of the accommodation space; an inlet communicating with the accommodation space and configured to transfer cooling gas for cooling the electric line into the accommodation space, the inlet being disposed in one of the support assembly and the seal; and an outlet disposed in the support assembly, communicating with the accommodation space, and configured to transfer the cooling gas out of the support assembly.

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING THE SAME
    62.
    发明申请
    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING THE SAME 有权

    公开(公告)号：US20250146130A1

    公开(公告)日：2025-05-08

    申请号：US18647721

    申请日：2024-04-26

    Applicant: SAMSUNG ELECTRONICS CO., LTD.

    Inventor： Dongho SHIN ,  Hanhim KANG ,  Seungjae KIM ,  Oh-Hyuk KWON ,  Jaeho PARK ,  Hongtaek LIM ,  Eun-Kyung HONG

    IPC: C23C16/455

    Abstract: Substrate processing apparatuses and methods are provided. A substrate processing apparatus includes placing a first substrate on a first stage in a process chamber, placing a second substrate on a second stage in the process chamber, performing a first deposition process on the first substrate, and performing a second deposition process on the second substrate. The performing the first deposition process includes supplying the first substrate with a first gas. The performing the second deposition process includes supplying the second substrate with a second gas. The supplying the first substrate with the first gas includes alternately and repeatedly performing steps of filling a first gas supply unit with the first gas for a first time length, and supplying the first substrate with the first gas for a second time length. The second time length is greater than the first time length.

    METHOD AND APPARATUS WITH AUTONOMOUS DRIVING DECISION LEARNING
    63.
    发明申请
    METHOD AND APPARATUS WITH AUTONOMOUS DRIVING DECISION LEARNING 有权

    公开(公告)号：US20250145174A1

    公开(公告)日：2025-05-08

    申请号：US18604604

    申请日：2024-03-14

    Applicant: SAMSUNG ELECTRONICS CO., LTD.

    Inventor： Dohyun JANG

    IPC: B60W60/00 ,  G06F40/20

    Abstract: Provided is a method of learning a driving-decision algorithm. The method of learning a driving-decision algorithm for a vehicle includes: receiving a dataset related to driving from a database in which a driving scenario is stored; obtaining a first output by inputting the dataset into a first large language model (LLM), wherein the first output includes an inference of the first LLM based on the dataset; based on the first output, training a decision-trainer and a behavior-and-trajectory planner; generating a second LLM by updating the first LLM based on a result of the training; and generating a third LLM by updating the second LLM based on the trained decision-trainer and based on a selected traffic rule.

    SYSTEM AND METHOD FOR GENERATING ALERT BASED ON MONITORING OF NECK ALIGNMENT OF USER
    65.
    发明申请
    SYSTEM AND METHOD FOR GENERATING ALERT BASED ON MONITORING OF NECK ALIGNMENT OF USER 有权

    公开(公告)号：US20250143600A1

    公开(公告)日：2025-05-08

    申请号：US18804703

    申请日：2024-08-14

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Jawwad AKHTER ,  Ayan TALUKDAR

    IPC: A61B5/11 ,  A61B5/00

    Abstract: A method for generating an alert based on monitoring of neck alignment of a user is provided. The method includes determining via one or more sensors of a wearable device worn by the user, an orientation of a head of the user based on an inclination of at least one sensor of the one or more sensors, evaluating a tilt angle associated with the head based on the determined orientation, determining a degree of misalignment of a neck of the user based on the tilt angle, determining a score associated with a posture of the neck based on a body mass index of the user, the tilt angle, a force on the neck, and the degree of misalignment of the neck, determining, based on the score, whether the posture corresponds to a specific type, and generating the alert, in response to determining that the posture corresponds to the specific type.

    ATTACHABLE/DETACHABLE DEVICE FOR SUPPORTING BAND
    66.
    发明申请
    ATTACHABLE/DETACHABLE DEVICE FOR SUPPORTING BAND 有权

    公开(公告)号：US20250143415A1

    公开(公告)日：2025-05-08

    申请号：US19002339

    申请日：2024-12-26

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Kuemjong BAE

    IPC: A44B11/26 ,  B25J9/00

    Abstract: An attachable/detachable device for supporting a band of a device, such as a wearable walking assist device, may include a base plate, a base protrusion, a base frame, a locking magnet, and a button comprising a slider, a slider magnet, a button cover, a button cap, and a spring, the button being attachable to/detachable from the base frame. Various other embodiments are possible.

    Integrated circuit semiconductor device
    69.
    发明授权
    Integrated circuit semiconductor device 有权

    公开(公告)号：US12295136B2

    公开(公告)日：2025-05-06

    申请号：US17844623

    申请日：2022-06-20

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Intak Jeon ,  Hyukwoo Kwon ,  Hanjin Lim

    IPC: H10B12/00 ,  H01L49/02

    Abstract: An integrated circuit semiconductor device includes a lower electrode formed on a substrate extending in a first direction and a second direction perpendicular to the first direction and a support structure supporting the lower electrode. The support structure includes a support pattern surrounding the lower electrode, extending in the first direction and the second direction, and having a hole through which the lower electrode passes, and a concavo-convex structure having at a surface of the support pattern a plurality of convex portions extending in a third direction perpendicular to the first direction and the second direction, and a plurality of concave portions arranged between the convex portions.

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