Method for resizing pattern to be written by lithography technique, and charged particle beam writing method
    61.
    发明授权
    Method for resizing pattern to be written by lithography technique, and charged particle beam writing method 有权
    用于通过光刻技术来调整图案的尺寸的方法,以及带电粒子束写入方法

    公开(公告)号:US08065635B2

    公开(公告)日:2011-11-22

    申请号:US11851176

    申请日:2007-09-06

    IPC分类号: G06F17/50

    摘要: A method for resizing a pattern to be written by using lithography technique includes calculating a first dimension correction amount of a pattern for correcting a dimension error caused by a loading effect, for each small region made by virtually dividing a writing region of a target workpiece into meshes of a predetermined size, based on an area density of the each small region, calculating a second dimension correction amount in accordance with a line width dimension of the pattern to be written in the each small region, correcting the first dimension correction amount by using the second dimension correction amount, and resizing the line width dimension of the pattern by using a corrected first dimension correction amount, and outputting a result of the resizing.

    摘要翻译: 通过使用光刻技术来调整要写入的图案的尺寸的方法包括:对通过将目标工件的写入区域进行实际分割而形成的每个小区域,计算用于校正由负载效应引起的尺寸误差的图案的第一维度校正量 基于每个小区域的面积密度预定尺寸的网格,根据要写入每个小区域的图案的线宽度尺寸来计算第二维度校正量,通过使用来校正第一维度校正量 第二维度校正量,并且通过使用校正的第一维度校正量来调整图案的线宽度尺寸,并输出调整大小的结果。

    DEFECT ESTIMATION DEVICE AND METHOD AND INSPECTION SYSTEM AND METHOD
    62.
    发明申请
    DEFECT ESTIMATION DEVICE AND METHOD AND INSPECTION SYSTEM AND METHOD 有权
    缺陷估算装置及方法及检查系统及方法

    公开(公告)号:US20110188734A1

    公开(公告)日:2011-08-04

    申请号:US13017641

    申请日:2011-01-31

    IPC分类号: G06K9/00

    摘要: Acquired mask data of a defect portion is sent to a simulated repair circuit 300 to be simulated. The simulation of the acquired mask data 204 is returned to the mask inspection results 205 and thereafter sent to a wafer transfer simulator 400 along with a reference image at the corresponding portion. A wafer transfer image estimated by the wafer transfer simulator 400 is sent to a comparing circuit 301. When it is determined that there is a defect in the comparing circuit 301, the coordinates and the wafer transfer image which is a basis for the defect determination are stored as transfer image inspection results 206. The mask inspection results 205 and the transfer image inspection result 206 are then sent to the review device 500.

    摘要翻译: 获取的缺陷部分的掩模数据被发送到模拟的修复电路300进行仿真。 获取的掩模数据204的模拟返回到掩模检查结果205,然后与对应部分的参考图像一起发送到晶片传送模拟器400。 由晶片转移模拟器400估计的晶片转印图像被发送到比较电路301.当确定比较电路301中存在缺陷时,作为缺陷确定的基础的坐标和晶片转印图像是 存储为转印图像检查结果206.然后将掩模检查结果205和转印图像检查结果206发送到检查装置500。

    Charged particle beam writing apparatus and charged particle beam writing method
    63.
    发明授权
    Charged particle beam writing apparatus and charged particle beam writing method 有权
    带电粒子束写入装置和带电粒子束写入方法

    公开(公告)号:US07928414B2

    公开(公告)日:2011-04-19

    申请号:US12042865

    申请日:2008-03-05

    申请人: Takayuki Abe

    发明人: Takayuki Abe

    IPC分类号: H01J37/304

    摘要: A charged particle beam writing apparatus includes an irradiation part configured to irradiate a charged particle beam; a first shaping aperture member having passing areas, that the charged particle beam passes through, on both sides of an area blocking the charged particle beam; a deflection part configured to deflect the charged particle beam that has passed through the first shaping aperture member; a second shaping aperture member having passing areas, that the charged particle beam passes through, on both sides of an area blocking the deflected charged particle beam; and a stage on which a target workpiece irradiated with the charged particle beam that has passed through the second shaping aperture member is placed.

    摘要翻译: 带电粒子束写入装置包括被配置为照射带电粒子束的照射部分; 在阻挡带电粒子束的区域的两侧上具有通过区域的带电粒子束通过的第一成形孔径构件; 偏转部件,其构造成偏转已经穿过第一成形孔部件的带电粒子束; 具有穿过区域的第二成形孔径构件,所述通过区域被带电粒子束穿过阻挡偏转的带电粒子束的区域的两侧; 以及放置已经通过第二成形孔部件的带电粒子束照射的目标工件的台阶。

    MAGNETIC RESONANCE IMAGING APPARATUS AND BLOOD VESSEL IMAGE ACQUIRING METHOD
    64.
    发明申请
    MAGNETIC RESONANCE IMAGING APPARATUS AND BLOOD VESSEL IMAGE ACQUIRING METHOD 有权
    磁共振成像装置和血管图像获取方法

    公开(公告)号:US20110064294A1

    公开(公告)日:2011-03-17

    申请号:US12991561

    申请日:2009-05-18

    IPC分类号: G06K9/00

    摘要: Plural blood vessels different in blood flow velocity are depicted with high image quality in blood vessel imaging using PC-MRA method. For this purpose, the present invention performs a measurement of an echo signal based on application of a positive-polarity flow encode pulse and a measurement of an echo signal based on application of a negative-polarity flow encode pulse on an examinee with each of plural phase encodes while varying the flow encode, and a blood vessel image of the examinee is reconstructed by using the plural echo signals having different flow encode absolute values.

    摘要翻译: 使用PC-MRA方法在血管成像中描绘了血流速度不同的多个血管,具有高图像质量。 为此,本发明基于正极极性流编码脉冲的应用和基于在受检者上施加负极性流编码脉冲的回波信号的测量来执行回波信号的测量,其中多个 相位编码,同时改变流编码,并且通过使用具有不同流编码绝对值的多个回波信号来重建受检者的血管图像。

    PLASMA CVD APPARATUS, PLASMA CVD METHOD, AND AGITATING DEVICE
    65.
    发明申请
    PLASMA CVD APPARATUS, PLASMA CVD METHOD, AND AGITATING DEVICE 审中-公开
    等离子体CVD装置,等离子体CVD方法和激活装置

    公开(公告)号:US20110003088A1

    公开(公告)日:2011-01-06

    申请号:US12865788

    申请日:2008-02-06

    摘要: The present invention provides a plasma CVD apparatus and a plasma CVD method capable of efficiently coating the surfaces of fine particles with a thin film or super-fine particles by concentrating a plasma near the fine particles. The plasma CVD apparatus according to the present invention is characterized by including a chamber 13, a container disposed in the chamber for housing fine particles 1, the container having a polygonal inner shape in a section approximately parallel to the direction of the gravity, a ground shielding member 27 for shielding the surface of the container other than a housing face for housing the fine particles 1, a rotation mechanism for causing the container to rotate or act as a pendulum on the axis of rotation approximately perpendicular to the section, an opposed electrode 21 disposed in the container so as to face the housing face, a plasma power source 23 electrically connected to the container, a gas introducing mechanism for introducing a raw gas into the container, and an evacuation mechanism for evacuating the inside of the chamber.

    摘要翻译: 本发明提供一种等离子体CVD装置和等离子体CVD方法,其能够通过在细颗粒附近浓缩等离子体而用薄膜或超细颗粒有效地涂覆微粒表面。 根据本发明的等离子体CVD装置的特征在于包括:室13,设置在容纳微粒1的室中的容器,具有与重力方向近似平行的截面的多边形内部形状的容器,地面 用于遮蔽容器表面的屏蔽构件27,除了用于容纳微粒1的容纳面以外,用于使容器旋转的旋转机构或者作为大致垂直于该截面的旋转轴的摆锤,相对的电极 21,与容器面相对配置在容器内,与容器电连接的等离子体动力源23,将原料气体导入容器的气体导入机构,以及对室内抽真空的排气机构。

    Pattern generation method and charged particle beam writing apparatus
    66.
    发明授权
    Pattern generation method and charged particle beam writing apparatus 有权
    图案生成方法和带电粒子束写入装置

    公开(公告)号:US07669174B2

    公开(公告)日:2010-02-23

    申请号:US11671243

    申请日:2007-02-05

    摘要: A pattern generation method includes changing a dimension of a pattern included in each mesh-like region of a plurality of mesh-like regions by using an area of the pattern and a total sum of lengths of circumferential sides of the pattern included in each mesh-like region to correct a dimension error of the pattern, wherein the dimension error being caused by loading effects and the plurality of mesh-like regions being virtually divided from a pattern forming region of a target object, and generating a pattern of the dimension changed on the target object.

    摘要翻译: 图案生成方法包括通过使用图案的区域和包括在每个网状区域中的图案的周边的长度的总和来改变包括在多个网状区域的每个网格区域中的图案的尺寸, 以校正图案的尺寸误差,其中所述尺寸误差是由加载效应引起的,并且所述多个网状区域从目标对象的图案形成区域虚拟地分割,并且生成维度上的尺寸的图案 目标对象。

    Charged particle beam writing method and apparatus
    67.
    发明授权
    Charged particle beam writing method and apparatus 有权
    带电粒子束写入方法和装置

    公开(公告)号:US07601968B2

    公开(公告)日:2009-10-13

    申请号:US11563109

    申请日:2006-11-24

    IPC分类号: G21K1/087

    摘要: A charged particle beam writing method includes irradiating a shot of a charged particle beam, and deflecting the charged particle beam of the shot using a plurality of deflectors arranged on an optical path of the charged particle beam to write a pattern on a target object, wherein any one of the plurality of deflectors controls deflection of a charged particle beam of a shot different from a shot which is controlled in deflection by another deflector in the same period.

    摘要翻译: 带电粒子束写入方法包括照射带电粒子束的镜头,并且使用布置在带电粒子束的光路上的多个偏转器偏转拍摄的带电粒子束以将目标物体写入图案,其中 所述多个偏转器中的任何一个控制在相同的周期内不同于由另一偏转器偏转控制的镜头的镜头的带电粒子束的偏转。

    Multiple irradiation effect-corrected dose determination technique for charged particle beam lithography
    68.
    发明授权
    Multiple irradiation effect-corrected dose determination technique for charged particle beam lithography 有权
    用于带电粒子束光刻的多重照射效应校正剂量测定技术

    公开(公告)号:US07525110B2

    公开(公告)日:2009-04-28

    申请号:US11671789

    申请日:2007-02-06

    IPC分类号: A61N5/00

    摘要: A charged-particle beam microlithographic apparatus is generally made up of a pattern writing unit and a system controller. The writer has an electron beam source and a pattern generator for forming a pattern image on a workpiece. The system controller includes a unit for correcting proximity and fogging effects occurrable during pattern writing. This unit has a first calculator for calculating a proximity effect-corrected dose, a functional module for calculation of a fog-corrected dose while including therein the influence of the proximity effect, and a multiplier for combining the calculated doses together to determine a total corrected dose. The module has a second calculator for calculating a variable real value representing the proximity-effect influence to be considered during fog correction, and a third calculator for calculating using this value the fog-corrected dose.

    摘要翻译: 带电粒子束微光刻设备通常由图案写入单元和系统控制器组成。 作者具有电子束源和用于在工件上形成图案图像的图案发生器。 系统控制器包括用于在模式写入期间发生的用于校正接近度和起雾效果的单元。 该单元具有用于计算接近效应校正剂量的第一计算器,用于计算雾化校正剂量的功能模块,同时在其中包括邻近效应的影响,以及用于将计算的剂量组合在一起以确定总校正的乘数 剂量。 该模块具有第二计算器,用于计算表示在雾化校正期间考虑的邻近效应影响的可变实数值;以及第三计算器,用于使用该值计算雾化校正剂量。

    Magnetic resonance imaging system and contrast-enhanced angiography
    69.
    发明授权
    Magnetic resonance imaging system and contrast-enhanced angiography 失效
    磁共振成像系统和对比度增强血管造影

    公开(公告)号:US07467006B2

    公开(公告)日:2008-12-16

    申请号:US10575159

    申请日:2004-10-05

    IPC分类号: A61B5/05 A61B6/00 G01V3/00

    CPC分类号: G01R33/5601

    摘要: An MRI system capable of acquiring a high-quality blood vessel image even during a measuring period other than at an injected contrast medium concentration peak by always picking up an image under optimum conditions while following up with an injected contrast medium concentration that changes every moment in the body. A flip angle is changed according to a contrast medium concentration b(t) as shown by a curve (102). During a period (Da) where a contrast medium concentration b(t) gradually increases, a flip angle (FA) increases according to a contrast medium concentration b(t); and during a period (Db) where a contrast medium concentration b(t) gradually decrease, a flip angle is gradually decreased. If a flip angle is controlled so as to follow up with a contrast medium concentration b(t) and reach an Ernst's angle at which a single intensity is at a maximum, a high-quality blood vessel image can be acquired even during a measuring period other than at an injected contrast medium concentration peak.

    摘要翻译: MRI系统即使在注射的造影剂浓度峰值之外的测量期间也能够在最佳条件下总是拾取图像而获得高质量的血管图像,同时跟踪每一刻改变的注射造影剂浓度 身体。 如由曲线(102)所示,根据造影剂浓度b(t)改变翻转角。 在造影剂浓度b(t)逐渐增加的期间(Da)中,翻转角(FA)根据造影剂浓度b(t)而增加; 并且在造影剂浓度b(t)逐渐减小的期间(Db)中,翻转角逐渐降低。 如果控制翻转角以跟随造影剂浓度b(t)并达到单一强度处于最大值的Ernst角,即使在测量期间也可以获得高质量的血管图像 除了注射造影剂浓度峰值。

    Magnetic Resonance Imaging Apparatus and Method
    70.
    发明申请
    Magnetic Resonance Imaging Apparatus and Method 有权
    磁共振成像装置及方法

    公开(公告)号:US20080024127A1

    公开(公告)日:2008-01-31

    申请号:US11662108

    申请日:2005-09-02

    IPC分类号: G01V3/18

    CPC分类号: A61B5/055 G01R33/56375

    摘要: A magnetic resonance imaging apparatus comprises static magnetic field generating means for generating a static magnetic field in an imaging space, a gradient magnetic field generating means for generating a gradient magnetic field in the imaging space, high-frequency magnetic field generating means for generating a high-frequency magnetic field so as to induce nuclear magnetic resonance in a subject placed in the imaging space, signal receiving means for detecting a nuclear magnetic resonance signal from the subject, signal processing means for reconstructing an image by using the detected nuclear magnetic resonance signal, display means for displaying the image, a table for placing the subject thereon to dispose the subject in the imaging means, and table moving means for moving the table on which the subject is placed. While moving the portions to be imaged of the subject continuously or stepwise in the imaging space and disposing the subject, a whole-body image of a large region of the subject is created. The magnetic resonance imaging apparatus further comprises means for detecting information on the displacement of the subject from a desired position and setting means for setting movement information on the table according to the displacement information. The table moving means moves the table according to the movement information set by the setting means to capture the whole-body image.

    摘要翻译: 磁共振成像装置包括用于在成像空间中产生静磁场的静磁场产生装置,用于在成像空间中产生梯度磁场的梯度磁场产生装置,用于产生高电平的高频磁场产生装置 频率磁场,以便在放置在成像空间中的对象中引起核磁共振,用于检测来自对象的核磁共振信号的信号接收装置,用于通过使用检测到的核磁共振信号重建图像的信号处理装置, 用于显示图像的显示装置,用于将被摄体放置在其上以将被摄体置于成像装置中的台子以及用于移动放置被摄体的台的台移动装置。 在成像空间中连续或逐步移动被摄体的成像部分并配置被摄体的同时,创建被检体的大区域的全身图像。 磁共振成像装置还包括用于检测来自所需位置的被摄体的位移的信息的装置和用于根据位移信息设置在桌子上的移动信息的设定装置。 桌子移动装置根据由设置装置设置的移动信息移动桌子以捕获全身图像。