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107 条记录 (耗时 0.011 秒)

    Electron beam apparatus
    51.
    发明授权
    Electron beam apparatus 失效
    电子束设备

    公开(公告)号：US3727093A

    公开(公告)日：1973-04-10

    申请号：US3727093D

    申请日：1971-01-20

    申请人： WESTINGHOUSE ELECTRIC CORP

    发明人： FINK J

    IPC分类号： B23K15/00 ,  H01J3/02 ,  H01J37/065 ,  H01J37/301 ,  H01J1/94 ,  H01J1/20

    CPC分类号： H01J37/301 ,  H01J37/065

    摘要： A high energy electron beam apparatus is provided having a cathode assembly for operation within a high temperature environment. The assembly associated with the cathode is subjected to high temperature generated by the cathode and associated excitation source. More specifically, this invention is directed to the support assembly associated with and about the cathode which includes sealed conductors with insulation means provided thereabout and also means for supporting and positioning a bolt type cathode accurately with respect to the assembly.

    摘要翻译： 提供了一种高能电子束装置，其具有用于在高温环境中操作的阴极组件。 与阴极相关联的组件经受由阴极和相关联的激发源产生的高温。 更具体地，本发明涉及与阴极相关联并且围绕阴极的支撑组件，其包括设置在其周围的绝缘装置的密封导体，以及用于相对于组件精确地支撑和定位螺栓型阴极的装置。

    Work treating with electron beam
    52.
    发明授权
    Work treating with electron beam 失效
    用电子束进行工作处理

    公开(公告)号：US3634645A

    公开(公告)日：1972-01-11

    申请号：US3634645D

    申请日：1970-04-21

    申请人： WESTINGHOUSE ELECTRIC CORP

    发明人： LEMPERT JOSEPH ,  LOWRY JERALD F ,  BONNER FREDERICK M

    IPC分类号： H01J37/063 ,  H01J37/21 ,  H01J37/24 ,  H01J37/301 ,  B23K9/00

    CPC分类号： H01J37/063 ,  H01J37/21 ,  H01J37/241 ,  H01J37/301

    摘要： The electron beam B is projected on work W, usually in the atmosphere outside of the chamber where the beam is generated, through a plurality of aperture members 11, 13, 15, 17. The holes in the aperture members are as small as practicable to suppress the feedback of air into the chamber. The beam B is focussed in regions 85 and 87 (FIG. 3) with reference to the aperture members so as to preclude damage to the members by impingement of the beam on the walls of the holes through which the beam passes. The beam current is varied in dependence on the demands of the work but the focus of the beam is maintained by bias resistor 115 (FIG. 1), without damage to the aperture member, by instantaneous change in the bias impressed on the beam by a control electrode G.

    摘要翻译： 电子束B通过多个孔径构件11,13,15,17，通常在产生梁的室内的大气外部突出在工件W上。孔径构件中的孔尽可能地小到 抑制空气反馈到室内。 光束B参照光圈元件聚焦在区域85和87（图3）中，以防止光束撞击光束通过的孔的壁上的部件损坏。 光束电流根据工作的需要而变化，但是通过偏置电阻器115（图1）来保持光束的焦点，而不会损坏孔径部件，通过施加在光束上的偏置的瞬时变化由 控制电极G.

    Particle optical apparatus with a predetermined final vacuum pressure
    58.
    发明授权
    Particle optical apparatus with a predetermined final vacuum pressure 有权
    具有预定最终真空压力的粒子光学装置

    公开(公告)号：US09153414B2

    公开(公告)日：2015-10-06

    申请号：US11700993

    申请日：2007-01-31

    申请人： Hendrik Nicolaas Slingerland ,  William Ralph Knowles

    发明人： Hendrik Nicolaas Slingerland ,  William Ralph Knowles

    IPC分类号： G01F23/00 ,  H01J37/18 ,  H01J37/301 ,  H01J37/305

    CPC分类号： H01J37/18 ,  H01J37/301 ,  H01J37/3056 ,  H01J2237/182 ,  H01J2237/2608 ,  H01J2237/28

    摘要： The invention relates to a particle-optical apparatus with a predetermined final vacuum pressure. To that end a vacuum chamber of said apparatus is via a first restriction connected to a volume where vapor or gas is present at a known pressure and via a second restriction to a vacuum pump. By making the ratio of the two conductances, associated with said restrictions, a calibrated ratio, the final pressure of the vacuum chamber is a predetermined final pressure. This eliminates the need for e.g. vacuum gauges and control systems, resulting in a more compact design of such apparatus.

    摘要翻译： 本发明涉及具有预定最终真空压力的粒子光学装置。 为此，所述装置的真空室经由与已知压力下存在蒸气或气体并通​​过第二限制到真空泵的体积连接的第一限制。 通过使与所述限制相关联的两个电导率的比率为校准比率，真空室的最终压力是预定的最终压力。 这消除了对例如 真空计和控制系统，从而使这种设备更加紧凑的设计。

    High pressure charged particle beam system
    60.
    发明授权
    High pressure charged particle beam system 有权
    高压带电粒子束系统

    公开(公告)号：US08921811B2

    公开(公告)日：2014-12-30

    申请号：US12525908

    申请日：2008-02-06

    申请人： Milos Toth ,  Rae Knowles

    发明人： Milos Toth ,  William Ralph Knowles

    IPC分类号： G01N23/00 ,  H01J37/305 ,  H01J37/301

    CPC分类号： H01J37/3056 ,  H01J37/301 ,  H01J2237/006 ,  H01J2237/188 ,  H01J2237/2003 ,  H01J2237/2605 ,  H01J2237/31732 ,  H01J2237/3174

    摘要： The current invention includes methods and apparatuses for processing, that is, altering and imaging, a sample in a high pressure charged particle beam system. Embodiments of the invention include a cell in which the sample is positioned during high pressure charged particle beam processing. The cell reduces the amount of gas required for processing, thereby allowing rapid introduction, exhaustion, and switching between gases and between processing and imaging modes. Maintaining the processes gases within the cell protects the sample chamber and column from contact with the gases. In some embodiments, the temperature of the cell walls and the sample can be controlled.

    摘要翻译： 本发明包括用于处理的方法和装置，即改变和成像高压带电粒子束系统中的样品。 本发明的实施例包括其中样品在高压带电粒子束处理期间被定位的单元。 电池减少处理所需的气体量，从而允许气体之间以及处理和成像模式之间的快速引入，耗尽和切换。 维持过程中的气体保护样品室和色谱柱不与气体接触。 在一些实施方案中，可以控制细胞壁和样品的温度。