Invention Grant
- Patent Title: High pressure charged particle beam system
- Patent Title (中): 高压带电粒子束系统
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Application No.: US12525908Application Date: 2008-02-06
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Publication No.: US08921811B2Publication Date: 2014-12-30
- Inventor: Milos Toth , William Ralph Knowles
- Applicant: Milos Toth , Rae Knowles
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Associates, PC
- Agent Michael O. Scheinberg
- International Application: PCT/US2008/053223 WO 20080206
- International Announcement: WO2008/098084 WO 20080814
- Main IPC: G01N23/00
- IPC: G01N23/00 ; H01J37/305 ; H01J37/301

Abstract:
The current invention includes methods and apparatuses for processing, that is, altering and imaging, a sample in a high pressure charged particle beam system. Embodiments of the invention include a cell in which the sample is positioned during high pressure charged particle beam processing. The cell reduces the amount of gas required for processing, thereby allowing rapid introduction, exhaustion, and switching between gases and between processing and imaging modes. Maintaining the processes gases within the cell protects the sample chamber and column from contact with the gases. In some embodiments, the temperature of the cell walls and the sample can be controlled.
Public/Granted literature
- US20110031394A1 HIGH PRESSURE CHARGED PARTICLE BEAM SYSTEM Public/Granted day:2011-02-10
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