Method of drawing-up a single crystal using a double-crucible apparatus
and double-crucible apparatus and double-crucible apparatus therefor
    51.
    发明授权
    Method of drawing-up a single crystal using a double-crucible apparatus and double-crucible apparatus and double-crucible apparatus therefor 失效
    使用双坩埚装置和双坩埚装置和双坩埚装置制作单晶的方法

    公开(公告)号:US5021118A

    公开(公告)日:1991-06-04

    申请号:US933924

    申请日:1986-11-24

    Inventor: Akihisa Kawasaki

    CPC classification number: C30B27/02 C30B15/12 Y10T117/1052

    Abstract: A method and apparatus for drawing up a single crystal using a double-crucible apparatus and a liquid capsule process. The inner crucible of the double-crucible apparatus is attached to the outer crucible. The presence of through holes in the lower portions of the inner crucible allow communication between the molten raw material in the inner and outer crucibles. Through holes in the upper portion of the inner crucible allow communication between the liquid sealing agent covering the molten raw material in the inner and outer crucibles. Single crystals having uniform impurity concentration and few defects are rapidly grown because the interface between the liquid sealing agent and molten raw material in the inner crucible is even with the same interface in the outer crucible.

    Abstract translation: 一种使用双坩埚装置和液体胶囊工艺制备单晶的方法和装置。 双坩埚装置的内坩埚附接到外坩埚。 在内坩埚的下部的通孔的存在允许内坩埚和外坩埚中的熔融原料之间的连通。 内坩埚上部的通孔允许覆盖内外坩埚中的熔融原料的液体密封剂之间的连通。 由于液体密封剂和内坩埚中的熔融原料之间的界面在外坩埚中具有相同的界面,所以具有均匀杂质浓度和少量缺陷的单晶是快速生长的。

    Apparatus and process for growing crystals of semiconductor materials
    52.
    发明授权
    Apparatus and process for growing crystals of semiconductor materials 失效
    用于生长半导体材料晶体的装置和工艺

    公开(公告)号:US5009862A

    公开(公告)日:1991-04-23

    申请号:US527887

    申请日:1990-05-23

    Abstract: An apparatus for melting a semiconductor material and growing a semiconductor crystal from the melted material includes a susceptor having a peripheral rim, a quartz crucible assembly for receiving the semiconductor material therein. The crucible assembly includes an outer crucible housed in and supported by the susceptor and an inner crucible adapted to be so placed within the outer crucible as to define a multi-wall structure. The apparatus also includes at least one fluid passage for permitting the melted material to flow between the inner and outer crucibles when the multi-wall structure is defined by the inner and outer crucibles, a holder for holding the inner crucible, a heater disposed so as to surround the susceptor for heating the material in the crucible assembly, and a drive mechanism operable to move at least one of the holder and the susceptor vertically between a coupled position where the holder is supported by the susceptor in such a manner that the inner crucible is so placed within the outer crucible as to define the multi-wall structure and a released position where the holder is disengaged from the susceptor in such a manner that the inner crucible is released from the outer crucible.There is also provided a process which may be conveniently carried out in the apparatus described above.

    Apparatus for manufacturing single silicon crystal
    53.
    发明授权
    Apparatus for manufacturing single silicon crystal 失效
    单晶硅制造装置

    公开(公告)号:US4957712A

    公开(公告)日:1990-09-18

    申请号:US457322

    申请日:1989-12-27

    CPC classification number: C30B15/12 Y10S117/90 Y10T117/1052

    Abstract: An apparatus for manufacturing a single silicon crystal comprises a quartz crucible accomodated into a graphite crucible, a partition member partitioning molten silicon material in the quartz crucible into a single silicon growing portion on the inner side and a material melting portion on the outer side, a heater for maintaining the molten silicon material in the single silicon growing portion at a temperature appropriate for growing the single silicon crystal and for supplying heat for melting the raw materials fed into the material melting portion, and small holes made in the partition member. The partition member is made of an opaque quartz glass. The material melting portion is replenished with the raw materials and single silicon crystal is pulled from the single silicon growing portion. Molton silicon material moves from the material melting portion into the single silicon growing portion through small holes made in the partition member.

    Method for growing single crystals of dissociative compound semiconductor
    54.
    发明授权
    Method for growing single crystals of dissociative compound semiconductor 失效
    生长离解化合物半导体单晶的方法

    公开(公告)号:US4750969A

    公开(公告)日:1988-06-14

    申请号:US878548

    申请日:1986-06-25

    CPC classification number: C30B15/00 C30B15/12 C30B27/02 C30B29/40 C30B29/42

    Abstract: A method for growing single crystals of a dissociative compound semiconductor which are pulled in an atmosphere of a gas of a volatile component of the dissociative compound filled in an inner chamber sealed within a growth apparatus is provided wherein the space of the inner chamber is divided into different parts by means of partition wall, which is disposed in the inner chamber and the lower part of which is immersed in a melt contained in a crucible, thereby high quality single crystals with a correct stoichiometric composition can be grown under the constant conditions of temperature and pressure without detrimental effects due to thermal convection in the crystal growth region and the melt. The partition wall may be made either of a monolithic structure or a composite structure capable of being divided into two parts, an upper member and a lower member like a float, the upper part of the lower member is vertically movably inserted into upper member.

    Abstract translation: 提供一种生长在分离化合物半导体中的单晶的方法,其在密封在生长装置中的填充在内腔中的解离化合物的挥发性成分的气体气氛中拉动,其中内室的空间被分成 不同部分通过分隔壁设置在内室中,其下部浸没在坩埚中的熔体中,从而可以在恒定的温度条件下生长具有正确化学计量组成的高质量单晶 并且由于晶体生长区和熔体中的热对流而没有不利影响的压力。 分隔壁可以由能够分成两部分的单块结构或复合结构制成,上部构件和下部构件如浮子一样,下部构件的上部可上下移动地插入上部构件。

    Cold crucible for melting and crystallizing non-metallic inorganic
compounds
    55.
    发明授权
    Cold crucible for melting and crystallizing non-metallic inorganic compounds 失效
    用于熔化和结晶非金属无机化合物的冷坩埚

    公开(公告)号:US4687646A

    公开(公告)日:1987-08-18

    申请号:US606019

    申请日:1984-05-02

    CPC classification number: C30B11/003 H05B6/24

    Abstract: A cold crucible for melting and crystallizing non-metallic inorganic compounds having a cooled crucible wall in the form of metal pipes through which cooling medium flows which are in mechanical connection with the bottom of the crucible through which cooling medium also flows, and having an induction coil which surrounds the wall of the crucible and via which high frequency energy can be coupled in the contents of the crucible and having a second induction coil which can be controlled independently of the induction coil surrounding the wall of the crucible and which is provided below the bottom of the crucible, and having a crucible bottom consisting of a dielectric material.

    Abstract translation: 一种用于熔化和结晶非金属无机化合物的冷坩埚,其具有金属管形式的冷却坩埚壁,冷却介质流经冷却坩埚壁,其与冷却介质也流过的坩埚底部机械连接,并具有感应 线圈,其围绕坩埚的壁并且可以在坩埚的内容物中耦合高频能量并具有第二感应线圈,该第二感应线圈可以独立于围绕坩埚壁的感应线圈被控制,并且设置在坩埚的下方 并且具有由电介质材料构成的坩埚底部。

    Continuous replenishment of molten semiconductor in a
Czochralski-process, single-crystal-growing furnace
    57.
    发明授权
    Continuous replenishment of molten semiconductor in a Czochralski-process, single-crystal-growing furnace 失效
    在Czochralski工艺,单晶生长炉中连续补充熔融半导体

    公开(公告)号:US4282184A

    公开(公告)日:1981-08-04

    申请号:US83169

    申请日:1979-10-09

    Abstract: A replenishment crucible is mounted adjacent the usual drawing crucible, from which a monocrystalline boule is drawn according to the Czochralski method. A siphon tube for molten semiconductor transfer extends from the replenishment crucible to the drawing crucible. Each crucible is enclosed within its own hermetic shell and is provided with its own heater. The siphon tube is initially filled with molten semiconductor by raising the inert atmospheric pressure in the shell surrounding the replenishment crucible above that surrounding the drawing crucible. Thereafter, adjustment of the level of molten semiconductor in the drawing crucible may be achieved by adjusting the level in either crucible, since the siphon tube will establish the same level in both crucibles. For continuous processing, solid semiconductor may be added to and melted in the replenishment crucible during the process of drawing crystals from the drawing crucible. A constant liquid level of melted semiconductor is maintained in the system by an optical monitoring device and any of several electromechanical controls of the rate of replenishment or crucible height.

    Abstract translation: 补充坩埚安装在通常的绘图坩埚附近,根据Czochralski法从中取出单晶棒。 用于熔融半导体传输的虹吸管从补充坩埚延伸到绘图坩埚。 每个坩埚都封闭在自己的密封外壳中,并设有自己的加热器。 虹吸管最初通过在围绕着绘图坩埚的补充坩埚周围的壳体中提高惰性大气压力来填充熔融半导体。 此后,由于虹吸管将在两个坩埚中建立相同的水平,所以可以通过调节坩埚中的液位来实现拉制坩埚中的熔融半导体的水平的调节。 对于连续加工,在从拉制坩埚中取出晶体的过程中,固体半导体可以加入并熔化在补充坩埚中。 通过光学监视装置和补充速率或坩埚高度的几个机电控制中的任何一个,在系统中维持熔融半导体的恒定液位。

    Apparatus for obtaining a dross-free crystalline growth melt
    58.
    发明授权
    Apparatus for obtaining a dross-free crystalline growth melt 失效
    用于获得无水晶体生长熔体的装置

    公开(公告)号:US3567397A

    公开(公告)日:1971-03-02

    申请号:US3567397D

    申请日:1967-10-11

    Inventor: O'HARA SYDNEY

    CPC classification number: C30B15/12 Y10S117/90 Y10T117/1004 Y10T117/1052

    Abstract: THIS INVENTION PROVIDES APPARATUS FOR GROWING WEBBED DENDRITIC SEMICONDUCTOR MATERIAL FROM A MELT SUBSTANTIALLY FREE OF ANY DROSS ON THE SURFACE OF THE MELT. THE APPARATUS COMPRISES A TWO COMPONENT CRUCIBLE, CONSISTING OF AN INNER SHELL AND AN OUTER SHELL. THE MELT IS FORMED IN THE OUTER SHELL. THE INNER SHELL, AXIALLY ALIGNED WITH THE OUTER SHELL, HAS A VERTICAL DISPLACEMENT MEANS ATTACHED TO IT. THE INNER SHELL IS LOWERED INTO THE MELT OF THE OUTER SHELL AND DROSS FREE MELT IS FORCED THROUGH AN APERTURE IN THE APEX OF A CAVITY OF THE INNER SHELL FORMING A POOL OF DROSS FREE MELT THEREIN. FROM THIS DROSS FREE MELT THE WEBBED DENDRITIC SEMICONDUCTOR MATERIAL IS GROWN.

    CZ CRUCIBLE
    60.
    发明公开
    CZ CRUCIBLE 审中-公开

    公开(公告)号:US20230265583A1

    公开(公告)日:2023-08-24

    申请号:US18018165

    申请日:2021-07-02

    CPC classification number: C30B35/002 C30B29/06 C30B15/12

    Abstract: A CZ crucible for growing a single crystal silicon ingot by a CZ method, where the CZ crucible includes a closed-end cylindrical graphite crucible and a closed-end cylindrical quartz glass crucible disposed inside the graphite crucible, and the CZ crucible includes a gap between an inner surface of a bottom portion of the graphite crucible and an outer surface of a bottom portion of the quartz glass crucible on a central axis of the CZ crucible, the gap keeping the inner surface of the bottom portion of the graphite crucible and the outer surface of the bottom portion of the quartz glass crucible contactless with each other. This provides a CZ crucible that ensures that a closed-end cylindrical quartz glass crucible for growing a single crystal silicon ingot by a CZ method can be stable and self-supporting when disposed inside a closed-end cylindrical graphite crucible.

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