公开(公告)号：US20210343500A1

公开(公告)日：2021-11-04

申请号：US17378327

申请日：2021-07-16

Applicant: APPLIED Materials, Inc.

Inventor： Costel Biloiu ,  Michael Honan ,  Robert B. Vopat ,  David Blahnik ,  Charles T. Carlson ,  Frank Sinclair ,  Paul Murphy

IPC: H01J37/30 ,  H01J37/317 ,  H01J23/213 ,  H01J23/18 ,  H01J25/02 ,  H01J25/58 ,  H01J37/32 ,  H01P7/00 ,  H01P7/08 ,  H01P7/06

Abstract: Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.

公开(公告)号：US11094504B2

公开(公告)日：2021-08-17

申请号：US16734746

申请日：2020-01-06

Applicant: APPLIED Materials, Inc.

Inventor： Costel Biloiu ,  Michael Honan ,  Robert B Vopat ,  David Blahnik ,  Charles T. Carlson ,  Frank Sinclair ,  Paul Murphy

IPC: H01J37/30 ,  H01J37/317 ,  H01J23/213 ,  H01J23/18 ,  H01J25/02 ,  H01J25/58 ,  H01J37/32 ,  H01P7/00 ,  H01P7/08 ,  H01P7/06

Abstract: Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.

公开(公告)号：US11056319B2

公开(公告)日：2021-07-06

申请号：US16524646

申请日：2019-07-29

Applicant: APPLIED Materials, Inc.

Inventor： Costel Biloiu ,  Appu Naveen Thomas ,  Tyler Rockwell ,  Frank Sinclair ,  Christopher Campbell

IPC: H01J37/32 ,  H01J37/08

Abstract: An ion beam processing apparatus may include a plasma chamber, and a plasma plate, disposed alongside the plasma chamber, where the plasma plate defines a first extraction aperture. The apparatus may include a beam blocker, disposed within the plasma chamber and facing the extraction aperture. The apparatus may further include a non-planar electrode, disposed adjacent the beam blocker and outside of the plasma chamber; and an extraction plate, disposed outside the plasma plate, and defining a second extraction aperture, aligned with the first extraction aperture.

公开(公告)号：US10763072B1

公开(公告)日：2020-09-01

申请号：US16354638

申请日：2019-03-15

Applicant: APPLIED Materials, Inc.

Inventor： Frank Sinclair ,  Costel Biloiu ,  Joseph C. Olson ,  Alexandre Likhanskii

IPC: H01J37/05 ,  H01J37/317 ,  H01J37/147

Abstract: An apparatus may include a housing including an entrance aperture, to receive an ion beam. The apparatus may include an exit aperture, disposed in the housing, downstream to the entrance aperture, the entrance aperture and the exit aperture defining a beam axis, extending therebetween. The apparatus may include an electrodynamic mass analysis assembly disposed in the housing and comprising an upper electrode assembly, disposed above the beam axis, and a lower electrode assembly, disposed below the beam axis. The apparatus may include an AC voltage assembly, electrically coupled to the upper electrode assembly and the lower electrode assembly, wherein the upper electrode assembly is arranged to receive an AC signal from the AC voltage assembly at a first phase angle, and wherein the lower electrode assembly is arranged to receive the AC signal at a second phase angle, the second phase angle 180 degrees shifted from the first phase angle.

公开(公告)号：US20200161077A1

公开(公告)日：2020-05-21

申请号：US16197251

申请日：2018-11-20

Applicant: APPLIED Materials, Inc.

Inventor： Alexandre Likhanskii ,  Frank Sinclair ,  Shengwu Chang ,  Eric D. Hermanson ,  Nevin H. Clay

IPC: H01J37/05 ,  H01J37/12 ,  H01J37/08 ,  H01J37/317 ,  H01J37/147

Abstract: An apparatus may include a main chamber, an entrance tunnel, having an entrance axis extending into the main chamber, and an exit tunnel, connected to the main chamber and defining an exit axis, wherein the entrance tunnel and the exit tunnel define a beam bend of less than 25 degrees therebetween. The apparatus may include an electrode assembly, disposed in the main chamber, on a lower side of the exit tunnel; and a catch assembly, disposed within the main chamber, in a line of sight from an exterior aperture of the exit tunnel.

公开(公告)号：US12144101B2

公开(公告)日：2024-11-12

申请号：US18373128

申请日：2023-09-26

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  David T. Blahnik ,  Wai-Ming Tam ,  Charles T. Carlson ,  Frank Sinclair

IPC: H05H7/02 ,  H05H7/12 ,  H05H9/00

Abstract: An exciter for a high frequency resonator. The exciter may include an exciter coil inner portion, extending along an exciter axis, an exciter coil loop, disposed at a distal end of the exciter coil inner portion. The exciter may also include a drive mechanism, including at least a rotation component to rotate the exciter coil loop around the exciter axis.

公开(公告)号：US20240266174A1

公开(公告)日：2024-08-08

申请号：US18431870

申请日：2024-02-02

Applicant: Applied Materials, Inc.

Inventor： Wonjae Lee ,  Pradeep Kumar Subrahmanyan ,  D. Jeffrey Lischer ,  Frank Sinclair

IPC: H01L21/265 ,  H01L21/66 ,  H01L21/67

CPC classification number: H01L21/265 ,  H01L21/67288 ,  H01L22/12

Abstract: Disclosed systems and techniques are directed to correct an out-of-plane deformation (OPD) of a substrate. The techniques include obtaining, using optical inspection data, a profile of the out-of-plane deformation of the substrate and identifying, using the obtained profile, one or more parameters characterizing a saddle-shaped stress of the substrate. The techniques further include computing, using the one or more identified parameters, one or more characteristics of a stress-compensation layer (SCL) for the substrate and causing the SCL to be deposited on the substrate. The techniques further include causing a stress-mitigation beam to be applied to a plurality of edge regions of the SCL, wherein settings of the stress-mitigation beam are determined using the one or more identified parameters.

公开(公告)号：US20240222072A1

公开(公告)日：2024-07-04

申请号：US18091041

申请日：2022-12-29

Applicant: Applied Materials, Inc.

Inventor： Stephen Krause ,  Gary J. Rosen ,  Matthew Gaucher ,  Jay T. Scheuer ,  Frank Sinclair

IPC: H01J37/317 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/3171 ,  H01J37/20 ,  H01J37/244

Abstract: An ion implanter to facilitate channeling of an ion beam into a crystalline structure of a workpiece is disclosed. The ion implanter comprises an ion source to generate an ion beam, a platen to support the workpiece having the crystalline structure, an Xray source to generate an Xray beam, wherein at least a portion of the Xray beam impacts the workpiece to produce diffracted Xrays, an Xray detector positioned to receive the diffracted Xrays, and a controller, in communication with the Xray source, the platen, and the Xray detector. The controller contains instructions, which enable the ion implanter to perform a rocking curve test after the workpiece is disposed on the platen and calculate an orientation of the platen for an ion implant process based on a result of the rocking curve test to facilitate channeling of the ion beam into the crystalline structure of the workpiece.

公开(公告)号：US11818830B2

公开(公告)日：2023-11-14

申请号：US17163251

申请日：2021-01-29

Applicant: Applied Materials, Inc.

Inventor： Frank Sinclair ,  Wai-Ming Tam ,  Costel Biloiu ,  William Davis Lee

IPC: H05H9/04 ,  H01J37/317 ,  H05H7/22 ,  H05H7/02

CPC classification number: H05H9/04 ,  H01J37/3171 ,  H05H7/02 ,  H05H7/22 ,  H01J2237/04732 ,  H05H2007/222 ,  H05H2007/227

Abstract: An apparatus may include a drift tube assembly, the drift tube assembly defining a triple gap configuration, and arranged to accelerate and transmit an ion beam along abeam path. The apparatus may include a resonator, to output an RF signal to the drift tube assembly, and an RF quadrupole triplet, connected to the drift tube assembly, and arranged circumferentially around the beam path.

公开(公告)号：US11710617B2

公开(公告)日：2023-07-25

申请号：US17378327

申请日：2021-07-16

Applicant: APPLIED Materials, Inc.

Inventor： Costel Biloiu ,  Michael Honan ,  Robert B. Vopat ,  David Blahnik ,  Charles T. Carlson ,  Frank Sinclair ,  Paul Murphy

IPC: H01J23/18 ,  H01J37/30 ,  H01J37/317

CPC classification number: H01J37/3007 ,  H01J23/18 ,  H01J37/3171 ,  H01J2237/0473

Abstract: Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.