Abstract:
A method of fabricating an electrically programmable fuse buried under quartz and layers of polyimide with a specific structure to enhance its "thermal" capabilities. The fuse is designed to "blow" and cool off quickly so as not to cause damage to areas above and surrounding the fuse. A passivation layer is added above the fuse to act as a heat sink and absorb and redistribute the heat generated from one localized area to a broader and cooler area. The materials used for the fuse and the heat sink are selected to be compatible with both oxide and polyimide personalization schemes. Modeling of the fuse enables optimizing the characteristics of the fuse, particularly to transmit to the surface of the passivation layer the thermal wave created during programming of the fuse.
Abstract:
A method of compensating grain boundaries or dislocations causing interstices to form particularly in polycrystalline semiconductor materials is disclosed which comprises selectively diffusing opposite impurity-type donor semiconductor material into the interstice to thereby reduce the conductivity of the interstice.
Abstract:
A method of producing semiconductor components, particularly solar elements, in which a P- or N-semiconductor chip is subjected to an oxidation step prior to formation of the device PN junction, such that the external surface and internal grain boundaries of the wafer are covered by a passivating oxide layer. Thereafter, the oxide layer on at least a portion of the semiconductor chip is removed, and at least one PN junction is formed in the chip.