公开(公告)号：US06710848B2

公开(公告)日：2004-03-23

申请号：US09941668

申请日：2001-08-30

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： G03B2742

CPC分类号： G03F9/7003 ,  G03F7/70258 ,  G03F7/70825 ,  G03F7/70883

摘要： An imagery characteristic is corrected by changing the position and/or orientation of a reticle or lens elements of a projection lens system. Correction of the imagery characteristic, however, causes displacement of the projected pattern image of the reticle. The relation between the driving amount of the lens elements and reticle and the lateral displacement of the center of the pattern image of the reticle is stored as a table in advance. When the lens elements and/or the reticle are driven, lateral displacement of the pattern image can be obtained by accessing the table. Alternatively, the lateral displacement can be determined using a base-line amount corresponding to a distance between a detection center of a substrate position detector and a center of the projected image. Once the pattern image displacement is determined, the substrate can be accurately positioned. In another arrangement, a mask alignment method prevents positional shift of a projected image of a mask pattern even if the projection magnification of the projection optical system is changed.

摘要翻译： 通过改变投影透镜系统的掩模版或透镜元件的位置和/或取向来校正图像特性。 然而，图像特征的校正导致标线的投影图案图像的位移。 透镜元件和掩模版的驱动量与标线图案的图案图像的中心的横向位移之间的关系作为表预先存储。 当透镜元件和/或光罩被驱动时，可以通过访问桌子来获得图案图像的横向位移。 或者，可以使用对应于基板位置检测器的检测中心与投影图像的中心之间的距离的基线量来确定横向位移。 一旦确定了图案图像位移，就可以准确地定位基板。 在另一种布置中，即使投影光学系统的投影倍率改变，掩模对准方法也可以防止掩模图案的投影图像的位置偏移。

公开(公告)号：US06496257B1

公开(公告)日：2002-12-17

申请号：US09577020

申请日：2000-05-22

申请人： Tetsuo Taniguchi ,  Masayuki Murayama

发明人： Tetsuo Taniguchi ,  Masayuki Murayama

IPC分类号： G01N2188

CPC分类号： G03F7/70916 ,  G03F7/2002 ,  G03F7/70241 ,  G03F7/70866 ,  G03F7/70925

摘要： Pattern transfer can be performed with improved exposure accuracy, by reducing the contamination caused by the attachment of a photosensitive agent or the like on an optical member of a projection optical member or the like. The pattern transfer onto a substrate W is performed after cleaning the objective member OB disposed at a given position by a cleaning device 8 at the time when pattern transfer is not performed, or while making flow a gas in a space between the substrate W and the optical member OB by a contamination protection device 98. Alternatively, the optical member OB disposed at a given position is inspected for contamination by a contamination inspection device 84 at the time when pattern transfer is not performed, and the pattern transfer or the cleaning or replacement of the optical member is performed based on the result.

摘要翻译： 可以通过降低由于将光敏剂等附着在投影光学元件等的光学构件上引起的污染而以更好的曝光精度进行图案转印。 在不进行图案转印时，通过清洁装置8清洁设置在给定位置的目标构件OB之后，或者在将衬底W和衬底W之间的空间中的气体流动的同时， 通过污染保护装置98进行光学构件OB.或者，在不执行图案转印时，检查布置在给定位置处的光学构件OB被污染检查装置84污染，并且图案转印或清洁或更换 基于该结果来执行光学部件。

公开(公告)号：US06333776B1

公开(公告)日：2001-12-25

申请号：US09184877

申请日：1998-11-03

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： G03B2768

CPC分类号： G03F7/70858 ,  G03F7/70091 ,  G03F7/70241 ,  G03F7/70258 ,  G03F7/70308 ,  G03F7/70333 ,  G03F7/70358

摘要： A transparent correcting plate is disposed between a reticle and a projection optical system. The correcting plate can be selectively inserted and withdrawn by a changing device. The correcting plate can be changed for another correcting plate stored in a storage unit according to need. The correcting plate has been polished so as to be capable of correcting random distortion, and thus it corrects random distortion produced by a projection exposure apparatus in which it is used. Further, a correcting plate is selected according to image distortion characteristics of a projection exposure apparatus used in the preceding exposure process or a projection exposure apparatus to be used in the subsequent process, thereby correcting the distortion of a projected image, and thus improving the overlay accuracy between two layers.

摘要翻译： 透明校正板设置在光罩和投影光学系统之间。 校正板可以通过改变装置选择性地插入和取出。 根据需要可以对存储在存储单元中的另一个校正板进行修正。 校正板已经被抛光，以便能够校正随机变形，从而校正由其使用的投影曝光设备产生的随机变形。 此外，根据在以前的曝光处理中使用的投影曝光装置的图像失真特性或将在随后的处理中使用的投影曝光装置来选择校正板，从而校正投影图像的失真，从而改善叠加 两层之间的精度。

公开(公告)号：US5945239A

公开(公告)日：1999-08-31

申请号：US811465

申请日：1997-03-03

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F7/706 ,  G03F7/70258 ,  G03F7/70641 ,  G03F7/70691

摘要： Methods and apparatus are disclosed for correcting distortion of a projection image obtained with a projection-exposure apparatus (such as a stepper) having a projection-optical system. Distortion is corrected even when the distortion of the projection image is not linear relative to depth in the optical-axis direction of the projection-optical system. Any distortion of the projection image is detected at a measurement surface and while the projection image is defocused in a direction along the optical axis relative to an image surface of the projection-optical system. Based on the detection results, the projection-optical system is adjusted to change the distortion relative to the converging surface of the projection-optical system.

摘要翻译： 公开了用于校正由具有投影光学系统的投影曝光装置（例如步进器）获得的投影图像的变形的方法和装置。 即使当投影图像的失真相对于投影光学系统的光轴方向上的深度不是线性时，失真也被校正。 在测量表面上检测到投影图像的任何失真，并且在投影图像相对于投影光学系统的图像表面沿着光轴的方向散焦。 基于检测结果，调整投影光学系统以相对于投影光学系统的会聚表面改变变形。

公开(公告)号：US5661546A

公开(公告)日：1997-08-26

申请号：US306899

申请日：1994-09-16

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/70058 ,  G03F7/70241 ,  G03F7/70258 ,  G03F7/70883

摘要： While a mask is illuminated under a predetermined illumination condition to transfer the image of the pattern of the mask to a substrate, the amount of imaging characteristic change of a projection optical system is calculated by the use of calculation parameters corresponding to the illumination condition, and the imaging characteristics are adjusted based on the calculated amount. Further, when the pattern on the mask or the illumination condition is changed, the amount of imaging characteristic change is calculated based on an amount of energy stored in the projection optical system prior to the changing of the condition, pattern exposure is started immediately after the changing of the condition, and the imaging characteristics are adjusted based on the calculated amount.

摘要翻译： 当在预定照明条件下照亮掩模以将掩模图案的图像转印到基板上时，通过使用对应于照明条件的计算参数来计算投影光学系统的成像特性变化量，以及 基于计算量来调整成像特性。 此外，当掩模上的图案或照明条件改变时，基于在改变条件之前存储在投影光学系统中的能量的量来计算成像特性变化量，在紧接着的情况下立即开始图案曝光 基于所计算的量来调整条件的变化和成像特性。

公开(公告)号：US20060007415A1

公开(公告)日：2006-01-12

申请号：US11204110

申请日：2005-08-16

申请人： Junichi Kosugi ,  Tetsuo Taniguchi ,  Naoyuki Kobayashi ,  Yoshitomo Nagahashi

发明人： Junichi Kosugi ,  Tetsuo Taniguchi ,  Naoyuki Kobayashi ,  Yoshitomo Nagahashi

IPC分类号： G03B27/52

CPC分类号： G03F7/70991 ,  G03F7/70716 ,  G03F7/70875

摘要： The exposure system of the present invention inhibits baseline shift by carrying out temperature control as required by each composite equipment. This exposure system has a first control system that that sets the temperature of a first liquid, and controls the temperature of an object by circulating the first liquid for which the temperature has been set through at least one object of a projection optics and a substrate stage, and a second control system that sets the temperature of a second liquid independent from the first control system, and controls the temperature of a reticle stage by circulating the second liquid for which the temperature has been set through the reticle stage. The first and second control systems have mutually different setting capacities with respect to the size of the temperature range when setting the temperatures of the liquids.

摘要翻译： 本发明的曝光系统通过根据每个复合设备的要求进行温度控制来抑制基线偏移。 该曝光系统具有第一控制系统，其设定第一液体的温度，并且通过将已经设定了温度的第一液体循环通过投影光学元件和基板台的至少一个物体来控制物体的温度 以及与第一控制系统独立地设定第二液体的温度的第二控制系统，并且通过使已经设定了温度的第二液体循环通过标线片台来控制标线片台的温度。 当设定液体的温度时，第一和第二控制系统相对于温度范围的尺寸具有相互不同的设定能力。

公开(公告)号：US06826053B2

公开(公告)日：2004-11-30

申请号：US10408064

申请日：2003-04-05

申请人： Mitsuhide Kato ,  Koji Tanaka ,  Tetsuo Taniguchi

发明人： Mitsuhide Kato ,  Koji Tanaka ,  Tetsuo Taniguchi

IPC分类号： H05K720

CPC分类号： H01L23/562 ,  H01L23/544 ,  H01L2223/54473 ,  H01L2224/16225 ,  H01L2224/32245 ,  H01L2224/73253 ,  H01L2924/01322 ,  H01L2924/19105 ,  H01L2924/3025 ,  H05K1/0218 ,  H05K1/023 ,  H05K1/181 ,  H05K3/3421 ,  H05K2201/0969 ,  H05K2201/10371 ,  H05K2201/10522 ,  H05K2201/10537 ,  H05K2201/10636 ,  Y02P70/611 ,  H01L2924/00

摘要： An electronic device includes a wiring substrate, an electronic component mounted on the wiring substrate by soldering, and a case fixed to the wiring substrate so as to cover the electronic component. The case is fixed to the wiring substrate via soldering, and the case and the electronic component are adhered to each other with an adhesive resin supplied through an opening provided in the upper surface of the case. The adhesive resin is applied so as not to contact the wiring substrate such that interface separation does not occur between the adhesive resin and the wiring substrate even when the solder for mounting the electronic component on the wiring substrate is melted and expanded in a solder reflow process. As a result, the generation of short circuiting between terminal electrodes of the electronic component, which is caused by the solder flowing in the portion of the interface separation, is prevented.

摘要翻译： 电子设备包括布线基板，通过焊接安装在布线基板上的电子部件和固定到布线基板以覆盖电子部件的壳体。 通过焊接将壳体固定到布线基板，并且壳体和电子部件通过设置在壳体的上表面中的开口供给的粘合树脂彼此粘合。 为了不与接线基板接触，施加粘合树脂，使得即使在焊料回流工艺中将用于安装电子部件的焊料在布线基板上进行熔融膨胀，也不会在粘合树脂和布线基板之间进行界面分离 。 结果，防止了在界面分离的部分中流动的焊料引起的电子部件的端子电极之间的短路的产生。

公开(公告)号：US06549266B1

公开(公告)日：2003-04-15

申请号：US09346704

申请日：1999-07-02

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： G03B2742

CPC分类号： G03F7/70091 ,  G03F7/70241 ,  G03F7/7025 ,  G03F7/70891

摘要： An exposure apparatus comprises an illumination optical system for irradiating an illuminating light onto a mask having a plurality of patterns for which pattern forming conditions differ from one another, and a projection optical system for projecting images of said plurality of patterns onto a photosensitive substrate, a device for compensating imaging errors of pattern images to be projected onto said substrate, and a control system for controlling the operation of said compensating device in accordance with imaging errors of said plurality of pattern images so that said plurality of pattern images may be projected in specified imaging characteristics.

摘要翻译： 曝光装置包括照明光学系统，用于将照明光照射到具有图案形成条件彼此不同的多个图案的掩模上;以及投影光学系统，用于将所述多个图案的图像投影到感光基板上， 用于补偿要投影到所述基板上的图案图像的成像误差的装置，以及用于根据所述多个图案图像的成像误差来控制所述补偿装置的操作的控制系统，使得可以将所述多个图案图像投影到指定的 成像特性。

公开(公告)号：US5710620A

公开(公告)日：1998-01-20

申请号：US505996

申请日：1995-07-24

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： G03F7/20 ,  G03B27/32 ,  G03F7/207 ,  G03F9/02 ,  H01L21/027 ,  H01L21/30 ,  G03B27/42

CPC分类号： G03F7/70091 ,  G03F7/70241 ,  G03F7/7025 ,  G03F7/70891

摘要： An exposure apparatus comprises an illumination optical system for irradiating an illuminating light onto a mask having a plurality of patterns for which pattern forming conditions differ from one another, and a projection optical system for projecting images of said plurality of patterns onto a photosensitive substrate, a device for compensating imaging errors of pattern images to be projected onto said substrate, and a control system for controlling the operation of said compensating device in accordance with imaging errors of said plurality of pattern images so that said plurality of pattern images may be projected in specified imaging characteristics.

公开(公告)号：US5140497A

公开(公告)日：1992-08-18

申请号：US700712

申请日：1991-05-16

申请人： Noboru Kato ,  Emiko Nogome ,  Hisatake Okamura ,  Teruhisa Tsuru ,  Tetsuo Taniguchi ,  Ken Tonegawa

发明人： Noboru Kato ,  Emiko Nogome ,  Hisatake Okamura ,  Teruhisa Tsuru ,  Tetsuo Taniguchi ,  Ken Tonegawa

IPC分类号： H01G4/12 ,  H01F27/00 ,  H01G4/255 ,  H01G4/40 ,  H03H3/00 ,  H03H5/02 ,  H03H7/01 ,  H03H7/09

CPC分类号： H03H7/1783 ,  H03H3/00 ,  H03H7/09 ,  H03H7/1708 ,  H03H7/1733 ,  H03H2001/0085 ,  Y10T29/435

摘要： A composite electronic component containing at least two circuit elements including an inductor. The composite electronic component comprises a component body including a laminated body of a plurality of non-conductive layers, an inductor electrode formed between either two adjacent non-conductive layers of the laminated body, a capacitor electrode formed between another two adjacent non-conductive layers of the laminated body, two shield electrodes formed on both surfaces of the laminated body, one of the shield electrodes being opposed to the capacitor electrode to constitute a capacitor, a frequency adjusting capacitor electrode which is formed outside at least one of the shield electrodes through a non-conductive layer and has a smaller area than the capacitor electrode, and a non-conductive protect layer, formed of a non-malleable material, for covering an outer surface of the frequency adjusting capacitor electrode and is to be trimmed along with the frequency adjusting capacitor electrode for frequency adjusting; and at least two connecting electrodes including a first connecting electrode connecting the capacitor electrode to the frequency adjusting capacitor electrode and a second connecting electrode connecting the two shield electrodes to each other.

摘要翻译： 包含至少两个包括电感器的电路元件的复合电子部件。 复合电子部件包括：包括多个非导电层的层叠体的组件体，形成在层叠体的两个相邻的非导电层之间的电感器电极，形成在另一个相邻的非导电层之间的电容器电极 层叠体的两个屏蔽电极，形成在层叠体的两面的两个屏蔽电极，其中一个屏蔽电极与电容器电极相对构成电容器，频率调节电容器电极形成在至少一个屏蔽电极之间的通过 非导电层并且具有比电容器电极更小的面积，以及由不可延展材料形成的用于覆盖调频电容器电极的外表面的非导电保护层，并且与 频率调节用电容电极; 以及至少两个连接电极，包括将电容器电极连接到频率调节电容器电极的第一连接电极和将两个屏蔽电极彼此连接的第二连接电极。