PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

    公开(公告)号:US20230230815A1

    公开(公告)日:2023-07-20

    申请号:US18188095

    申请日:2023-03-22

    Abstract: A plasma processing apparatus includes a chamber providing a space for processing a substrate, a substrate stage configured to support the substrate within the chamber and including a lower electrode, an upper electrode facing the lower electrode, a focus ring in or on an upper peripheral region of the substrate stage to surround the substrate, and a plasma adjustment assembly in at least one of a first position between the upper electrode and the lower electrode and a second position between the focus ring and the lower electrode, the plasma adjustment assembly including a photoreactive material layer and a plurality of light sources configured to irradiate light onto a local region of the photoreactive material layer. A capacitance of the local region is changed as the light is irradiated to the local region.

    PLASMA CONTROL APPARATUS AND PLASMA PROCESSING SYSTEM

    公开(公告)号:US20230187189A1

    公开(公告)日:2023-06-15

    申请号:US17864541

    申请日:2022-07-14

    Abstract: a plasma processing system includes a chamber providing a space for performing a plasma process on a substrate, a substrate stage having a seating surface for supporting the substrate, the substrate stage having a circular electrode and at least one annular electrode therein, an upper electrode provided over the substrate, a power supply configured to supply source power to the upper electrode, a first capacitance variator configured to vary a capacitance of the circular electrode based on an inputted first control signal, a second capacitance variator configured to vary a capacitance of the annular electrode based on an inputted second control signal, a sensor connected to the first and second capacitance variators respectively and configured to acquire electrical signal data of the circular electrode and the at least one annular electrode, and a controller configured to determine a thin film profile in first and second regions of the substrate corresponding to the circular electrode and the annular electrode respectively based on the electrical signal data obtained from the sensor, the controller being configured to output the first and second control signals respectively in order to obtain a desired thin film profile.

    RF GENERATING DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS INCLUDING THE SAME

    公开(公告)号:US20230118000A1

    公开(公告)日:2023-04-20

    申请号:US17970242

    申请日:2022-10-20

    Abstract: A radio frequency (RF) generating device for generating RF output signals is provided. The RF generating device includes: a controller configured to generate an RF control signal and a gain control signal; a plurality of RF signal generators, each RF signal generator being configured to generate an RF signal having at least one of a frequency and a phase determined based on the RF control signal; a plurality of RF amplification modules, each RF amplification module being configured to receive the RF signal generated by a corresponding RF signal generator and generate an RF amplification signal by controlling a gain of the RF signal based on the gain control signal; an RF switch module configured to select at least one of the RF amplification signals generated by the RF amplification modules and generate an RF output signal in a form of a multi-level pulse based on the selected at least one of the RF amplification signals; and an impedance converter connected to an electrode of an external load and configured to convert a load impedance into a target impedance having a target range, the load impedance being an impedance of the external load.

    Substrate processing apparatus
    45.
    发明授权

    公开(公告)号:US11538697B2

    公开(公告)日:2022-12-27

    申请号:US17016881

    申请日:2020-09-10

    Abstract: A substrate processing apparatus, including a processing chamber including a first internal space and a second internal space arranged in a vertical direction, the first internal space being configured to receive process gas to generate plasma; an induction electrode configured to divide the processing chamber, and having a plurality of through-holes arranged to connect the first internal space and the second internal space, wherein the plurality of through-holes are configured to induce an ion beam extracted from ions included in the plasma generated in the first internal space; a radical supply located in the second internal space, and including a reservoir configured to receive chemical liquid in which an object to be processed is immersed, and a lower electrode configured to apply nanopulses to the reservoir to generate radicals from the chemical liquid; and a chemical liquid supply configured to supply the chemical liquid to the reservoir.

    DISPLAY APPARATUS AND CONTROL METHOD THEREOF

    公开(公告)号:US20220270562A1

    公开(公告)日:2022-08-25

    申请号:US17742992

    申请日:2022-05-12

    Abstract: A display apparatus includes a liquid crystal panel, a power supply, a backlight unit including a plurality of sub-blocks configured to radiate light to the liquid crystal panel, and a controller configured to determine a peak voltage and a source voltage supplied to each of the plurality of sub-blocks. Each of the plurality of sub-blocks includes a first switching element configured to receive the peak voltage as a gate voltage, and a second switching element including a drain terminal connected to a source terminal of the first switching element, the second switching element configured to receive an amount of charges corresponding to the source voltage through a gate terminal.

    DISPLAY APPARATUS AND LIGHT SOURCE DEVICE THEREOF

    公开(公告)号:US20220260877A1

    公开(公告)日:2022-08-18

    申请号:US17733661

    申请日:2022-04-29

    Abstract: A display apparatus and light source device thereof are provided. The light source device includes an optical dome having a specifically defined shape to be able to maintain an optical profile of a light source. According to the disclosure, a display apparatus includes a printed circuit board (PCB), a light emitting diode (LED) chip mounted on the PCB and configured to emit light, an optical dome formed to enclose the LED chip by being dispensed on the LED chip, and a liquid crystal panel configured to block or pass light output from the LED chip, wherein the optical dome may be formed to satisfy 1.70

    Display apparatus and light source device thereof

    公开(公告)号:US11262620B1

    公开(公告)日:2022-03-01

    申请号:US17340521

    申请日:2021-06-07

    Abstract: Disclosed is a display apparatus and light source device which includes an optical dome having a specifically defined shape to be able to maintain an optical profile of a light source. A display apparatus includes a printed circuit board (PCB), a light emitting diode (LED) chip mounted on the PCB and emitting light, an optical dome formed to enclose the LED chip by being dispensed on the LED chip, a liquid crystal panel blocking or passing light output from the LED chip, and an optical film arranged between the LED chip and the liquid crystal panel, wherein a ratio of height of the optical dome to a diameter of a bottom surface of the optical dome may be 0.25 to 0.31.

    Display apparatus
    50.
    发明授权

    公开(公告)号:US12230746B2

    公开(公告)日:2025-02-18

    申请号:US18195534

    申请日:2023-05-10

    Abstract: Disclosed herein is a display apparatus. The display apparatus includes: a liquid crystal panel; and a backlight unit configured to emit light to the liquid crystal panel. The backlight unit includes: a substrate extending along a first direction; a light emitting diode provided on the substrate; a refractive cover provided on the light emitting diode to refract light emitted from the light emitting diode; and a lens provided on the substrate and the refractive cover, the lens comprising a bottom surface having a first length in the first direction that is less than a second length in a second direction perpendicular to the first direction.

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