公开(公告)号：US20180100796A1

公开(公告)日：2018-04-12

申请号：US15836160

申请日：2017-12-08

Applicant: KLA-Tencor Corporation

Inventor： Hidong Kwak ,  John Lesoine ,  Malik Sadiq ,  Lanhua Wei ,  Shankar Krishnan ,  Leonid Poslavsky ,  Mikhail M. Sushchik

IPC: G01N21/21 ,  G01N21/95 ,  G01N21/27

CPC classification number: G01N21/211 ,  G01B2210/56 ,  G01N21/274 ,  G01N21/9501 ,  G01N2021/213

Abstract: Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters.

公开(公告)号：US20180088040A1

公开(公告)日：2018-03-29

申请号：US15382713

申请日：2016-12-18

Applicant: KLA-Tencor Corporation

Inventor： Shankar Krishnan ,  David Y. Wang

IPC: G01N21/3563 ,  G01N21/33 ,  G01N21/21 ,  G01J3/28 ,  G01J3/02 ,  G01N21/47

CPC classification number: G01N21/3563 ,  G01B11/28 ,  G01B2210/56 ,  G01J3/0229 ,  G01J3/2803 ,  G01N21/211 ,  G01N21/33 ,  G01N21/47 ,  G01N21/55 ,  G01N2021/213 ,  G01N2021/3137 ,  G01N2021/335 ,  G01N2021/3568 ,  G01N2021/4711

Abstract: Methods and systems for performing spectroscopic reflectometry measurements of semiconductor structures at infrared wavelengths are presented herein. In some embodiments measurement wavelengths spanning a range from 750 nanometers to 2,600 nanometers, or greater, are employed. In one aspect, reflectometry measurements are performed at oblique angles to reduce the influence of backside reflections on measurement results. In another aspect, a broad range of infrared wavelengths are detected by a detector that includes multiple photosensitive areas having different sensitivity characteristics. Collected light is linearly dispersed across the surface of the detector according to wavelength. Each different photosensitive area is arranged on the detector to sense a different range of incident wavelengths. In this manner, a broad range of wavelengths are detected with high signal to noise ratio by a single detector.

公开(公告)号：US20170314913A1

公开(公告)日：2017-11-02

申请号：US15204938

申请日：2016-07-07

Applicant: KLA-Tencor Corporation

Inventor： Shankar Krishnan

IPC: G01B11/22 ,  G01N15/08 ,  G01B11/06

CPC classification number: G01B11/22 ,  G01B11/0641 ,  G01B2210/56 ,  G01N15/088 ,  G01N21/00

Abstract: Methods and systems for performing optical measurements of geometric structures filled with an adsorbate by a gaseous adsorption process are presented herein. Measurements are performed while the metrology target under measurement is treated with a flow of purge gas that includes a controlled amount of fill material. A portion of the fill material adsorbs onto the structures under measurement and fills openings in the structural features, spaces between structural features, small volumes such as notches, trenches, slits, contact holes, etc. In one aspect, the desired degree of saturation of vaporized material in the gaseous flow is determined based on the maximum feature size to be filled. In one aspect, measurement data is collected when a structure is unfilled and when the structure is filled by gaseous adsorption. The collected data is combined in a multi-target model based measurement to reduce parameter correlations and improve measurement performance.

公开(公告)号：US20160245741A1

公开(公告)日：2016-08-25

申请号：US14833370

申请日：2015-08-24

Applicant: KLA-Tencor Corporation

Inventor： Shankar Krishnan ,  Guorong V. Zhuang ,  David Y. Wang ,  Xuefeng Liu

IPC: G01N21/25 ,  G01N21/95 ,  G01J3/02

CPC classification number: G01N21/255 ,  G01J3/0205 ,  G01J3/0208 ,  G01J3/18 ,  G01J3/2803 ,  G01J3/42 ,  G01J2003/425 ,  G01N21/211 ,  G01N21/55 ,  G01N21/9501 ,  G01N2021/213 ,  G01N2201/06113 ,  G01N2201/068

Abstract: Methods and systems for performing broadband spectroscopic metrology with reduced sensitivity to focus errors are presented herein. Significant reductions in sensitivity to focus position error are achieved by imaging the measurement spot onto the detector such that the direction aligned with the plane of incidence on the wafer surface is oriented perpendicular to the direction of wavelength dispersion on the detector surface. This reduction in focus error sensitivity enables reduced focus accuracy and repeatability requirements, faster focus times, and reduced sensitivity to wavelength errors without compromising measurement accuracy. In a further aspect, the dimension of illumination field projected on the wafer plane in the direction perpendicular to the plane of incidence is adjusted to optimize the resulting measurement accuracy and speed based on the nature of target under measurement.

Abstract translation: 本文介绍了对聚焦误差灵敏度降低的宽带光谱测量方法和系统。 通过将测量点成像到检测器上来实现对聚焦位置误差的敏感性的显着降低，使得与晶片表面上的入射平面对准的方向定向为垂直于检测器表面上的波长色散的方向。 聚焦误差灵敏度的降低可以降低聚焦精度和重复性要求，更快的聚焦时间，降低对波长误差的灵敏度，而不会影响测量精度。 在另一方面，调整在垂直于入射平面的方向上投射在晶片平面上的照明场的尺寸，以根据测量目标的性质优化所得到的测量精度和速度。

公开(公告)号：US09228943B2

公开(公告)日：2016-01-05

申请号：US13661752

申请日：2012-10-26

Applicant: KLA-Tencor Corporation

Inventor： David Y. Wang ,  Guorong Vera Zhuang ,  Johannes D. de Veer ,  Kevin Peterlinz ,  Shankar Krishnan

IPC: G01B11/14 ,  G01N21/55 ,  G01N21/21

CPC classification number: G01N21/55 ,  G01N21/211 ,  G01N2021/213 ,  G01N2021/556

Abstract: The present invention may include an illumination source, a detector, a selectably adjustable optical system including a dynamically adjustable illumination pupil of the illumination arm, a dynamically adjustable collection pupil of the collection arm, a dynamically adjustable illumination field stop of the illumination arm, a dynamically adjustable collection field stop of the collection arm, a sensor configured to measure one or more optical characteristics of one or more components of the optical system, and a control system configured to selectably dynamically adjust at least one of the illumination pupil, the collection pupil, the illumination field stop, the collection field stop, and a spectral radiance of the illumination source.

Abstract translation: 本发明可以包括照明源，检测器，可选择地调节的光学系统，其包括照明臂的动态可调节照明光瞳，收集臂的动态可调收集光瞳，照明臂的动态可调照明场停止， 收集臂的可动态调整的收集场停止，被配置为测量所述光学系统的一个或多个部件的一个或多个光学特性的传感器，以及被配置为可选择地动态地调整所述照明瞳孔，所述收集瞳孔 照明场停止，收集场停止以及照明源的光谱。

公开(公告)号：US20150285735A1

公开(公告)日：2015-10-08

申请号：US14745047

申请日：2015-06-19

Applicant: KLA-Tencor Corporation

Inventor： David Y. Wang ,  Klaus Flock ,  Lawrence Rotter ,  Shankar Krishnan ,  Johannes D. de Veer ,  Catalin Filip ,  Gregory Brady ,  Muzammil Arain ,  Andrei Shchegrov

IPC: G01N21/21 ,  G01N21/95

CPC classification number: G01N21/211 ,  G01B2210/56 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/214 ,  G01N2021/8848 ,  G01N2201/06113 ,  G01N2201/0636

Abstract: An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.

Abstract translation: 一种装置包括（i）用于提供在从深紫外波长到红外波长的范围内可选择的多个波长的照明光束的明亮光源，（ii）照明光学器件，用于将照明光束以可选择的角度集合 （AOI）或方位角（AZ）和极化状态以提供光谱椭偏仪，其中照明光学器件包括用于控制每个可选AOI / AZ组上样品上的照明光束的光斑尺寸的变迹器，（iii ）收集光学器件，用于响应于在每个可选择的AOI / AZ集合处的照明光束和朝向基于输出光束产生输出信号或图像的检测器的偏振状态来引导来自样品的输出光束，以及（v） 控制器，用于基于输出信号或图像来表征样本的特征。