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公开(公告)号：US10605722B2
公开(公告)日：2020-03-31
申请号：US15836160
申请日：2017-12-08
Applicant: KLA-Tencor Corporation
Inventor： Hidong Kwak , John Lesoine , Malik Sadiq , Lanhua Wei , Shankar Krishnan , Leonid Poslavsky , Mikhail M. Sushchik
Abstract: Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters.
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公开(公告)号：US20180100796A1
公开(公告)日：2018-04-12
申请号：US15836160
申请日：2017-12-08
Applicant: KLA-Tencor Corporation
Inventor： Hidong Kwak , John Lesoine , Malik Sadiq , Lanhua Wei , Shankar Krishnan , Leonid Poslavsky , Mikhail M. Sushchik
CPC classification number: G01N21/211 , G01B2210/56 , G01N21/274 , G01N21/9501 , G01N2021/213
Abstract: Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters.
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公开(公告)号：US20130132021A1
公开(公告)日：2013-05-23
申请号：US13680273
申请日：2012-11-19
Applicant: KLA-Tencor Corporation
Inventor： Hidong Kwak , Zhiming Jiang , Ward RDell Dixon , Kenneth Edward James, JR. , Leonid Poslavsky , Torsten Kaack
IPC: G01N21/27
CPC classification number: G01N21/274 , G01N21/211 , G03F7/70608
Abstract: Methods and systems for calibrating system parameter values of a target inspection system are presented. Spectral Error Based Calibration (SEBC) increases consistency among inspection systems by minimizing differences in the spectral error among different inspection systems for a given specimen or set of specimens. The system parameter values are determined such that differences between a spectral error associated with a measurement of a specimen by the target inspection system and a spectral error associated with a measurement of the same specimen by a reference inspection system are minimized. In some examples, system parameter values are calibrated without modifying specimen parameters. Small inaccuracies in specimen parameter values have little effect on the calibration because the target system and the reference system both measure the same specimen or set of specimens. By performing SEBC over a set of specimens, the resulting calibration is robust to a wide range of specimens under test.
Abstract translation: 介绍了目标检测系统校准系统参数值的方法和系统。 基于光谱误差的校准（SEBC）通过最小化给定样品或一组样品的不同检查系统之间的光谱误差的差异来提高检测系统之间的一致性。 确定系统参数值，使得由目标检查系统与样本的测量相关联的光谱误差与由参考检查系统对相同样本的测量相关联的光谱误差之间的差异最小化。 在一些示例中，系统参数值在不修改样本参数的情况下进行校准。 样本参数值的小的不准确性对校准几乎没有影响，因为目标系统和参考系统都测量相同的样本或一组样本。 通过在一组样品上执行SEBC，所得到的校准对于广泛的被测样品是稳健的。
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公开(公告)号：US09857291B2
公开(公告)日：2018-01-02
申请号：US14277898
申请日：2014-05-15
Applicant: KLA-Tencor Corporation
Inventor： Hidong Kwak , John Lesoine , Malik Sadiq , Lanhua Wei , Shankar Krishnan , Leonid Poslavsky , Mikhail M. Sushchik
CPC classification number: G01N21/211 , G01B2210/56 , G01N21/274 , G01N21/9501 , G01N2021/213
Abstract: Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters.
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Patent Agency Ranking
公开(公告)号：US20150029494A1
公开(公告)日：2015-01-29
申请号：US14450018
申请日：2014-08-01
Applicant: KLA-Tencor Corporation
Inventor： Hidong Kwak , Ward Dixon , Torsten R. Kaack , Ning-Yi Neil Wang , Jagjit Sandhu
CPC classification number: G01N21/55 , B08B5/02 , G01B11/06 , G01B11/0641 , G01B2210/56 , G01N21/21 , H01L21/67017 , H01L22/12 , H01L2924/0002 , H01L2924/00
Abstract: A local purging tool for purging a portion of a surface of a wafer with purging gas is disclosed. The purging tool includes a purging chamber configured to contain purging gas within a cavity of the purging chamber, a permeable portion of a surface of the purging chamber configured to diffuse purging gas from the cavity of the chamber to a portion of a surface of a wafer, and an aperture configured to transmit illumination received from an illumination source to a measurement location of the portion of the surface of the wafer and further configured to transmit illumination reflected from the measurement location to a detector.
Abstract translation: 公开了一种用清洗气体清洗晶片表面的一部分的局部清洗工具。 清洗工具包括净化室，其构造成在清洗室的空腔内容纳清洗气体，清洗室的表面的可渗透部分构造成将清洗气体从腔的腔扩散到晶片表面的一部分 以及被配置为将从照明源接收的照明传送到晶片表面的该部分的测量位置并且还被配置为将从测量位置反射的照射传输到检测器的孔。
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公开(公告)号：US10088413B2
公开(公告)日：2018-10-02
申请号：US13680273
申请日：2012-11-19
Applicant: KLA-Tencor Corporation
Inventor： Hidong Kwak , Zhiming Jiang , Ward RDell Dixon , Kenneth Edward James, Jr. , Leonid Poslavsky , Torsten Kaack
Abstract: Methods and systems for calibrating system parameter values of a target inspection system are presented. Spectral Error Based Calibration (SEBC) increases consistency among inspection systems by minimizing differences in the spectral error among different inspection systems for a given specimen or set of specimens. The system parameter values are determined such that differences between a spectral error associated with a measurement of a specimen by the target inspection system and a spectral error associated with a measurement of the same specimen by a reference inspection system are minimized. In some examples, system parameter values are calibrated without modifying specimen parameters. Small inaccuracies in specimen parameter values have little effect on the calibration because the target system and the reference system both measure the same specimen or set of specimens. By performing SEBC over a set of specimens, the resulting calibration is robust to a wide range of specimens under test.
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公开(公告)号：US09574992B1
公开(公告)日：2017-02-21
申请号：US15214814
申请日：2016-07-20
Applicant: KLA-Tencor Corporation
Inventor： Esen Salcin , Fuming Wang , Kevin Peterlinz , Hidong Kwak , Damon Kvamme , Uri Greenberg , Daniel R. Hennigan
CPC classification number: G01N21/211 , G01B11/065 , G01B2210/56 , G01N21/9501
Abstract: Methods and systems for performing single wavelength ellipsometry (SWE) measurements with reduced measurement spot size are presented herein. In one aspect, a pupil stop is located at or near a pupil plane in the collection optical path to reduce sensitivity to target edge diffraction effects. In another aspect, a field stop is located at or near an image plane conjugate to the wafer plane in the collection optical path to reduce sensitivity to undesired optical-structural interactions. In another aspect, a linear polarizer acting on the input beam of the SWE system includes a thin, nanoparticle based polarizer element. The nanoparticle based polarizer element improves illumination beam quality and reduces astigmatism on the wafer plane. The pupil and field stops filter out unwanted light rays before reaching the detector. As a result, measurement spot size is reduced and tool-to-tool matching performance for small measurement targets is greatly enhanced.
Abstract translation: 本文介绍了用于执行单波长椭偏仪（SWE）测量的方法和系统，其测量点尺寸减小。 在一个方面，光瞳停止位于收集光路中的光瞳平面处或附近，以降低对目标边缘衍射效应的灵敏度。 在另一方面，场停止位于收集光路中与晶片平面共轭的图像平面附近或附近，以降低对不期望的光学 - 结构相互作用的灵敏度。 在另一方面，作用在SWE系统的输入光束上的线性偏振器包括薄的基于纳米颗粒的偏振器元件。 基于纳米颗粒的偏振器元件改善照明光束质量并减少晶片平面上的像散。 瞳孔和场域在到达检测器之前将不需要的光线过滤掉。 结果，测量点尺寸减小，并且大大提高了小测量目标的工具对工具匹配性能。
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公开(公告)号：US09110020B2
公开(公告)日：2015-08-18
申请号：US14450018
申请日：2014-08-01
Applicant: KLA-Tencor Corporation
Inventor： Hidong Kwak , Ward Dixon , Torsten R. Kaack , Ning-Yi Neil Wang , Jagjit Sandhu
CPC classification number: G01N21/55 , B08B5/02 , G01B11/06 , G01B11/0641 , G01B2210/56 , G01N21/21 , H01L21/67017 , H01L22/12 , H01L2924/0002 , H01L2924/00
Abstract: A local purging tool for purging a portion of a surface of a wafer with purging gas is disclosed. The purging tool includes a purging chamber configured to contain purging gas within a cavity of the purging chamber, a permeable portion of a surface of the purging chamber configured to diffuse purging gas from the cavity of the chamber to a portion of a surface of a wafer, and an aperture configured to transmit illumination received from an illumination source to a measurement location of the portion of the surface of the wafer and further configured to transmit illumination reflected from the measurement location to a detector.
Abstract translation: 公开了一种用清洗气体清洗晶片表面的一部分的局部清洗工具。 清洗工具包括净化室，其构造成在清洗室的空腔内容纳清洗气体，清洗室的表面的可渗透部分构造成将清洗气体从腔的腔扩散到晶片表面的一部分 以及被配置为将从照明源接收的照明传送到晶片表面的该部分的测量位置并且还被配置为将从测量位置反射的照射传输到检测器的孔。
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公开(公告)号：US20140340682A1
公开(公告)日：2014-11-20
申请号：US14277898
申请日：2014-05-15
Applicant: KLA-Tencor Corporation
Inventor： Hidong Kwak , John Lesoine , Malik Sadiq , Lanhua Wei , Shankar Krishnan , Leonid Poslavsky , Mikhail M. Sushchik
CPC classification number: G01N21/211 , G01B2210/56 , G01N21/274 , G01N21/9501 , G01N2021/213
Abstract: Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters.
Abstract translation: 提出了用于匹配一个或多个光学测量系统的测量光谱的方法和系统。 用于确定样本对目标计量系统执行的测量的光谱响应的一个或多个系统参数的值被优化。 对系统参数值进行优化，使得由参考系统生成的测量光谱与目标系统之间的差异最小化，以测量相同的度量目标。 还提出了用于在一个或多个光学测量系统上匹配光谱误差的方法和系统。 可靠的计量系统测量至少一个样本参数的值，以最小化由参考和目标计量系统测量时存在的不同测量条件引入的模型误差。 提出了基于低阶响应面的参数优化方法和系统，以减少改进系统校准参数所需的计算时间。
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