公开(公告)号：US09046500B2

公开(公告)日：2015-06-02

申请号：US14109457

申请日：2013-12-17

Applicant: KLA-Tencor Corporation

Inventor： Damon Kvamme ,  Yanming Zhao

IPC: G02B5/02 ,  G02B5/10 ,  F21V7/09 ,  G01N21/95 ,  G02B27/09 ,  G02B17/06 ,  G02B5/08

CPC classification number: G01N21/9501 ,  G02B5/0891 ,  G02B17/0621 ,  G02B27/0988 ,  G02B27/0994

Abstract: An apparatus for focusing light in a semi-conductor inspection system, including: a first mirror arranged to reflect extreme ultra-violet (EUV) generated by a plasma source; and a second mirror arranged to focus the EUV light, reflected from the first mirror, onto a first intermediate focus plane. A homogenizing tunnel, including: a first aperture having a first shape and a first size and arranged to receive extreme ultra-violet (EUV) light; a second aperture having a second shape and a second size; and a passageway connecting the first and second apertures and arranged to homogenize the EUV light received by the first aperture. The first shape is different from the second shape or the first size is different from the second size.

Abstract translation: 一种用于将光聚焦在半导体检查系统中的装置，包括：第一反射镜，被布置成反射由等离子​​体源产生的极紫外（EUV）; 以及布置成将从第一反射镜反射的EUV光聚焦到第一中间焦平面上的第二反射镜。 一种均质隧道，包括：具有第一形状和第一尺寸的第一孔，并且布置成接收极紫外（EUV）光; 具有第二形状和第二尺寸的第二孔; 以及连接第一孔和第二孔并设置成使由第一孔接收的EUV光均匀化的通道。 第一形状与第二形状不同，或者第一尺寸与第二尺寸不同。

公开(公告)号：US09574992B1

公开(公告)日：2017-02-21

申请号：US15214814

申请日：2016-07-20

Applicant: KLA-Tencor Corporation

Inventor： Esen Salcin ,  Fuming Wang ,  Kevin Peterlinz ,  Hidong Kwak ,  Damon Kvamme ,  Uri Greenberg ,  Daniel R. Hennigan

IPC: G01J4/00 ,  G01N21/21 ,  G01J4/04

CPC classification number: G01N21/211 ,  G01B11/065 ,  G01B2210/56 ,  G01N21/9501

Abstract: Methods and systems for performing single wavelength ellipsometry (SWE) measurements with reduced measurement spot size are presented herein. In one aspect, a pupil stop is located at or near a pupil plane in the collection optical path to reduce sensitivity to target edge diffraction effects. In another aspect, a field stop is located at or near an image plane conjugate to the wafer plane in the collection optical path to reduce sensitivity to undesired optical-structural interactions. In another aspect, a linear polarizer acting on the input beam of the SWE system includes a thin, nanoparticle based polarizer element. The nanoparticle based polarizer element improves illumination beam quality and reduces astigmatism on the wafer plane. The pupil and field stops filter out unwanted light rays before reaching the detector. As a result, measurement spot size is reduced and tool-to-tool matching performance for small measurement targets is greatly enhanced.

Abstract translation: 本文介绍了用于执行单波长椭偏仪（SWE）测量的方法和系统，其测量点尺寸减小。 在一个方面，光瞳停止位于收集光路中的光瞳平面处或附近，以降低对目标边缘衍射效应的灵敏度。 在另一方面，场停止位于收集光路中与晶片平面共轭的图像平面附近或附近，以降低对不期望的光学 - 结构相互作用的灵敏度。 在另一方面，作用在SWE系统的输入光束上的线性偏振器包括薄的基于纳米颗粒的偏振器元件。 基于纳米颗粒的偏振器元件改善照明光束质量并减少晶片平面上的像散。 瞳孔和场域在到达检测器之前将不需要的光线过滤掉。 结果，测量点尺寸减小，并且大大提高了小测量目标的工具对工具匹配性能。

公开(公告)号：US09448343B2

公开(公告)日：2016-09-20

申请号：US13837765

申请日：2013-03-15

Applicant: KLA-Tencor Corporation

Inventor： Damon Kvamme ,  Frank Chilese

IPC: G01N21/88 ,  G02B5/08 ,  G02B5/09 ,  G03F1/84 ,  G01N21/956

CPC classification number: G02B5/0891 ,  G01N21/8806 ,  G01N21/956 ,  G02B5/09 ,  G03F1/84

Abstract: An apparatus for inspecting a photomask, comprising an illumination source for generating a light which illuminates a target substrate, objective optics for receiving and projecting the light which is reflected from the target substrate, the objective optics includes a first mirror arranged to receive and reflect the light which is reflected from the target substrate, a second mirror which is arranged to receive and reflect the light which is reflected by the first mirror, a third mirror which is arranged to receive and reflect the light which is reflected by the second mirror, and a segmented mirror which is arranged to receive and reflect the light which is reflected by the third mirror. The segmented mirror includes at least two mirror segments. The apparatus further includes at least one sensor for detecting the light which is projected by the objective optics.

Abstract translation: 一种用于检查光掩模的装置，包括用于产生照射目标基板的光的照明源，用于接收和投射从目标基板反射的光的物镜，所述物镜包括第一反射镜，其布置成接收和反射 从目标基板反射的光，被配置为接收和反射由第一反射镜反射的光的第二反射镜，布置成接收和反射由第二反射镜反射的光的第三反射镜，以及 被布置成接收和反射由第三反射镜反射的光的分段镜。 分段镜包括至少两个镜片段。 该装置还包括至少一个用于检测由物镜光学器件投影的光的传感器。

公开(公告)号：US20140264051A1

公开(公告)日：2014-09-18

申请号：US13837765

申请日：2013-03-15

Applicant: KLA-TENCOR CORPORATION

Inventor： Damon Kvamme ,  Frank Chilese

IPC: G02B5/08 ,  G01N21/88

CPC classification number: G02B5/0891 ,  G01N21/8806 ,  G01N21/956 ,  G02B5/09 ,  G03F1/84

Abstract: An apparatus for inspecting a photomask, comprising an illumination source for generating a light which illuminates a target substrate, objective optics for receiving and projecting the light which is reflected from the target substrate, the objective optics includes a first mirror arranged to receive and reflect the light which is reflected from the target substrate, a second mirror which is arranged to receive and reflect the light which is reflected by the first mirror, a third mirror which is arranged to receive and reflect the light which is reflected by the second mirror, and a segmented mirror which is arranged to receive and reflect the light which is reflected by the third mirror. The segmented mirror includes at least two mirror segments. The apparatus further includes at least one sensor for detecting the light which is projected by the objective optics.

Abstract translation: 一种用于检查光掩模的装置，包括用于产生照射目标基板的光的照明源，用于接收和投射从目标基板反射的光的物镜，所述物镜包括：第一反射镜，被布置成接收和反射 从目标基板反射的光，被配置为接收和反射由第一反射镜反射的光的第二反射镜，布置成接收和反射由第二反射镜反射的光的第三反射镜，以及 被布置成接收和反射由第三反射镜反射的光的分段镜。 分段镜包括至少两个镜片段。 该装置还包括至少一个用于检测由物镜光学器件投影的光的传感器。

公开(公告)号：US20140175308A1

公开(公告)日：2014-06-26

申请号：US14109457

申请日：2013-12-17

Applicant: KLA-Tencor Corporation

Inventor： Damon Kvamme ,  Yanming Zhao

IPC: G01N21/95 ,  G02B27/09 ,  G02B19/00

CPC classification number: G01N21/9501 ,  G02B5/0891 ,  G02B17/0621 ,  G02B27/0988 ,  G02B27/0994

Abstract: An apparatus for focusing light in a semi-conductor inspection system, including: a first mirror arranged to reflect extreme ultra-violet (EUV) generated by a plasma source; and a second mirror arranged to focus the EUV light, reflected from the first mirror, onto a first intermediate focus plane. A homogenizing tunnel, including: a first aperture having a first shape and a first size and arranged to receive extreme ultra-violet (EUV) light; a second aperture having a second shape and a second size; and a passageway connecting the first and second apertures and arranged to homogenize the EUV light received by the first aperture. The first shape is different from the second shape or the first size is different from the second size.

Abstract translation: 一种用于将光聚焦在半导体检查系统中的装置，包括：第一反射镜，被布置成反射由等离子​​体源产生的极紫外（EUV）; 以及布置成将从第一反射镜反射的EUV光聚焦到第一中间焦平面上的第二反射镜。 一种均质隧道，包括：具有第一形状和第一尺寸的第一孔，并且布置成接收极紫外（EUV）光; 具有第二形状和第二尺寸的第二孔; 以及连接第一孔和第二孔并设置成使由第一孔接收的EUV光均匀化的通道。 第一形状与第二形状不同，或者第一尺寸与第二尺寸不同。