公开(公告)号：US20190178639A1

公开(公告)日：2019-06-13

申请号：US15979336

申请日：2018-05-14

Applicant: KLA-Tencor Corporation

Inventor： Nadav Gutman ,  Eran Amit ,  Stefan Eyring ,  Hari Pathangi ,  Frank Laske ,  Ulrich Pohlmann ,  Thomas Heidrich

IPC: G01B15/00

Abstract: An overlay metrology system includes a particle-beam metrology tool to scan a particle beam across an overlay target on a sample including a first-layer target element and a second-layer target element. The overlay metrology system may further include a controller to receive a scan signal from the particle-beam metrology tool, determine symmetry measurements for the scan signal with respect to symmetry metrics, and generate an overlay measurement between the first layer and the second layer based on the symmetry measurements in which an asymmetry of the scan signal is indicative of a misalignment of the second-layer target element with respect to the first-layer target element and a value of the overlay measurement is based on the symmetry measurements.

公开(公告)号：US10274837B2

公开(公告)日：2019-04-30

申请号：US14621026

申请日：2015-02-12

Applicant: KLA-TENCOR CORPORATION

Inventor： Eran Amit ,  Raviv Yohanan

IPC: G03F7/20 ,  G01N21/47 ,  G01N21/95

Abstract: Metrology targets, design files, and design and production methods thereof are provided. The targets comprise two or more parallel periodic structures at respective layers, wherein a predetermined offset is introduced between the periodic structures, for example, opposite offsets at different parts of a target. Quality metrics are designed to estimate the unintentional overlay from measurements of a same metrology parameter by two or more alternative measurement algorithms. Target parameters are configured to enable both imaging and scatterometry measurements and enhance the metrology measurements by the use of both methods on the same targets. Imaging and scatterometry target parts may share elements or have common element dimensions. Imaging and scatterometry target parts may be combined into a single target area or may be integrated into a hybrid target using a specified geometric arrangement.

公开(公告)号：US09874527B2

公开(公告)日：2018-01-23

申请号：US14797754

申请日：2015-07-13

Applicant: KLA-Tencor Corporation

Inventor： Eran Amit ,  Zeev Bomzon ,  Barak Bringoltz ,  Boris Efraty

IPC: G01B11/00 ,  G01N21/88 ,  G01N21/47 ,  G03F7/20

CPC classification number: G01N21/8851 ,  G01N21/47 ,  G03F7/70633

Abstract: Metrology methods and respective software and module are provided, which identify and remove measurement inaccuracy which results from process variation leading to target asymmetries. The methods comprise identifying an inaccuracy contribution of process variation source(s) to a measured scatterometry signal (e.g., overlay) by measuring the signal across a range of measurement parameter(s) (e.g., wavelength, angle) and targets, and extracting a measurement variability over the range which is indicative of the inaccuracy contribution. The method may further assume certain functional dependencies of the resulting inaccuracy on the target asymmetry, estimate relative donations of different process variation sources and apply external calibration to further enhance the measurement accuracy.

公开(公告)号：US20170023358A1

公开(公告)日：2017-01-26

申请号：US15287388

申请日：2016-10-06

Applicant: KLA-Tencor Corporation

Inventor： Myungjun Lee ,  Mark D. Smith ,  Michael E. Adel ,  Eran Amit ,  Daniel Kandel

IPC: G01B11/27 ,  G01J9/00 ,  G03F7/20

CPC classification number: G01J9/00 ,  G03F7/705 ,  G03F7/70683 ,  H01L22/30

Abstract: Metrology methods, modules and targets are provided, for measuring tilted device designs. The methods analyze and optimize target design with respect to the relation of the Zernike sensitivity of pattern placement errors (PPEs) between target candidates and device designs. Monte Carlo methods may be applied to enhance the robustness of the selected target candidates to variation in lens aberration and/or in device designs. Moreover, considerations are provided for modifying target parameters judiciously with respect to the Zernike sensitivities to improve metrology measurement quality and reduce inaccuracies.

Abstract translation: 提供了测量方法，模块和目标，用于测量倾斜的设备设计。 该方法针对目标候选者和设备设计之间的图案布局错误（PPEs）的泽尔尼克敏感度的关系，分析和优化目标设计。 可以应用蒙特卡洛方法来增强所选择的目标候选者对透镜像差和/或装置设计中的变化的鲁棒性。 此外，还提供了考虑到明确地修改Zernike敏感度的目标参数，以提高计量测量质量并减少不准确度。

公开(公告)号：US20150292877A1

公开(公告)日：2015-10-15

申请号：US14727038

申请日：2015-06-01

Applicant: KLA-Tencor Corporation

Inventor： Tal Marciano ,  Eran Amit ,  Barak Bringoltz ,  Nuriel Amir ,  Amit Shaked

IPC: G01B11/27 ,  G06F17/50

CPC classification number: G01B11/27 ,  G06F17/5081

Abstract: Metrology methods and targets are provided, for estimating inter-cell process variation by deriving, from overlay measurements of at least three target cells having different designed misalignments, a dependency of a measured inaccuracy on the designed misalignments (each designed misalignment is between at least two overlapping periodic structures in the respective target cell). Inaccuracies which are related to the designed misalignments are reduced, process variation sources are detected and targets and measurement algorithms are optimized according to the derived dependency.

Abstract translation: 提供了计量方法和目标，用于通过从具有不同设计的不对准的至少三个目标单元的重叠测量推导出测量的不准确度对所设计的不对准的依赖性（每个设计的未对准在至少两个 各个靶细胞中重叠的周期性结构）。 与设计的不对准相关的不准确被减少，检测到过程变化源，并根据派生的依赖性优化目标和测量算法。

公开(公告)号：US20140060148A1

公开(公告)日：2014-03-06

申请号：US13834915

申请日：2013-03-15

Applicant: KLA-TENCOR CORPORATION

Inventor： Eran Amit ,  Dana Klein ,  Guy Cohen ,  Amir Widmann ,  Nimrod Shuall ,  Amnon Manassen ,  Nuriel Amir

IPC: G01B21/04

CPC classification number: G01B21/042 ,  G03F7/70625 ,  G03F7/70633

Abstract: Aspects of the present disclosure describe systems and methods for calibrating a metrology tool by using proportionality factors. The proportionality factors may be obtained by measuring a substrate under different measurement conditions. Then calculating the measured metrology value and one or more quality merits. From this information, proportionality factors may be determined. Thereafter the proportionality factors may be used to quantify the inaccuracy in a metrology measurement. The proportionality factors may also be used to determine an optimize measurement recipe. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Abstract translation: 本公开的方面描述了通过使用比例因子来校准度量工具的系统和方法。 可以通过在不同测量条件下测量衬底来获得比例因子。 然后计算测量的度量值和一个或多个质量优点。 根据该信息，可以确定比例因子。 此后，可以使用比例因子来量化度量测量中的不精确度。 比例因子也可用于确定优化测量配方。 要强调的是，该摘要被提供以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。