公开(公告)号：US09909982B2

公开(公告)日：2018-03-06

申请号：US14244179

申请日：2014-04-03

Applicant: KLA-Tencor Corporation

Inventor： Barak Bringoltz ,  Irina Vakshtein ,  Ofir Aharon ,  Guy Ben Dov ,  Zeev Bomzon

IPC: G01C19/00 ,  G01N21/47 ,  G03F7/20

CPC classification number: G01N21/4785 ,  G03F7/70633

Abstract: Methods and calibrations modules are provided, for calibrating a pupil center in scatterometry overlay measurements. The calibration comprises calculating fluctuations from a first statistical figure of merit such as an average of an overlay signal per pixel at the pupil and significantly reducing, for example minimizing, the fluctuations with respect to a second statistical figure of merit thereof, such as a pupil weighted variance of the fluctuations.

公开(公告)号：US20140257734A1

公开(公告)日：2014-09-11

申请号：US14244179

申请日：2014-04-03

Applicant: KLA-Tencor Corporation

Inventor： Barak Bringoltz ,  Irina Vakshtein ,  Ofir Aharon ,  Guy Ben Dov ,  Zeev Bomzon

IPC: G01N21/47 ,  G01B11/00

CPC classification number: G01N21/4785 ,  G03F7/70633

Abstract: Methods and calibrations modules are provided, for calibrating a pupil center in scatterometry overlay measurements. The calibration comprises calculating fluctuations from a first statistical figure of merit such as an average of an overlay signal per pixel at the pupil and significantly reducing, for example minimizing, the fluctuations with respect to a second statistical figure of merit thereof, such as a pupil weighted variance of the fluctuations.

Abstract translation: 提供了方法和校准模块，用于在散射测量叠加测量中校准瞳孔中心。 校准包括从第一统计品质因数计算波动，例如在瞳孔处的每个像素的覆盖信号的平均值，并且显着地减少例如相对于其第二统计品质因数例如瞳孔的波动最小化 波动的加权方差。

公开(公告)号：US20150233705A1

公开(公告)日：2015-08-20

申请号：US14184295

申请日：2014-02-19

Applicant: KLA-Tencor Corporation

Inventor： Barak Bringoltz ,  Mark Ghinovker ,  Daniel Kandel ,  Vladimir Levinski ,  Zeev Bomzon

IPC: G01B11/14 ,  G01B11/24

CPC classification number: G01B11/14 ,  G01B11/2441 ,  G03F7/70633

Abstract: Methods and systems for minimizing of algorithmic inaccuracy in scatterometry overlay (SCOL) metrology are provided. SCOL targets are designed to limit the number of oscillation frequencies in a functional dependency of a resulting SCOL signal on the offset and to reduce the effect of higher mode oscillation frequencies. The targets are segmented in a way that prevents constructive interference of high modes with significant amplitudes, and thus avoids the inaccuracy introduced by such terms into the SCOL signal. Computational methods remove residual errors in a semi-empirical iterative process of compensating for the residual errors algorithmically or through changes in target design.

Abstract translation: 提供了用于最小化散点映射覆盖（SCOL）计量学中算法不准确性的方法和系统。 SCOL目标被设计为将所得到的SCOL信号的功能依赖性的振荡频率的数量限制在偏移上并且降低更高模式振荡频率的影响。 目标被分段，以防止具有显着幅度的高模式的建构性干扰，从而避免了由这些术语引入到SCOL信号中的不准确性。 计算方法在半经验迭代过程中，通过算法或通过目标设计的变化来补偿残差，从而消除残差。

公开(公告)号：US20140146322A1

公开(公告)日：2014-05-29

申请号：US13936529

申请日：2013-07-08

Applicant: KLA-Tencor Corporation

Inventor： Andrew V. Hill ,  Amnon Manassen ,  Barak Bringoltz ,  Ohad Bachar ,  Mark Ghinovker ,  Zeev Bomzon ,  Daniel Kandel

IPC: G01N21/47 ,  G01N21/55

CPC classification number: G02B27/58 ,  G01B11/00 ,  G01N21/47 ,  G01N21/55 ,  G01N2201/06113 ,  G01N2201/068 ,  G03F7/70625 ,  G03F7/70633

Abstract: The disclosure is directed to various apodization schemes for pupil imaging scatterometry. In some embodiments, the system includes an apodizer disposed within a pupil plane of the illumination path. In some embodiments, the system further includes an illumination scanner configured to scan a surface of the sample with at least a portion of apodized illumination. In some embodiments, the system includes an apodized pupil configured to provide a quadrupole illumination function. In some embodiments, the system further includes an apodized collection field stop. The various embodiments described herein may be combined to achieve certain advantages.

Abstract translation: 本公开涉及用于瞳孔成像散射测量的各种变迹方案。 在一些实施例中，该系统包括设置在照明路径的光瞳平面内的变迹器。 在一些实施例中，系统还包括照明扫描器，其构造成用至少一部分变迹照明来扫描样品的表面。 在一些实施例中，系统包括配置成提供四极照明功能的变迹瞳孔。 在一些实施例中，系统还包括变迹集合区域停止。 可以组合这里描述的各种实施例以实现某些优点。

公开(公告)号：US09784987B2

公开(公告)日：2017-10-10

申请号：US14799132

申请日：2015-07-14

Applicant: KLA-Tencor Corporation

Inventor： Andrew V. Hill ,  Amnon Manassen ,  Barak Bringoltz ,  Ohad Bachar ,  Mark Ghinovker ,  Zeev Bomzon ,  Daniel Kandel

IPC: G01B11/14 ,  G02B27/58 ,  G01N21/55 ,  G01N21/47 ,  G01B11/00 ,  G03F7/20

CPC classification number: G02B27/58 ,  G01B11/00 ,  G01N21/47 ,  G01N21/55 ,  G01N2201/06113 ,  G01N2201/068 ,  G03F7/70625 ,  G03F7/70633

Abstract: The disclosure is directed to various apodization schemes for pupil imaging scatterometry. In some embodiments, the system includes an apodizer disposed within a pupil plane of the illumination path. In some embodiments, the system further includes an illumination scanner configured to scan a surface of the sample with at least a portion of apodized illumination. In some embodiments, the system includes an apodized pupil configured to provide a quadrupole illumination function. In some embodiments, the system further includes an apodized collection field stop. The various embodiments described herein may be combined to achieve certain advantages.

公开(公告)号：US09182219B1

公开(公告)日：2015-11-10

申请号：US14160279

申请日：2014-01-21

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Barry Loevsky ,  Zeev Bomzon

IPC: G01B11/14 ,  H01L23/544 ,  G03F7/20

CPC classification number: G03F7/70633 ,  G01B11/02 ,  G01B11/14 ,  G06K9/00 ,  G06K9/3216 ,  G06T7/0004 ,  H01L22/30 ,  H01L23/544 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method and system for overly measurement is disclosed. The overlay measurement is performed based on moiré effect observed between structured illumination grids and overlay targets. A structured illumination is used to illuminate a first overlay target and a second overlay target. Upon obtaining an image of the first overlay target illuminated by the structured illumination and an image of the second overlay target illuminated by the structured illumination, relative displacement between the first overlay target and the structured illumination and relative displacement between the second overlay target and the structured illumination are measured. The overlay between the first overlay target and the second overlay target is then measured based on their relative displacements with respect to the structured illumination.

Abstract translation: 公开了一种用于过度测量的方法和系统。 基于在结构化照明网格和覆盖目标之间观察到的莫尔效应来进行覆盖测量。 结构照明用于照亮第一覆盖目标和第二覆盖目标。 在获得由结构化照明照明的第一覆盖目标的图像和由结构化照明照明的第二覆盖目标的图像时，第一覆盖目标和结构化照明之间的相对位移以及第二覆盖目标与结构化照明之间的相对位移 测量照度。 然后基于它们相对于结构化照明的相对位移来测量第一覆盖目标和第二覆盖目标之间的覆盖。

公开(公告)号：US20150316783A1

公开(公告)日：2015-11-05

申请号：US14799132

申请日：2015-07-14

Applicant: KLA-Tencor Corporation

Inventor： Andrew V. Hill ,  Amnon Manassen ,  Barak Bringoltz ,  Ohad Bachar ,  Mark Ghinovker ,  Zeev Bomzon ,  Daniel Kandel

IPC: G02B27/58 ,  G01B11/00 ,  G01N21/47

CPC classification number: G02B27/58 ,  G01B11/00 ,  G01N21/47 ,  G01N21/55 ,  G01N2201/06113 ,  G01N2201/068 ,  G03F7/70625 ,  G03F7/70633

Abstract: The disclosure is directed to various apodization schemes for pupil imaging scatterometry. In some embodiments, the system includes an apodizer disposed within a pupil plane of the illumination path. In some embodiments, the system further includes an illumination scanner configured to scan a surface of the sample with at least a portion of apodized illumination. In some embodiments, the system includes an apodized pupil configured to provide a quadrupole illumination function. In some embodiments, the system further includes an apodized collection field stop. The various embodiments described herein may be combined to achieve certain advantages.

Abstract translation: 本公开涉及用于瞳孔成像散射测量的各种变迹方案。 在一些实施例中，该系统包括设置在照明路径的光瞳平面内的变迹器。 在一些实施例中，系统还包括照明扫描器，其构造成用至少一部分变迹照明来扫描样品的表面。 在一些实施例中，系统包括配置成提供四极照明功能的变迹瞳孔。 在一些实施例中，系统还包括变迹集合区域停止。 可以组合这里描述的各种实施例以实现某些优点。

公开(公告)号：US20150316490A1

公开(公告)日：2015-11-05

申请号：US14797754

申请日：2015-07-13

Applicant: KLA-Tencor Corporation

Inventor： Eran Amit ,  Zeev Bomzon ,  Barak Bringoltz ,  Boris Efraty

IPC: G01N21/88 ,  G01N21/47

CPC classification number: G01N21/8851 ,  G01N21/47 ,  G03F7/70633

Abstract: Metrology methods and respective software and module are provided, which identify and remove measurement inaccuracy which results from process variation leading to target asymmetries. The methods comprise identifying an inaccuracy contribution of process variation source(s) to a measured scatterometry signal (e.g., overlay) by measuring the signal across a range of measurement parameter(s) (e.g., wavelength, angle) and targets, and extracting a measurement variability over the range which is indicative of the inaccuracy contribution. The method may further assume certain functional dependencies of the resulting inaccuracy on the target asymmetry, estimate relative donations of different process variation sources and apply external calibration to further enhance the measurement accuracy.

Abstract translation: 提供了计量方法和各自的软件和模块，其识别和消除由过程变化导致的目标不对称性的测量不准确度。 所述方法包括通过测量跨越测量参数（例如波长，角度）和目标的范围的信号来识别过程变化源对测量的散射测量信号（例如，覆盖）的不准确贡献，并且提取 在范围内的测量变异性表示不准确的贡献。 该方法可以进一步假设所得到的不准确性对目标不对称性的某些功能依赖性，估计不同过程变化源的相对捐赠并应用外部校准以进一步提高测量精度。

公开(公告)号：US09091650B2

公开(公告)日：2015-07-28

申请号：US13936529

申请日：2013-07-08

Applicant: KLA-Tencor Corporation

Inventor： Andrew V. Hill ,  Amnon Manassen ,  Barak Bringoltz ,  Ohad Bachar ,  Mark Ghinovker ,  Zeev Bomzon ,  Daniel Kandel

IPC: G01B11/14 ,  G01N21/55 ,  G03F7/20

CPC classification number: G02B27/58 ,  G01B11/00 ,  G01N21/47 ,  G01N21/55 ,  G01N2201/06113 ,  G01N2201/068 ,  G03F7/70625 ,  G03F7/70633

Abstract: The disclosure is directed to various apodization schemes for pupil imaging scatterometry. In some embodiments, the system includes an apodizer disposed within a pupil plane of the illumination path. In some embodiments, the system further includes an illumination scanner configured to scan a surface of the sample with at least a portion of apodized illumination. In some embodiments, the system includes an apodized pupil configured to provide a quadrupole illumination function. In some embodiments, the system further includes an apodized collection field stop. The various embodiments described herein may be combined to achieve certain advantages.

Abstract translation: 本公开涉及用于瞳孔成像散射测量的各种变迹方案。 在一些实施例中，该系统包括设置在照明路径的光瞳平面内的变迹器。 在一些实施例中，系统还包括照明扫描器，其构造成用至少一部分变迹照明来扫描样品的表面。 在一些实施例中，系统包括配置成提供四极照明功能的变迹瞳孔。 在一些实施例中，系统还包括变迹集合区域停止。 可以组合这里描述的各种实施例以实现某些优点。

公开(公告)号：US09874527B2

公开(公告)日：2018-01-23

申请号：US14797754

申请日：2015-07-13

Applicant: KLA-Tencor Corporation

Inventor： Eran Amit ,  Zeev Bomzon ,  Barak Bringoltz ,  Boris Efraty

IPC: G01B11/00 ,  G01N21/88 ,  G01N21/47 ,  G03F7/20

CPC classification number: G01N21/8851 ,  G01N21/47 ,  G03F7/70633

Abstract: Metrology methods and respective software and module are provided, which identify and remove measurement inaccuracy which results from process variation leading to target asymmetries. The methods comprise identifying an inaccuracy contribution of process variation source(s) to a measured scatterometry signal (e.g., overlay) by measuring the signal across a range of measurement parameter(s) (e.g., wavelength, angle) and targets, and extracting a measurement variability over the range which is indicative of the inaccuracy contribution. The method may further assume certain functional dependencies of the resulting inaccuracy on the target asymmetry, estimate relative donations of different process variation sources and apply external calibration to further enhance the measurement accuracy.