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公开(公告)号：US20190131317A1
公开(公告)日：2019-05-02
申请号：US16107884
申请日：2018-08-21
Inventor： Binbin Cao , Hui Zhang , Li Ai
Abstract: A method for manufacturing an array substrate, including forming at least two data lines, forming a buffer layer on the data lines, forming an organic film, which is provided with vias, on the buffer layer, the vias being in a partially overlapping relationship with the orthographic projection of the two adjacent data lines on a base substrate, forming a first conductive layer on the organic film.
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公开(公告)号：US10134770B2
公开(公告)日：2018-11-20
申请号：US15114219
申请日：2016-01-21
Inventor： Zhiyuan Lin , Yinhu Huang , Zhixiang Zou , Binbin Cao
IPC: H01L27/12 , H01L21/77 , G02F1/1333 , G02F1/1343 , G02F1/1362 , G02F1/1368 , H01L21/308 , H01L21/768 , H01L29/45 , H01L29/49 , G02F1/136
Abstract: A preparation method of a conductive via hole structure, a preparation method of an array substrate and a preparation method of a display device, the preparation method of the array substrate includes: forming a first metal layer (01) including the first metal structure (01a), forming a non-metallic film including a first part corresponding to the first metal structure (01a) and an organic insulating film (40′) in sequence; patterning the organic insulating film (40′) to form a first organic insulating layer via hole (41) corresponding to the first part; then baking to form an organic insulating layer (40); and then, removing the first part of the non-metallic film to form a non-metallic layer and expose the part of the surface (011) of the first metal structure (01a). This method can avoid the metal structure from being seriously oxidized.
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公开(公告)号：US09952479B2
公开(公告)日：2018-04-24
申请号：US15108114
申请日：2016-01-06
Inventor： Binbin Cao , Peng Jiang , Peng Chen , Jongwon Moon , Yinhu Huang , Chengshao Yang , Haipeng Yang
IPC: G02F1/1362 , G02F1/1343 , G02F1/1368
CPC classification number: G02F1/136286 , G02F1/134363 , G02F1/13439 , G02F1/136209 , G02F1/1368 , G02F2001/133357 , G02F2001/136218 , G02F2001/136222 , G02F2001/13629 , G02F2001/136295 , G02F2201/121 , G02F2202/16 , H01L27/124 , H01L29/78633
Abstract: The present invention relates to a display substrate and a method for fabricating the same, a display panel and a display device. The display substrate comprises a plurality of pixels, each of which has a display region, a non-display region being between the plurality of pixels, and the display substrate further comprises a protection metal layer covering the non-display region. In the display substrate, the protection metal layer covers the non-display region of the display substrate so as to shield the structures of the thin-film transistors, signal lines and the like on the display substrate, and thus the stability of structure of the display panel as well as the high resolution of the display panel and excellent display effect thereof can be ensured, and, in the meantime, the procedure of fabrication process is simplified, the manufacture efficiency is improved, and the cost for manufacturing is reduced.
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公开(公告)号：US09716113B2
公开(公告)日：2017-07-25
申请号：US14744308
申请日：2015-06-19
Inventor： Binbin Cao , Zhiyuan Lin
IPC: H01L27/12
CPC classification number: H01L27/124 , H01L27/1262 , H01L29/45 , H01L29/458 , H01L29/4908
Abstract: The present invention discloses a conductive structure, a method of manufacturing the conductive structure, and an array substrate. The method of manufacturing the conductive structure, comprising steps of: Forming a barrier metal film and a copper metal film in this order on a substrate, wherein the copper metal film being laminated on the barrier metal film; forming a preset photoresist pattern on the copper metal film; etching the barrier metal film and the copper metal film; oxidizing an exposed sidewall of the etched barrier metal film and an exposed sidewall of the etched copper metal film, so as to generate metal oxide layers on the exposed sidewall of the etched barrier metal film and the exposed sidewall of the etched copper metal film, respectively; and stripping off the photoresist pattern by means of a photoresist stripping liquid. In the method of manufacturing the conductive structure according to embodiments of the present invention, the exposed sidewall of the conductive structure is oxidized to generate a uniform metal oxidization layer on the exposed sidewall before removing the photoresist from the conductive structure by a wet stripping process. In this way, it can effectively prevent the interfaces between the copper metal film and the barrier metal film from being separated during performing the wet stripping process.
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公开(公告)号：US20170168607A1
公开(公告)日：2017-06-15
申请号：US15327546
申请日：2016-03-28
Inventor： Binbin Cao , Yinhu Huang
CPC classification number: G06F3/044 , G06F3/0412 , G06F3/0418 , G09G3/3648 , G09G2300/0426
Abstract: Disclosed is an in-cell touch screen, a display device and a method for manufacturing the same. The in-cell touch screen includes: an array substrate; a color filter substrate; and a plurality of spacers disposed between the array substrate and the color filter substrate, each spacer including a top surface, a first side surface and a second side surface opposite to the first surface. The in-cell touch screen further includes a touch electrode laid on the top surface and at least a part of the first side surface and/or the second side surface. In the present invention, the touch electrode is laid on the pillar spacers, thus it is possible to increase a surface area of the touch electrode so that the mutual capacitance between the touch driving electrode and the touch sensing electrode is increased so as to increase the inductive capacitance generated when there is a touch by a finger. Meanwhile, it is possible to reduce the influence of the liquid crystal layer on the touch effect and improve the signal-noise-ratio and further improve sensitivity and accuracy of touch identification.
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Patent Agency Ranking
46.发明授权Method for displaying position of alignment mark, array substrate and manufacturing method thereof 有权显示对准标记位置的方法，阵列基板及其制造方法公开(公告)号：US09583443B2
公开(公告)日：2017-02-28
申请号：US15098456
申请日：2016-04-14
Inventor： Binbin Cao , Yinhu Huang , Chengshao Yang
IPC: H01L29/15 , H01L23/544 , H01L27/12
CPC classification number: H01L23/544 , H01L27/1218 , H01L27/1262 , H01L2223/54426 , H01L2223/54486
Abstract: A method for displaying a position of an alignment mark, an array substrate and a manufacturing method thereof are provided. The method for displaying the position of the alignment mark includes: forming an alignment mark on a surface of a base substrate; forming a first isolation layer covering the alignment mark; forming a via hole in the first isolation layer to expose the alignment mark; applying a first material in the via hole to form a first material pattern; and applying a second material on surfaces of the first material pattern and the first isolation layer to form a second material film, wherein the first material and the second material are configured to have different polarities, so that the second material cannot be attached to the first material pattern.
Abstract translation: 提供一种显示对准标记位置的方法，阵列基板及其制造方法。 用于显示对准标记的位置的方法包括：在基底基板的表面上形成对准标记; 形成覆盖所述对准标记的第一隔离层; 在所述第一隔离层中形成通孔以露出所述对准标记; 在所述通孔中施加第一材料以形成第一材料图案; 以及将第二材料施加在所述第一材料图案和所述第一隔离层的表面上以形成第二材料膜，其中所述第一材料和所述第二材料被配置为具有不同的极性，使得所述第二材料不能附着到所述第一材料膜上 材质图案
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47.发明授权Oxide thin film transistor array substrate having transparent connection structure connecting source electrode and data line of oxide TFT and display panel including the same 有权氧化物薄膜晶体管阵列基板，其具有连接源电极和氧化物TFT的数据线的透明连接结构和包括其的显示面板公开(公告)号：US09502575B2
公开(公告)日：2016-11-22
申请号：US14354215
申请日：2013-04-24
Inventor： Binbin Cao , Chengshao Yang , Bozhu Zhou
IPC: H01L29/786 , H01L27/32 , G02F1/1368 , G02F1/1362 , H01L27/12 , H01L21/02 , H01L29/24 , H01L29/423 , H01L29/66
CPC classification number: H01L29/7869 , G02F1/136286 , G02F1/1368 , H01L21/02565 , H01L27/1225 , H01L27/124 , H01L27/1248 , H01L27/1259 , H01L27/3248 , H01L27/3288 , H01L29/24 , H01L29/42356 , H01L29/66969
Abstract: An oxide thin film transistor array substrate, a manufacturing method thereof and a display panel are provided. The oxide TFT array substrate includes a base substrate and an oxide TFT, a gate line, a data line and a pixel electrode provided on the base substrate, the drain electrode of the oxide TFT being connected with the pixel electrode, wherein a connection structure is provided between the source electrode of the oxide TFT and the data line, by which the source electrode of the oxide TFT and the data line are electrically connected, and the resistivity of the connection structure is larger than the resistivity of the source electrode.
Abstract translation: 提供氧化物薄膜晶体管阵列基板，其制造方法和显示面板。 氧化物TFT阵列基板包括基底和氧化物TFT，栅极线，数据线和设置在基底基板上的像素电极，氧化物TFT的漏极与像素电极连接，其中连接结构为 设置在氧化物TFT的源电极和数据线之间，氧化物TFT的源电极和数据线电连接，并且连接结构的电阻率大于源电极的电阻率。
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48.发明授权Array substrate and manufacturing method thereof, and display device including the array substrate 有权阵列基板及其制造方法以及包括阵列基板的显示装置公开(公告)号：US09490270B2
公开(公告)日：2016-11-08
申请号：US14380168
申请日：2013-12-14
Inventor： Xiangyang Xu , Liyun Deng , Minsu Kim , Binbin Cao
IPC: H01L27/14 , H01L29/04 , H01L27/12 , H01L29/786 , H01L29/24 , H01L21/027 , H01L21/3213 , H01L21/4763 , H01L29/66 , G02F1/1343 , G02F1/1362
CPC classification number: H01L27/124 , G02F1/134309 , G02F1/134363 , G02F1/13439 , G02F1/136286 , G02F2001/134345 , G02F2001/134372 , G02F2001/136295 , H01L21/0274 , H01L21/32139 , H01L21/47635 , H01L27/1222 , H01L27/1225 , H01L27/1288 , H01L29/24 , H01L29/66765 , H01L29/66969 , H01L29/78606 , H01L29/78669 , H01L29/7869
Abstract: An array substrate and manufacturing method thereof and a display device having the array substrate are provided. The array substrate includes a non-pixel region distributed in the form of a grid and a plurality of sub-pixel regions formed by being surrounded by the non-pixel region, a plurality of scan lines (12) and data lines (16) disposed in a crossing manner are provided within the non-pixel region, and a common electrode (20) is provided in the sub-pixel regions and the non-pixel region. A zone of the common electrode (20) corresponding to the sub-pixel regions has a first thickness, a zone of the common electrode (20) corresponding to the scan lines (12) and/or the data lines (16) has a second thickness, and the first thickness is smaller than the second thickness. By means of arranging the common electrode (20) to have such a structure that thickness of its zone corresponding to scan lines (12) and/or data lines (16) in a non-pixel region is larger than thickness of its zone corresponding to sub-pixel regions, the ability of conductivity of the common electrode (20) can be enhanced, and this makes the voltage distribution on the whole liquid crystal display panel for the common electrode (20) be more even. Thus, the display quality of picture is improved, and the quality grade of the display device is promoted.
Abstract translation: 提供阵列基板及其制造方法以及具有阵列基板的显示装置。 阵列基板包括以栅格形式分布的非像素区域和由非像素区域包围形成的多个子像素区域，多个扫描线（12）和数据线（16）被布置 在非像素区域内设置交叉方式，在子像素区域和非像素区域设置公共电极（20）。 对应于子像素区域的公共电极（20）的区域具有第一厚度，对应于扫描线（12）和/或数据线（16）的公共电极（20）的区域具有第二厚度 厚度，第一厚度小于第二厚度。 通过将公共电极（20）布置成具有与非像素区域中的扫描线（12）和/或数据线（16）对应的区域的厚度大于其对应于其区域的区域的厚度的结构 子像素区域，可以提高公共电极（20）的导电性能，这使得公共电极（20）的整个液晶显示面板的电压分布更均匀。 因此，提高了图像的显示质量，促进了显示装置的质量等级。
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公开(公告)号：US09159867B2
公开(公告)日：2015-10-13
申请号：US14021314
申请日：2013-09-09
Inventor： Bozhu Zhou , Mingji Bai , Binbin Cao , Na Zhao , Wenlong Wang , Yijun Wang
CPC classification number: H01L27/1259 , H01L21/3213 , H01L27/124 , H01L29/42356 , H01L29/42384 , H01L29/458 , H01L33/0041
Abstract: Embodiments of the invention provide an array substrate, a manufacturing method thereof and a display device. The array substrate comprises: a base substrate; a gate line and a gate electrode formed on the base substrate; a gate insulating layer formed on the gate line and the gate electrode; a source electrode, a drain electrode and a pixel electrode formed on the gate insulating layer, wherein the pixel electrode is directly connected to the drain electrode; and an active layer formed on the gate insulating layer, the source electrode and the drain electrode.
Abstract translation: 本发明的实施例提供阵列基板，其制造方法和显示装置。 阵列基板包括：基底; 形成在基底基板上的栅极线和栅电极; 形成在栅极线和栅电极上的栅极绝缘层; 形成在所述栅极绝缘层上的源电极，漏电极和像素电极，其中所述像素电极直接连接到所述漏电极; 以及形成在栅极绝缘层，源电极和漏电极上的有源层。
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公开(公告)号：US20150277641A1
公开(公告)日：2015-10-01
申请号：US14436020
申请日：2014-07-17
Inventor： Bozhu Zhou , Myoung Kee Baek , Xianxue Duan , Cheng Chen , Chengshao Yang , Binbin Cao
CPC classification number: G06F3/0412 , G02B6/00 , G06F1/16 , G06F3/0386 , G06F3/0421 , G06F3/0428 , G06F2203/04109
Abstract: An optical touch screen and a display device are disclosed. The optical touch screen (200) comprises an optical touch panel (210) and a first sensor (220) and a second sensor (230). The optical touch panel (210) comprises a first optical transmission channel (211) and a second optical transmission channel (212) which are intersected with each other. The first sensor (220) is disposed on at least one end of the first optical transmission channel (211) and configured to receive light emitted by the first optical transmission channel (211). The second sensor (230) is disposed on at least one end of the second optical transmission channel (212) and configured to receive light emitted by the second optical transmission channel (212). The optical touch screen and the display device can improve the positioning accuracy of the touch position.
Abstract translation: 公开了一种光学触摸屏和显示装置。 光学触摸屏（200）包括光学触摸面板（210）和第一传感器（220）和第二传感器（230）。 光学触摸面板（210）包括彼此相交的第一光传输通道（211）和第二光传输通道（212）。 第一传感器（220）设置在第一光传输通道（211）的至少一端，并且被配置为接收由第一光传输通道（211）发射的光。 第二传感器（230）设置在第二光传输通道（212）的至少一端，并且被配置为接收由第二光传输通道（212）发射的光。 光学触摸屏和显示装置可以提高触摸位置的定位精度。
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