摘要:
In a non-volatile semiconductor memory, a large current can be flowed through the memory cell during reading. The number of the column lines can be reduced. The electron injection to the floating gates of the respective memory cells is averaged to reduce the dispersion of the threshold voltages thereof. The electron emission from the floating gates of the respective memory cells is also averaged to reduce the dispersion of the threshold voltages thereof. An increase in chip size due to latch circuits can be prevented. By noting that either of a plurality of “0” or “1” of the binary data are stored much in the memory cells of the memory cell bundle or block, a negative threshold voltage is allocated to the memory cells for storing the more bit side data of the binary data. A single column line is used in common for the two adjacent memory blocks. To inject electrons to the floating gates of the memory cells, voltage is increased gradually and stopped when electrons have been injected up to a predetermined injection rate. Electrons are once emitted from the floating gates, and thereafter the electrons are injected again to store one of a binary data. Further, the data latch circuits can be formed at any positions remote from the memory cell array.
摘要:
A nonvolatile semiconductor memory is disclosed. This nonvolatile semiconductor memory includes a memory cell string containing a selection transistor and at least one cell transistor which is connected to the selection transistor and has a floating gate. This memory further includes a bias circuit for, when the selection transistor is unselected, supplying a potential different from the ground potential to the gate of the cell transistor connected to the unselected selection transistor.
摘要:
The current paths of a plurality of floating gate type MOSFETs are series-connected to form a series circuit. The series circuit is connected at one end to receive a reference voltage, and is connected to data programming and readout circuit. In the data programming mode, electrons are discharged from the floating gate to the drain of the MOSFET or holes are injected into the drain into the floating gate. The data readout operation is effected by checking whether current flows from the other end to the one end of the series circuit or not.
摘要:
The current paths of a plurality of floating gate type MOSFETs are series-connected to form a series circuit. The series circuit is connected at one end to receive a reference voltage, and is connected to data programming and readout circuit. In the data programming mode, electrons are discharged from the floating gate to the drain of the MOSFET or holes are injected into the drain into the floating gate. The data readout operation is effected by checking whether current flows from the other end to the one end of the series circuit or not.
摘要:
The current paths of a plurality of floating gate type MOSFETs are series-connected to form a series circuit. The series circuit is connected at one end to receive a reference voltage, and is connected to data programming and readout circuit. In the data programming mode, electrons are discharged from the floating gate to the drain of the MOSFET or holes are injected into the drain into the floating gate. The data readout operation is effected by checking whether current flows from the other end to the one end of the series circuit or not.
摘要:
The current paths of a plurality of floating gate type MOSFETs are series-connected to form a series circuit. The series circuit is connected at one end to receive a reference voltage, and is connected to data programming and readout circuit. In the data programming mode, electrons are discharged from the floating gate to the drain of the MOSFET or holes are injected into the drain into the floating gate. The data readout operation is effected by checking whether current flows from the other end to the one end of the series circuit or not.
摘要:
A memory cell array is formed of a plurality of nonvolatile memory cell transistors arranged in a matrix form. The patterns of the control gate electrode and the source region of each memory cell transistor are formed in parallel and the pattern of the erasing gate electrode is formed to intersect the source region and control gate electrode patterns. A field oxide film is formed in an intersecting portion between the source region and the erasing gate electrode.
摘要:
A semiconductor integrated circuit which is protected from element breakdown includes a memory cell, series-connected first and second program load transistors arranged between the memory cell and the program power source, a boosting circuit for outputting a board voltage higher than the voltage of a program power source, and a controller. The controller applies the boosted voltage to the gates of the first and second program load transistors when program data is set at a first logic level. The controller applies a voltage of about 0 V to the gate of the first program load transistor and an intermediate voltage lower than the voltage of the program power source and higher than 0 V to the gate of the second load transistor when the program data is set at a second logic level.
摘要:
In the semiconductor integrated circuit, the data delay circuit and data latch circuit are connected between the sense amplifier circuit and the output buffer circuit. A pulse signal for controlling the output buffer is first generated according to a pulse output signal of the address change detection circuit, and then a latch signal which permits output data of the data detection circuit obtained before the change of the address input signal to be latched by the data latch circuit for a preset period of time is generated. Next, a delay signal is generated which sets the delay time of the data delay circuit to be short in a case where data detected by the data detection circuit is not output from the output buffer circuit, and sets the delay time of the data delay circuit to be long in a case where data is output from the output buffer circuit. Generation of the delay signal is interrupted after the pulse signal of the address change detection circuit is interrupted. As a result, the power source variation at the time of output data change or erroneous operation due to noise input from the exterior can be prevented. Further, the driving ability of the output buffer transistor can be set to a large value so that a highly reliable semiconductor integrated circuit in which the operation margin of the integrated circuit with respect to the power source variation and noise can be made large while keeping the data readout speed high can be obtained.
摘要:
In a nonvolatile semiconductor memory device, a wiring layer is connected between a power source and a memory cell. Resistance of the wiring layer is larger than the on-resistance of a load transistor, so that the load transistor substantially determines the load characteristic. Therefore, the load characteristic curve is more gentle in inclination and more rectilinear in shape. This makes the data writing operation stable against a variance in the channel lengths of manufactured transistors forming the memory cells.