公开(公告)号：US20130327951A1

公开(公告)日：2013-12-12

申请号：US13621720

申请日：2012-09-17

Applicant: Jürgen FROSIEN

Inventor： Jürgen FROSIEN

IPC: H01J3/20 ,  H01J3/26

CPC classification number: H01J37/067 ,  H01J37/141 ,  H01J2237/06325 ,  H01J2237/1501

Abstract: A condenser lens arrangement for an electron beam system is described. The condenser lens arrangement includes a magnetic condenser lens adapted for generating a magnetic condenser lens field, the condenser lens having a symmetry axis, and a magnetic deflector adapted for generating a magnetic deflector field. The deflector is configured so that the superposition of the magnetic condenser lens field and the magnetic deflector field results in an optical axis of the condenser lens arrangement being movable relative to the symmetry axis. Further, an electron beam optical system including a condenser lens arrangement and a method for moving a condenser lens are described.

Abstract translation: 描述了一种用于电子束系统的聚光透镜装置。 聚光透镜装置包括适于产生磁聚焦透镜场的聚光透镜，具有对称轴的聚光透镜，以及适于产生磁偏转器场的磁偏转器。 偏转器被配置为使得磁聚光透镜场和磁偏转器场的叠加导致聚光透镜装置的光轴相对于对称轴线是可移动的。 此外，描述了包括聚光透镜布置的电子束光学系统和用于移动聚光透镜的方法。

公开(公告)号：US20130153782A1

公开(公告)日：2013-06-20

申请号：US13464261

申请日：2012-05-04

Applicant: Weiming Ren ,  Zhongwei Chen

Inventor： Weiming Ren ,  Zhongwei Chen

IPC: H01J3/20 ,  H01F7/02

CPC classification number: H01J37/14 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/20 ,  H01J37/141 ,  H01J37/145 ,  H01J37/3177 ,  H01J2237/1035 ,  H01J2237/1415 ,  H01J2237/31774

Abstract: The present invention provides two ways to form a special permeability-discontinuity unit inside every sub-lens of a multi-axis magnetic lens, which either has a simpler configuration or has more flexibility in manufacturing such as material selection and mechanical structure. Accordingly several types of multi-axis magnetic lens are proposed for various applications. One type is for general application such as a multi-axis magnetic condenser lens or a multi-axis magnetic transfer lens, another type is a multi-axis magnetic non-immersion objective which can require a lower magnetomotive force, and one more type is a multi-axis magnetic immersion objective lens which can generate smaller aberrations. Due to using permeability-discontinuity units, every multi-axis magnetic lens in this invention can also be electrically excited to function as a multi-axis electromagnetic compound lens so as to further reduce aberrations thereof and/or realize electron beam retarding for low-voltage irradiation on specimen.

Abstract translation: 本发明提供了在多轴磁性透镜的每个子透镜内部形成特殊的渗透率不连续单元的两种方式，其具有更简单的构造或者在诸如材料选择和机械结构的制造中具有更大的灵活性。 因此，针对各种应用提出了几种类型的多轴磁性透镜。 一种用于一般应用，例如多轴磁聚焦透镜或多轴磁性转印透镜，另一种类型是可能需要较低磁动势的多轴磁性非浸没物镜，另外一种类型是 可以产生较小像差的多轴磁浸物镜。 由于使用导磁率不连续单位，本发明中的每个多轴磁性透镜也可以被电激励以用作多轴电磁复合透镜，以便进一步降低其像差和/或实现低电压的电子束延迟 对样品照射

公开(公告)号：US20120298861A1

公开(公告)日：2012-11-29

申请号：US13113770

申请日：2011-05-23

Applicant: Raymond Browning

Inventor： Raymond Browning

IPC: H01J40/00 ,  G01T1/20 ,  G01T1/16

CPC classification number: H01J37/141 ,  H01J37/285 ,  H01J2237/1035 ,  H01J2237/1415 ,  H01J2237/2855

Abstract: A photoelectron microscope uses the vector potential field as a spatial reference. The microscope can be used with a source of photons to image surface chemistry.

Abstract translation: 光电子显微镜使用矢量势场作为空间参考。 显微镜可以与光子源一起使用来成像表面化学。

公开(公告)号：US08314401B2

公开(公告)日：2012-11-20

申请号：US12896110

申请日：2010-10-01

Applicant: Xu Zhang ,  Zhong-Wei Chen

Inventor： Xu Zhang ,  Zhong-Wei Chen

IPC: H01J1/50

CPC classification number: H01J37/141 ,  H01J37/063 ,  H01J2237/065 ,  H01J2237/083 ,  H01J2237/1035 ,  H01J2237/1405

Abstract: An electron gun comprises an electron emitter, an electrode surrounding the electron emitter, an extraction electrode, and a double condenser lens assembly, the double condenser lens assembly comprising a magnetic immersion pre-condenser lens and a condenser lens. In combination with a probe forming objective lens, the electron gun apparatus can provide an electron beam of independently adjustable probe size and probe current, as is desirable in electron beam applications. The electron emitter is immersed in the magnetic field generated by a magnetic type pre-condenser lens. When activated, the pre-condenser lens collimates the beam effectively to increase its angular intensity while at the same time enlarging the virtual source as compared with non-immersion case, due to geometric magnification and aberrations of its lens action. The pre-condenser lens is followed by a condenser lens. If the condenser lens is of the magnetic type, its peak magnetic field is far enough away and thus its action does not significantly affect the size of the virtual source. Independent adjustment of the lenses, combined with suitable selection of final probe forming objective aperture size, allows various combination of the final probe size and probe current to be obtained in a range sufficient for most electron beam applications.

Abstract translation: 电子枪包括电子发射器，围绕电子发射体的电极，引出电极和双重聚光透镜组件，双重聚光透镜组件包括磁性浸入式预聚光透镜和聚光透镜。 与形成物镜的探针组合，如在电子束应用中所希望的那样，电子枪装置可以提供独立可调的探针尺寸和探针电流的电子束。 将电子发射器浸入由磁式预聚光透镜产生的磁场中。 当激活时，由于几何放大和其透镜作用的像差，预聚焦透镜有效地准直光束以增加其角度强度，同时与非浸没情况相比放大虚拟光源。 预聚光透镜之后是聚光透镜。 如果聚光透镜是磁性的，则其峰值磁场足够远，因此其作用不会显着影响虚拟源的尺寸。 透镜的独立调整结合适当选择最终探针形成物镜孔径的尺寸允许在足以满足大多数电子束应用的范围内获得最终探针尺寸和探针电流的各种组合。

公开(公告)号：US07888660B2

公开(公告)日：2011-02-15

申请号：US11341838

申请日：2006-01-27

Applicant: Kenneth H. Purser ,  Harald A. Enge ,  Norman L. Turner

Inventor： Kenneth H. Purser ,  Harald A. Enge ,  Norman L. Turner

IPC: G21K5/04

CPC classification number: H01J37/141 ,  H01J37/14 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/315 ,  H01J37/3171 ,  H01J2237/141 ,  H01J2237/1534 ,  H01J2237/31703

Abstract: A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also, the method and apparatus may be used for introducing quadrupole fields along a beam line.

Abstract translation: 一种满足日益增长的要求的方法和装置，用于提高冲击半导体晶片的注入离子入射角的精度以及当离子束通过时晶片的均匀掺杂的带状离子束的精度。 该方法和装置涉及用于植入目的的新型磁离子 - 光学传输元件的设计和组合。 光学元件的设计成为可能：（1）宽幅调节工件上的带状光束的宽度; （2）纠正带状横梁宽度的强度分布不准确; （3）关于X轴和Y轴的独立转向; （4）工件入射角校正; 和（5）空间费用引起的光束膨胀效应的近似补偿。 在实际情况下，这些元件的组合允许源和工件之间的带状光束膨胀到350毫米，具有良好的均匀性和角度精度。 此外，该方法和装置可用于沿着光束线引入四极场。

公开(公告)号：US07807983B2

公开(公告)日：2010-10-05

申请号：US11622619

申请日：2007-01-12

Applicant: Kenneth H. Purser ,  James S. Buff ,  Victor Benveniste

Inventor： Kenneth H. Purser ,  James S. Buff ,  Victor Benveniste

IPC: H01J37/317 ,  H01J37/141 ,  H01J37/153

CPC classification number: H01J37/141 ,  H01J37/153 ,  H01J37/3171 ,  H01J2237/1501 ,  H01J2237/1526 ,  H01J2237/24528

Abstract: A technique for reducing magnetic fields at an implant location is disclosed. In one particular exemplary embodiment, the technique may be realized as an apparatus and method for reducing magnetic fields at an implant location. The apparatus and method may comprise a corrector-bar assembly comprising a set of magnetic core members, a plurality of coils distributed along the set of magnetic core members, and connecting elements to connect ends of the set of magnetic core members with each other to form a rectangular corrector-bar configuration. The corrector-bar assembly may be positioned at an exit region of a magnetic deflector to improve uniformity of a ribbon beam having a plurality of beamlets exiting from the magnetic deflector and the rectangular corrector-bar configuration may provide a desired magnetic field clamping action.

Abstract translation: 公开了一种用于在植入位置减小磁场的技术。 在一个特定的示例性实施例中，该技术可以被实现为用于减少植入位置处的磁场的装置和方法。 该装置和方法可以包括校正棒组件，其包括一组磁芯构件，沿着该组磁芯构件分布的多个线圈，以及连接元件，用于将一组磁芯构件的端部彼此连接以形成 一个矩形校正器配置。 校正棒组件可以定位在磁偏转器的出口区域处，以改善具有从磁偏转器离开的多个子束的带状束的均匀性，并且矩形校正器配置可以提供期望的磁场夹紧动作。

公开(公告)号：US20080315090A1

公开(公告)日：2008-12-25

申请号：US12219802

申请日：2008-07-29

Applicant: Mamoru Nakasuji ,  Tohru Satake ,  Hirosi Sobukawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Nobuharu Noji

Inventor： Mamoru Nakasuji ,  Tohru Satake ,  Hirosi Sobukawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Nobuharu Noji

IPC: G01N23/00

CPC classification number: H01J37/141 ,  H01J2237/1534 ,  H01J2237/28

Abstract: An electron beam system or a method for manufacturing a device using the electron beam system in which an electron beam can be irradiated at a high current density and a ratio of transmittance of a secondary electron beam of an image projecting optical system can be improved and which can be compact in size. The surface of the sample S is divided into plural stripe regions which in turn are divided into rectangle-shaped main fields. The main field is further divided into plural square-shaped subfields. The irradiation with the electron beams and the formation of a two-dimensional image are repeated in a unit of the subfields. A magnetic gap formed by the inner and outer magnetic poles of the objective lens is formed on the side of the sample, and an outer side surface and an inner side surface of each of the inner magnetic pole and the outer magnetic pole, respectively, forming the magnetic gap have each part of a conical shape with a convex having an angle of 45° or greater with respect to the optical axis.

公开(公告)号：US20080224062A1

公开(公告)日：2008-09-18

申请号：US12047614

申请日：2008-03-13

Applicant: Pavel ADAMEC

Inventor： Pavel ADAMEC

IPC: H01J1/50

CPC classification number: H01J37/141 ,  H01J2237/002 ,  H01J2237/1405

Abstract: A magnetic lens for a charged particle beam device and a charged particle beam device are provided. The magnetic lens includes a coil with coil windings to be excited for generation of a magnetic field, a pole piece to guide the magnetic field, a heat shield, which is connected to a cooling system, and a thermal insulation layer provided between the heat shield and the coil.

Abstract translation: 提供了一种用于带电粒子束装置和带电粒子束装置的磁透镜。 磁性透镜包括具有用于产生磁场的被激励的线圈绕组的线圈，用于引导磁场的极片，连接到冷却系统的隔热层和设置在隔热层之间的绝热层 和线圈。

公开(公告)号：US07411191B2

公开(公告)日：2008-08-12

申请号：US11806573

申请日：2007-06-01

Applicant: Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hiroshi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

Inventor： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hiroshi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

IPC: H01J37/26

CPC classification number: H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

Abstract: An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.

Abstract translation: 电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器， 光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在微环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。

公开(公告)号：US20080116391A1

公开(公告)日：2008-05-22

申请号：US11943241

申请日：2007-11-20

Applicant: Hiroyuki Ito ,  Yuko Sasaki ,  Tohru Ishitani ,  Yoshinori Nakayama

Inventor： Hiroyuki Ito ,  Yuko Sasaki ,  Tohru Ishitani ,  Yoshinori Nakayama

IPC: G21K1/087 ,  G21K1/093

CPC classification number: H01J37/141 ,  H01J37/09 ,  H01J37/12 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/142 ,  H01J2237/1534 ,  H01J2237/303

Abstract: The present invention relates to an orbit correction method for a charged particle beam, and aims to solve problems inherent in conventional aberration correction systems and to provide a low-cost, high-precision, high-resolution optical converging system for a charged particle beam. To this end, employed is a configuration in which a beam orbit is limited in ring zone form to form a distribution of electromagnetic field converging toward the center of a beam orbit axis. Consequently, a nonlinear action outwardly augmented, typified by spherical aberration of an electron lens, can be cancelled out. Specifically, this effect can be achieved by an electron disposed on the axis and subjected to a voltage to facilitate the occurrence of electrostatic focusing. For a magnetic field, this effect can be achieved by forming a coil radially distributed-wound on a surface equiangularly divided in the direction of rotation to control convergence of a magnetic flux density.

Abstract translation: 本发明涉及一种用于带电粒子束的轨道校正方法，其目的在于解决常规像差校正系统中固有的问题，并提供一种用于带电粒子束的低成本，高精度，高分辨率的聚光系统。 为此，所采用的是波束轨道受环形形式限制以形成朝向光束轨道中心收敛的电磁场分布的结构。 因此，可以抵消以电子透镜的球面像差为代表的向外扩大的非线性动作。 具体地说，这种效果可以通过设置在轴上的电子元件实现，并且经受电压以便于静电聚焦的发生。 对于磁场，这种效果可以通过在旋转方向上等角地分割的表面上形成径向分布缠绕的线圈来实现，以控制磁通密度的收敛。