Photoresist stripping composition
    40.
    发明授权
    Photoresist stripping composition 失效
    光阻剥离组合物

    公开(公告)号:US5554312A

    公开(公告)日:1996-09-10

    申请号:US374205

    申请日:1995-01-13

    申请人: Irl E. Ward

    发明人: Irl E. Ward

    摘要: A non-aqueous photoresist stripping composition for effectively preventing the redeposition of alkali metal ions, particularly sodium and potassium ions, on a substrate during the stripping operation is disclosed. The stripping composition comprises:(a) an organic polar solvent;(b) an organic aliphatic or aromatic amine, or an organic amino alcohol; and(c) either polyethylene glycol or polypropylene glycol in an amount to provide a caging effect. The composition also preferably includes a biodegradable organic solvent.

    摘要翻译: 公开了一种用于在剥离操作期间有效地防止碱金属离子,特别是钠和钾离子在基底上再沉积的非水性光致抗蚀剂剥离组合物。 汽提组合物包含:(a)有机极性溶剂; (b)有机脂族或芳族胺或有机氨基醇; 和(c)以提供笼养效果的量的聚乙二醇或聚丙二醇。 该组合物还优选包括可生物降解的有机溶剂。