摘要:
The present invention relates to a method for electrically coalescing emulsions especially those containing lipophilic fluid. The present invention is also directed to a method to treat fabrics wherein such an emulsion is created during the treatment process and requires electric coalescence prior to reuse of the lipophilic fluid.
摘要:
A semiconductor wafer cleaning formulation, including 2-98% wt. organic amine, 0-50% wt. water, 0.1-60% wt. 1,3-dicarbonyl compound chelating agent, 0-25% wt. of additional different chelating agent(s), 0.5-40% wt. nitrogen-containing carboxylic acid or an imine, and 2-98% wt polar organic solvent. The formulations are useful to remove residue from wafers following a resist plasma ashing step, such as inorganic residue from semiconductor wafers containing delicate copper interconnecting structures.
摘要:
Fabric article treatment in a domestic appliance having at least one detergency step, products therefor, and kits which combine treatment products for more effective results.
摘要:
The present invention relates to automatic home laundering processes for cleaning or refreshing fabric articles, especially articles of clothing, linen and drapery. The present invention also relates to automatic home laundering of mixed loads of fabric articles comprising machine washable fabric articles and dry clean only fabric articles.
摘要:
A non-corrosive photoresist stripping and cleaning composition, comprising: (a) about 5% to about 50% of a solvent; (b) about 10% to about 90% of an alkanolamine; (c) about 0.1 to 10 % of a carboxylic acid; and (d) about 1.0% to 40% of water.
摘要:
An aqueous stripping composition comprising a mixture of a polar amine, an organic or inorganic amine and a corrosion inhibitor which is gallic acid, its ester or analog. The stripping composition is effective to strip photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures without redepositing any substantial amount of metal ions.
摘要:
A non-flammable water-repellent/oil repellent composition containing a fluorine containing-polymer and a solvent containing at least 40% by weight of a non-flammable perfluoro organic compound.
摘要:
This invention provides graffiti removers for removing permanent ink stains from painted surfaces. The graffiti removers include an active solvent for dissolving the stains, which are organic in nature, an optional secondary solvent for concentrated attack on the stain without being adversely affected by dilution with water, an emollient for maintaining a uniform dispersion of particulates in the remover and on the graffiti-stained painted surfaces, and an amorphous, particulate, mildly abrasive filler for imbibing the solvents, the filler being selected to permit the slow release of the active solvent.
摘要:
An aqueous and acidic stripping and cleaning composition is provided which contains a polyhydric alcohol, ammonium fluoride, dimethylsulfoxide and water. The pH of the composition is greater than about 4 but less than 7. Also provided is a method of stripping and cleaning utilizing the compositions of the invention. Optionally, the composition may contain a phosphate buffer.
摘要:
A non-aqueous photoresist stripping composition for effectively preventing the redeposition of alkali metal ions, particularly sodium and potassium ions, on a substrate during the stripping operation is disclosed. The stripping composition comprises:(a) an organic polar solvent;(b) an organic aliphatic or aromatic amine, or an organic amino alcohol; and(c) either polyethylene glycol or polypropylene glycol in an amount to provide a caging effect. The composition also preferably includes a biodegradable organic solvent.