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    Aluminum oxide particle and polishing composition containing the same
    32.
    发明申请
    Aluminum oxide particle and polishing composition containing the same 审中-公开
    氧化铝颗粒和含有它的抛光组合物

    公开(公告)号：US20110258938A1

    公开(公告)日：2011-10-27

    申请号：US12997455

    申请日：2009-06-12

    申请人： Hitoshi Morinaga ,  Muneaki Tahara ,  Yasushi Matsunami

    发明人： Hitoshi Morinaga ,  Muneaki Tahara ,  Yasushi Matsunami

    IPC分类号： C09G1/02 ,  C09K3/14

    CPC分类号： B24D3/00 ,  C01F7/02 ,  C01F7/441 ,  C01P2004/03 ,  C01P2004/38 ,  C01P2004/39 ,  C01P2004/45 ,  C01P2004/52 ,  C01P2004/54 ,  C01P2004/61 ,  C01P2004/62 ,  C09K3/1409 ,  Y10T428/2982

    摘要： Aluminum oxide particles are provided that include primary particles each having a hexahedral shape and an aspect ratio of 1 to 5. The aluminum oxide particles preferably have an average primary particle size of 0.01 to 0.6 μm. The aluminum oxide particles preferably have an alpha conversion rate of 5 to 70%. Further, the aluminum oxide particles preferably have an average secondary particle size of 0.01 to 2 μm, and the value obtained by dividing the 90% particle size of the aluminum oxide particles by the 10% particle size of the aluminum oxide particles is preferably 3 or less. The aluminum oxide particles are used, for example, as abrasive grains in the applications of polishing semiconductor device substrates, hard disk substrates, or display substrates.

    摘要翻译： 提供氧化铝颗粒，其包括各自具有六面体形状和长宽比为1至5的一次颗粒。氧化铝颗粒的平均一次粒径优选为0.01至0.6μm。 优选氧化铝粒子的α转化率为5〜70％。 此外，氧化铝粒子的平均二次粒径优选为0.01〜2μ​​m，通过将氧化铝粒子的90％粒径除以氧化铝粒子的10％粒径而得到的值优选为3或 减。 氧化铝粒子例如在研磨半导体器件基板，硬盘基板或显示基板的应用中用作磨粒。

    Process for the preparation of precipitated silica, new precipitated silicas containing zinc and their use for the reinforcement of elastomers
    34.
    发明授权
    Process for the preparation of precipitated silica, new precipitated silicas containing zinc and their use for the reinforcement of elastomers 失效
    沉淀二氧化硅的制备方法，含锌的新型沉淀二氧化硅及其用于增强弹性体的用途

    公开(公告)号：US5846311A

    公开(公告)日：1998-12-08

    申请号：US737975

    申请日：1997-03-03

    申请人： Yves Bomal ,  Yvonick Chevallier ,  Evelyne Prat

    发明人： Yves Bomal ,  Yvonick Chevallier ,  Evelyne Prat

    IPC分类号： C01B33/193 ,  C08K3/36 ,  C08K9/00 ,  C08L21/00 ,  C09C1/30 ,  C01B33/12

    CPC分类号： C09C1/3045 ,  C01B33/193 ,  C08K3/36 ,  C09C1/30 ,  C01P2002/54 ,  C01P2004/12 ,  C01P2004/20 ,  C01P2004/32 ,  C01P2004/39 ,  C01P2004/50 ,  C01P2004/61 ,  C01P2006/10 ,  C01P2006/12 ,  C01P2006/14 ,  C01P2006/16 ,  C01P2006/17 ,  C01P2006/19 ,  C01P2006/80 ,  C01P2006/90

    摘要： The invention relates to a new process for the preparation of precipitated silica which has a good dispersibility and very satisfactory reinforcing properties. It also relates to new precipitated silicas which are in the form of powder, of substantially spherical beads or of granules, these silicas being characterized by the fact that they have a CTAB specific surface of between 90 and 250 m.sup.2 /g, a DOP oil uptake lower than 300 ml/100 g, a pore distribution such that the pore volume consisting of the pores whose diameter is between 175 and 275 .ANG. represents less than 50% of the pore volume consisting of the pores of diameters smaller than or equal to 400 .ANG., a zinc content of between 1 and 5% by weight and by the fact that the number N of molecules of stearic acid consumed per nm.sup.2 of silica surface, when stearic acid is reacted with the said silica in xylene for 2 hours at 120.degree. C., is at least 1. The invention also relates to the use of the said silicas as reinforcing fillers for elastomers especially for improving their rheological properties.

    摘要翻译： PCT No.PCT / FR96 / 00461 Sec。 371日期1997年3月3日 102（e）1997年3月3日PCT 1996年3月28日PCT公布。 WO96 / 30301 PCT出版物 日期1996年10月3日本发明涉及一种制备沉淀二氧化硅的新方法，其具有良好的分散性和非常令人满意的增强性能。 它还涉及新的沉淀二氧化硅，其为粉末形式，基本上为球形的珠粒或颗粒，这些二氧化硅的特征在于它们的CTAB比表面积为90至250m 2 / g，DOP油吸收 小于300ml / 100g，孔分布使得由直径在175和275之间的孔组成的孔体积小于由直径小于或等于400的孔组成的孔体积的50％ ，锌含量为1至5重量％，并且当硬脂酸与所述二氧化硅在二甲苯中在120℃下反应2小时时，二氧化硅表面的nm2消耗的硬脂酸分子数N为N 本发明还涉及所述二氧化硅作为弹性体的增强填料的用途，特别是为了改善它们的流变性能。