发明申请
US20110258938A1 Aluminum oxide particle and polishing composition containing the same
审中-公开
氧化铝颗粒和含有它的抛光组合物
- 专利标题: Aluminum oxide particle and polishing composition containing the same
- 专利标题(中): 氧化铝颗粒和含有它的抛光组合物
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申请号: US12997455申请日: 2009-06-12
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公开(公告)号: US20110258938A1公开(公告)日: 2011-10-27
- 发明人: Hitoshi Morinaga , Muneaki Tahara , Yasushi Matsunami
- 申请人: Hitoshi Morinaga , Muneaki Tahara , Yasushi Matsunami
- 申请人地址: JP Kiyosu-shi
- 专利权人: FUJIMI INC.
- 当前专利权人: FUJIMI INC.
- 当前专利权人地址: JP Kiyosu-shi
- 优先权: JP2008-155603 20080613
- 国际申请: PCT/JP2009/060766 WO 20090612
- 主分类号: C09G1/02
- IPC分类号: C09G1/02 ; C09K3/14
摘要:
Aluminum oxide particles are provided that include primary particles each having a hexahedral shape and an aspect ratio of 1 to 5. The aluminum oxide particles preferably have an average primary particle size of 0.01 to 0.6 μm. The aluminum oxide particles preferably have an alpha conversion rate of 5 to 70%. Further, the aluminum oxide particles preferably have an average secondary particle size of 0.01 to 2 μm, and the value obtained by dividing the 90% particle size of the aluminum oxide particles by the 10% particle size of the aluminum oxide particles is preferably 3 or less. The aluminum oxide particles are used, for example, as abrasive grains in the applications of polishing semiconductor device substrates, hard disk substrates, or display substrates.
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