METHOD OF CORRECTING DYNAMIC VISION SENSOR (DVS) EVENTS AND IMAGE SENSOR PERFORMING THE SAME

    公开(公告)号:US20210014435A1

    公开(公告)日:2021-01-14

    申请号:US16796401

    申请日:2020-02-20

    Abstract: A method of correcting dynamic vision sensor (DVS) events is described. The method generates event data including events representing motion information of an object included in an image. Additionally, the method generates image data capturing an image and generates edge data representing edge information of the image based on the image data. The method also generates omitted events of the event data based on the edge data. Accuracy of the event data and performance of machine vision devices and systems operating based on the event data are enhanced by supplementing the omitted events of the event data provided from the DVS, using the edge information.

    Vision sensor and image processing device including the same

    公开(公告)号:US11765486B2

    公开(公告)日:2023-09-19

    申请号:US17494243

    申请日:2021-10-05

    CPC classification number: H04N25/771

    Abstract: A vision sensor including a plurality of pixels configured to sense intensity of incident light, and to output request signals representing an occurrence status of an event; and an event detection circuit configured to generate event data including information about a pixel at which the event occurs, based on the request signals, wherein each pixel of the plurality of pixels includes: a photoelectric conversion device configured to generate a current corresponding to the incident light; a current-to-voltage converter configured to generate a voltage corresponding to the current; an amplifier configured to amplify a variation amount of the generated voltage to generate an output voltage; an event storage configured to generate an event signal corresponding to a comparison between the output voltage and a threshold voltage, and to hold the event signal using cross-coupled transistors; and an output logic configured to output a request signal based on the event signal.

    Semiconductor device including plurality of patterns

    公开(公告)号:US11735522B2

    公开(公告)日:2023-08-22

    申请号:US17224906

    申请日:2021-04-07

    CPC classification number: H01L23/528 H01L23/5226

    Abstract: A semiconductor device includes a first metal wiring pattern area, and a second metal wiring pattern area that does not overlap the first metal wiring pattern area in a plan view. The first metal wiring pattern area includes a first pattern, the second metal wiring pattern area includes a second pattern that is spaced apart from the first pattern and includes one or more lines. The first metal wiring pattern area includes an assist pattern comprising one or more lines. The assist pattern is spaced apart from the second pattern, parallel with the second pattern, and is between the first pattern and the second pattern. One end of the assist pattern is connected to the first pattern.

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