公开(公告)号：US11899356B2

公开(公告)日：2024-02-13

申请号：US17958088

申请日：2022-09-30

Applicant: HOYA CORPORATION

Inventor： Kazuhiro Hamamoto ,  Takashi Uchida

IPC: G03F1/24

CPC classification number: G03F1/24

Abstract: A reflective film coated substrate includes a substrate having two main surfaces opposite to each other and end faces connected to outer edges of the two main surfaces; and a reflective film formed on one of the main surfaces and extending onto at least part of the end faces. The reflective film on the main surface has a multilayer structure including low refractive index layers and high refractive index layers alternately formed. The reflective film which extends onto the end faces has a single-layer structure containing a first element higher in content than any other element in the low refractive index layers and a second element higher in content than any other element in the high refractive index layers.

公开(公告)号：US11681214B2

公开(公告)日：2023-06-20

申请号：US17581590

申请日：2022-01-21

Applicant: HOYA CORPORATION

Inventor： Kazuhiro Hamamoto ,  Tsutomu Shoki

IPC: G03F1/24 ,  G03F1/42 ,  G03F7/20

CPC classification number: G03F1/24 ,  G03F1/42 ,  G03F7/2004

Abstract: A substrate with a multilayer reflective film, a reflective mask blank, a reflective mask and a method of manufacturing a semiconductor device that can prevent contamination of the surface of the multilayer reflective film even in the case of having formed reference marks on the multilayer reflective film. A substrate with a multilayer reflective film contains a substrate and a multilayer reflective film that reflects EUV light formed on the substrate. Reference marks are formed to a concave shape on the surface of the substrate with the multilayer reflective film. The reference marks have grooves or protrusions roughly in the center. The shape of the grooves or protrusions when viewed from overhead is similar or roughly similar to the shape of the reference marks.

公开(公告)号：US11500281B2

公开(公告)日：2022-11-15

申请号：US17008949

申请日：2020-09-01

Applicant: HOYA CORPORATION

Inventor： Kazuhiro Hamamoto ,  Takashi Uchida

IPC: G03F1/24

Abstract: A reflective film coated substrate includes a substrate having two main surfaces opposite to each other and end faces connected to outer edges of the two main surfaces; and a reflective film formed on one of the main surfaces and extending onto at least part of the end faces. The reflective film on the main surface has a multilayer structure including low refractive index layers and high refractive index layers alternately formed. The reflective film which extends onto the end faces has a single-layer structure containing a first element higher in content than any other element in the low refractive index layers and a second element higher in content than any other element in the high refractive index layers.

公开(公告)号：US11131921B2

公开(公告)日：2021-09-28

申请号：US16054295

申请日：2018-08-03

Applicant: HOYA CORPORATION

Inventor： Tsutomu Shoki ,  Kazuhiro Hamamoto ,  Yohei Ikebe

IPC: C23C14/02 ,  C23C14/35 ,  C23C14/46 ,  G03F1/24 ,  G03F1/38 ,  G03F1/84 ,  G06T7/00

Abstract: A method of manufacturing a reflective mask blank comprising a multilayer reflective film formed on a substrate so as to reflect EUV light; and a laminated film formed on the multilayer reflective film. The method includes the steps of depositing the multilayer reflective film on the substrate to form a multilayer reflective film formed substrate; carrying out defect inspection for the multilayer reflective film formed substrate; depositing the laminated film on the multilayer reflective film of the multilayer reflective film formed substrate; forming a fiducial mark for an upper portion of the laminated film to thereby form a reflective mask blank comprising the fiducial mark, the fiducial mark serving as a reference for a defect position in defect information; and carrying out defect inspection of the reflective mask blank by using the fiducial mark as a reference.

公开(公告)号：US10527927B2

公开(公告)日：2020-01-07

申请号：US16235334

申请日：2018-12-28

Applicant: HOYA CORPORATION

Inventor： Kazuhiro Hamamoto ,  Yoichi Usui

IPC: G03F1/24 ,  G03F1/38 ,  B32B7/02 ,  G03F7/20

Abstract: A conductive film coated substrate, including a conductive film formed thereon. In a relationship between a bearing area (%) and a bearing depth (nm) that are obtained by measuring, with an atomic force microscope, a region of 1 μm×1 μm of a surface of the conductive film, the surface of the conductive film satisfies a relationship that (BA70−BA30)/(BD70−BD30) is 15 or more and 260 or less (%/nm), and a maximum height (Rmax) is 1.3 nm or more and 15 nm or less.

公开(公告)号：US10394113B2

公开(公告)日：2019-08-27

申请号：US15539263

申请日：2015-12-15

Applicant: HOYA CORPORATION

Inventor： Kazuhiro Hamamoto ,  Yohei Ikebe

IPC: G03F1/24 ,  G03F1/32 ,  G03F1/48 ,  C03C3/06 ,  C03C15/00 ,  C03C17/34 ,  C03C17/36 ,  C03C23/00

Abstract: An object of the present invention is to obtain a reflective mask blank capable of obtaining high contrast at the edges of a phase shift film pattern. Provided is a reflective mask blank comprising a multilayer reflective film and a phase shift film that shifts the phase of EUV light formed in that order on a substrate, wherein root mean square roughness (Rms), obtained by measuring a 1 μm×1 μm region on the surface of the phase shift film with an atomic force microscope, is not more than 0.50 nm, and power spectrum density at a spatial frequency of 10 to 100 μm−1 is not more than 17 nm4.

公开(公告)号：US10175394B2

公开(公告)日：2019-01-08

申请号：US15705304

申请日：2017-09-15

Applicant: HOYA CORPORATION

Inventor： Kazuhiro Hamamoto ,  Toshihiko Orihara

IPC: G03B27/32 ,  G02B5/08 ,  G03F1/24 ,  G02B5/26 ,  G02B5/28 ,  G03F1/52 ,  G03F1/84 ,  G03F7/20 ,  G02B1/14 ,  G02B5/00

Abstract: A substrate with multilayer reflective film for discovery of critical defects by inhibiting the detection of pseudo defects attributable to surface roughness of a substrate or film using a highly sensitive defect inspection apparatus. The substrate has a multilayer reflective film obtained by alternately laminating a high refractive index layer and a low refractive index layer on a main surface of a mask blank substrate used in lithography, wherein an integrated value I of the power spectrum density (PSD) at a spatial frequency of 1 μm−1 to 10 μm−1 of the surface of the substrate with a multilayer reflective film, obtained by measuring a region measuring 3 μm×3 μm with an atomic force microscope, is not more than 180×10−3 nm3, and the maximum value of the rower spectrum density (PSD) at a spatial frequency of 1 μm−1 to 10 μm−1 is not more than 50 nm4.

公开(公告)号：US09897909B2

公开(公告)日：2018-02-20

申请号：US15134776

申请日：2016-04-21

Applicant: HOYA CORPORATION

Inventor： Kazuhiro Hamamoto ,  Toshihiko Orihara ,  Hirofumi Kozakai ,  Youichi Usui ,  Tsutomu Shoki ,  Junichi Horikawa

IPC: G03F1/22 ,  G03F1/50 ,  G03F1/60 ,  G03F7/20 ,  H01L21/033

CPC classification number: G03F1/22 ,  G03F1/50 ,  G03F1/60 ,  G03F7/2004 ,  H01L21/0332 ,  H01L21/0334

Abstract: Disclosed is a mask blank substrate for use in lithography, wherein a main surface of the substrate satisfies a relational equation of (BA70−BA30)/(BD70−BD30)≧350 (%/nm), and has a maximum height (Rmax)≦1.2 nm in a relation between a bearing area (%) and a bearing depth (nm) obtained by measuring, with an atomic force microscope, an area of 1 μm×1 μm in the main surface on the side of the substrate where a transfer pattern is formed, wherein BA30 is defined as a bearing area of 30%, BA70 is defined as a bearing area of 70%, and BD70 and BD30 are defined to respectively represent bearing depths for the bearing area of 30% and the bearing area of 70%.

公开(公告)号：US09726969B2

公开(公告)日：2017-08-08

申请号：US14787532

申请日：2014-08-29

Applicant: HOYA CORPORATION

Inventor： Kazuhiro Hamamoto ,  Tatsuo Asakawa ,  Tsutomu Shoki

IPC: G03F1/24 ,  G03F1/50 ,  G03F1/84 ,  G03F7/20

CPC classification number: G03F1/24 ,  G03F1/84 ,  G03F7/2004

Abstract: A reflective mask blank capable of facilitating the discovery of contaminants, scratches and other critical defects by inhibiting the detection of pseudo defects attributable to surface roughness of a substrate or film in a defect inspection using a highly sensitive defect inspection apparatus. The reflective mask blank has a mask blank multilayer film comprising a multilayer reflective film, obtained by alternately laminating a high refractive index layer and a low refractive index layer, and an absorber film on a main surface of a mask blank substrate, wherein, in the relationship between bearing area (%) and bearing depth (nm) as measured with an atomic force microscope for a 1 μm×1 μm region of the surface of the reflective mask blank on which the mask blank multilayer film is formed, the surface of the reflective mask blank satisfies the relationship of (BA70−BA30)/(BD70−BD30)≧60(%/nm) and maximum height (Rmax)≦4.5 nm.

公开(公告)号：US09348217B2

公开(公告)日：2016-05-24

申请号：US14348349

申请日：2013-03-28

Applicant: HOYA CORPORATION

Inventor： Kazuhiro Hamamoto ,  Toshihiko Orihara ,  Hirofumi Kozakai ,  Youichi Usui ,  Tsutomu Shoki ,  Junichi Horikawa

IPC: G03F1/50 ,  G03F1/22 ,  G03F1/60

CPC classification number: G03F1/22 ,  G03F1/50 ,  G03F1/60 ,  G03F7/2004 ,  H01L21/0332 ,  H01L21/0334

Abstract: Disclosed is a mask blank substrate for use in lithography, wherein a main surface of the substrate satisfies a relational equation of (BA70−BA30)/(BD70−BD30)≧350 (%/nm), and has a maximum height (Rmax)≦1.2 nm in a relation between a bearing area (%) and a bearing depth (nm) obtained by measuring, with an atomic force microscope, an area of 1 μm×1 μm in the main surface on the side of the substrate where a transfer pattern is formed, wherein BA30 is defined as a bearing area of 30%, BA70 is defined as a bearing area of 70%, and BD70 and BD30 are defined to respectively represent bearing depths for the bearing area of 30% and the bearing area of 70%.

Abstract translation: 公开了一种用于光刻的掩模空白基板，其中基板的主表面满足关系式（BA70-BA30）/（BD70-BD30）≥350（％/ nm），并具有最大高度（Rmax） ＆nlE; 1.2nm的轴承面积（％）和轴承深度（nm）之间的关系，通过使用原子力显微镜测量在基板侧的主表面中的1μm的面积， 形成转印图案，其中BA30被定义为30％的轴承面积，BA70被定义为70％的轴承面积，并且BD70和BD30被定义为分别表示30％的轴承面积的轴承深度和轴承 面积达70％。