Quantum dot ink
    31.
    发明授权

    公开(公告)号:US10311994B2

    公开(公告)日:2019-06-04

    申请号:US15118234

    申请日:2015-12-29

    Abstract: A quantum dot ink, a manufacturing method thereof and a quantum dot light emitting diode device are provided. The quantum dot ink includes a non-polar organic solvent, a surface tension modifier and a hydrophobic quantum dot, the quantum dot ink further includes a carrier transport material, wherein phase separation is present between the hydrophobic quantum dot and the carrier transport material. After completing ink-jet printing the quantum dot ink, phase separation occurs between the hydrophobic quantum dot and the carrier transport material. Thus, the two-layer structure of a hydrophobic quantum dot layer and a carrier transport material layer is formed through one process. Not only a quantum dot light emitting device is manufactured by the method of ink-jet printing, but also the operation is simplified, and the manufacturing cost of the quantum dot light emitting device is reduced.

    Array Substrate and Display Device
    32.
    发明申请

    公开(公告)号:US20190051679A1

    公开(公告)日:2019-02-14

    申请号:US16160223

    申请日:2018-10-15

    Abstract: Disclosed is an array substrate and a display device. The array substrate includes: a plurality of gate lines and a plurality of data lines formed on a base substrate, and a plurality of pixel units defined by the plurality of gate lines and the plurality of data lines intersecting each other, wherein each pixel unit includes a thin film transistor and a pixel electrode connected with the thin film transistor, the pixel electrode, the data line, as well as an active layer, a source and a drain of the thin film transistor are disposed in a same layer and are formed through a single patterning process,

    Array substrate, method for fabricating the same, and OLED display device
    35.
    发明授权
    Array substrate, method for fabricating the same, and OLED display device 有权
    阵列基板及其制造方法以及OLED显示装置

    公开(公告)号:US09401390B2

    公开(公告)日:2016-07-26

    申请号:US14105145

    申请日:2013-12-12

    Abstract: This invention provides an array substrate, a method for fabricating the same, and an OLED display device, which can solve the technical problem that the existing OLED display device has low luminous efficiency. Each pixel unit of the array substrate comprises: a TFT drive layer; an OLED further away from the substrate than the TFT drive layer and driven by it, the OLED sequentially comprises a first electrode, a light emitting layer, and a transparent second electrode, wherein the first electrode is a reflection layer, or the first electrode is transparent and has a reflection layer disposed thereunder; a transflective layer further away from the substrate than the OLED and forming a microcavity structure with the reflection layer; and a color filter film disposed between the OLED and the transflective layer and located in the microcavity structure. The present invention is particularly suitable for a WOLED display device.

    Abstract translation: 本发明提供阵列基板,其制造方法和OLED显示装置,其可以解决现有的OLED显示装置的发光效率低的技术问题。 阵列基板的每个像素单元包括:TFT驱动层; OLED比TFT驱动层更远离OLED驱动的OLED,OLED顺序地包括第一电极,发光层和透明的第二电极,其中第一电极是反射层,或者第一电极是 透明并具有设置在其下面的反射层; 比OLED更远离衬底的半透反射层,并与反射层形成微腔结构; 以及设置在OLED和透反射层之间并且位于微腔结构中的滤色膜。 本发明特别适用于WOLED显示装置。

    Open-type head mount display device and display method thereof
    36.
    发明授权
    Open-type head mount display device and display method thereof 有权
    开式头戴显示装置及其显示方法

    公开(公告)号:US09348139B2

    公开(公告)日:2016-05-24

    申请号:US14077729

    申请日:2013-11-12

    Abstract: The present invention provides an open-type head mount display device and a display method thereof. The open-type head mount display device according to the present invention comprises a display unit for generating display images; a focusing lens unit for adjusting the object distance of a display image from a user's eye; an image acquisition unit for acquiring the image of the two eyes of the user; a focal distance analyzing unit for obtaining the focal distance of the user's eye according to the image of the two eyes of the user; and a lens adjusting unit for adjusting the position of the focusing lens unit in the light ray propagation direction of the display image according to a control command from the analyzing unit, so that the object distance of the display image is matched with the current focal distance of the user's eye.

    Abstract translation: 本发明提供一种开放型头戴式显示装置及其显示方法。 根据本发明的开放型头戴式显示装置包括:用于产生显示图像的显示单元; 聚焦透镜单元,用于调节显示图像与使用者的眼睛的距离; 图像获取单元,用于获取用户的两只眼睛的图像; 焦距分析单元,用于根据用户的两只眼睛的图像获得用户的眼睛的焦距; 以及透镜调整单元,用于根据来自分析单元的控制命令调整聚焦透镜单元在显示图像的光线传播方向上的位置,使得显示图像的物距与当前焦距 的用户眼睛。

    SCANNING TYPE BACKLIGHT MODULE AND DISPLAY DEVICE
    37.
    发明申请
    SCANNING TYPE BACKLIGHT MODULE AND DISPLAY DEVICE 有权
    扫描式背光模组和显示装置

    公开(公告)号:US20160033709A1

    公开(公告)日:2016-02-04

    申请号:US14422048

    申请日:2014-06-05

    Abstract: The embodiments of the invention disclose a scanning type backlight module and a display device. Since a laser light source with good collimation is applied, during a display time of a frame, with the modulation of the optical path regulator, the laser emitted from the laser light source performs a progressive scanning for a region corresponding to at least one row of pixel units in a light guide plate or a display panel. Therefore, the problem of dynamic picture ghosting can be solved effectively; moreover, since the progressive scanning for the entire light guide plate can be realized by changing the light propagation path of the laser emitted from the laser light source with the optical path regulator, the number of the laser light sources can be reduced and the production cost can be decreased.

    Abstract translation: 本发明的实施例公开了一种扫描型背光模块和显示装置。 由于在帧的显示时间期间应用具有良好准直的激光光源,通过光路调节器的调制,从激光光源发射的激光对与至少一行的对应的区域执行逐行扫描 导光板或显示面板中的像素单元。 因此,动态图像重影的问题可以有效解决; 此外,由于可以通过使用光路调节器改变从激光光源发射的激光的光传播路径来实现整个导光板的逐行扫描,所以可以减少激光光源的数量并且生产成本 可以减少。

    ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, DISPLAY DEVICE
    38.
    发明申请
    ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, DISPLAY DEVICE 有权
    阵列基板及其制造方法,显示装置

    公开(公告)号:US20150294993A1

    公开(公告)日:2015-10-15

    申请号:US14407514

    申请日:2014-05-30

    Abstract: An array substrate and a manufacturing method thereof as well as a display device are disclosed. The array substrate includes a gate (21) and a gate insulating layers (22) of TFT formed in this order on a surface of a base substrate (20); a semiconductor active layer (23), an etching stop layer (24), and a source (251)/drain (252) of the TFT formed in this order on a surface of the gate insulating layer (22) corresponding to the gate (21) of the TFT. The source (251) and drain (252) of the TFT contact the semiconductor active layer (23) through respective vias. The array substrate further includes: a shielding electrode (26) formed between the gate (21) of the TFT and the base substrate (20); and an insulating layer (27) formed between the gate (21) of the TFT and the shielding electrode (26). In a region where the gate (21) faces the source (251), the area of the gate (210) is smaller than that of the source (251); and/or in a region where the gate (21) faces the drain (252), the area of the gate (210) is smaller than that of the drain (252). The array substrate according to embodiments of the present invention reduces the parasitic capacitance between the source/drain and the gate of the TFT and improves the quality of a display device.

    Abstract translation: 公开了阵列基板及其制造方法以及显示装置。 阵列基板包括在基底(20)的表面上依次形成的栅极(21)和栅极绝缘层(22); 在栅极绝缘层(22)的与栅极对应的表面上依次形成的TFT的半导体有源层(23),蚀刻停止层(24)以及源极(251)/漏极(252) 21)的TFT。 TFT的源极(251)和漏极(252)通过各自的通孔与半导体活性层(23)接触。 阵列基板还包括:形成在TFT的栅极(21)与基底(20)之间的屏蔽电极(26); 以及形成在TFT的栅极(21)与屏蔽电极(26)之间的绝缘层(27)。 在栅极(21)面对源极(251)的区域中,栅极(210)的面积小于源极(251)的面积; 和/或在栅极(21)面对漏极(252)的区域中,栅极(210)的面积小于漏极(252)的面积。 根据本发明的实施例的阵列基板减小了TFT的源极/漏极和栅极之间的寄生电容,并提高了显示器件的质量。

    ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICE
    39.
    发明申请
    ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICE 有权
    阵列基板及其制造方法及显示装置

    公开(公告)号:US20140353690A1

    公开(公告)日:2014-12-04

    申请号:US14347451

    申请日:2013-12-02

    CPC classification number: H01L27/1259 G02F1/134363 H01L27/124

    Abstract: An array substrate, a manufacturing method thereof, and a display device are provided. The array substrate comprise a base substrate (11), a gate line, a data line, and a pixel region defined by intersection of the gate line and the data line, which are formed on the base substrate (11), wherein the pixel region comprises a thin film transistor, and the thin film transistor comprises a gate, a gate insulation layer, an active layer, a source and a drain, the pixel region further comprise: at least one groove (110), formed on a surface of the base substrate (11); a first electrode layer (12) comprising at least one first electrode bar (120), the first electrode bars (120) are disposed in the groove (110) and electrically connected with each other; and a second electrode layer (13) comprising at least one second electrode bar (130), wherein the second electrode bars (130) are disposed outside the groove (110) and electrically connected with each other. No overlapping between the common electrode and the pixel electrode can be achieved, so as to improve display quality of the display device.

    Abstract translation: 提供阵列基板,其制造方法和显示装置。 阵列基板包括形成在基底基板(11)上的基极基板(11),栅极线,数据线以及与栅极线和数据线交叉限定的像素区域,其中像素区域 所述薄膜晶体管包括栅极,栅极绝缘层,有源层,源极和漏极,所述像素区域还包括:至少一个沟槽(110),形成在所述薄膜晶体管的表面上, 基底(11); 包括至少一个第一电极棒(120)的第一电极层(12),所述第一电极棒(120)设置在所述凹槽(110)中并彼此电连接; 以及包括至少一个第二电极棒(130)的第二电极层(13),其中所述第二电极棒(130)设置在所述凹槽(110)的外部并彼此电连接。 可以实现公共电极和像素电极之间的重叠,从而提高显示装置的显示质量。

    Fabricating Method Of Thin Film Transistor, Fabricating Method Of Array Substrate And Display Device
    40.
    发明申请
    Fabricating Method Of Thin Film Transistor, Fabricating Method Of Array Substrate And Display Device 有权
    薄膜晶体管的制造方法,阵列基板和显示装置的制造方法

    公开(公告)号:US20140080254A1

    公开(公告)日:2014-03-20

    申请号:US14028667

    申请日:2013-09-17

    CPC classification number: H01L29/66969 H01L27/1225 H01L29/7869

    Abstract: An embodiment of the present invention provides a fabricating method of a thin film transistor, a fabricating method of an array substrate, and a display device. The fabricating method of a thin film transistor comprises: forming a gate electrode on a substrate; and forming a gate insulating layer, a semiconductor layer, source and drain electrodes and a channel region on the substrate, wherein, the semiconductor layer is formed of a metal oxide, and two etching steps are used to form the channel region, and in a first etching step, a part of a source-drain metal layer above the semiconductor layer corresponding to the channel region is removed by using a dry etching, and in a second etching step, a remaining part of the source-drain metal layer above the semiconductor layer corresponding to the channel region is removed by using a wet etching, thereby forming the channel region.

    Abstract translation: 本发明的实施例提供了薄膜晶体管的制造方法,阵列基板的制造方法和显示装置。 薄膜晶体管的制造方法包括:在衬底上形成栅电极; 以及在基板上形成栅极绝缘层,半导体层,源极和漏极以及沟道区,其中半导体层由金属氧化物形成,并且使用两个蚀刻步骤来形成沟道区,并且在 第一蚀刻步骤,通过使用干蚀刻去除对应于沟道区的半导体层上方的源极 - 漏极金属层的一部分,并且在第二蚀刻步骤中,在半导体上方的源极 - 漏极金属层的剩余部分 通过使用湿法蚀刻除去与沟道区对应的层,从而形成沟道区。

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