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    Jet control devices and methods
    22.
    发明授权
    Jet control devices and methods 有权
    喷气控制装置和方法

    公开(公告)号：US09267515B2

    公开(公告)日：2016-02-23

    申请号：US14385898

    申请日：2013-04-04

    申请人： General Fusion, Inc.

    发明人： Victoria Suponitsky ,  Sandra Justine Barsky ,  J. Michel G. Laberge ,  Douglas Harvey Richardson ,  Peter Leszek Kostka

    IPC分类号： H01J13/28 ,  F15D1/00 ,  F15D1/08 ,  F17D1/00

    CPC分类号： B05B1/26 ,  F15D1/0005 ,  F15D1/08 ,  F17D1/00 ,  G21B3/008 ,  H05H1/24 ,  H05H2277/13 ,  Y10T137/0318 ,  Y10T137/86163

    摘要： Examples of a jet control device are described. The jet control device can comprise a jet deflecting member that is configured to intercept and/or collide with a high speed jet emerging from a jet formation location. The interaction of the jet deflecting member and the jet can cause the high speed jet to be dispersed into a plurality of jets with a number of flow directions which may be sideways to an initial direction of the high speed jet. In one embodiment the deflecting member can include a liquid guide formed by injecting a fluid out of an outlet nozzle so that the liquid guide extends longitudinally away from the outlet nozzle. In another embodiment the deflecting member can include an array of solid pellets injected through an outlet in a direction of the emerging high speed jet and configured to collide with the emerging jet thereby deflecting its initial direction.

    摘要翻译： 描述喷射控制装置的实例。 喷射控制装置可以包括射流偏转构件，其构造成拦截和/或与从喷射形成位置出射的高速喷射器相撞。 喷射偏转构件和射流的相互作用可以使高速射流分散成多个喷射流，其中多个流动方向可以横向到高速射流的初始方向。 在一个实施例中，偏转构件可以包括通过将流体从出口喷嘴喷射而形成的液体引导件，使得液体引导件纵向远离出口喷嘴延伸。 在另一个实施例中，偏转构件可以包括通过出口沿着出现的高速射流的方向注入并配置成与出现的射流碰撞从而偏转其初始方向的固体粒子阵列。

    System and method to adaptively pre-compensate for target material push-out to optimize extreme ultraviolet light production
    23.
    发明授权
    System and method to adaptively pre-compensate for target material push-out to optimize extreme ultraviolet light production 有权
    系统和方法适应性地预补偿目标材料推出，以优化极紫外光生产

    公开(公告)号：US09238243B2

    公开(公告)日：2016-01-19

    申请号：US13631645

    申请日：2012-09-28

    申请人： Jeroen van der Burgt ,  Matthew R. Graham ,  Charles Kinney ,  Wayne J. Dunstan

    发明人： Jeroen van der Burgt ,  Matthew R. Graham ,  Charles Kinney ,  Wayne J. Dunstan

    IPC分类号： H05G2/00 ,  B05B17/00

    CPC分类号： G03F7/70033 ,  B05B17/00 ,  H05G2/006 ,  H05G2/008 ,  H05H1/24

    摘要： Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam is focused on droplets of target material to generate plasma at a primary focal spot. Maintaining droplets at the primary focal spot during burst firing is difficult because generated plasma from preceding droplets push succeeding droplets out of the primary focal spot. Current droplet-to-droplet feedback control to re-align droplets to the primary focal spot is relatively slow. The system and method described herein adaptively pre-compensate for droplet push-out by directing droplets to a target position that is offset from the primary focal spot such that when a droplet is lased, the droplet is pushed by the laser beam into the primary focal spot to generate plasma. Over time, the EUV system learns to maintain real-time alignment of droplet position so plasma is generated consistently within the primary focal spot.

    摘要翻译： 来自激光产生的等离子体（LPP）极紫外光（EUV）系统的能量输出基于激光束聚焦在目标材料的液滴上以在主要焦点产生等离子体的程度而变化。 在爆发射击过程中，在主焦点处保持液滴是困难的，因为来自前面的液滴的所产生的等离子体将后续的液滴推出主焦点。 将液滴重新对准主要焦点的当前液滴到液滴的反馈控制相对较慢。 本文所述的系统和方法通过将液滴引导到偏离主要焦点的目标位置来自适应地预补偿液滴推出，使得当液滴被照射时，液滴被激光束推动到主要焦点 点产生等离子体。 随着时间的推移，EUV系统学会保持液滴位置的实时对准，从而在主焦点内始终产生等离子体。

    Micro-plasma generation using micro-springs
    24.
    发明授权
    Micro-plasma generation using micro-springs 有权
    使用微弹簧的微等离子体生成

    公开(公告)号：US09210785B2

    公开(公告)日：2015-12-08

    申请号：US13802569

    申请日：2013-03-13

    申请人： Palo Alto Research Center Incorporated

    发明人： Bowen Cheng ,  Dirk DeBruyker ,  Eugene M. Chow

    IPC分类号： F21V7/00 ,  H05H1/24 ,  H01T23/00 ,  H05H1/48

    CPC分类号： H05H1/24 ,  H01T23/00 ,  H05H2001/481

    摘要： An ionic wind engine unit for cooling semiconductor circuit assemblies includes a curved micro-spring and an associated electrode that are maintained apart at an appropriate gap distance such that, when subjected to a sufficiently high voltage potential (i.e., as determined by Peek's Law), current crowding at the spring's tip portion creates an electrical field that sufficiently ionizes neutral molecules in a portion of the air-filled region surrounding the tip portion to generate a micro-plasma event. In one engine type the electrode is a metal pad, and in a second engine type the electrode is a second micro-spring. Ionic wind cooling is generated, for example, between an IC die and a base substrate in a flip-chip arrangement, by controlling multiple engines disposed on the facing surfaces to produce an air current in the air gap region separating the IC device and base substrate.

    摘要翻译： 用于冷却半导体电路组件的离子风力发动机单元包括弯曲的微型弹簧和相关联的电极，其被保持在适当的间隙距离处，使得当经受足够高的电压电位（即，由佩克定律确定）时， 在弹簧的尖端部分处的电流拥挤产生电场，该电场使围绕尖端部分的空气填充区域的一部分中的中性分子充分电离以产生微等离子体事件。 在一种发动机类型中，电极是金属焊盘，在第二发动机类型中，电极是第二微型弹簧。 通过控制设置在相对表面上的多个发动机在分离IC器件和基底基板的气隙区域中产生气流而产生例如以倒装芯片布置在IC芯片和基底基板之间的离子风冷却 。

    Plasma CVD apparatus
    25.
    发明授权
    Plasma CVD apparatus 有权
    等离子体CVD装置

    公开(公告)号：US09133547B2

    公开(公告)日：2015-09-15

    申请号：US13395800

    申请日：2010-10-01

    申请人： Hiroshi Tamagaki ,  Tadao Okimoto ,  Toshiki Segawa

    发明人： Hiroshi Tamagaki ,  Tadao Okimoto ,  Toshiki Segawa

    IPC分类号： C23F1/00 ,  H01L21/306 ,  C23C16/503 ,  C23C16/50 ,  C23C16/505 ,  C23C16/509 ,  C23C16/54 ,  C23C16/44 ,  H01J37/32 ,  H05H1/24

    CPC分类号： C23C16/503 ,  C23C16/4412 ,  C23C16/50 ,  C23C16/505 ,  C23C16/509 ,  C23C16/54 ,  C23C16/545 ,  H01J37/32036 ,  H01J37/32366 ,  H01J37/32513 ,  H01J37/3266 ,  H01J37/3277 ,  H05H1/24 ,  H05H1/46 ,  H05H2001/4645 ,  H05H2001/485

    摘要： The disclosed plasma CVD apparatus (1) is provided with a vacuum chamber (3); a pair of deposition rollers (2, 2) disposed within the vacuum chamber (3) that are connected to both poles of an AC power supply and around which a substrate (W) is wound; a gas-supplying device (5) that supplies process gas containing a source gas to a deposition zone (D) which is a portion of or all of the region that is on one side of a line linking the centers of rotation of the pair of deposition rollers (2, 2); and a magnetic-field-generating device (7) that, by means of the AC power supply being applied to each of the deposition rollers (2, 2), forms a magnetic field that causes the source gas in a predetermined region to become plasma. The magnetic-field-generating device (7) causes the source gas in the region adjacent to the surface of the portion of the pair of deposition rollers (2, 2) located within the deposition zone (D) to become plasma, forming a plasma region (P). The substrate (W) is wound around the pair of deposition rollers (2, 2) so as to pass through the plasma region (P).

    摘要翻译： 所公开的等离子体CVD装置（1）设置有真空室（3）; 设置在所述真空室（3）内的一对沉积辊（2,2），其连接到交流电源的两个极，并且绕其上缠绕有衬底（W）; 将含有源气体的处理气体供给到沉积区（D）的供气装置（5），所述沉积区（D）是连接所述一对的旋转中心的线的一侧的区域的一部分或全部 沉积辊（2,2）; 以及通过施加到每个沉积辊（2,2）的交流电源形成磁场的磁场产生装置（7）形成使得预定区域中的源气体变成等离子体的磁场 。 磁场产生装置（7）使得位于沉积区（D）内的一对沉积辊（2,2）的部分的表面附近的区域中的源气体变成等离子体，形成等离子体 区域（P）。 基板（W）绕在该对沉积辊（2,2）周围，以通过等离子体区域（P）。

    EXTREME EDGE AND SKEW CONTROL IN ICP PLASMA REACTOR
    26.
    发明申请
    EXTREME EDGE AND SKEW CONTROL IN ICP PLASMA REACTOR 审中-公开
    ICP等离子体反应器的极端边缘和轴流控制

    公开(公告)号：US20150181684A1

    公开(公告)日：2015-06-25

    申请号：US14543316

    申请日：2014-11-17

    申请人： Applied Materials, Inc.

    发明人： Samer BANNA ,  Vladimir KNYAZIK ,  Kyle TANTIWONG

    IPC分类号： H05H1/24 ,  H01L21/67 ,  H01L21/3065

    CPC分类号： H05H1/24 ,  H01J37/321 ,  H01J37/32174 ,  H01J37/32642 ,  H01J37/32697 ,  H01L21/6875

    摘要： Embodiments of the present disclosure provide apparatus and methods for improving plasma uniformity around edge regions and/or reducing non-symmetry in a plasma processing chamber. One embodiment of the present disclosure provides a plasma tuning assembly having one or more conductive bodies disposed around an edge region of a substrate support in a plasma processing chamber. The one or more conductive bodies are isolated from other chamber components and electrically floating in the processing chamber near the edge region without connecting to active electrical potentials. During operation, when a plasma is maintained in the plasma processing chamber, the presence of the one or more conductive bodies affects the plasma distribution near the one or more conductive bodies.

    摘要翻译： 本公开的实施例提供了用于改善边缘区域周围的等离子体均匀性和/或降低等离子体处理室中的非对称性的装置和方法。 本公开的一个实施例提供了等离子体调谐组件，其具有设置在等离子体处理室中的衬底支撑件的边缘区域周围的一个或多个导电体。 一个或多个导电体与其它腔室部件隔离，并且在边缘区域附近电处理室中浮动，而不会连接到有源电位。 在操作期间，当在等离子体处理室中维持等离子体时，一个或多个导电体的存在影响一个或多个导电体附近的等离子体分布。

    Plasma generation apparatus
    27.
    发明授权
    Plasma generation apparatus 有权
    等离子体发生装置

    公开(公告)号：US09066413B2

    公开(公告)日：2015-06-23

    申请号：US14082795

    申请日：2013-11-18

    申请人： KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY

    发明人： Hong-Young Chang ,  Sanghyuk An ,  Jinwon Lee

    IPC分类号： H01J7/24 ,  H05B41/36 ,  H05H1/24 ,  H05H1/46 ,  H01J37/32

    CPC分类号： H05H1/24 ,  H01J37/321 ,  H01J37/32174 ,  H05H1/46 ,  H05H2001/4667 ,  H05H2001/4682

    摘要： A plasma generation apparatus includes a vacuum container, dielectrics connected to through-holes formed in the vacuum container, RF coils of the same structure disposed in the vicinity of the respective dielectrics and electrically connected in parallel, an RF power source to supply power to the RF coils, an impedance matching circuit disposed between the RF power source and the RF coils, and a power distribution unit disposed between the impedance matching circuit and one ends of the RF coils to distribute the power of the RF power source to the RF coils. The power distribution unit includes a power distribution line and a conductive outer cover enclosing the power distribution line. Distance between an input end of the power distribution unit and the RF coils are equal to each other, and the other ends of the RF coils are connected to the conductive outer cover to be grounded.

    摘要翻译： 等离子体产生装置包括真空容器，连接到形成在真空容器中的通孔的电介质，设置在各个电介质附近并并联并联的相同结构的RF线圈，RF电源，以向 RF线圈，设置在RF电源和RF线圈之间的阻抗匹配电路，以及布置在阻抗匹配电路和RF线圈的一端之间的配电单元，以将RF电源的功率分配给RF线圈。 配电单元包括配电线路和封闭配电线路的导电外罩。 配电单元的输入端和RF线圈之间的距离彼此相等，并且RF线圈的另一端连接到导电外盖以进行接地。

    BARRIER-FILM FORMING APPARATUS, BARRIER-FILM FORMING METHOD, AND BARRIER-FILM COATED CONTAINER
    29.
    发明申请
    BARRIER-FILM FORMING APPARATUS, BARRIER-FILM FORMING METHOD, AND BARRIER-FILM COATED CONTAINER 审中-公开
    遮蔽膜形成装置，遮蔽膜形成方法和遮盖膜涂布容器

    公开(公告)号：US20150108031A1

    公开(公告)日：2015-04-23

    申请号：US14579349

    申请日：2014-12-22

    申请人： MITSUBISHI HEAVY INDUSTRIES FOOD & PACKAGING MACHINERY CO., LTD. ,  KIRIN BEER KABUSHIKI KAISHA

    发明人： Yuji ASAHARA ,  Hideo YAMAKOSHI ,  Minoru DANNO ,  Seiji GOTO ,  Akira SHIRAKURA ,  Masaki NAKAYA ,  Kiyoshi HIROYA

    IPC分类号： C23C16/503 ,  B65D25/14

    CPC分类号： C23C16/503 ,  B65D23/02 ,  B65D25/14 ,  C23C16/045 ,  C23C16/509 ,  H01J37/32348 ,  H01J37/32623 ,  H05H1/24 ,  H05H1/2406 ,  H05H2001/2412

    摘要： A barrier-film forming apparatus that forms a barrier film on an inner face of a container having a concave or convex portion as a processing target, including: a dielectric member having a cavity sized to enclose the container, an external electrode covering an outer circumference of the dielectric member, an exhaust unit installed on an end face of the external electrode on a side where a mouth of the container is located, with an insulating member interposed therebetween, and depressurizing inside of the container through an exhaust pipe, an internal electrode inserted from a side of the exhaust pipe and also serving as a gas blowout unit that blows out medium gas for generating a barrier film into the container, and an electric-field applying unit that applies an electric field for generating exhaust between the external electrode and a ground electrode.

    摘要翻译： 一种阻隔膜形成装置，其在具有凹部或凸部的容器的内表面上形成阻挡膜作为加工对象，所述阻挡膜形成装置包括：电介质构件，其具有用于封闭所述容器的尺寸的空腔，覆盖外周的外部电极 所述绝缘构件安装在所述外部电极的位于所述容器的口侧的端面上的排气单元，其间具有绝缘构件，并且通过排气管对所述容器的内部进行减压，所述内部电极 从排气管的一侧插入并且还用作将用于产生阻挡膜的介质气体吹出到容器中的气体吹出单元，以及电场施加单元，其在外部电极和外部电极之间施加用于产生排气的电场 接地电极。