MICROWAVE SUBSTANCE TREATMENT SYSTEMS AND METHODS OF OPERATION

    公开(公告)号:US20190185349A1

    公开(公告)日:2019-06-20

    申请号:US15848345

    申请日:2017-12-20

    Applicant: NXP USA, Inc.

    Abstract: A substance treatment apparatus includes an RF signal source, power detection circuitry, a controller, and a transmission path between the RF signal source and a first electrode that radiates electromagnetic energy into a chamber. The RF signal source includes a solid-state amplifier that generates an RF signal. The power detection circuitry detects reflected signal power along the transmission path. Based on the reflected signal power, the controller modifies values of variable components within an impedance matching network electrically coupled along the transmission path to adjust a magnitude of the reflected signal power. The impedance matching network may have a double-ended input connected to a balun, and a double-ended output connected to the first electrode and to a second electrode. Alternatively, the impedance matching network may have a single-ended input connected to the RF signal source, and a single-ended output connected to the first electrode. The second electrode may be grounded.

    NON-THERMAL PLASMA GATE DEVICE
    10.
    发明申请

    公开(公告)号:US20190134594A1

    公开(公告)日:2019-05-09

    申请号:US16236756

    申请日:2018-12-31

    Applicant: Pear Labs LLC

    Abstract: A plasma gate device comprises a housing, a gas inlet, first and second dielectrics, and first, second, and third electrodes. The housing includes an internal reactor chamber. The gas inlet receives a source gas that flows to the reactor chamber. The first and second dielectrics are spaced apart from one another, with each dielectric including an upper surface and a lower surface. The two dielectrics are oriented such that the lower surface of the first dielectric faces the upper surface of the second dielectric. The first and second dielectrics form boundaries of the reactor chamber. The first electrode receives a first electric voltage. The second electrode receives a second electric voltage. The first and second electric voltages in combination generate an electric field in the reactor chamber through which the source gas flows creating a positive ion plasma and a cloud of electrons. The third electrode attracts the electrons.

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