Semiconductor device and fabrication process therefor and capacitor structure
    21.
    发明授权
    Semiconductor device and fabrication process therefor and capacitor structure 失效
    半导体器件及其制造工艺及电容器结构

    公开(公告)号:US06400022B1

    公开(公告)日:2002-06-04

    申请号:US09907689

    申请日:2001-07-19

    IPC分类号: H01L2840

    摘要: A semiconductor device with a high reliability is provided. The semiconductor device includes a silicon substrate, titanium nitride films and an interlayer insulating film. A first opening is formed in the titanium nitride film. A second opening having a diameter different from that of the first opening is formed in the second titanium nitride film. A contact hole is formed in the interlayer insulating film. A titanium film, a titanium nitride film, a plug layer and an interconnect layer are formed so as to be electrically connected to the titanium nitride films through the first and second openings.

    摘要翻译: 提供了具有高可靠性的半导体器件。 该半导体器件包括硅衬底,氮化钛膜和层间绝缘膜。 在氮化钛膜中形成第一开口。 在第二氮化钛膜中形成具有与第一开口的直径不同的直径的第二开口。 在层间绝缘膜中形成接触孔。 形成钛膜,氮化钛膜,插塞层和互连层,以通过第一和第二开口与氮化钛膜电连接。

    Method of manufacturing a semiconductor device
    22.
    发明授权
    Method of manufacturing a semiconductor device 失效
    制造半导体器件的方法

    公开(公告)号:US06251741B1

    公开(公告)日:2001-06-26

    申请号:US09219786

    申请日:1998-12-23

    IPC分类号: H01L218242

    CPC分类号: H01L27/10852 H01L27/10817

    摘要: There is described the manufacture of a semiconductor device having a storage node or high-yield manufacture of a compact memory IC. The present invention provides a method of manufacturing a semiconductor device including a basic dielectric layer formation step for forming a basic dielectric layer from a first dielectric material, a stopper film formation step for forming on the basic dielectric layer an etch stopper film from a second dielectric material differing from the first dielectric film, a sacrificial dielectric layer formation step for forming on the etch stopper film a sacrificial dielectric layer from the first dielectric material, a space formation step for forming a storage node formation space by removal of a predetermined area from the sacrificial dielectric layer until the etch stopper film becomes exposed, a storage node formation step for forming in the storage node formation space a storage node from a capacitive material, and a sacrificial dielectric layer removal step for removing the sacrificial dielectric layer surrounding the storage node by means of an etching operation suitable for removal of the first dielectric material.

    摘要翻译: 描述了具有存储节点或紧凑型存储器IC的高产量制造的半导体器件的制造。 本发明提供一种制造半导体器件的方法,该半导体器件包括用于从第一介电材料形成基本电介质层的基本电介质层形成步骤,用于在基本电介质层上形成来自第二电介质的蚀刻停止膜的阻挡膜形成步骤 与第一介电膜不同的材料;牺牲介电层形成步骤,用于在蚀刻停止膜上形成来自第一介电材料的牺牲介电层;空间形成步骤,用于通过从第一电介质膜去除预定区域形成存储节点形成空间; 牺牲电介质层,直到蚀刻停止膜露出,存储节点形成步骤,用于在存储节点形成空间中形成存储节点与电容材料;以及牺牲介电层去除步骤,用于通过以下步骤去除存储节点周围的牺牲介电层: 蚀刻操作的手段适合于去除 l的第一介电材料。

    Method for instructing a data processor to process data
    23.
    发明授权
    Method for instructing a data processor to process data 有权
    指示数据处理器处理数据的方法

    公开(公告)号:US08443173B2

    公开(公告)日:2013-05-14

    申请号:US13153035

    申请日:2011-06-03

    IPC分类号: G06F9/30

    摘要: A data processor which executes instructions described in first and second instruction formats. The first instruction format defines a register-addressing field of a predetermined size, while the second instruction format defines a register-addressing field of a size larger than that of the register-addressing field defined by the first instruction format. The data processor includes: instruction-type identifier, responsive to an instruction, for identifying the received instruction as being described in the first or second instruction format by the instruction itself; a first register file including a plurality of registers; and a second register file also including a plurality of registers, the number of the registers included in the second register file being larger than that of the registers included in the first register file.

    摘要翻译: 执行以第一和第二指令格式描述的指令的数据处理器。 第一指令格式定义了预定大小的寄存器寻址字段,而第二指令格式定义了大于由第一指令格式定义的寄存器寻址字段的大小的寄存器寻址字段。 数据处理器包括:指令类型标识符,响应于指令,用于通过指令本身识别接收到的以第一或第二指令格式描述的指令; 包括多个寄存器的第一寄存器堆; 以及还包括多个寄存器的第二寄存器堆,包括在第二寄存器堆中的寄存器的数目大于包含在第一寄存器堆中的寄存器的寄存器数。

    Semiconductor device and method for fabricating the same
    25.
    发明申请
    Semiconductor device and method for fabricating the same 审中-公开
    半导体装置及其制造方法

    公开(公告)号:US20070272963A1

    公开(公告)日:2007-11-29

    申请号:US11807494

    申请日:2007-05-29

    申请人: Takeshi Kishida

    发明人: Takeshi Kishida

    IPC分类号: H01L29/94 H01L21/8242

    摘要: A semiconductor device having in a deep hole formed in a first interlayer insulating film a memory cell region that comprises a plurality of capacitors having a lower electrode 229 composed of a crown structure having an outside face and inner face, a first upper electrode 231 facing the outside face of the lower electrode, and a dielectric and a second upper electrode extending from the inner face of the lower electrode to the surface of a first interlayer insulating film other than the deep hole; wherein the first upper electrode is connected to the second upper electrode by connecting a first upper electrode 227 formed on the inner wall of the deep hole to the wiring 241a via a conductor film 224 and a conductor plug 236a, and connecting a second upper electrode 231 to be a plate to a wiring 241a via a conductor plug 239a.

    摘要翻译: 一种在第一层间绝缘膜中形成有深孔的半导体器件,存储单元区域包括具有由具有外表面和内表面的表冠结构构成的下电极229的多个电容器,面向 下电极的外表面以及从下电极的内表面延伸到除了深孔以外的第一层间绝缘膜的表面的电介质和第二上电极; 其中,所述第一上部电极通过经由导体膜224和导体插塞236a将形成在深孔的内壁上的第一上部电极227与布线241a连接而与第二上部电极连接,并且将第二上部电极 电极231经由导体插塞239a成为布线241a的板。

    Data processor
    26.
    发明申请

    公开(公告)号:US20070150704A1

    公开(公告)日:2007-06-28

    申请号:US11706333

    申请日:2007-02-15

    IPC分类号: G06F9/40

    摘要: A data processor according to the present invention executes instructions described in first and second instruction formats. The first instruction format defines a register-addressing field of a predetermined size, while the second instruction format defines a register-addressing field of a size larger than that of the register-addressing field defined by the first instruction format. The data processor includes: instruction-type identifier, responsive to an instruction, for identifying the received instruction as being described in the first or second instruction format by the instruction itself; a first register file including a plurality of registers; and a second register file also including a plurality of registers, the number of the registers included in the second register file being larger than that of the registers included in the first register file. If the instruction-type identifier has identified the received instruction as being described in the first instruction format, the data processor executes the instruction using data held in the first register file. On the other hand, if the instruction-type identifier has identified the received instruction as being described in the second instruction format, the data processor executes the instruction using data held in the second register file.

    Method of fabricating semiconductor device comprising superposition inspection step
    27.
    发明授权
    Method of fabricating semiconductor device comprising superposition inspection step 失效
    制造半导体器件的方法,包括叠加检查步骤

    公开(公告)号:US06775920B2

    公开(公告)日:2004-08-17

    申请号:US10437911

    申请日:2003-05-15

    IPC分类号: G01D2100

    摘要: A photolithography step is carried out for exposing/etching a resist film in an etching step. Thereafter a superposition inspection step employing a superposed layer superposition mark and a resist film superposition mark is carried out with a superposition inspection apparatus. In this step, an applied mask confirmation step is simultaneously carried out with the superposition inspection apparatus. Thus, it is possible to provide a method of fabricating a semiconductor device including a superposition inspection step, capable of efficiently confirming an applied mask and improving the fabrication yield for the semiconductor device.

    摘要翻译: 在蚀刻步骤中进行曝光/蚀刻抗蚀剂膜的光刻步骤。 此后,使用重叠检查装置进行使用叠加层叠加标记和抗蚀剂膜叠加标记的叠加检查步骤。 在该步骤中,与叠加检查装置同时进行应用的掩模确认步骤。 因此,可以提供一种制造包括叠加检查步骤的半导体器件的方法,其能够有效地确认所施加的掩模并且提高半导体器件的制造成品率。

    Data processor
    28.
    发明授权

    公开(公告)号:US06199155B1

    公开(公告)日:2001-03-06

    申请号:US09267135

    申请日:1999-03-11

    IPC分类号: G06F930

    摘要: A data processor according to the present invention executes instructions described in first and second instruction formats. The first instruction format defines a register-addressing field of a predetermined size, while the second instruction format defines a register-addressing field of a size larger than that of the register-addressing field defined by the first instruction format. The data processor includes: instruction-type identifier, responsive to an instruction, for identifying the received instruction as being described in the first or second instruction format by the instruction itself; a first register file including a plurality of registers; and a second register file also including a plurality of registers, the number of the registers included in the second register file being larger than that of the registers included in the first register file. If the instruction-type identifier has identified the received instruction as being described in the first instruction format, the data processor executes the instruction using data held in the first register file. On the other hand, if the instruction-type identifier has identified the received instruction as being described in the second instruction format, the data processor executes the instruction using data held in the second register file.

    Microprocessor with arithmetic processing units and arithmetic execution
unit
    29.
    发明授权
    Microprocessor with arithmetic processing units and arithmetic execution unit 失效
    具有算术处理单元和算术执行单元的微处理器

    公开(公告)号:US6065112A

    公开(公告)日:2000-05-16

    申请号:US98448

    申请日:1998-06-17

    摘要: Along with an arithmetic processing unit and an arithmetic execution unit, another arithmetic processing unit is coupled in parallel to an instruction issue unit. Disposed within one of the arithmetic processing units are an address generation unit, an instruction buffer, an instruction decoder, an arithmetic execution unit, a data memory, and a flag register. The instruction decoder decodes an instruction read from the instruction buffer. If the decoded instruction is an iteration start instruction, the instruction decoder extracts a number of times an iterative process is to be executed that is included in the instruction for forwarding to the address generation unit. The address generation unit exerts control as to the execution and termination of iterative processes.

    摘要翻译: 与算术处理单元和算术执行单元一起,另一个运算处理单元与指令发行单元并联耦合。 在一个运算处理单元内配置有地址生成单元,指令缓冲器,指令译码器,运算执行单元,数据存储器以及标志寄存器。 指令解码器对从指令缓冲器读取的指令进行解码。 如果解码指令是迭代开始指令,则指令解码器提取包括在用于转发到地址生成单元的指令中的要执行的迭代处理的次数。 地址生成单元对迭代处理的执行和终止进行控制。