Measuring overlay and profile asymmetry using symmetric and anti-symmetric scatterometry signals
    21.
    发明申请
    Measuring overlay and profile asymmetry using symmetric and anti-symmetric scatterometry signals 有权
    使用对称和反对称散射测量信号测量覆盖层和轮廓不对称

    公开(公告)号:US20060274310A1

    公开(公告)日:2006-12-07

    申请号:US11325872

    申请日:2006-01-04

    CPC classification number: G01N21/211 G01N21/9501 G01N21/956 G03F7/70633

    Abstract: Systems and methods are disclosed for using ellipsometer configurations to measure the partial Mueller matrix and the complete Jones matrix of a system that may be isotropic or anisotropic. In one embodiment two or more signals, which do not necessarily satisfy any symmetry assumptions individually, are combined into a composite signal which satisfies a symmetry assumption. The individual signals are collected at two or more analyzer angles. Symmetry properties of the composite signals allow easy extraction of overlay information for any relative orientation of the incident light beam with respect to a ID grating target, as well as for targets comprising general 2D gratings. Signals of a certain symmetry property also allow measurement of profile asymmetry in a very efficient manner. In another embodiment a measurement methodology is defined to measure only signals which satisfy a symmetry assumption. An optional embodiment comprises a single polarization element serving as polarizer and analyzer. Another optional embodiment uses an analyzing prism to simultaneously collect two polarization components of reflected light.

    Abstract translation: 公开了使用椭偏仪配置来测量可能是各向同性或各向异性的系统的部分Mueller矩阵和完整琼斯矩阵的系统和方法。 在一个实施例中,不一定满足任何对称假设的两个或更多个信号被组合成满足对称假设的复合信号。 各个信号以两个或多个分析器角度收集。 复合信号的对称属性允许容易地提取用于入射光束相对于ID光栅目标的任何相对取向以及包括通用2D光栅的目标的覆盖信息。 具有某种对称性质的信号也可以以非常有效的方式测量轮廓不对称。 在另一个实施例中,测量方法被定义为仅测量满足对称假设的信号。 可选实施例包括用作偏振器和分析器的单个偏振元件。 另一个可选实施例使用分析棱镜来同时收集反射光的两个偏振分量。

    Process and apparatus for integrating sheet resistance measurements and reflectance measurements of a thin film in a common apparatus
    22.
    发明授权
    Process and apparatus for integrating sheet resistance measurements and reflectance measurements of a thin film in a common apparatus 有权
    用于在普通设备中集成薄膜电阻测量和薄膜反射测量的方法和装置

    公开(公告)号:US07050160B1

    公开(公告)日:2006-05-23

    申请号:US10407669

    申请日:2003-04-03

    CPC classification number: G01N21/8422 G01B7/06 G01B11/0625 G01N21/55

    Abstract: A process for measuring both the reflectance and sheet resistance of a thin film, such as a metal film or a doped semiconductor, in a common apparatus comprises: directing a beam of radiation from a radiation source on the common apparatus onto a portion of the surface of the thin film, sensing the amount of radiation reflected from the surface of the thin film, and contacting the surface of the thin film with a sheet resistance measurement apparatus on the apparatus at a portion of the surface of the thin film coincident with or adjacent to the portion of the thin film contacted by the radiation beam to measure the sheet resistance of the thin film. The sheet resistance measurement apparatus may, by way of example, comprise a 4 point probe or an eddy current measurement apparatus. The respective measurements may be carried out either simultaneously or sequentially. By deriving the resistivity of the thin film from the measured reflectance at any particular region of the thin film surface, the thickness of the thin film, at that region of the film, may be obtained by dividing the derived resistivity by the measured sheet resistance for that same region.

    Abstract translation: 用于在公共装置中测量诸如金属膜或掺杂半导体的薄膜的反射率和薄层电阻的方法包括:将来自辐射源的辐射束引导到公共装置上的表面的一部分上 感测从薄膜表面反射的辐射量,并且在薄膜表面的与或相邻的薄膜的表面的一部分处的薄膜电阻测量装置接触薄膜表面 到由辐射束接触的薄膜的部分以测量薄膜的薄层电阻。 作为示例,薄层电阻测量装置可以包括4点探针或涡流测量装置。 相应的测量可以同时或顺序地进行。 通过从薄膜表面的任何特定区域处的测量的反射率导出薄膜的电阻率,可以通过将导电电阻率除以测得的薄层电阻值来获得薄膜的该薄膜的该区域的厚度 同一地区。

    Method and apparatus to simultaneously measure emissivities and
thermodynamic temperatures of remote objects
    23.
    发明授权
    Method and apparatus to simultaneously measure emissivities and thermodynamic temperatures of remote objects 失效
    同时测量远程物体的发射率和热力学温度的方法和装置

    公开(公告)号:US5011295A

    公开(公告)日:1991-04-30

    申请号:US422644

    申请日:1989-10-17

    Abstract: Method and apparatus for accurately and instantaneously determining the thermodynamic temperature of remote objects by continuous determination of the emissivity, the reflectivity, and optical constants, as well as the apparent or brightness temperature of the sample with a single instrument. The emissivity measurement is preferably made by a complex polarimeter including a laser that generates polarized light, which is reflected from the sample into a detector system. The detector system includes a beamsplitter, polarization analyzers, and four detectors to measure independently the four Stokes vectors of the reflected radiation. The same detectors, or a separate detector in the same instrument, is used to measure brightness temperature. Thus, the instrument is capable of measuring both the change in polarization upon reflection as well as the degree of depolarization and hence diffuseness. This enables correction for surface roughness of the sample and background radiation, which could otherwise introduce errors in temperature measurement.

    Abstract translation: 通过用单个仪器连续测定样品的发射率,反射率和光学常数以及样品的表观或亮度温度来准确和瞬时地确定远程物体的热力学温度的方法和设备。 发射率测量优选由包括产生偏振光的激光器的复合旋光计来进行,该偏振光从样品反射到检测器系统中。 检测器系统包括分束器,偏振分析器和四个检测器,以独立地测量反射辐射的四个斯托克斯矢量。 相同的检测器或相同仪器中的单独检测器用于测量亮度温度。 因此,该仪器能够测量反射时的极化的变化以及去极化的程度,从而测量扩散度。 这样可以校正样品的表面粗糙度和背景辐射,否则会导致温度测量误差。

    Light source tracking in optical metrology system
    24.
    发明授权
    Light source tracking in optical metrology system 有权
    光学测量系统中的光源跟踪

    公开(公告)号:US09146156B2

    公开(公告)日:2015-09-29

    申请号:US13285712

    申请日:2011-10-31

    Abstract: The present invention may include loading a diagnostic sample onto a sample stage, focusing light from an illumination source disposed on a multi-axis stage onto the diagnostic sample, collecting a portion of light reflected from a surface of the diagnostic sample utilizing a detector, wherein the illumination source and the detector are optically direct-coupled via an optical system, acquiring a set of diagnostic parameters indicative of illumination source position drift from the diagnostic sample, determining a magnitude of the illumination source position drift by comparing the acquired set of diagnostic parameters to an initial set of parameters obtained from the diagnostic sample at a previously measured alignment condition, determining a direction of the illumination source position drift; and providing illumination source position adjustment parameters configured to correct the determined magnitude and direction of the illumination source position drift to the multi-axis actuation control system of the multi-axis stage.

    Abstract translation: 本发明可以包括将诊断样本加载到样本台上,将来自设置在多轴平台上的照明源的光聚焦到诊断样本上,利用检测器收集从诊断样品的表面反射的一部分光,其中 照明源和检测器通过光学系统光学直接耦合,获取指示来自诊断样本的照明源位置漂移的一组诊断参数,通过比较所获取的诊断参数集合来确定照明源位置漂移的大小 到在先前测量的对准条件下从诊断样本获得的初始参数集合,确定照明源位置漂移的方向; 以及提供照明源位置调整参数,其被配置为校正所确定的照明源位置漂移的大小和方向到所述多轴平台的多轴致动控制系统。

    LIGHT SOURCE TRACKING IN OPTICAL METROLOGY SYSTEM
    25.
    发明申请
    LIGHT SOURCE TRACKING IN OPTICAL METROLOGY SYSTEM 有权
    光学系统系统中的光源跟踪

    公开(公告)号:US20130033704A1

    公开(公告)日:2013-02-07

    申请号:US13285712

    申请日:2011-10-31

    Abstract: The present invention may include loading a diagnostic sample onto a sample stage, focusing light from an illumination source disposed on a multi-axis stage onto the diagnostic sample, collecting a portion of light reflected from a surface of the diagnostic sample utilizing a detector, wherein the illumination source and the detector are optically direct-coupled via an optical system, acquiring a set of diagnostic parameters indicative of illumination source position drift from the diagnostic sample, determining a magnitude of the illumination source position drift by comparing the acquired set of diagnostic parameters to an initial set of parameters obtained from the diagnostic sample at a previously measured alignment condition, determining a direction of the illumination source position drift; and providing illumination source position adjustment parameters configured to correct the determined magnitude and direction of the illumination source position drift to the multi-axis actuation control system of the multi-axis stage.

    Abstract translation: 本发明可以包括将诊断样本加载到样本台上,将来自设置在多轴平台上的照明源的光聚焦到诊断样本上,利用检测器收集从诊断样品的表面反射的一部分光,其中 照明源和检测器通过光学系统光学直接耦合,获取指示来自诊断样本的照明源位置漂移的一组诊断参数,通过比较所获取的诊断参数集合来确定照明源位置漂移的大小 到在先前测量的对准条件下从诊断样本获得的初始参数集合,确定照明源位置漂移的方向; 以及提供照明源位置调整参数,其被配置为校正所确定的照明源位置漂移的大小和方向到所述多轴平台的多轴致动控制系统。

    Azimuth angle measurement
    26.
    发明授权
    Azimuth angle measurement 有权
    方位角测量

    公开(公告)号:US08040511B1

    公开(公告)日:2011-10-18

    申请号:US12357294

    申请日:2009-01-21

    CPC classification number: G01N21/211 G01B11/26

    Abstract: Methods and apparatus for measuring an optical azimuth angle φO of a substrate relative to a plane of detection in scatterometry tools are disclosed. A grating target on a stage of a scatterometry tool may be illuminated and positions of the resulting diffraction orders may be observed. The optical azimuth angle may be determined from the positions of the diffraction orders. Alternatively, polarization-dependent signals of radiation scattered from a line grating may be measured for equal and opposite polarization angles +A and −A. A combination signal may be computed from the polarization-dependent signals obtained at +A and −A and a property of the combination signal may be calculated for several mechanical Azimuth angles φM. A relationship between the optical azimuth angle φO and the mechanical azimuth angle φM may be determined from a behavior of the property as a function of mechanical azimuth angle φM.

    Abstract translation: 公开了用于测量基底相对于散射测量工具中的检测平面的光学方位角< O的方法和装置。 可以照射散射测量工具的台上的光栅目标,并且可以观察所得衍射级的位置。 光学方位角可以从衍射级的位置确定。 或者,可以测量从线光栅散射的辐射的偏振相关信号,以获得相等和相反的偏振角+ A和-A。 可以从在+ A和-A处获得的偏振相关信号计算组合信号,并且可以针对若干机械方位角& M来计算组合信号的特性。 可以根据作为机械方位角的函数的性质的行为来确定光学方位角< O和机械方位角& M之间的关系。

    Measurement of thin film porosity
    27.
    发明授权
    Measurement of thin film porosity 有权
    测量薄膜孔隙率

    公开(公告)号:US07907264B1

    公开(公告)日:2011-03-15

    申请号:US12193450

    申请日:2008-08-18

    Inventor: Shankar Krishnan

    CPC classification number: G01N15/08

    Abstract: A method of measuring a porosity of a film, by measuring a refractive index of the film in a first environment having a first relative humidity to produce a first refractive index measurement. The refractive index of the film is measured in a second environment having a second relative humidity, where the first relative humidity is different from the second relative humidity, to produce a second refractive index measurement. Multiple gases can be used to create the first and second environments. The first refractive index measurement and the second refractive index measurement are input into a model that correlates refractive index to film porosity, to output the porosity of the film.

    Abstract translation: 一种通过在具有第一相对湿度的第一环境中测量膜的折射率来测量膜的孔隙率以产生第一折射率测量的方法。 在具有第二相对湿度的第二环境中测量膜的折射率,其中第一相对湿度与第二相对湿度不同,以产生第二折射率测量。 可以使用多种气体来创建第一和第二种环境。 第一折射率测量和第二折射率测量被输入到将折射率与膜孔隙度相关联的模型中,以输出膜的孔隙率。

    Measurement systems configured to perform measurements of a specimen and illumination subsystems configured to provide illumination for a measurement system
    28.
    发明授权
    Measurement systems configured to perform measurements of a specimen and illumination subsystems configured to provide illumination for a measurement system 有权
    测量系统被配置为执行被配置成为测量系统提供照明的样本和照明子系统的测量

    公开(公告)号:US07869040B1

    公开(公告)日:2011-01-11

    申请号:US12184419

    申请日:2008-08-01

    Abstract: An illumination subsystem configured to provide illumination for a measurement system includes first and second light sources configured to generate light for measurements in different wavelength regimes. The illumination subsystem also includes a TIR prism configured to be moved into and out of an optical path from the first and second light sources to the measurement system. If the TIR prism is positioned out of the optical path, light from only the first light source is directed along the optical path. If the TIR prism is positioned in the optical path, light from only the second light source is directed along the optical path. Various measurement systems are also provided. One measurement system includes an optical subsystem configured to perform measurements of a specimen using light in different wavelength regimes directed along a common optical path. The different wavelength regimes include vacuum ultraviolet, ultraviolet, visible, and near infrared wavelength regimes.

    Abstract translation: 被配置为为测量系统提供照明的照明子系统包括被配置为产生用于不同波长方案中的测量的光的第一和第二光源。 照明子系统还包括被配置为移入和移出从第一和第二光源到测量系统的光路的TIR棱镜。 如果TIR棱镜位于光路外,则仅沿着光路引导来自第一光源的光。 如果TIR棱镜位于光路中,则仅沿着光路引导来自第二光源的光。 还提供了各种测量系统。 一个测量系统包括光学子系统,该光学子系统被配置为使用沿着公共光路引导的不同波长方式的光来对样本进行测量。 不同的波长方案包括真空紫外线,紫外线,可见光和近红外波长方案。

    Global registration of multiple 3D point sets via optimization on a manifold
    29.
    发明授权
    Global registration of multiple 3D point sets via optimization on a manifold 有权
    通过在歧管上进行优化来全局注册多个3D点集

    公开(公告)号:US07831090B1

    公开(公告)日:2010-11-09

    申请号:US11480044

    申请日:2006-06-30

    Abstract: A method for registering multiple 3D point sets by determining optimal relative positions and orientations of the 3D point sets. Initial values are determined for the rotation matrices corresponding to the relative orientations of reference frames of the 3D point sets. A registration error cost function is optimized on a product manifold of all of the rotation matrices to determine optimal values of the rotation matrices. The optimal values of the rotation matrices are used to determine optimal values for translation vectors corresponding to the relative positions of the reference frames of the 3D point sets. The 3D point sets are registered on a common reference frame using the optimal rotation matrices and the optimal translation vectors.

    Abstract translation: 一种用于通过确定3D点集合的最佳相对位置和取向来登记多个3D点集的方法。 对于与3D点集的参考帧的相对取向相对应的旋转矩阵确定初始值。 在所有旋转矩阵的乘积歧管上优化注册误差成本函数,以确定旋转矩阵的最佳值。 旋转矩阵的最佳值用于确定对应于3D点集的参考帧的相对位置的平移向量的最优值。 使用最佳旋转矩阵和最优平移向量将3D点集登记在公共参考帧上。

    METHOD AND APPARATUS FOR LOCATING FACILITIES
    30.
    发明申请
    METHOD AND APPARATUS FOR LOCATING FACILITIES 审中-公开
    用于定位设施的方法和装置

    公开(公告)号:US20100088415A1

    公开(公告)日:2010-04-08

    申请号:US12246973

    申请日:2008-10-07

    CPC classification number: H04L41/0826 H04L41/12

    Abstract: A method and apparatus for providing facility location plans for a network are disclosed. For example, the method identifies a facility and a number of nearest active clients associated with a minimized cost per unit demand of connecting these clients to this facility. The method then connects the number of nearest active clients to the facility associated with the minimized cost per unit demand. In one embodiment, the method iterates this process with the remaining clients until all demands have been assigned to facilities.

    Abstract translation: 公开了一种用于为网络提供设施位置计划的方法和装置。 例如,该方法识别与将这些客户端连接到该设施的每单位需求的最小化成本相关联的设施和最近的活动客户端的数量。 然后,该方法将最近的活动客户端的数量连接到与每单位需求的最小化成本相关联的设施。 在一个实施例中,该方法与剩余的客户端重复该过程,直到所有需求都被分配给设施。

Patent Agency Ranking